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7618520 |
Physical vapor deposition target constructions
The invention includes a target construction having a sputtering region and a flange region laterally outward relative to the sputtering region. The flange region has a front surface disposed on a...
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7618521 |
Split magnet ring on a magnetron sputter chamber
A split magnet ring, particularly useful in a magnetron plasma reactor sputter depositing tantalum or tungsten or other barrier metal into a via and also resputter etching the deposited material...
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7604717 |
Electrochemical device
The invention relates to an essentially metallic target of a cathodic sputtering device, in particular a magnetic-field-assisted device, the said target mainly comprising nickel alloyed with at...
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7598004 |
Film-depositing target and preparation of phase shift mask blank
For the manufacture of a halftone phase shift mask blank comprising a transparent substrate and a translucent film of one or more layers having a controlled phase and transmittance, at least one...
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7588668 |
Thermally conductive dielectric bonding of sputtering targets using diamond powder filler or thermally conductive ceramic fillers
A sputtering target assembly and method for bonding a sputtering target to a backing plate is disclosed. When insulatively bonding a sputtering target to a backing plate, it is necessary to ensure...
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7578909 |
Method of forming CNT containing wiring material and sputtering target material used for the method
A method of forming a CNT containing wiring material is conducted by sputtering simultaneously CNT and a metal material on a surface of a substrate to form a CNT containing metal layer, then...
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7566438 |
Method for manufacturing nanostructured manganese oxide having dendritic structure, and oxygen reduction electrode comprising nanostructured transition metal oxide having dendritic structure
An object of the present invention is to provide an oxygen reduction electrode having excellent oxygen reduction properties (oxygen reduction catalyst abilities). The present invention...
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7566472 |
Easy-to-clean cooking surface and electric household appliance comprising same
The invention relates to a food cooking surface for kitchen utensils or cooking appliances. The invention is characterised in that the cooking surface is a metallic compound containing, by weight,...
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7563488 |
Process for the manufacturing of a sputter target
The invention relates to a process for manufacturing a sputter target. The process comprises the steps of—providing a target holder ( 12 ); —applying an intermediate layer ( 14 ) on said target...
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7550066 |
Staggered target tiles
A sputtering target, particularly for sputter depositing a target material onto large rectangular panels, in which a plurality of target tiles are bonded to a backing plate in a two-dimensional...
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7540976 |
Sputtering target for forming thin phosphor film
A sputtering target for fluorescent thin-film formation comprising a matrix material and a luminescent center material, wherein said matrix material has a chemical composition represented by the...
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7521132 |
Coated tool
A tool consists of a base material selected from cemented carbide, tool steels, cermet, or hard materials, and a coating of two or more layers. At least one coating layer has the composition...
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7513981 |
Manufacturing apparatus of semiconductor device
A load lock chamber ( 12 ) is connected in a front stage of a film forming chamber ( 11 ) through a damper and the like. A pipe to which a N 2 gas and aeriform or fog-like H 2 O are supplied is...
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7510990 |
Sputtering target, optical thin film and manufacturing method thereof using the sputtering target, and optical recording medium
A sputtering target contains Si and C as its major components and includes a texture in which a Si phase continuously exists in a net shape in gaps among SiC crystal grains. An average diameter of...
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7510635 |
High purity zinc oxide powder and method for production thereof, and high purity zinc oxide target and thin film of high purity zinc oxide
Provided is a manufacturing method of high purity oxide powder including the steps of subjecting a raw material such as Zn-containing scrap to acid leaching or electrolytic extraction, thereafter...
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7494617 |
Enhanced formulation of cobalt alloy matrix compositions
A method for manufacturing a single-element matrix cobalt-based granular media alloy composition formulated as Co f 1 -(M u O v ) f 2 , M representing a base metal selected from the group...
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7468110 |
Hollow cathode target and methods of making same
Sputtering targets and methods of making sputtering targets are described. The method includes the steps of: providing a sputtering metal workpiece made of a valve metal; transverse cold-rolling...
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7431808 |
Sputter target based on titanium dioxide
An electrically conductive titanium dioxide sputter target with an electrical resistivity of less than 5 Ω-cm, which contains as an additive at least one doping agent or a mixture of doping agents...
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7393600 |
Sputtering target, sintered article, conductive film fabricated by utilizing the same, organic EL device, and substrate for use therein
A sintered article is fabricated which contains one or more of indium oxide, zinc oxide, and tin oxide as a component thereof and contains any one or more types of metal out of hafnium oxide,...
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7347353 |
Method for connecting magnetic substance target to backing plate, and magnetic substance target
A method for connecting a magnetic substance target to a backing plate with less variation in plate thickness, characterized in having the steps of connecting the magnetic substance target to an...
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7338582 |
Method for manufacturing manganese oxide nanostructure and oxygen reduction electrode using said manganese oxide nanostructure
It is an object of the present invention to provide an oxygen reduction electrode having excellent oxygen reduction catalysis ability. In a method of manufacturing a manganese oxide nanostructure...
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RE40100 |
Fabrication of B/C/N/O/Si doped sputtering targets
The present invention relates to a method of manufacturing sputtering targets doped with non-metal components including boron, carbon, nitrogen, oxygen and silicon. A powder process is utilized...
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7316763 |
Multiple target tiles with complementary beveled edges forming a slanted gap therebetween
A target assembly composed of multiple target tiles bonded in an array to a backing plate of another material. The edges of the tile within the interior of the array are formed with complementary...
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7282123 |
Composite sputter target and phosphor deposition method
The invention is a novel sputter target and deposition method for multi-element thin film phosphors for thick film dielectric electroluminescent displays in which the deposited phosphors provide a...
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7279211 |
Sputtering target containing zinc sulfide as major component, optical recording medium on which phase change optical disk protective film containing zinc sulfide as major component is formed by using the target, and method for manufacturing the sputtering target
Provided is a sputtering target and an optical recording medium having formed thereon a phase change optical disc protective film having zinc sulfide as its principal component employing such a...
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7241368 |
Hafnium silicide target for gate oxide film formation and its production method
The present invention relates to a hafnium silicide target for forming a gate oxide film composed of HfSi 0.05-0.37 . Obtained is a hafnium silicide target superior in workability and embrittlement...
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7229588 |
Mechanically alloyed precious metal magnetic sputtering targets fabricated using rapidly solidified alloy powders and elemental Pt metal
A cobalt-chromium-boron-platinum sputtering target alloy having multiple phases. The alloy can include Cr, B, Ta, Nb, C, Mo, Ti, V, W, Zr, Zn, Cu, Hf, O, Si or N. The alloy is prepared by mixing Pt...
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7186324 |
Hard film cutting tools, cutting tool coated with hard film, process for forming hard film and target used to form hard film
A hard film for cutting tools which is composed of
(Ti 1−a−b−c−d , Al a , Cr b , Si c , B d )(C 1−e N e )
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7175802 |
Refurbishing spent sputtering targets
Spent sputtering targets are refurbished by filling the depleted region of the target with new sputter material using a hot isostatic pressing or HIP'ing technique.
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7166921 |
Aluminum alloy film for wiring and sputter target material for forming the film
Disclosed is an Al alloy film for wiring, which consists of, by atom, 0.2 to 1.5% Ge and 0.2 to 2.5% Ni and the balance being essentially Al, wherein a total amount of Ge and Ni is not more than...
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7156963 |
Tantalum sputtering target and method for preparation thereof
Provided is a tantalum sputtering target having a crystal structure in which the (222) orientation is preferential from a position of 10% of the target thickness toward the center face of the...
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7150810 |
Sputtering target and method for fabricating the same
A sputtering target includes a backing plate, a copper target provided on the backing plate, and a protection layer formed of a corrosion-resistant metal on the surface of the copper target The...
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7146703 |
Low temperature sputter target/backing plate method and assembly
A sputtering target and a backing plate are diffusion-bonded with or without an insert or inserts interposed there-between so as to have a solid phase diffusion-bonded interface. The sputtering...
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7087142 |
Method for determining a critical size of an inclusion in aluminum or aluminum alloy sputtering target
The present invention relates to a method for determining a critical size for a diameter of an Al 2 O 3 inclusion ( 38 ) in an Al or Al alloy sputter target ( 42 ) to prevent arcing during...
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7074506 |
Method of forming a ceramic coating on a substrate by electron-beam physical vapor deposition
A composite target is placed in a chamber. The target is in the form of a bar made of ceramic powder and it presents composition that is not uniform in the longitudinal direction. At least one...
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7063773 |
High purity sputter targets with target end-of-life indication and method of manufacture
A preferred sputter target assembly ( 10, 10 ′) comprises a target ( 12, 12 ′), a backing plate ( 14, 14 ′) bonded to the target ( 12, 12 ′) along an interface ( 22, 22 ′) and dielectric...
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7041205 |
Sputtering target and method for making composite soft magnetic films with a sintered target
High-saturation magnetization composite soft magnetic films can be deposited with sintered targets made of preferably at least two kinds of powders/elements with much lower saturation magnetization...
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7041204 |
Physical vapor deposition components and methods of formation
A PVD component forming method includes inducing a sufficient amount of stress in the component to increase magnetic pass through flux exhibited by the component compared to pass through flux...
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7041200 |
Reducing particle generation during sputter deposition
In a magnetron sputtering chamber, a substrate is placed in the chamber and a deposition shield is maintained about the substrate to shield internal surfaces in the chamber. The deposition shield...
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7037413 |
Optical information recording medium, producing method thereof and method of recording/erasing/reproducing information
The present invention provides an optical information medium having excellent weather resistance and repeating characteristics. The optical information medium has a barrier layer between a...
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7008519 |
Sputtering target for forming high-resistance transparent conductive film, and method for producing the film
The present invention provides an ITO sputtering target for forming a high-resistance transparent conductive film which target can be used virtually in a DC magnetron sputtering apparatus and can...
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7001675 |
Method of forming a nanocomposite coating
There is disclosed a method of depositing a nanocomposite coating of stainless steel and a metallic carbide or metallic nitride, e.g. chromium carbide or chromium nitride, onto a stainless steel...
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6994775 |
Multilayer composites and manufacture of same
The present invention is directed towards a process of depositing multilayer thin films, disk-shaped targets for deposition of multilayer thin films by a pulsed laser or pulsed electron beam...
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6986834 |
Hafnium silicide target and manufacturing method for preparation thereof
Provided is a hafnium silicide target for forming a gate oxide film composed of HfSi 0.82-0.98 , wherein the oxygen content is 500 to 10000 ppm. Manufactured is a hafnium silicide target for...
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6946039 |
Physical vapor deposition targets, and methods of fabricating metallic materials
The invention includes a physical vapor deposition target composed of a face centered cubic unit cell metal or alloy and having a uniform grain size less than 30 microns, preferably less than 1...
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6929726 |
Sputtering target, Al interconnection film, and electronic component
A sputtering target consists essentially of 0.1 to 50% by weight of at least one kind of element that forms an intermetallic compound with Al, and the balance of Al. The element that forms an...
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6921470 |
Method of forming metal blanks for sputtering targets
The present invention relates to an improvement in the manufacture of metal blanks, discs, and sputtering targets by flattening only one of the two surfaces of a metal plate. The elimination of...
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6921465 |
Method for controlling a refractive index of a dry plating film and method for making a dry plating built-up film
A method for making a dry plating built-up film comprises providing silicon carbide as a starting source and subjecting to dry plating while changing a concentration of a reactive gas continuously...
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6916407 |
Target comprising thickness profiling for an RF magnetron
Method for sputtering from a dielectric target ( 9 ) in a vacuum chamber ( 2 ) with a high frequency gas discharge, the target ( 9 ) being mounted on a cooled metallic back plate ( 10 ) and this...
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6913675 |
Film forming apparatus, substrate for forming oxide thin film, and production method thereof
The invention provides a film forming apparatus that is capable of forming films sequentially with two types of film forming mechanisms in the same chamber. The film forming apparatus according to...
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