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7611619 Electrochemical miniaturization of organic micro-and nanostructures  
The invention provides a simple and convenient strategy for reducing the dimensions of organic micro- and nanostructures on metal surfaces. By varying electrochemical desorption conditions, organic...
7578924 Process for producing high etch gains for electrolytic capacitor manufacturing  
Anode foil, preferably aluminum anode foil, is etched using a process of treating the foil in an electrolyte bath composition comprising a sulfate and a halide, such as sodium chloride. The anode...
7566391 Methods and systems for removing materials from microfeature workpieces with organic and/or non-aqueous electrolytic media  
Methods and systems for removing materials from microfeature workpieces are disclosed. A method in accordance with one embodiment of the invention includes providing a microfeature workpiece having...
7531079 Method and apparatus for uniform electropolishing of damascene IC structures by selective agitation  
The present invention pertains to apparatus and methods for planarization of metal surfaces having both recessed and raised features, over a large range of feature sizes. The invention accomplishes...
7513986 Method and device for locally removing coating from parts  
A method and a device for locally removing coatings from components. An absorbent medium supplied with a coating removal liquid is brought into contact with one or more areas of a component from...
7501051 Electropolishing electrolyte and method for planarizing a metal layer using the same  
The present electropolishing electrolyte comprises an acid solution and an alcohol additive having at least one hydroxy group, wherein the contact angle of the alcohol additive is smaller than the...
7422700 Compositions and methods of electrochemical removal of material from a barrier layer of a wafer  
Methods and compositions have been provided for removing barrier layer material from a work piece during an electrochemical mechanical polishing process while protecting a metallization layer of...
7374654 Method of making an organic memory cell  
A method of making an organic memory cell which comprises two electrodes with a controllably conductive media between the two electrodes is disclosed. The present invention involves providing a...
7357854 Process for electropolishing a device made from cobalt-chromium  
The invention is directed to an electropolishing solution for products or devices made from at least in part a cobalt-chromium alloy. The invention is particularly suitable for medical devices or...
7332068 Selective removal of dielectric materials and plating process using same  
A metal is provided on a polymeric component and the component is subjected to a removal process such as plasma or liquid etching in the presence of an electric field. The etchant selectively...
7259101 Nanoparticles and method for making the same  
A method for making nanoparticles, nanoparticle inks and device layers therefrom is disclosed. In accordance with the present invention, nanoparticles are isolated from a composite material that is...
7239121 Quantative extraction of micro particles from metallic disk spacer rings  
Embodiments of the present invention include a method for quantitatively detecting embedded particles of a disk spacer ring comprising. The method includes dissolving a layer of a disk spacer ring...
7150820 Thiourea- and cyanide-free bath and process for electrolytic etching of gold  
An aqueous thiourea-free gold etching bath for electrolytically etching gold from a microelectronic workpiece. One embodiment of the aqueous thiourea-free bath contains: (a) about 0.5–1.5 M...
7128825 Method and composition for polishing a substrate  
Polishing compositions and methods for removing conductive materials from a substrate surface are provided. In one aspect, a composition includes an acid based electrolyte system, one or more...
7101471 Method for planar material removal technique using multi-phase process environment  
An electroetching process of the present invention uses a multiphase environment for planarizing a wafer with conductive surface having a non-uniform topography. The multiphase environment includes...
7094131 Microelectronic substrate having conductive material with blunt cornered apertures, and associated methods for removing conductive material  
A microelectronic substrate and method for removing conductive material from a microelectronic substrate. In one embodiment, the microelectronic substrate includes a conductive or semiconductive...
7045052 Method of manufacturing a spectral filter for green and longer wavelengths  
A method of manufacture for optical spectral filters with omnidirectional properties in the visible, near IR, mid IR and/or far IR (infrared) spectral ranges is based on the formation of large...
7026255 Method and device for photo-electrochemically etching a semiconductor sample, especially gallium nitride  
In a method for photo-electrochemical etching of a semiconductor sample, the semiconductor sample is brought in contact with an electrolyte liquid. The contact area formed thereby is illuminated...
6969457 Method for partially stripping a coating from the surface of a substrate, and related articles and compositions  
An electrochemical process for selectively stripping at least one coating from the surface of a substrate is disclosed. The substrate (often a turbine engine component) is immersed in a composition...
6923900 Alloy pipes and methods of making same  
A profiled tube ( 50 b ) comprising a high carbon content alloy (greater than 0.3%), superalloy or other high creep strength material, has a fluted bore with internal fins ( 52 b ) and intervening...
6899804 Electrolyte composition and treatment for electrolytic chemical mechanical polishing  
An electrolyte composition and method for planarizing a surface of a wafer using the electrolyte composition is provided. In one aspect, the electrolyte composition includes ammonium dihydrogen...
6884338 Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor  
The present invention provides methods of polishing and/or cleaning copper interconnects using bis(perfluoroalkanesulfonyl) imide acids or copper tris(perfluoroalkanesulfonyl) methide acids...
6866769 Drive head and ECM method and tool for making same  
A drive head for a bolt, fastener, coupling, nut or other driveable head made from a less malleable metal such as a powder metal nickel alloy. The drive head has an upper drive portion having at...
6858124 Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor  
The present invention provides methods of polishing and/or cleaning copper interconnects using sulfonic acid compositions.
6858126 High capacitance anode and system and method for making same  
A method of producing electrodes for electrolytic capacitors by etching metal foil in a low pH etching electrolyte is disclosed. The low pH electrolyte is an aqueous solution, which comprises...
6843929 Accelerated etching of chromium  
A method and associated structure for increasing the rate at which a chromium volume is etched when the chromium body is contacted by an acid solution such as hydrochloric acid. The etch rate is...
6835299 Electrochemical machining method and apparatus  
An electrochemical machining technique involves moving a cathode ( 2 ) towards an anodic workpiece ( 1 ). A current is passed through an electrolyte which flows between the cathode ( 2 ) and...
6802954 Creation of porous anode foil by means of an electrochemical drilling process  
The present invention is directed to a method of creating porous anode foil for use in multiple anode stack configuration electrolytic capacitors, producing a pore structure that is microscopic in...
6790785 Metal-assisted chemical etch porous silicon formation method  
A thin discontinuous layer of metal such as Au, Pt, or Au/Pd is deposited on a silicon surface. The surface is then etched in a solution including HF and an oxidant for a brief period, as little as...
6790336 Method of fabricating damascene structures in mechanically weak interlayer dielectrics  
A copper damascene process for a mechanically weak low k dielectric layer is described. Electropolishing is used to etch back the copper. A sacrificial conductive layer beneath the barrier layer...
6783657 Systems and methods for the electrolytic removal of metals from substrates  
The present invention provides methods and systems for the electrolytic removal of platinum and/or other of the Group 8-11 metals from substrates.
6780305 Method for producing support for planographic printing plate, support for planographic printing plate, and planographic printing plate precursor  
The invention provides a method for producing a support for planographic printing plates which comprises a step of roughening the surface of an aluminum plate and in which the surface-roughening...
6736956 Non-uniform etching of anode foil to produce higher capacitance gain without sacrificing foil strength  
The present invention is directed to a method of etching anode foil in a non-uniform manner which increases the overall capacitance gain of the foil while retaining foil strength. In particular, by...
6682645 Process for producing aluminum support for lithographic printing plate  
In a process for producing an aluminum support of a lithographic printing plate, the desired aluminum support is produced by imparting fine asperities to an aluminum plate and then roughening it...
6679985 Electrochemical discharge machining device and machining method  
An electrochemical discharge machining method may include electrolytically machining a tool fed by a three-dimensional tool feeder which can accurately feed a tool in three dimensions. The...
6676826 Method for production of a rotor for centrifugal compressors  
A method for production of a rotor for centrifugal compressor, wherein the said rotor is produced from a monolithic disc, which is provided with a central hole. The method consists of use, within...
6610194 Bath composition for electropolishing of titanium and method for using same  
A bath composition for the electropolishing of a metal surface made of nonalloyed titanium is disclosed. The bath composition may comprise sulfuric acid of 2 to 40% by volume, hydrofluoric acid of...
6596150 Production method for an aluminum support for a lithographic printing plate  
Disclosed is a production method of an aluminum support for a lithographic printing plate, capable of stable and low-cost production of an aluminum support for a lithographic printing plate, the...
6585947 Method for producing silicon nanoparticles  
A method for producing the silicon nanoparticle of the invention is a gradual advancing electrochemical etch of bulk silicon. Separation of nanoparticles from the surface of the silicon may also be...
6579439 Electrolytic aluminum polishing processes  
This invention, in one aspect, relates to processes for electropolishing aluminum, in particular, aluminum alloy metal surfaces, by immersing the metal surface in a polishing solution and making...
6565734 Electrochemical process using current density controlling techniques  
An electrochemical process using current density controlling techniques is disclosed. In the electrochemical process of this invention, a carbon cathode rod activated with a negative voltage and an...
6491808 Electrolytic etching method, method for producing photovoltaic element, and method for treating defect of photovoltaic element  
An electrolytic etching method for etching treating an object to be etched by an electrochemical reaction through an electrolyte between the object to be etched and an etching electrode, where the...
6488834 Blade re-sharpener and method  
A razor blade sharpener utilising the principles of an electrochemical cell. The blade ( 10 ) forms an anode (−) and a cathodic plate ( 16 ) is provided in close proximity to the razor edge ( 12...
6485630 Method of reducing wear in lubricated metal cutting operation  
A method of reducing cutting tool wear in a lubricated metal cutting operation has been developed. An electrical cutting cell is provided having an anodic conductive cutting tool and a cathodic...
6436276 Cathodic photoresist stripping process  
A novel photoresist stripping process is disclosed. Specifically, it has been found that if a printed wiring board panel having photoresist on its surface is used as a cathode during electrolysis...
6402592 Electrochemical methods for polishing copper films on semiconductor substrates  
Methods for electrochemically polishing copper films on semiconductor substrates use an alkaline solution with a pH in the range of about 8.0 to 10.5. A constant current density of from 5 to 100...
6398940 Method for fabricating nanoscale patterns on a surface  
A novel method to fabricate nanoscale pits on Au(111) surfaces in contact with aqueous solution is claimed. The method uses in situ electrochemical scanning tunnelling microscopy with independent...
6376285 Annealed porous silicon with epitaxial layer for SOI  
An epitaxial layer of silicon is grown on a layer of partially-oxidized porous silicon, then covered by a capping layer which provides structural support and prevents oxidation of the epitaxial...
6328876 Method for producting a filter  
A method for producing a filter includes the steps of providing a blank of etchable semiconductor material having a first side and a second side and affixing a holding element to the blank. The...
6287449 Method of electrolytic texturing and electrolytic liquid slurry  
An electrolytic liquid slurry containing pure water, abrading particles and nitric acid, boric acid, alkanol amine, sodium sulfite, sodium chloride, ammonium chloride, sodium phosphate, potassium...
Matches 1 - 50 out of 283 1 2 3 4 5 6 >