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7578889 |
Methodology for cleaning of surface metal contamination from electrode assemblies
Systematic and effective methodology to clean capacitively coupled plasma reactor electrodes and reduce surface roughness so that the cleaned electrodes meet surface contamination specifications...
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7550091 |
Implant surface preparation
The surface of a device that is surgically implantable in living bone is prepared. The device is made of titanium with a native oxide layer on the surface. The method of preparation comprises the...
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7531492 |
Composition for the removal of sidewall residues
A composition for the production of semiconductors, comprising H2SiF6 and/or HBF4 in a total amount of 10-500 mg/kg, 1-17 % by weight of H2S04, 1-15% by weight of H202, optionally in combination...
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7501073 |
Methods for producing metallic implants having roughened surfaces
The invention provides a method of providing a metallic orthopaedic implant with a micron or nanometer-scale surface roughness to facilitate acceptance of tissue and bone growth or apposition after...
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7497963 |
Etching method
In this etching method, since an etching gas is introduced before introduction of free radicals into a processing chamber, the etching gas has been adsorbed on the surface of substrates when the...
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7491341 |
Method of making tapered capillary tips with constant inner diameters
Methods of forming electrospray ionization emitter tips are disclosed herein. In one embodiment, an end portion of a capillary tube can be immersed into an etchant, wherein the etchant forms a...
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7417016 |
Composition for the removing of sidewall residues
The present invention relates to a composition for the removal of so-called “sidewall residues” from metal surfaces, in particular from aluminium or aluminium-containing surfaces, in particular...
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7368065 |
Implants with textured surface and methods for producing the same
Compositions and methods are provided for preparing a metal substrate having a uniform textured surface with a plurality of indentations with a diameter in the nanometer and micrometer range. The...
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7367343 |
Method of cleaning a surface of a cobalt-containing material, method of forming an opening to a cobalt-containing material, semiconductor processing method of forming an integrated circuit comprising a copper-containing conductive line, and a cobalt-containing film cleaning solution
The invention includes methods of cleaning a surface of a cobalt-containing material, methods of forming an opening to a cobalt-containing material, semiconductor processing methods of forming an...
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7347951 |
Method of manufacturing electronic device
A method of manufacturing an electronic device comprises forming a wiring material layer made of aluminum or an aluminum alloy on the surface of an insulating film on a substrate, patterning the...
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7314575 |
Manufacturing method of glass substrate for magnetic disk, and manufacturing method of magnetic disk
A method for manufacturing a glass substrate for a magnetic disk comprises mirror surface polishing and cleaning of a glass substrate, wherein polishing agent of which the principal component is...
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7306681 |
Method of cleaning a semiconductor substrate
A cleaning method and cleaning recipes are disclosed. The present invention relates to a method for cleaning a semiconductor substrate and cleaning recipes. The present invention utilizes a first...
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7276181 |
Method for preparing decorative glass using glass etching composition
A method for preparing a decorative glass using a glass etching composition, wherein a frosting of elaborate patterns and designs is applied on the surface of the glass having an arbitrary shape,...
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7098143 |
Etching method using an at least semi-solid media
An etching method that uses an etch reactant retained within at least a semi-solid media ( 120, 220, 224, 230 ). The etch reactant media is applied to selectively etch a surface layer ( 106, 218,...
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7097783 |
Method for inspecting a titanium-based component
A process for detecting an aluminum-based material deposited onto a titanium-based gas turbine engine component during engine operation is disclosed. The process comprises immersing at least a...
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7067015 |
Modified clean chemistry and megasonic nozzle for removing backside CMP slurries
A cleaning chemistry for lowering defect levels on the backside of a semiconductor wafer after chemical mechanical planarization (CMP). In a preferred embodiment of the present invention, a...
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7048870 |
Metallic implant and process for treating a metallic implant
A process for treating a metallic implant consisting essentially of treating the metallic implant with a solution of hydrofluoric acid, which solution has a pH between 1.6 and 3.0.
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7033519 |
Method of fabricating sub-micron structures in transparent dielectric materials
A sub-micron structure is fabricated in a transparent dielectric material by focusing femtosecond laser pulses into the dielectric to create a highly tapered modified zone with modified etch...
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7022254 |
Chromate-free method for surface etching of titanium
Non-chromate solutions for treating and/or etching metals, particularly, aluminum, aluminum alloys, steel and titanium, and method of applying same wherein the solutions include either a titanate...
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6953533 |
Process for removing chromide coatings from metal substrates, and related compositions
A method for removing a chromide coating from the surface of a substrate is described. The coating is treated with a composition which includes an acid having the formula H x AF 6 , where “A”...
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6933254 |
Plasma-resistant articles and production method thereof
A plasma-resistant article is provided in which a surface region of the article to be exposed to plasma in a corrosive atmosphere is formed from a zirconia-based ceramic that contains yttria in an...
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6908561 |
Polymide-to-substrate adhesion promotion in HDI
Methods for adhering polyimide dielectric materials to copper-, titanium-, aluminum-, or copper-and-titanium-containing portions of a substrate are described. The methods include the steps of...
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6902626 |
Method for roughening copper surface
A liquid etchant and a method for roughening a copper surface each capable of providing copper with a roughened surface increased in acid resistance regardless of a chlorine ion in a short period...
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6893578 |
Selective etchant for oxide sacrificial material in semiconductor device fabrication
An etching composition and method is disclosed for removing an oxide sacrificial material during manufacture of semiconductor devices including micromechanical, microelectromechanical or...
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6843929 |
Accelerated etching of chromium
A method and associated structure for increasing the rate at which a chromium volume is etched when the chromium body is contacted by an acid solution such as hydrochloric acid. The etch rate is...
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6843928 |
Method for removing metal cladding from airfoil substrate
A method for removing metal cladding adhered to an airfoil, such as a turbine blade, wherein the airfoil comprises a substrate and wherein at least a portion of the cladding is adhered to at least...
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6821452 |
Etchant
An etching agent which can etch insulating film with high speeds without damaging the resist pattern, provide realistic throughput when the insulting film etching process in the semiconductor...
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6808746 |
Multilayer carbon nanotube films and method of making the same
This invention relates to a process for the preparation of a substrate-free aligned nanotube film, comprising: (a) synthesizing a layer of aligned carbon nanotubes on a quartz glass substrate by...
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6802911 |
Method for cleaning damaged layers and polymer residue from semiconductor device
A method of cleaning damaged layers and polymer residue on semiconductor devices includes mixing HF and ozone water in a vessel to form a solution of HF and ozone water, and dipping a semiconductor...
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6800214 |
Method for correcting characteristics of attenuated phase-shift mask
A method for correcting characteristics of an attenuated phase-shift mask having an attenuated layer including (a) storing a data in a memory, which shows a correlation between characteristics and...
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6793838 |
Chemical milling process and solution for cast titanium alloys
The present invention relates to a chemical milling solution and a chemical milling process for removing a desired depth of material from metal parts. The milling solution contains nitric acid,...
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6793738 |
Method for processing acid treatment solution, solution processed thereby, and method for treating articles therewith
A method for preparing a solution for treating an article, a treatment solution made thereby, and a method for treating an article with the solution are presented with, for example, the treatment...
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6790786 |
Etching processes for integrated circuit manufacturing including methods of forming capacitors
The invention includes semiconductor processing methods, including methods of forming capacitors. In one implementation, a semiconductor processing method includes providing a semiconductor...
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6776918 |
Titanium composite material
The invention provides a titanium composite material comprising a bonded laminate having a layer of macromolecular material bonded to the modified surface of a titanium sheet or a titanium alloy...
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6733597 |
Method of cleaning a dual damascene structure
A method is provided for cleaning a dual damascene structure. A first metal layer, a cap layer, and a dielectric layer are formed on a substrate in sequence. Then a dual damascene opening is formed...
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6726848 |
Apparatus and method for single substrate processing
In a method for treating a semiconductor substrate, a single substrate is positioned in a single-substrate process chamber and subjected to wet etching, cleaning and/or drying steps. The single...
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6706121 |
Device and method for the treatment of semiconductor wafers
In a method of treating substrates a treatment fluid is fed into a collection vessel after treatment, at least a portion of the treatment fluid is withdrawn from the collection vessel and returned...
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6669857 |
Process for etching bismuth-containing oxide films
A process is described for etching oxide films containing at least one bismuth-containing oxide, in particular a ferroelectric bismuth-containing mixed oxide. A substrate onto which at least one...
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6649947 |
Surface-micromachined rotatable member having a low-contact-area hub
A surface-micromachined rotatable member formed on a substrate and a method for manufacturing thereof are disclosed. The surface-micromachined rotatable member, which can be a gear or a rotary...
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6635184 |
Method for pattern-etching alumina layers and products
A method for pattern-etching thick alumina layers in the manufacture of thin film heads (TFH) by using compatible metallic mask layers and a wet chemical etchant. The deep alumina etching...
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6634186 |
Process for cutting a glass sheet and a glass disk for a recording medium
A U-shaped groove is formed in a glass sheet along a cutting line and the sheet is cut by breaking along the groove. The groove is formed by heating a sheet portion including the cutting line by a...
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6620332 |
Method for making a mesh-and-plate surgical implant
Method for making a mesh-and-plate surgical implant includes the steps of applying maskant to first and second faces of a metal sheet, selectively ablating the maskant on both faces, affixing a...
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6607674 |
Method of repairing a phase shifting mask
A phase shifting mask repair process is described. The process uses an etching gas or a hydrofluoric acid solution to etch the quartz substrate and the characteristics of the phase shifter layer...
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6605230 |
Solutions and processes for removal of sidewall residue after dry etching
The present invention relates to a novel process for removing sidewall residue after dry-etching process. Conventionally, after dry-etching, photoresist and sidewall residues are removed by ozone...
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6558733 |
Method for etching a micropatterned microdepot prosthesis
An implantable prosthesis, for example a stent, is provided having one or more micropatterned microdepots formed in the stent. Depots are formed in the prosthesis via chemical etching and laser...
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6500352 |
Electrode plate, liquid crystal device and production thereof
An electrode plate is formed by a substrate and a plurality of patterned electrodes formed on the substrate. Each patterned electrode has a laminate structure including a first layer of nickel...
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6475373 |
Method of controlling NOx gas emission by hydrogen peroxide
Emission of NOx during acid-piclding treatment of metals in an aqueous solution containing at least nitric acid is controlled by the addition of hydrogen peroxide. The addition amount of hydrogen...
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6444010 |
Platinum group impurity recovery liquid and method for recovering platinum group impurity
A mixed aqueous solution containing HCl with a concentration of 10 to 25% by weight, H 2 O 2 with a concentration of 2 to 5% by weight, and HF with a concentration of 0.01 to 2% by weight or a...
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6428716 |
Method of etching using hydrofluorocarbon compounds
A method of etching comprising subjecting a material under plasma etching conditions to an etching composition comprising at least an etchant compound having the formula C X H C F Z wherein:...
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6426012 |
Wet chemical etch process for patterning MRAM magnetic layers
A three-part etching process is employed to selectively pattern exposed magnetic film layers of a magnetic thin film structure. The magnetic structure to be etched includes at least one bottom...
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