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8043483 |
Film forming method by sputtering and sputtering apparatus thereof
To provide a sputtering apparatus that enables oblique film forming by arranging a target and a substrate so as to allow sputtered particles emitted from the target to obliquely enter the substrate...
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7955480 |
Sputtering apparatus and film deposition method
The present invention provides a sputtering apparatus and a film deposition method capable of forming a magnetic film with reduced variations in the direction of magnetic anisotropy. The sputtering...
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7510634 |
Apparatus and methods for deposition and/or etch selectivity
Disclosed are apparatus and method embodiments for achieving etch and/or deposition selectivity in vias and trenches of a semiconductor wafer. That is, deposition coverage in the bottom of each via...
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7229532 |
Sputtering apparatus
A sputtering apparatus for forming a film by a physical gas-phase growth on a substrate having a irregular or flat shape is provided including three or more axes for independently varying a...
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6905578 |
Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure
An apparatus and method for depositing plural layers of materials on a substrate within a single vacuum chamber allows high-throughput deposition of structures such as these for GMR and MRAM...
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6835289 |
Particle implantation apparatus and particle implantation method
The particle implantation apparatus comprises a target, an ion beam source, a target scanning mechanism, a slit plate, a holder, and a holder scanning mechanism. The target is used for sputtering....
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6736946 |
Physical vapor deposition apparatus with modified shutter disk and cover ring
Physical vapor deposition (PVD) system comprises a chamber, an upper shield and a lower shield mounted within the chamber, a cover ring having one or more tabs extending radially inwardly...
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6726816 |
Method for forming thin film, spheroid coated with thin film, light bulb using the spheroid and equipment for film formation
The present invention provides a method for forming thin films, wherein thin films with a uniform thickness can be formed on substrates as objects such as spheroids, even when the films are formed...
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6641702 |
Sputtering device
The present invention is directed to a sputtering device for depositing multi-layer films on a substrate, the sputtering device comprising at least one planar-magnetron-sputtering-cathode and at...
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6623606 |
Method and apparatus for sputter coating with variable target to substrate spacing
Thickness uniformity of films sputtered from a target onto a series of substrates is maintained as the target surface shape changes due to the consumption of the target. The eroded condition of the...
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6579420 |
Apparatus and method for uniformly depositing thin films over substrates
A thin film deposition apparatus and method are disclosed in this invention. The apparatus includes a depositing thin-film particle source, a beam-defining aperture between the particle source and...
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6485616 |
System and method for coating substrates with improved capacity and uniformity
A system and method for coating substrates. The coating process includes an improved capacity and uniformity through the addition of a second motion component in which the substrates move in a...
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6461483 |
Method and apparatus for performing high pressure physical vapor deposition
A method and apparatus that operates at a high pressure of at least one torr for improving sidewall coverage within trenches and vias in a substrate. The apparatus comprises a chamber enclosing a...
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6402906 |
Sputtering alloy films using a crescent-shaped aperture
A method and system for producing thin film alloy by a sputtering deposition process comprising using a crescent-shaped aperture interposed between the target and substrate of a sputtering...
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6395156 |
Sputtering chamber with moving table producing orbital motion of target for improved uniformity
A sputtering chamber has a target that moves with an orbital motion relative to an ion beam. An X-Y assembly allows for target movement in both the horizontal and vertical directions. The X-Y...
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6355146 |
Sputtering process and apparatus for coating powders
A process and apparatus for coating small particles and fibers. The process involves agitation by vibrating or tumbling the particles or fibers to promote coating uniformly, removing adsorbed gases...
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6328858 |
Multi-layer sputter deposition apparatus
A multi-layer sputter deposition chamber or cluster tool module is described. The sputter deposition chamber includes a plurality of magnetrons mounted on a rotatable member that defines an...
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6309516 |
Method and apparatus for metal allot sputtering
A method and apparatus for sputter deposition of metal alloys with improved compositional uniformity is provided, wherein a first, narrow width target is provided with a sputtering surface...
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6303008 |
Rotating film carrier and aperture for precision deposition of sputtered alloy films
A method and system for producing thin film alloy by a sputtering deposition process comprising using a circle-shaped aperture interposed between the target and substrate of a sputtering deposition...
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6270633 |
Artificial latticed multi-layer film deposition apparatus
The present invention relates to an artificial latticed multi-layer film deposition apparatus for depositing on a substrate a gigantic magneto-resistive effect film (GMR film) having an artificial...
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6238531 |
Method and apparatus to improve the properties of ion beam deposited films in an ion beam sputtering system
An ion beam sputtering system having a chamber, an ion beam source, multiple targets, a shutter, and a substrate stage for securely holding a wafer substrate during the ion beam sputtered...
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6235171 |
Vacuum film forming/processing apparatus and method
Disclosed is a vacuum film forming/processing apparatus and method which is hardly influenced by dusts and contamination on a substrate and moreover has a reduced exhaust volume. A substrate...
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6216631 |
Robotic manipulation system utilizing patterned granular motion
A system (100, 100', 100") and method for robotic manipulation of objects (130) is provided wherein particulates (110, 110') are agitated by the transfer of energy thereto to establish patterned...
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6210540 |
Method and apparatus for depositing thin films on vertical surfaces
A mask is placed over a center portion of a deposition source to limit angle of the flux from the source. A substrate or device with a vertical surface (referenced to a major surface of the...
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6193853 |
Magnetron sputtering method and apparatus
An elongate emitter is used as a cathode to coat material onto a cylindrical workpiece by magnetron sputterinig. Where the inside surface of the workpiece is coated, the workpiece itself is used as...
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6149785 |
Apparatus for coating powders
A process and apparatus for coating small particles and fibers. The process involves agitation by vibrating or tumbling the particles or fibers to promote coating uniformly, removing adsorbed gases...
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6123814 |
Coating station
A coating station has a flat sputter source opposite a workpiece receiving arrangement is configured as a planet arrangement. The rotating axes (AP) of the planets intersect one another on a...
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6036821 |
Enhanced collimated sputtering apparatus and its method of use
A sputtering apparatus using a collimator disposed between a wafer holder for holding a wafer and a target to intercept some of the particles ejected from the target, wherein the collimator is...
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5783055 |
Multi-chamber sputtering apparatus
A multi-chamber sputtering apparatus characterized in that a plurality of target electrodes and a substrate transfer mechanism which is able to transfer a substrate to positions facing the target...
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5755937 |
Apparatus for applying layers of metal onto a surface
An apparatus and method for supporting and agitating a plurality of loose objects during a procedure known as sputter coating. A magnetron gun and the apparatus are positioned within a vacuum...
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5741404 |
Multi-planar angulated sputtering target and method of use for filling openings
Disclosed is a multi-plans sputtering target and a method of using the multi-planar sputtering target in PVD sputtering for filling high aspect ratio interconnect structure openings. The...
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5730847 |
Arc ion plating device and arc ion plating system
The present invention relates to an arc ion plating device utilizing a vacuum arc discharge to be utilized for the surface process of works and to an arc ion plating system provided with the...
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5709785 |
Metallizing machine
A vacuum-metallizing machine including a metal platter base (17) having an obverse side and a face side. A substrate-receiving platter (2) is resiliently disposed (3, 3b) in a recess on the face...
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5662785 |
Method for masking a workpiece and a vacuum treatment facility
A vacuum treatment facility and method are provided for the surface treatment of workpieces, particularly for the covering of the central and/or peripheral area of circular-disk-shaped workpieces,...
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5616226 |
Cathode assembly
A pair of parallel elongate targets are fixed with respect to respective plates mounted in a vacuum chamber by means of clamps arranged along the longitudinal sides of each target, and an...
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5540821 |
Method and apparatus for adjustment of spacing between wafer and PVD target during semiconductor processing
A heater and pedestal actuator is provided to actuate the pedestal of a deposition chamber from a first position wherein a wafer may be placed thereon to a second position adjacent to the...
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5520784 |
Ultrasonic enhancement of aluminum step coverage and apparatus
A method and apparatus for sputter depositing aluminum onto a semiconductor substrate to fill micron and submicron vias utilizes ultrasonic energy to ensure adequate filling of the vias. The...
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5182256 |
Process and apparatus for preparing superconducting thin films
A process for preparing a thin film of high-temperature compound oxide superconductor by a magnetron sputtering method. A substrate and a target are arranged in parallel with each other in a vacuum...
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5180708 |
Process and apparatus for preparing superconducting thin films
A process for preparing a thin film of high-temperature compound oxide superconductor having a large area on a substrate by a magnetron sputtering method. A magnetron electrode on which an...
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4988424 |
Mask and method for making gradient sputtered coatings
Sputtered coatings of gradient thicknesses are produced by employing a foraminous mask between the cathode and the substrate. The size of openings in the foraminous mask may be varied in different...
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4904362 |
Bar-shaped magnetron or sputter cathode arrangement
The invention relates to a bar-shaped magnetron-sputter cathode arrangement having an internal, cooled permanent magnet system and a carrier tube for the target. It is provided according to the...
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4851095 |
Magnetron sputtering apparatus and process
A rotary cylindrical sputtering system incorporates separate, separately-controlled linear magnetron sputter cathode and reaction zones for sputter depositing materials such as refractory metals...
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4490227 |
Process for making a curved, conductively coated glass member and the product thereof
The specification discloses a method for making a curved, conductively coated glass member, and the resulting product, by providing for a sufficient degree of substoichiometry at the moment of bend...
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4437966 |
Sputtering cathode apparatus
A sputtering cathode apparatus for the deposition of thin films which are produced at a relatively high deposition rate. A relatively large planar magnetron sputtering system or apparatus is...
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4132624 |
Apparatus for producing metal oxide films
A substantially uniform, transparent, electrically conducting, metal oxide film (e.g. of indium/tin oxide) can be deposited on to a substrate such as glass of large lateral dimensions, e.g. a...
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4102768 |
Metal oxide coatings
A method and apparatus are disclosed for depositing transparent electrically-conductive metal oxide coatings or films, e.g. of indium/tin oxides, on non-conducting substrates, such as glass. The...
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4022947 |
Transparent panel having high reflectivity for solar radiation and a method for preparing same
Disclosed is a transparent panel capable of transmitting a desired proportion of visible radiation while reflecting a large proportion of incident solar radiation, and a method of preparing same,...
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3891536 |
Sputter-coating apparatus
A sputter-coating apparatus comprises an elongated chamber provided at its ends with loading doors and having internally upright supports each provided with a pair of vertically spaced guide rails...
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3738928 |
SPUTTER-COATING APPARATUS WITH END FEED
A sputter-coating apparatus comprises an elongated chamber provided at one end with a loading door and having internally a plurality of pairs of guide rails between which vertical platelike...
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3546091 |
SPUTTERING DEVICE FOR DEPOSITING WEAR RESISTANT COATINGS ON WORK SURFACES
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