Matches 1 - 42 out of 42
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7578889 Methodology for cleaning of surface metal contamination from electrode assemblies  
Systematic and effective methodology to clean capacitively coupled plasma reactor electrodes and reduce surface roughness so that the cleaned electrodes meet surface contamination specifications...
7314575 Manufacturing method of glass substrate for magnetic disk, and manufacturing method of magnetic disk  
A method for manufacturing a glass substrate for a magnetic disk comprises mirror surface polishing and cleaning of a glass substrate, wherein polishing agent of which the principal component is...
7306681 Method of cleaning a semiconductor substrate  
A cleaning method and cleaning recipes are disclosed. The present invention relates to a method for cleaning a semiconductor substrate and cleaning recipes. The present invention utilizes a first...
7060631 Methods of cleaning surfaces of copper-containing materials, and methods of forming openings to copper-containing substrates  
The invention encompasses a semiconductor processing method of cleaning a surface of a copper-containing material by exposing the surface to an acidic mixture comprising Cl − , NO 3 − and F...
6936183 Etch process for etching microstructures  
A two-step method of releasing microelectromechanical devices from a substrate is disclosed. The first step comprises isotropically etching a silicon oxide layer sandwiched between two...
6902626 Method for roughening copper surface  
A liquid etchant and a method for roughening a copper surface each capable of providing copper with a roughened surface increased in acid resistance regardless of a chlorine ion in a short period...
6893578 Selective etchant for oxide sacrificial material in semiconductor device fabrication  
An etching composition and method is disclosed for removing an oxide sacrificial material during manufacture of semiconductor devices including micromechanical, microelectromechanical or...
6793838 Chemical milling process and solution for cast titanium alloys  
The present invention relates to a chemical milling solution and a chemical milling process for removing a desired depth of material from metal parts. The milling solution contains nitric acid,...
6706121 Device and method for the treatment of semiconductor wafers  
In a method of treating substrates a treatment fluid is fed into a collection vessel after treatment, at least a portion of the treatment fluid is withdrawn from the collection vessel and returned...
6666987 Liquid etchant and method for roughening copper surface  
A liquid etchant and a method for roughening a copper surface each capable of providing copper with a roughened surface increased in acid resistance regardless of a chlorine ion in a short period...
6656294 Method of reducing elution of lead in lead-containing copper alloy, and drinking water service fittings made of lead-containing copper alloy  
It is an object of the present invention to provide a processing method for preventing elution of lead in a lead-containing copper alloy to prevent lead from eluting from a faucet metal, etc. made...
6605230 Solutions and processes for removal of sidewall residue after dry etching  
The present invention relates to a novel process for removing sidewall residue after dry-etching process. Conventionally, after dry-etching, photoresist and sidewall residues are removed by ozone...
6589439 Composition for selective etching of oxides over metals  
A composition for selective etching of oxides over a metal. The composition contains water, hydroxylammonium salt, carboxylic acid, a fluorine containing compound, and optionally, a base. The pH of...
6540931 Removal of copper kiss from pickling high copper alloys  
When iron group, especially high nickel, metal alloys that contain substantial amounts of copper are pickled, a displacement coating of copper that is called a “copper kiss” often forms on the...
6123865 Method for improving etch uniformity during a wet etching process  
A method for improving etch uniformity during a wet etching process is disclosed. The method comprises the steps of first rinsing the wafer to form a water film over the wafer surface, followed by...
6083413 Metals removal process  
5620558 Etching of copper-containing devices  
The linewidth in patterns produced by etching copper layers is more easily maintained using a specific etching medium. In particular, this medium includes aqueous hydrofluoric acid, copper...
5554254 Post contact layer etch back process which prevents precipitate formation  
A process for preventing the formation of precipitates on a substrate surface after a contact layer (e.g., tungsten layer) etch back. The process involves removing the precursor chemicals of the...
5431774 Copper etching  
A dry etch for metals such as copper using π-acids in an energetic environment such as a plasma, laser, or afterglow reactor (102) or by using ligands forming volatiles at low temperature within a...
5328552 Leadframe processing for molded package arrangements  
A method for processing a leadframe for use with a molded package is disclosed. In particular, the method is suited for arrangements where direct wirebond attachment sites are exposed through the...
5106454 Process for multilayer printed circuit board manufacture  
Process for at least partially dissolving a copper oxide surface layer by contacting the surface layer with one or more copper oxide dissolving compounds. When used in the manufacture of a...
5049234 Methods for removing stringers appearing in copper-containing multi-layer printed wiring boards  
Copper-containing multilayer substrates are etched, and stringers formed in the plated through-holes in these substrates are simultaneously removed by treatment with an aqueous composition...
4915781 Stabilized hydrogen peroxide compositions  
The present invention is directed to a hydrogen peroxide solution stabilized by ##STR1## wherein X is a linking group and Y is a metal cation or H which compound is soluble in hydrogen peroxide. In...
4875973 Hydrogen peroxide compositions containing a substituted aminobenzaldehyde  
The invention is directed to a hydrogen peroxide solution stabilized by a substituted aminobenzaldehyde compound which is soluble in hydrogen peroxide. The stabilized hydrogen peroxide solution...
4875972 Hydrogen peroxide compositions containing a substituted oxybenzene compound  
The present invention is directed to a hydrogen peroxide solution stabilized by a substituted oxybenzene compound which is soluble in hydrogen peroxide. In a second aspect of the invention, a...
4725374 Process and apparatus for etching copper base materials  
A solution for etching copper or a copper base material, the solution consisting essentially of peroxydisulfuric acid, being present in an amount of from about 0.5N up to about 6.0N, with chloride...
4687545 Process for stripping tin or tin-lead alloy from copper  
A two step process is described for selectively stripping tin or tin-lead alloys from a copper substrate without significant loss of copper from the substrate. In a first step the substrate coated...
4581102 Copper-base alloy cleaning solution  
The present invention relates to a cleaning solution for removing surface oxides from copper base alloys without significantly etching the copper-base alloy material. The cleaning solution...
4510018 Solution and process for treating copper and copper alloys  
A solution and process for cleaning, deoxidizing and brightening copper or copper alloys comprising immersion of the copper or copper alloy in a solution comprising an aqueous mixture of sulfuric...
4424097 Metal stripping process and composition  
A stripper, for the removal of tin and tin compounds, in particular copper metal-resists in contact switches, comprises an aqueous solution of 5 to 20% v/v hydrochloric acid, 2.5 to 6.0 g/l copper...
4319955 Ammoniacal alkaline cupric etchant solution for and method of reducing etchant undercut  
An improved ammoniacal alkaline etchant solution and method of reducing etchant undercut for use in etching copper and copper-containing alloy traces on substrates having resist-coated areas and...
4220706 Etchant solution containing HF-HnO.sub.3 -H.sub.2 SO.sub.4 -H.sub.2 O.sub.2  
An etchant solution for multilayered metal layers comprising an aqueous solution of from 0.5 to 50 percent by weight of nitric acid, from 0.03 to 1.0 percent by weight of hydrofluoric acid, from...
4175011 Sulfate-free method of etching copper pattern on printed circuit boards  
In printed circuit board manufacture, a copper pattern on the board is slightly etched and then a tin/lead layer is plated onto the etched copper pattern. The etching step is free of sulfate...
3986970 Solution for chemical dissolution treatment of tin or alloys thereof  
A solution for chemical dissolution treatment (for example, pickling, etching, chemical milling, chemical polishing or leaching) of tin or its alloys which comprises an aqueous solution of an acid,...
3945865 Metal dissolution process  
Evolution of NOx fumes during dissolution of metal values in mineral acid solutions of nitric acid can be eliminated by the addition of small quantities of hydrogen peroxide to the acid solution.
3939089 Etching solutions for copper and copper alloys and etching process using the same  
This invention provides etching solutions for copper and copper alloys comprising a mixed aqueous solution of a peroxysulfate with a purine compound and a halogen compound added as the catalyst....
3936332 Copper and copper alloy etching solutions and process  
This invention provides cooper and copper alloy etching solutions comprising a mixed aqueous solution of a peroxysulfate with a diazine compound and a halogen compound added as the catalyst. There...
3520746 METAL ETCH COMPOSITIONS  
3056709 Etched filler containing polytetrafluoroethylene bearing material  
2946683 Presensitized printing plate and method for preparing same  
3556883 Title is not available  
3600245 Title is not available  
Matches 1 - 42 out of 42