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7611619 |
Electrochemical miniaturization of organic micro-and nanostructures
The invention provides a simple and convenient strategy for reducing the dimensions of organic micro- and nanostructures on metal surfaces. By varying electrochemical desorption conditions, organic...
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7578924 |
Process for producing high etch gains for electrolytic capacitor manufacturing
Anode foil, preferably aluminum anode foil, is etched using a process of treating the foil in an electrolyte bath composition comprising a sulfate and a halide, such as sodium chloride. The anode...
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7566391 |
Methods and systems for removing materials from microfeature workpieces with organic and/or non-aqueous electrolytic media
Methods and systems for removing materials from microfeature workpieces are disclosed. A method in accordance with one embodiment of the invention includes providing a microfeature workpiece having...
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7531079 |
Method and apparatus for uniform electropolishing of damascene IC structures by selective agitation
The present invention pertains to apparatus and methods for planarization of metal surfaces having both recessed and raised features, over a large range of feature sizes. The invention accomplishes...
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7513986 |
Method and device for locally removing coating from parts
A method and a device for locally removing coatings from components. An absorbent medium supplied with a coating removal liquid is brought into contact with one or more areas of a component from...
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7501051 |
Electropolishing electrolyte and method for planarizing a metal layer using the same
The present electropolishing electrolyte comprises an acid solution and an alcohol additive having at least one hydroxy group, wherein the contact angle of the alcohol additive is smaller than the...
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7422700 |
Compositions and methods of electrochemical removal of material from a barrier layer of a wafer
Methods and compositions have been provided for removing barrier layer material from a work piece during an electrochemical mechanical polishing process while protecting a metallization layer of...
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7374654 |
Method of making an organic memory cell
A method of making an organic memory cell which comprises two electrodes with a controllably conductive media between the two electrodes is disclosed. The present invention involves providing a...
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7357854 |
Process for electropolishing a device made from cobalt-chromium
The invention is directed to an electropolishing solution for products or devices made from at least in part a cobalt-chromium alloy. The invention is particularly suitable for medical devices or...
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7332068 |
Selective removal of dielectric materials and plating process using same
A metal is provided on a polymeric component and the component is subjected to a removal process such as plasma or liquid etching in the presence of an electric field. The etchant selectively...
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7259101 |
Nanoparticles and method for making the same
A method for making nanoparticles, nanoparticle inks and device layers therefrom is disclosed. In accordance with the present invention, nanoparticles are isolated from a composite material that is...
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7239121 |
Quantative extraction of micro particles from metallic disk spacer rings
Embodiments of the present invention include a method for quantitatively detecting embedded particles of a disk spacer ring comprising. The method includes dissolving a layer of a disk spacer ring...
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7150820 |
Thiourea- and cyanide-free bath and process for electrolytic etching of gold
An aqueous thiourea-free gold etching bath for electrolytically etching gold from a microelectronic workpiece. One embodiment of the aqueous thiourea-free bath contains: (a) about 0.5–1.5 M...
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7128825 |
Method and composition for polishing a substrate
Polishing compositions and methods for removing conductive materials from a substrate surface are provided. In one aspect, a composition includes an acid based electrolyte system, one or more...
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7101471 |
Method for planar material removal technique using multi-phase process environment
An electroetching process of the present invention uses a multiphase environment for planarizing a wafer with conductive surface having a non-uniform topography. The multiphase environment includes...
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7094131 |
Microelectronic substrate having conductive material with blunt cornered apertures, and associated methods for removing conductive material
A microelectronic substrate and method for removing conductive material from a microelectronic substrate. In one embodiment, the microelectronic substrate includes a conductive or semiconductive...
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7045052 |
Method of manufacturing a spectral filter for green and longer wavelengths
A method of manufacture for optical spectral filters with omnidirectional properties in the visible, near IR, mid IR and/or far IR (infrared) spectral ranges is based on the formation of large...
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7026255 |
Method and device for photo-electrochemically etching a semiconductor sample, especially gallium nitride
In a method for photo-electrochemical etching of a semiconductor sample, the semiconductor sample is brought in contact with an electrolyte liquid. The contact area formed thereby is illuminated...
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6969457 |
Method for partially stripping a coating from the surface of a substrate, and related articles and compositions
An electrochemical process for selectively stripping at least one coating from the surface of a substrate is disclosed. The substrate (often a turbine engine component) is immersed in a composition...
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6923900 |
Alloy pipes and methods of making same
A profiled tube ( 50 b ) comprising a high carbon content alloy (greater than 0.3%), superalloy or other high creep strength material, has a fluted bore with internal fins ( 52 b ) and intervening...
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6899804 |
Electrolyte composition and treatment for electrolytic chemical mechanical polishing
An electrolyte composition and method for planarizing a surface of a wafer using the electrolyte composition is provided. In one aspect, the electrolyte composition includes ammonium dihydrogen...
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6884338 |
Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor
The present invention provides methods of polishing and/or cleaning copper interconnects using bis(perfluoroalkanesulfonyl) imide acids or copper tris(perfluoroalkanesulfonyl) methide acids...
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6866769 |
Drive head and ECM method and tool for making same
A drive head for a bolt, fastener, coupling, nut or other driveable head made from a less malleable metal such as a powder metal nickel alloy. The drive head has an upper drive portion having at...
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6858124 |
Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor
The present invention provides methods of polishing and/or cleaning copper interconnects using sulfonic acid compositions.
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6858126 |
High capacitance anode and system and method for making same
A method of producing electrodes for electrolytic capacitors by etching metal foil in a low pH etching electrolyte is disclosed. The low pH electrolyte is an aqueous solution, which comprises...
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6843929 |
Accelerated etching of chromium
A method and associated structure for increasing the rate at which a chromium volume is etched when the chromium body is contacted by an acid solution such as hydrochloric acid. The etch rate is...
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6835299 |
Electrochemical machining method and apparatus
An electrochemical machining technique involves moving a cathode ( 2 ) towards an anodic workpiece ( 1 ). A current is passed through an electrolyte which flows between the cathode ( 2 ) and...
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6802954 |
Creation of porous anode foil by means of an electrochemical drilling process
The present invention is directed to a method of creating porous anode foil for use in multiple anode stack configuration electrolytic capacitors, producing a pore structure that is microscopic in...
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6790785 |
Metal-assisted chemical etch porous silicon formation method
A thin discontinuous layer of metal such as Au, Pt, or Au/Pd is deposited on a silicon surface. The surface is then etched in a solution including HF and an oxidant for a brief period, as little as...
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6790336 |
Method of fabricating damascene structures in mechanically weak interlayer dielectrics
A copper damascene process for a mechanically weak low k dielectric layer is described. Electropolishing is used to etch back the copper. A sacrificial conductive layer beneath the barrier layer...
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6783657 |
Systems and methods for the electrolytic removal of metals from substrates
The present invention provides methods and systems for the electrolytic removal of platinum and/or other of the Group 8-11 metals from substrates.
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6780305 |
Method for producing support for planographic printing plate, support for planographic printing plate, and planographic printing plate precursor
The invention provides a method for producing a support for planographic printing plates which comprises a step of roughening the surface of an aluminum plate and in which the surface-roughening...
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6736956 |
Non-uniform etching of anode foil to produce higher capacitance gain without sacrificing foil strength
The present invention is directed to a method of etching anode foil in a non-uniform manner which increases the overall capacitance gain of the foil while retaining foil strength. In particular, by...
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6682645 |
Process for producing aluminum support for lithographic printing plate
In a process for producing an aluminum support of a lithographic printing plate, the desired aluminum support is produced by imparting fine asperities to an aluminum plate and then roughening it...
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6679985 |
Electrochemical discharge machining device and machining method
An electrochemical discharge machining method may include electrolytically machining a tool fed by a three-dimensional tool feeder which can accurately feed a tool in three dimensions. The...
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6676826 |
Method for production of a rotor for centrifugal compressors
A method for production of a rotor for centrifugal compressor, wherein the said rotor is produced from a monolithic disc, which is provided with a central hole. The method consists of use, within...
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6610194 |
Bath composition for electropolishing of titanium and method for using same
A bath composition for the electropolishing of a metal surface made of nonalloyed titanium is disclosed. The bath composition may comprise sulfuric acid of 2 to 40% by volume, hydrofluoric acid of...
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6596150 |
Production method for an aluminum support for a lithographic printing plate
Disclosed is a production method of an aluminum support for a lithographic printing plate, capable of stable and low-cost production of an aluminum support for a lithographic printing plate, the...
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6585947 |
Method for producing silicon nanoparticles
A method for producing the silicon nanoparticle of the invention is a gradual advancing electrochemical etch of bulk silicon. Separation of nanoparticles from the surface of the silicon may also be...
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6579439 |
Electrolytic aluminum polishing processes
This invention, in one aspect, relates to processes for electropolishing aluminum, in particular, aluminum alloy metal surfaces, by immersing the metal surface in a polishing solution and making...
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6565734 |
Electrochemical process using current density controlling techniques
An electrochemical process using current density controlling techniques is disclosed. In the electrochemical process of this invention, a carbon cathode rod activated with a negative voltage and an...
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6491808 |
Electrolytic etching method, method for producing photovoltaic element, and method for treating defect of photovoltaic element
An electrolytic etching method for etching treating an object to be etched by an electrochemical reaction through an electrolyte between the object to be etched and an etching electrode, where the...
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6488834 |
Blade re-sharpener and method
A razor blade sharpener utilising the principles of an electrochemical cell. The blade ( 10 ) forms an anode (−) and a cathodic plate ( 16 ) is provided in close proximity to the razor edge ( 12...
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6485630 |
Method of reducing wear in lubricated metal cutting operation
A method of reducing cutting tool wear in a lubricated metal cutting operation has been developed. An electrical cutting cell is provided having an anodic conductive cutting tool and a cathodic...
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6436276 |
Cathodic photoresist stripping process
A novel photoresist stripping process is disclosed. Specifically, it has been found that if a printed wiring board panel having photoresist on its surface is used as a cathode during electrolysis...
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6402592 |
Electrochemical methods for polishing copper films on semiconductor substrates
Methods for electrochemically polishing copper films on semiconductor substrates use an alkaline solution with a pH in the range of about 8.0 to 10.5. A constant current density of from 5 to 100...
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6398940 |
Method for fabricating nanoscale patterns on a surface
A novel method to fabricate nanoscale pits on Au(111) surfaces in contact with aqueous solution is claimed. The method uses in situ electrochemical scanning tunnelling microscopy with independent...
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6376285 |
Annealed porous silicon with epitaxial layer for SOI
An epitaxial layer of silicon is grown on a layer of partially-oxidized porous silicon, then covered by a capping layer which provides structural support and prevents oxidation of the epitaxial...
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6328876 |
Method for producting a filter
A method for producing a filter includes the steps of providing a blank of etchable semiconductor material having a first side and a second side and affixing a holding element to the blank. The...
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6287449 |
Method of electrolytic texturing and electrolytic liquid slurry
An electrolytic liquid slurry containing pure water, abrading particles and nitric acid, boric acid, alkanol amine, sodium sulfite, sodium chloride, ammonium chloride, sodium phosphate, potassium...
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