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7361256 |
Electrolytic reactor
An electrolytic reactor including a conical recess of removable slices through which the electrolyte circulates towards a part to be coated under the action of a pump setting up forced circulation....
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7273534 |
Optical device substrate film-formation apparatus, optical disk substrate film-formation method, substrate holder manufacture method, substrate holder, optical disk and a phase-change recording type of optical disk
In an optical disk substrate film-formation apparatus which prepared an optical disk by forming a thin film on a substrate, the optical disk substrate is held by a holder section. A contact support...
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7204913 |
In-situ pre-coating of plasma etch chamber for improved productivity and chamber condition control
A semiconductor processing chamber having a silicon containing pre-coat is provided. The chamber includes a top electrode in communication with a power supply and a processing chamber defined...
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7182814 |
Sample holder for physical vapor deposition equipment
A sample holder for physical vapor deposition equipment, which is disposed in a vacuum chamber for holding samples, includes a transmission mechanism and a fastening mechanism. The transmission...
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7163608 |
Apparatus for synthesis of layers, coatings or films
Systems and methods are described for the synthesis of films, coatings or layers. An apparatus includes a first holder; a second holder coupled to the first holder; a linkage coupled to the first...
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7163607 |
Process kit for improved power coupling through a workpiece in a semiconductor wafer processing system
Apparatus for supporting a substrate such as a semiconductor wafer in a process chamber to improve power coupling through the substrate. The apparatus contains a pedestal assembly and a pedestal...
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7039501 |
Method for determining a position of a robot
Generally, a method of determining a position of a robot is provided. In one embodiment, a method of determining a position of a robot comprises acquiring a first set of positional metrics,...
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6946064 |
Sample mount for performing sputter-deposition in a focused ion beam (FIB) tool
A method and structure for a sample processing apparatus that uses a vacuum enclosure is disclosed. A focused ion beam tool, sputter target, movable stage, and hinged mount are all included within...
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6936546 |
Apparatus for shaping thin films in the near-edge regions of in-process semiconductor substrates
An apparatus for shaping and encapsulating near edge regions of a semiconductor wafer is described. A housing of the apparatus has a slot for receiving an edge of a wafer affixed on a rotatable...
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6905582 |
Configurable vacuum system and method
An exemplary configurable vacuum system is provided for use in coating or plating that provides the capability and versatility to handle substrates of significantly different shapes and sizes. The...
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6905578 |
Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure
An apparatus and method for depositing plural layers of materials on a substrate within a single vacuum chamber allows high-throughput deposition of structures such as these for GMR and MRAM...
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6884319 |
Susceptor of apparatus for manufacturing semiconductor device
A susceptor of an apparatus for manufacturing a semiconductor device includes a first part having a first lift pin hole, a second part combined with the first part and forming a space with the...
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6878240 |
Apparatus and method for obtaining symmetrical junctions between a read sensor and hard bias layers
A sputtering system is provided with a substrate and a sputtering material layer that are located in a sputtering chamber. The sputtering material layer has a sputtering surface where atoms of the...
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6869508 |
Physical vapor deposition apparatus and process
A PVD process and apparatus ( 120 ) for depositing a coating ( 132 ) from multiple sources ( 110, 111 ) of different materials. The process and apparatus ( 120 ) are particulaity intended to...
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6855236 |
Components for vacuum deposition apparatus and vacuum deposition apparatus therewith, and target apparatus
A component for a vacuum deposition apparatus comprises a component body and a spray deposit formed on a surface of a component body. A spray deposit has surface roughness in which a mean spacing S...
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6843892 |
Apparatus and method for selectively and controllably electrically biasing a plurality of substrates on a pallet
An in-line, multi-station apparatus including an improved pallet for transporting a plurality of workpieces/substrates through the apparatus, the pallet comprising:
(a) a sheet of...
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6841048 |
Coating apparatus for disk-shaped workpieces
Coating apparatus for disk-shaped workpieces has a transport chamber with a workpiece transport configuration having two linearly driven transport rams connected to a rotational axis. The rams are...
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6818108 |
Chamber for the transport of workpieces in a vacuum atmosphere, a chamber combination and a method for transporting a workpiece
A vacuum chamber for transporting at least one workpiece has two or more openings defining respective opening areas for treating or handling the at least one workpiece. A transport device is...
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6802942 |
Storage plate support for receiving disk-shaped storage plates
To generate an especially good heat transfer between a seating face of a storage plate support and a storage plate, during coating with a sputter source in a vacuum installation, the seating face...
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6783596 |
Wafer handling device
The present invention provides a wafer handling device having a base plate (G; G′), which has a first and a second supporting surface for a respective wafer (W 1 , W 2 ) to be laid on; and a...
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6776887 |
Method and apparatus for thin film center shielding
A carrier ( 20 ) is used in the thin film coating of disks ( 35 ). The disks ( 35 ) are held in a disk tray ( 30 ). The disks ( 35 ) have a center ( 35 a ) through which the thin film coating can...
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6773562 |
Shadow frame for substrate processing
A vacuum processing chamber with walls defining a cavity for processing a substrate. The processing chamber includes a substrate support for supporting a substrate being processed in the cavity, a...
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6749729 |
Method and apparatus for workpiece biassing utilizing non-arcing bias rail
A non-arcing bias rail assembly for supplying an electrical bias potential to a moving workpiece/substrate holder, comprising an elongated metal strip adapted for mounting along a wall of a...
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6746540 |
Wafer support plate assembly having recessed upper pad and vacuum processing apparatus comprising the same
A plate assembly on which a wafer is supported in the processing chamber of a processing apparatus facilitates a precise transfer of the wafer therefrom even when a vacuum atmosphere is present in...
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6743340 |
Sputtering of aligned magnetic materials and magnetic dipole ring used therefor
A magnetic dipole ring assembly positioned inside a vacuum chamber and around a wafer being sputter deposited with a ferromagnetic material such as NiFe or other magnetic materials so that the...
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6743296 |
Apparatus and method for self-centering a wafer in a sputter chamber
A wafer lifter for self-centering a wafer onto a wafer pedestal situated in a physical vapor deposition chamber and a method for self-centering a wafer onto the wafer pedestal are described. The...
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6723214 |
Apparatus for improved power coupling through a workpiece in a semiconductor wafer processing system
Apparatus for supporting a substrate such as a semiconductor wafer in a process chamber to improve power coupling through the substrate. The apparatus contains a pedestal assembly and a pedestal...
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6719886 |
Method and apparatus for ionized physical vapor deposition
Ionized Physical Vapor Deposition (IPVD) is provided by a method of apparatus ( 500 ) particularly useful for sputtering conductive metal coating material from an annular magnetron sputtering...
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6709556 |
Plasma processing apparatus
A sputter apparatus ( 10 ) includes a chamber ( 13 a ) housing a target ( 11 ), a work piece support ( 12 ) and a process area ( 14 ) between the target and the support. The apparatus further...
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6699375 |
Method of extending process kit consumable recycling life
One embodiment relates to an apparatus for sputtering material onto a workpiece, the apparatus including a vacuum chamber and a target disposed in the vacuum chamber, the target comprising a...
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6695954 |
Plasma vapor deposition with coil sputtering
A method and apparatus for depositing a layer of a material which contains a metal on a workpiece surface, in an installation including a deposition chamber; a workpiece support providing a...
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6689264 |
Semiconductor wafer clamp retainer
An improved wafer clamp retainer is provided. The retainer is used to movably secure a wafer clamp to an upper electrode within a parallel-plate reactor. When drawn downward, the wafer clamp is...
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6676812 |
Alignment mark shielding ring without arcing defect and method for using
An alignment mark shielding ring for use in a physical vapor deposition chamber and a method for using the ring to avoid arcing problems on the wafer. The alignment mark shielding ring can be...
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6616816 |
Substrate processing device and method
A substrate processing device in which a film is formed on a substrate while a magnetic field, by a magnet arranged in the periphery of a substrate holder, is imparted on to the surface of a...
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6605195 |
Multi-layer deposition process using four ring sputter sources
A sputtering apparatus for depositing layers of material onto a substrate includes a vacuum chamber, a first target and a second target positioned within the vacuum chamber. A source of power is...
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6592729 |
In-line sputtering apparatus
An in-line sputtering apparatus includes a deposition chamber, a target installed inside the deposition chamber, a substrate holder to hold a substrate, a substrate holder transferring mechanism...
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6589352 |
Self aligning non contact shadow ring process kit
The invention provides a removable first edge ring configured for pin and recess/slot coupling with a second edge ring disposed on the substrate support. In one embodiment, a first edge ring...
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6579421 |
Transverse magnetic field for ionized sputter deposition
Ionized sputter deposition apparatus and method employing a low frequency or DC transverse magnetic field to increase the transverse component of the trajectory of sputtered material ions being...
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6528124 |
Disk carrier
A first disk carrier constructed in accordance with the invention is substantially circular, and has a size and shape such that it can be placed in an opening in a second, larger disk carrier. In...
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6521105 |
Sputtering apparatus
In order to provide technology where film deposition speed and Sr/Ti composition ratio is constant even when forming dielectric films consecutively on a plurality of substrates using sputtering...
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6506291 |
Substrate support with multilevel heat transfer mechanism
A substrate support having heat transfer enhancing topography. Generally, the substrate support includes a first side that supports the substrate and a second side. A ring and a plurality of...
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6494997 |
Radio frequency magnetron sputtering for lighting applications
A magnetron sputtering device and method for applying an interference layer to a substrate includes a magnetron sputtering chamber (A) which houses a substrate carrying assembly (B). The substrate...
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6491802 |
Magnetic film forming system
A magnetic film forming system which can always apply a magnetic field to a substrate in a constant direction is disclosed. The magnetic film forming system includes a vacuum container, a substrate...
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6488820 |
Method and apparatus for reducing migration of conductive material on a component
A substrate support and method for reducing the migration of a conductive material is provided. In one embodiment, a support includes a chuck body having a support side and a backside. A guard...
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6485616 |
System and method for coating substrates with improved capacity and uniformity
A system and method for coating substrates. The coating process includes an improved capacity and uniformity through the addition of a second motion component in which the substrates move in a...
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6471837 |
Vacuum coating installation and coupling device
A vacuum coating installation has at least a central distribution station which can be evacuated and has a transport arrangement driven in a controlled manner essentially along a plane, for the...
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6471830 |
Inductively-coupled-plasma ionized physical-vapor deposition apparatus, method and system
A system and related method are disclosed for performing an inductively-coupled-plasma ionized physical-vapor deposition (“PVD”) process for depositing material layers onto a substrate. Within...
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6464843 |
Contamination controlling method and apparatus for a plasma processing chamber
A plasma processing chamber includes a substrate holder and a member of silicon carbide such as a liner, focus ring, perforated baffle or a gas distribution plate, the member having an exposed...
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6454909 |
Method and apparatus for forming a film on an object to be processed
A processing apparatus includes a processing chamber, a support mechanism provided in the processing chamber to support a wafer having an underlying film formed on a major surface and adjacent side...
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6454908 |
Vacuum treatment system
A vacuum treatment system has a vacuum chamber in which there is at least one part which is driven in rotation and is connected by a gear train which comprises at least two rotating transmission...
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