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Document Title |
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8430998 |
Sputtering apparatus
A sputtering apparatus includes a preheating chamber, a deposition chamber, a passage in communication with the preheating chamber and the deposition chamber, a first support assembly received in...
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8414968 |
In-line film forming apparatus and manufacturing method of magnetic recording medium
An in-line film forming apparatus capable of conveying a carrier at a high speed, increasing the exhaust capability within a film forming chamber, and easily realizing a high vacuum degree in a...
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8388753 |
Coating apparatus
A coating apparatus includes a deposition case, a reaction assembly, two precursors, a target, and a driving assembly. The deposition case includes a housing defining a cavity for receiving...
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8382965 |
Tools and methods for mounting transport rails in a substrate processing system
Devices and methods for mounting and aligning transport rails to a processing chamber of a substrate processing system are described. An alignment feature is built-in to the transport rail and a...
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8371565 |
Clamping device and coating apparatus having same
A clamping device for clamping a substrate with a first surface and a second surface includes a supporting plate and a number of clamping units. The supporting plate includes a base portion and an...
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8252118 |
Substrate support device and plasma processing apparatus
There is provided a substrate support device capable of preventing powder dust from being produced. A thermoconductive intermediate member is interposed between a base table and a substrate support...
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8241473 |
Sputter-coating apparatus
A sputter-coating apparatus for coating a plurality of workpieces includes a deposition case defining a cavity, a supporting assembly received in the cavity, and a target assembly received in the...
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8236151 |
Substrate carrier for wet chemical processing
A carrier provides the ability to perform wet chemical processing on substrates using low cost equipment inspired by the electroplating methods typically utilized in leadframe-based semiconductor...
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8221602 |
Non-contact process kit
A process kit for use in a physical vapor deposition (PVD) chamber, along with a PVD chamber having a non-contact process kit are provided. In one embodiment, a process kit includes a generally...
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8182660 |
Power supply apparatus and deposition method using the power supply apparatus
A power supply apparatus includes a power supply mechanism which supplies, from an external power supply, electric power to be supplied to an electrostatic chuck. The power supply mechanism...
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8168050 |
Electrode pattern for resistance heating element and wafer processing apparatus
There is disclosed a wafer processing apparatus having optimized electrode patterns for its resistive heating element. The optimized electrode pattern is designed to compensate for the heat loss...
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8147664 |
Sputtering apparatus
A sputtering apparatus includes a target holder which is placed in a vacuum vessel and can hold a target configured to deposit a film on a substrate, a substrate holder which can mount the...
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8133362 |
Physical vapor deposition with multi-point clamp
A physical vapor deposition apparatus includes a vacuum chamber having side walls, a cathode inside the vacuum chamber, wherein the cathode is configured to include a sputtering target, a radio...
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8128793 |
Vertical substrate transfer apparatus and film-forming apparatus
To provide a vertical substrate transfer apparatus and a film-forming apparatus capable of, regardless of a carrying position of a substrate, subjecting either surface thereof to film-formation,...
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8110078 |
Substrate supporting device and sputtering apparatus including the same
A substrate supporting device for forming a coating film having a maximally even and necessary thickness with a sufficiently strong adhesiveness and a good film quality on a substrate, and a...
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8101054 |
Magnetic particle trapper for a disk sputtering system
A magnetic particle trapper for use in a sputtering system includes a roller cover plate having a plurality of openings arranged and dimensioned to accommodate a plurality of rollers associated...
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8101055 |
Sputtering apparatus and method for forming coating film by sputtering
A sputtering apparatus for forming a coating film made of a metallic film on a coating surface of a substrate by sputtering to have such a film thickness that gradually increases or gradually...
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8101049 |
Method for producing low cost media
Disclosed is a method for the low cost manufacturing a plurality of rigid sputtered magnetic media disks of one or more sizes from a rigid sheet, in which one or more initial steps of preparing the...
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8082977 |
Ceramic mounting for wafer apparatus with thermal expansion feature
A mounting apparatus includes a surface plate; a temperature control unit integrated with the surface plate; and a bottom plate integrated with the temperature control unit via a heat insulation...
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8083912 |
Substrate carrier
A carrier for a substrate, wherein at least a part of the carrier contains a material with a coefficient of thermal expansion which is higher than the coefficient of thermal expansion of the...
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8062487 |
Wafer supporting device of a sputtering apparatus
A wafer supporting device of a sputter apparatus includes a pedestal positioned in a sputtering chamber and used to load a wafer for sputtering, a deposition ring having a recess positioned on a...
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8052853 |
Sputtering apparatus and method of preventing damage thereof
A sputtering apparatus includes a container; a plate for supporting the container; a first attachment for attaching the container to the plate; and a second attachment for less tightly attaching...
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8047636 |
Film depositing apparatus, a film depositing method, a piezoelectric film, and a liquid ejecting apparatus
A film depositing apparatus comprises: a process chamber; a target holder provided in the process chamber for holding a target; a substrate holder for supporting a deposition substrate such that...
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8038797 |
Apparatus and method for manufacturing magnetic recording medium
A method and apparatus for manufacturing a magnetic recording medium uses a small-diameter insulating substrate. The apparatus includes a carrier for a special size of 3.5 inches for receiving a...
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8038850 |
Sputter deposition method for forming integrated circuit
A sputter deposition apparatus and method, and a substrate holder for use with a sputter deposition apparatus is disclosed. According to one embodiment of the invention, a sputter deposition...
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8007644 |
Inclined carrier transferring apparatus
An inclined carrier transferring apparatus for use inline sputtering equipment. The inclined carrier transferring apparatus includes rollers and a guiding portion. The rollers transfer and support...
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7985296 |
Sample fixing device of evaporation machine
A sample fixing device of an evaporation machine includes a first transmission mechanism having a first rotation axis driven by a driving device and a first rotation wheel; a fixing plate and a...
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7967961 |
Film forming apparatus
There is provided a film forming apparatus which is capable of forming a film on both surfaces of a substrate by sputtering continuously with high efficiency by restraining a rise in temperature of...
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7964069 |
Device for galvanic coating of a piston
A device for galvanic coating of a piston has a pot-shaped interior for accommodating the piston and an electrolyte fluid, a holder device for fixing the piston in place, a cover that is structured...
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7951272 |
Thin film producing method
The present invention is made to provide a method of producing a ZnO thin film in which the c-axis is oriented in-plane over a large area. A ZnO target 28 as the material of the thin film is...
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7927473 |
Substrate holder, deposition method using substrate holder, hard disk manufacturing method, deposition apparatus, and program
A substrate holder for supporting an insulating substrate includes a conductive substrate holder main body having an opening, a first support member formed to protrude inside the opening from the...
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7922882 |
Substrate holding device, substrate processing system and liquid crystal display device
In holding a substrate p loaded at a specified position on a holder 30 by clamping a peripheral region of the substrate p against the holder 30 through a plurality of engagement elements 32, it can...
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7837843 |
Fixture for use in a coating operation
This invention relates to a fixture for use in a physical vapor deposition coating operation which comprises a support structure 14 comprising a circular base member 10, a circular top member 11...
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7790004 |
Substrate holder for a vapour deposition system
The invention relates to a partially disposable substrate holder used in magnetic latches for securing substrates on a planetary rotating platform suspended above a coating source in a vacuum...
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7785456 |
Magnetic latch for a vapour deposition system
The invention relates to a magnetic latch for securing substrates on a planetary rotating platform suspended above a coating source in a vacuum chamber of a vapor deposition system, e.g. a chemical...
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7678198 |
Vertical-offset coater
The invention provides a coater, and methods of using the coater, for depositing thin films onto generally-opposed major surfaces of a sheet-like substrate. The coater has a substrate transport...
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7638022 |
Magnetron source for deposition on large substrates
A magnetron source for producing a magnetic field near a surface of a target in a deposition system include a first magnet, a second magnet separated by a gap from the first magnet along a first...
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7571698 |
Low-frequency bias power in HDP-CVD processes
A substrate processing system has a housing that defines a process chamber. A substrate holder disposed within the process chamber supports a substrate during substrate processing. A gas-delivery...
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7520969 |
Notched deposition ring
A process kit for a semiconductor processing chamber is provided. In one embodiment, a process kit includes a notched deposition ring. In another embodiment, a process kit includes a cover ring...
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7501161 |
Methods and apparatus for reducing arcing during plasma processing
In a first aspect, a method is provided for use during plasma processing. The first method includes the steps of (1) placing a substrate on a substrate holder of a plasma chamber; (2) positioning a...
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7485198 |
Tantalum and niobium billets and methods of producing the same
Extruded tantalum billets and niobium billets are described having a substantially uniform grain size and preferably an average grain size of about 150 microns or less and more preferably an...
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7479210 |
Temperature control of pallet in sputtering system
A multi-chamber processing system is described for depositing materials on multiple workpieces (wafers, display panels, or any other workpieces) at a time in a vacuum chamber. The system includes a...
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7444955 |
Apparatus for directing plasma flow to coat internal passageways
An apparatus for coating surfaces of a workpiece is configured to establish a pressure gradient within internal passageways through the workpiece, so that the coating within the internal...
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7445697 |
Method and apparatus for fluid processing a workpiece
A method and apparatus for retaining a workpiece against a workpiece holder are described. A flexible member can be used to provide a substantially uniform force to securely retain the workpiece,...
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7407358 |
Interback-type substrate processing device
An interback-type device in which a substrate 9 is carried into the device from one side of the device and is inverted in the device to be carried out and returned to the same side, a plurality of...
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7361256 |
Electrolytic reactor
An electrolytic reactor including a conical recess of removable slices through which the electrolyte circulates towards a part to be coated under the action of a pump setting up forced circulation....
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7273534 |
Optical device substrate film-formation apparatus, optical disk substrate film-formation method, substrate holder manufacture method, substrate holder, optical disk and a phase-change recording type of optical disk
In an optical disk substrate film-formation apparatus which prepared an optical disk by forming a thin film on a substrate, the optical disk substrate is held by a holder section. A contact support...
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7204913 |
In-situ pre-coating of plasma etch chamber for improved productivity and chamber condition control
A semiconductor processing chamber having a silicon containing pre-coat is provided. The chamber includes a top electrode in communication with a power supply and a processing chamber defined...
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7182814 |
Sample holder for physical vapor deposition equipment
A sample holder for physical vapor deposition equipment, which is disposed in a vacuum chamber for holding samples, includes a transmission mechanism and a fastening mechanism. The transmission...
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7163608 |
Apparatus for synthesis of layers, coatings or films
Systems and methods are described for the synthesis of films, coatings or layers. An apparatus includes a first holder; a second holder coupled to the first holder; a linkage coupled to the first...
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