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8911601 Deposition ring and electrostatic chuck for physical vapor deposition chamber  
Embodiments of the invention generally relate to a process kit for a semiconductor processing chamber, and a semiconductor processing chamber having a kit. More specifically, embodiments described...
8906206 Vertical-offset coater and methods of use  
The invention provides a coater, and methods of using the coater, for depositing thin films onto generally-opposed major surfaces of a sheet-like substrate. The coater has a substrate transport...
8899565 Sputtering device with gas injection assembly  
A sputtering device includes a chamber; and a substrate transferring unit for loading a substrate into, or unloading the substrate from the chamber, the substrate transferring unit including a gas...
8871066 Sample receiving device for sample materials in ultra-high vacuum chambers  
The disclosure relates to a sample-receiving device for sample materials in ultra-high vacuum chambers, in particular for sputter coating installations.
8864966 Coating mask for electrolytically coating a peripheral region on an outer surface of a cylindrical body  
The invention relates to a coating mask (1) for electrolytically coating the piston ring groove (39) of a piston (38), which is made of an elastically deformable material and has openings (3 to 10)...
8852411 Sputtering apparatus  
A sputtering apparatus includes a support assembly and posts. The support assembly includes an upper base, a lower base, seat members, and connection posts interconnected between the upper base and...
8834088 Elevator linear motor drive  
Disclosed is a substrate processing system with a magnetic conduit configuration to improve the movement of a substrate carrier within the system. The configuration specifically provides for safe,...
8795479 Wafer clamp assembly for holding a wafer during a deposition process  
A wafer clamp assembly for holding a wafer during a deposition process comprises an outer annular member defining a central recess that has a diameter slightly greater than the diameter of the...
8790499 Process kit components for titanium sputtering chamber  
A process kit for a sputtering chamber comprises a deposition ring, cover ring, and a shield assembly, for placement about a substrate support in a sputtering chamber. The deposition ring...
8758580 Deposition system with a rotating drum  
A deposition method comprises flowing a first gas into a metallization zone maintained at a first pressure. A second gas flows into a reaction zone maintained at a second pressure. The second...
8758579 Chamber for physical vapour deposition and door for a physical vapour deposition chamber  
A chamber for physical vapor deposition is provided. The chamber includes a housing, a door for opening and closing the housing, and a bearing for receiving a target, wherein the bearing is...
8747627 Method and device for reversing the feeding of sputter coating systems in clean rooms  
The invention relates to a method and to a device for reversing the feeding of a sputter coating system, particularly when coating a photovoltaic module, in clean rooms, having the following...
8709218 Vacuum processing apparatus, vacuum processing method, and electronic device manufacturing method  
A vacuum processing apparatus includes an evacuatable vacuum chamber, a substrate holder which is provided in the vacuum chamber, has a substrate chuck surface vertically facing down, and includes...
8702918 Apparatus for enabling concentricity of plasma dark space  
In some embodiments, substrate processing apparatus may include a chamber body; a lid disposed atop the chamber body; a target assembly coupled to the lid, the target assembly including a target of...
8696878 Wafer processing deposition shielding components  
Embodiments described herein generally relate to components for a semiconductor processing chamber, a process kit for a semiconductor processing chamber, and a semiconductor processing chamber...
8647486 Magnet bar support system  
An apparatus and method for controlling local deposition rate in a physical vapor deposition process is provided. A magnet bar assembly is disposed inside a sputtering target. The magnet bar...
8591711 Method and chamber for inductively coupled plasma processing for cylinderical material with three-dimensional surface  
The present invention relates to an inductively coupled plasma processing chamber and method for a cylindrical workpiece with a three-dimensional profile, and more particularly to an inductively...
8557093 Deposition system with electrically isolated pallet and anode assemblies  
A system for substrate deposition. The system includes a wafer pallet and an anode. The wafer pallet has a bottom and a top. The top of the wafer pallet is configured to hold a substrate wafer. The...
8535495 Coating device  
A coating device includes a rotatable base, a board for holding workpieces, a positioning shaft positioned on the rotatable base, two eccentric wheels, a rack, and two reciprocating shafts. The two...
8535496 Sputter-coating apparatus  
A sputter-coating apparatus is configured for forming coatings on a plurality of workpieces, and includes a deposition chamber defining a cavity, a plurality of targets received in the cavity, and...
8524054 Loading device and sputtering device using same  
A sputtering device includes a main body and a loading device received in the main body. The main body includes a top portion, a bottom portion, and a sidewall connected between the top portion and...
8517364 Disk holder with replaceable inserts to retain springs  
Embodiments of the present invention include a substrate holder apparatus comprising a plate configured with an opening designed to receive a substrate; and a plurality of gripper assemblies...
8512530 Sputtering apparatus  
A sputtering apparatus includes a process chamber having first and second regions, a metal target inside the process chamber, a target transfer unit inside the process chamber, the target transfer...
8506772 Sputtering apparatus  
A sputtering apparatus includes a support assembly and posts. The support assembly includes an upper base, a lower base, seat members, and connection posts interconnected between the upper base and...
8499715 Coating appratus having two coating devices for successively coating same surface of substrate  
A coating apparatus includes a first coating device, a number of second coating devices and a number of substrate holders. Each of the substrate holders is rotatable relative to the first coating...
8500974 Carrier and sputtering device using the same  
A carrier for use during sputtering includes a main body and support members. The main body defines a receiving space and includes a lateral surface defining at least one groove extending along a...
8430998 Sputtering apparatus  
A sputtering apparatus includes a preheating chamber, a deposition chamber, a passage in communication with the preheating chamber and the deposition chamber, a first support assembly received in...
8414968 In-line film forming apparatus and manufacturing method of magnetic recording medium  
An in-line film forming apparatus capable of conveying a carrier at a high speed, increasing the exhaust capability within a film forming chamber, and easily realizing a high vacuum degree in a...
8388753 Coating apparatus  
A coating apparatus includes a deposition case, a reaction assembly, two precursors, a target, and a driving assembly. The deposition case includes a housing defining a cavity for receiving...
8382965 Tools and methods for mounting transport rails in a substrate processing system  
Devices and methods for mounting and aligning transport rails to a processing chamber of a substrate processing system are described. An alignment feature is built-in to the transport rail and a...
8371565 Clamping device and coating apparatus having same  
A clamping device for clamping a substrate with a first surface and a second surface includes a supporting plate and a number of clamping units. The supporting plate includes a base portion and an...
8252118 Substrate support device and plasma processing apparatus  
There is provided a substrate support device capable of preventing powder dust from being produced. A thermoconductive intermediate member is interposed between a base table and a substrate support...
8241473 Sputter-coating apparatus  
A sputter-coating apparatus for coating a plurality of workpieces includes a deposition case defining a cavity, a supporting assembly received in the cavity, and a target assembly received in the...
8236151 Substrate carrier for wet chemical processing  
A carrier provides the ability to perform wet chemical processing on substrates using low cost equipment inspired by the electroplating methods typically utilized in leadframe-based semiconductor...
8221602 Non-contact process kit  
A process kit for use in a physical vapor deposition (PVD) chamber, along with a PVD chamber having a non-contact process kit are provided. In one embodiment, a process kit includes a generally...
8182660 Power supply apparatus and deposition method using the power supply apparatus  
A power supply apparatus includes a power supply mechanism which supplies, from an external power supply, electric power to be supplied to an electrostatic chuck. The power supply mechanism...
8168050 Electrode pattern for resistance heating element and wafer processing apparatus  
There is disclosed a wafer processing apparatus having optimized electrode patterns for its resistive heating element. The optimized electrode pattern is designed to compensate for the heat loss...
8147664 Sputtering apparatus  
A sputtering apparatus includes a target holder which is placed in a vacuum vessel and can hold a target configured to deposit a film on a substrate, a substrate holder which can mount the...
8133362 Physical vapor deposition with multi-point clamp  
A physical vapor deposition apparatus includes a vacuum chamber having side walls, a cathode inside the vacuum chamber, wherein the cathode is configured to include a sputtering target, a radio...
8128793 Vertical substrate transfer apparatus and film-forming apparatus  
To provide a vertical substrate transfer apparatus and a film-forming apparatus capable of, regardless of a carrying position of a substrate, subjecting either surface thereof to film-formation,...
8110078 Substrate supporting device and sputtering apparatus including the same  
A substrate supporting device for forming a coating film having a maximally even and necessary thickness with a sufficiently strong adhesiveness and a good film quality on a substrate, and a...
8101054 Magnetic particle trapper for a disk sputtering system  
A magnetic particle trapper for use in a sputtering system includes a roller cover plate having a plurality of openings arranged and dimensioned to accommodate a plurality of rollers associated...
8101055 Sputtering apparatus and method for forming coating film by sputtering  
A sputtering apparatus for forming a coating film made of a metallic film on a coating surface of a substrate by sputtering to have such a film thickness that gradually increases or gradually...
8101049 Method for producing low cost media  
Disclosed is a method for the low cost manufacturing a plurality of rigid sputtered magnetic media disks of one or more sizes from a rigid sheet, in which one or more initial steps of preparing the...
8082977 Ceramic mounting for wafer apparatus with thermal expansion feature  
A mounting apparatus includes a surface plate; a temperature control unit integrated with the surface plate; and a bottom plate integrated with the temperature control unit via a heat insulation...
8083912 Substrate carrier  
A carrier for a substrate, wherein at least a part of the carrier contains a material with a coefficient of thermal expansion which is higher than the coefficient of thermal expansion of the...
8062487 Wafer supporting device of a sputtering apparatus  
A wafer supporting device of a sputter apparatus includes a pedestal positioned in a sputtering chamber and used to load a wafer for sputtering, a deposition ring having a recess positioned on a...
8052853 Sputtering apparatus and method of preventing damage thereof  
A sputtering apparatus includes a container; a plate for supporting the container; a first attachment for attaching the container to the plate; and a second attachment for less tightly attaching...
8047636 Film depositing apparatus, a film depositing method, a piezoelectric film, and a liquid ejecting apparatus  
A film depositing apparatus comprises: a process chamber; a target holder provided in the process chamber for holding a target; a substrate holder for supporting a deposition substrate such that...
8038797 Apparatus and method for manufacturing magnetic recording medium  
A method and apparatus for manufacturing a magnetic recording medium uses a small-diameter insulating substrate. The apparatus includes a carrier for a special size of 3.5 inches for receiving a...
Matches 1 - 50 out of 413 1 2 3 4 5 6 7 8 9 >