|
Match
|
Document |
Document Title |
|
|
7601246 |
Methods of sputtering a protective coating on a semiconductor substrate
Methods of depositing a protective coating of a silicon-containing or metallic material onto a semiconductor substrate include sputtering such material from an electrode onto a semiconductor...
|
|
|
7585396 |
Coated article with ion treated overcoat layer and corresponding method
A coated article is provided that may be used as a vehicle windshield, insulating glass (IG) window unit, or the like. Ion beam treatment is performed on a layer(s) of the coating. For example, an...
|
|
|
7550067 |
Coated article with ion treated underlayer and corresponding method
A coated article is provided that may be used as a vehicle windshield, insulating glass (IG) window unit, or the like. Ion beam treatment is performed on a layer(s) of the coating. For example, a...
|
|
|
7517515 |
Hafnium silicide target for forming gate oxide film and method for preparation thereof
The present invention relates to a hafnium silicide target for forming a gate oxide film composed of HfSi 1.02-2.00 . Obtained is a hafnium silicide target superior in workability and embrittlement...
|
|
|
7316867 |
Method for manufacturing a multi-layered thin film for use as an anode in a lithium secondary battery
A thin film for an anode of a lithium secondary battery having a current collector and an anode active material layer formed thereon is provided. The anode active material layer is a multi-layered...
|
|
|
7273534 |
Optical device substrate film-formation apparatus, optical disk substrate film-formation method, substrate holder manufacture method, substrate holder, optical disk and a phase-change recording type of optical disk
In an optical disk substrate film-formation apparatus which prepared an optical disk by forming a thin film on a substrate, the optical disk substrate is held by a holder section. A contact support...
|
|
|
7235160 |
Hollow cathode sputtering apparatus and related method
The present invention provides an improved hollow cathode method for sputter coating a substrate. The method of the invention comprises providing a channel for gas to flow through, the channel...
|
|
|
7135097 |
Box-shaped facing-targets sputtering apparatus and method for producing compound thin film
Disclosed is a box-shaped facing-targets sputtering apparatus capable of forming, at low temperature, a compound thin film of high quality while causing minimal damage to an underlying layer. The...
|
|
|
7118656 |
Thin film stent
A method for fabricating a stent or other medical device by creating a free standing thin film of metal.
|
|
|
7052552 |
Gas chemistry cycling to achieve high aspect ratio gapfill with HDP-CVD
A method and apparatus are disclosed for depositing a dielectric film in a gap having an aspect ratio at least as large as 6:1. By cycling the gas chemistry of a high-density-plasma...
|
|
|
7037595 |
Thin hafnium oxide film and method for depositing same
A thin layer of hafnium oxide or stacking of thin layers comprising hafnium oxide layers for producing surface treatments of optical components, or optical components, in which at least one layer...
|
|
|
7008519 |
Sputtering target for forming high-resistance transparent conductive film, and method for producing the film
The present invention provides an ITO sputtering target for forming a high-resistance transparent conductive film which target can be used virtually in a DC magnetron sputtering apparatus and can...
|
|
|
6986834 |
Hafnium silicide target and manufacturing method for preparation thereof
Provided is a hafnium silicide target for forming a gate oxide film composed of HfSi 0.82-0.98 , wherein the oxygen content is 500 to 10000 ppm. Manufactured is a hafnium silicide target for...
|
|
|
6958112 |
Methods and systems for high-aspect-ratio gapfill using atomic-oxygen generation
Methods and systems are provided for depositing silicon oxide in a gap on a substrate. The silicon oxide is formed by flowing a process gas into a process chamber and forming a plasma having an...
|
|
|
6921465 |
Method for controlling a refractive index of a dry plating film and method for making a dry plating built-up film
A method for making a dry plating built-up film comprises providing silicon carbide as a starting source and subjecting to dry plating while changing a concentration of a reactive gas continuously...
|
|
|
6919101 |
Method to deposit an impermeable film on porous low-k dielectric film
A method for improving the adhesion of an impermeable film on a porous low-k dielectric film in an interconnect structure is disclosed. The method provides an in-situ annealing step before the...
|
|
|
6893543 |
Information carrier and method for producing the same
A method and apparatus for producing an information carrier which has at least two solid material interfaces at which information is, or may be applied and where the information is stored by local...
|
|
|
6878243 |
Method and apparatus for producing an optically effective system of layers on both sides of a substrate
A method and apparatus for producing an optically effective system of layers on a substrate, such as a lens for use in an optical device. A plasma supported sputter deposition process is employed...
|
|
|
6852203 |
Three-dimensional periodical structure, its manufacturing method, and method of manufacturing film
A three-dimensional periodical structure whose period is about 1 μm or smaller is provided. At least two kinds of films which have two-dimensionally substantially periodical projections are...
|
|
|
6824654 |
Method of making a cube
A cube used to perform optical functions in a system, such as beam splitting or polarizing, or both, is manufactured by optically contacting a coated prism with an uncoated prism. The coated prism...
|
|
|
6821562 |
Method of forming an electrically insulating sealing structure for use in a semiconductor manufacturing apparatus
In accordance with the present invention, an insulating sealing structure useful in physical vapor deposition apparatus is provided. The insulating sealing structure is capable of functioning under...
|
|
|
6811826 |
Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and UV barrier and method for making same
The coated multilayer structure comprising a polymeric base layer, a zero valent material barrier layer, and a top coat on the zero valent material barrier layer, the top coat comprising a soluble...
|
|
|
6808753 |
Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same
The coated multilayer structure comprising a polymeric base layer, an inorganic oxide gas barrier layer on a surface of the polymeric base layer, and a top coat on the inorganic oxide gas barrier...
|
|
|
6802944 |
High density plasma CVD process for gapfill into high aspect ratio features
A method of depositing a film on a substrate. In one embodiment, the method includes depositing a first portion of the film using a high density plasma to partially fill a gap formed between...
|
|
|
6800179 |
Heat treatable coated article with anti-migration barrier between dielectric and solar control layer portion, and methods of making same
A heat treatable coated article includes an oxidation graded layer designed so as to include an at least partially oxided anti-migration or barrier layer(s) portion provided between a solar...
|
|
|
6793781 |
Cathode targets of silicon and transition metal
Silicon-chromium cathode targets having 5 to 80 weight percent chromium are used to sputter absorbing coatings of silicon-chromium-containing material in atmospheres of inert gas such as argon,...
|
|
|
6776882 |
Method for producing a hybrid disk and hybrid disks
Method for producing hybrid disks has a first substrate that is transparent in a given spectral band. A layer system that is semi-transparent in the given band succeeds the first substrate and is...
|
|
|
6764580 |
Application of multi-layer antistatic/antireflective coating to video display screen by sputtering
A multi-layer antistatic/antireflective coating having high electrical conductivity (10 3 ohms) and low reflectivity (0.7%) is applied to the outer surface of a video display screen by sputtering....
|
|
|
6764579 |
Solar management coating system including protective DLC
A substrate is coated with a solar management coating system including at least one infrared (IR) reflective layer. A diamond-like carbon (DLC) inclusive protective coating system (e.g., including...
|
|
|
6746960 |
Electronic techniques for analyte detection
Techniques are used to detect and identify analytes. Techniques are used to fabricate and manufacture sensors to detect analytes. An analyte ( 1810 ) is sensed by sensors ( 1820 ) that output...
|
|
|
6726812 |
Ion beam sputtering apparatus, method for forming a transparent and electrically conductive film, and process for the production of a semiconductor device
An ion beam sputtering apparatus comprising: a first means for generating an ion beam and directing said ion beam in a prescribed direction, a second means for supporting a target at a position...
|
|
|
6652974 |
Hard, scratch-resistant coatings for substrates
A transparent, scratch-resistant, amorphous, easily washed coating on a transparent substrate, together with a method for its preparation. A substrate such as glass is introduced into a sputtering...
|
|
|
6649032 |
System and method for sputtering silicon films using hydrogen gas mixtures
A method has been provided for forming a polycrystalline silicon (p-Si) film with a small amount of hydrogen. Such a film has been found to have excellent sheet resistance, and it is useful in the...
|
|
|
6649033 |
Method for producing electrode for lithium secondary battery
The method for producing an electrode for a lithium secondary battery, having an active material in the form of a thin film composed of an interface layer formed on a current collector and an...
|
|
|
6582809 |
Glazing assembly comprising a substrate provided with a stack of thin layers for solar protection and/or thermal insulation
A glazing assembly is provided made of at least one transparent substrate having a stack thereon that includes an alternation of n functional layers and n−1 coatings, wherein the functional...
|
|
|
6579423 |
Light transmitting electromagnetic wave filter and process for producing the same
A light transmitting electromagnetic wave filter comprising a transparent and a light transmitting electromagnetic wave shield film having a laminate structure composed of 2n+1 (n≧1) layers in...
|
|
|
6579425 |
System and method for forming base coat and thin film layers by sequential sputter depositing
A system and method are provided to sequentially deposit a silicon dioxide base coat barrier layer adjacent a thin silicon film, to minimize the formation of water and —OH radicals. Both the base...
|
|
|
6562207 |
Refractory metal silicide alloy sputter targets, use and manufacture thereof
Sputter target, method of manufacture of same and sputter coating process using the target as a sputtering source are disclosed. The sputter target comprises an Me/Si multi-phase, consolidated...
|
|
|
6537428 |
Stable high rate reactive sputtering
A method and apparatus for monitoring and controlling reactive sputter deposition, particularly useful for depositing insulating compounds (e.g., metal-oxides, metal-nitrides, etc.). For a given...
|
|
|
6528442 |
Optical transparent film and sputtering target for forming optical transparent film
To provide an optically transparent film containing 0.01 to 20% by weight glass forming oxide consisting of Nb 2 O 5 , V 2 O 5 , B 2 O 3 , SiO 2 , and P 2 O 6 ; 0.01 to 20% by weight Al 2 O 3 or...
|
|
|
6511584 |
Configuration for coating a substrate by means of a sputtering device
A sputtering electrode is switched between two power values at a constant reactive gas flow rate which is selected so that the target of the sputtering electrode is in the metallic mode at the...
|
|
|
6491799 |
Method for forming a thin dielectric layer
The method disclosed herein comprises initially providing a tool comprised of a process chamber, a lid above the process chamber, an RF coil for assisting in generating a plasma in the chamber, a...
|
|
|
6471832 |
Method of producing protected thermal head
A method of producing a wear-resistant protective film for a thermal head comprises depositing a wear-resistant protective film by sputtering on a thermal head which includes a substrate, and a...
|
|
|
6468405 |
Sputtering target assembly and method for depositing a thickness gradient layer with narrow transition zone
A sputtering target assembly for depositing onto a selected substrate area comprises a target/cathode having a planar sputtering surface including an erosion track area, a collimating shield...
|
|
|
6468403 |
Methods for producing functional films
A method for producing a transparent conductive film composed mainly of an oxide by sputtering using a sputtering target capable of forming a transparent conductive film, wherein intermittent...
|
|
|
6440592 |
Thermochromic coating
A thermochromic coating comprises a vanadium oxide layer 16 which comprises tungsten and fluorine (FIG. 1).
|
|
|
6425987 |
Technique for deposition of multilayer interference thin films using silicon as the only coating material
A new technique is provided using only one coating material (pure silicon) to deposit thin films in a high vacuum, and using an ion source with a working gas (or gases) to control the refractive...
|
|
|
6423191 |
Sputtering method and apparatus for depositing a coating onto substrate
Sputtering method and apparatus for depositing a coating onto substrate employs variable magnetic field arranged in vicinity of a cathode within a working chamber, filled with ionizable fluid. By...
|
|
|
6413386 |
Reactive sputtering method for forming metal-silicon layer
Within a method for forming a metal-silicon layer there is first provided a reactor chamber. There is then positioned within the reactor chamber a substrate spaced from a metal source target. There...
|
|
|
6391395 |
Method of fabricating a polysilicon layer
The present invention is directed to a method of forming a polysilicon layer. A light shield layer having a super-resolution near-field structure is arranged on an amorphous silicon layer. The...
|