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7390381 Information recording medium and method of manufacturing the same  
An information recording medium that is excellent in repeated-rewriting performance and is deteriorated less in crystallization sensitivity with time is provided, with respect to which high density...
7388201 Radiation detector having coated nanostructure and method  
A radiation detector has an electron emitter that includes a coated nanostructure on a support. The nanostructure can include a plurality of nanoneedles. A nanoneedle is a shaft tapering from a...
7378002 Aluminum sputtering while biasing wafer  
An aluminum sputtering process including RF biasing the wafer and a two-step aluminum fill process and apparatus used therefor to fill aluminum into a narrow via hole by sputtering under two...
7374642 Treatment process for improving the mechanical, catalytic, chemical, and biological activity of surfaces and articles treated therewith  
A continuous, uninterrupted two-step treatment process capable of forming nanometer scale physical structures on the surface of articles fabricated from metallic, ceramic, glass, or plastic...
7368041 Method for controlling plasma density or the distribution thereof  
Method for manufacturing magnetron sputter-coated workpieces includes placing a substrate adjacent a magnetron source having a target cathode, generating above the target cathode, at least one...
7364644 Silver selenide film stoichiometry and morphology control in sputter deposition  
A method of sputter depositing silver selenide and controlling the stoichiometry and nodular defect formations of a sputter deposited silver-selenide film. The method includes depositing...
7361302 Oxidation and fatigue resistant metallic coating  
The present invention relates to a metallic coating to be deposited on gas turbine engine components. The metallic coating comprises up to 18 wt % cobalt, 3.0 to 18 wt % chromium, 5.0 to 15 wt %...
7358511 Plasma doping method and plasma doping apparatus  
A plasma doping method, even though a plasma doping treatment is repeated, can make a dose from a film to a silicon substrate uniform for each time. The method includes preparing a vacuum chamber...
7357975 Carbon-containing hard coating and a method for depositing a hard coating onto a substrate  
The carbon-containing hard coating (1) according to the invention comprises nano-crystalline grains being separated from each other by grain boundaries, wherein said hard coating comprises aluminum...
7347958 Oxide sintered body and sputtering target, and manufacturing method for transparent conductive oxide film as electrode  
An oxide sintered body for sputtering target is provided wherein the main component is indium oxide, and it contains titanium such that the atomic ratio of Ti/In is 0.003 to 0.120, and the specific...
7344660 Sputtering target and process for producing the same  
A manufacturing method of a sputtering target having mainly oxychalcogenide containing La and Cu by sintering at least one or more powders selected from an elementary substance of a constituent...
7338581 Sputtering apparatus  
A sputtering apparatus includes paired targets 31 disposed in a vacuum chamber 30 , substrate holder 33 disposed at a position nearly perpendicular to the paired target 31 and apart from a...
7335426 High strength vacuum deposited nitinol alloy films and method of making same  
A vacuum deposition method for fabricating high-strength nitinol films by sputter depositing nickel and titanium from a heated sputtering target, and controlling the sputter deposition process...
7335282 Sputtering using an unbalanced magnetron  
A sputtering process and magnetron especially advantageous for low-pressure plasma sputtering or sustained self-sputtering, in which the magnetron has a reduced area but full target coverage. The...
7332061 Integration of multiple frequency band FBAR filters  
A method and system for forming FBAR filters for different frequency bands with film stacks of different thicknesses, where at least some layers of different thicknesses are formed substantially at...
7323219 Apparatus and method for applying diamond-like carbon coatings  
The invention relates to a coating and apparatus and method for applying the same, said coating including Diamond Like Carbon (DLC) applied by chemical vapor deposition using a pulsed DC biased...
7316867 Method for manufacturing a multi-layered thin film for use as an anode in a lithium secondary battery  
A thin film for an anode of a lithium secondary battery having a current collector and an anode active material layer formed thereon is provided. The anode active material layer is a multi-layered...
7312958 Method for manufacturing magnetic disk apparatus  
A method for manufacturing a magnetic disk apparatus having a highly sensitive reproducing head. A spin-valve-type multilayer film composed of an antiferromagnetic layer, a ferromagnetic layer, a...
7300556 Method for depositing a thin film adhesion layer  
A method of physical vapor deposition (PVD) is disclosed in which xenon is used as the operating gas in the vacuum chamber in the deposition of an adhesion layer, preferably silicon, which allows...
7291251 Method of making coated article with IR reflecting layer(s) using krypton gas  
A method of making a coated article is provided, where the coated article may be used in a window or the like and may have at least one infrared (IR) reflecting layer in a low-E coating. The IR...
7282261 Method of enhancing the stability of electroactive polymers and redox active materials  
This invention relates to a method of enhancing the stability of electroactive polymers, redox active materials, or a composite comprising an electroactive polymer and a redox active material,...
7282123 Composite sputter target and phosphor deposition method  
The invention is a novel sputter target and deposition method for multi-element thin film phosphors for thick film dielectric electroluminescent displays in which the deposited phosphors provide a...
7279078 Thin-film coating for wheel rims  
A process for coating a non-uniform, thin-film, dichroic pattern to a wheel rim or motorcycle part. The thin-film coating adds a colored or iridescent pattern to the wheel rim or motorcycle part,...
7276187 Transparent conductive thin film, process for producing the same, sintered target for producing the same, and transparent, electroconductive substrate for display panel, and organic electroluminiscence device  
A transparent conductive thin film which can be produced easily by sputtering or the like with a sintered target, needs no post-treatment such as etching or grinding, is low in resistance and...
7264883 Hard coating film excellent in adhesion and manufacturing method thereof  
A hard coating film of the present invention is formed on a substrate, and is a multilayer including at least the following layers (1) to (3). (1) A first layer on the substrate side comprising one...
7249405 Method for manufacturing a magnetic medium  
Disclosed is a magnetic recording medium and a method for manufacturing the same to provide a magnetic recording medium reducing medium noise and having excellent thermal stability. The magnetic...
7246586 Wear-resistant coating and process for producing it  
The present invention relates to a process for producing a wear-resistant coating and to a wear-resistant coating on predetermined surfaces of machine or engine parts, in particular for internal...
7235160 Hollow cathode sputtering apparatus and related method  
The present invention provides an improved hollow cathode method for sputter coating a substrate. The method of the invention comprises providing a channel for gas to flow through, the channel...
7235159 Methods for producing and using catalytic substrates for carbon nanotube growth  
A catalyst material for carbon nanotube synthesis includes a uniform dispersion of host particles on a substrate. The host particles themselves include catalyst nanoparticles that are effective to...
7229533 Method of making coated article having low-E coating with ion beam treated and/or formed IR reflecting layer  
A coated article is provided that may be used as a vehicle windshield, insulating glass (IG) window unit, or the like. An ion beam is used during at least part of forming an infrared (IR)...
7202000 Anode for secondary battery, secondary battery using same and method for fabricating anode  
An anode for a secondary battery capable of inserting and extracting a lithium ion having a multi-layered structure including a first anode layer containing carbon as a main component; a second...
7198700 Thin film formation use sputtering target material, thin film formed using same, and optical recording medium  
An alloy material, a thin film and an optical recording medium to achieve various tasks such as maintenance of a high reflectivity, improved corrosion resistance, simplified production of the...
7198699 Sputter coating apparatus including ion beam source(s), and corresponding method  
A coating apparatus deposits a first coating (single or multi-layered) onto a first side of a substrate (e.g., glass substrate) passing through the apparatus, and a second coating (single or...
7179500 Sub-micron electrolyte thin film on nano-porous substrate by oxidation of metal film  
A fluid impermeable thin film is fabricated on a porous substrate by depositing a material having a certain spatial oxidation expansion. After deposition, the material is oxidized whereby the...
7156960 Method and device for continuous cold plasma deposition of metal coatings  
A method for the deposition of a metal layer on a substrate ( 1 ) uses a cold plasma inside an enclosure ( 7 ) heated to avoid the formation of a metal deposit at its surface. The enclosure has an...
7150810 Sputtering target and method for fabricating the same  
A sputtering target includes a backing plate, a copper target provided on the backing plate, and a protection layer formed of a corrosion-resistant metal on the surface of the copper target The...
7141186 Oxide sintered body and sputtering target, and manufacturing method for transparent conductive oxide film as electrode  
An oxide sintered body for sputtering target is provided wherein the main component is indium oxide, and it contains titanium such that the atomic ratio of Ti/In is 0.003 to 0.120, and the specific...
7134185 Method of making narrow track width magnetoresistive sensor  
A method and system for forming a microscopic transducer are described. The method and system include forming a plurality of adjoining sensor layers. The sensor layers include a first magnetically...
7122100 Porous getter devices with reduced particle loss and method for manufacturing same  
A method for reducing the loss of particles from the surface of porous getter bodies is taught herein. The method consists in producing on the surface of the porous getter a thin layer of a metal...
7118656 Thin film stent  
A method for fabricating a stent or other medical device by creating a free standing thin film of metal.
7115191 Magnetic recording disk, magnetic recording disk manufacturing method and magnetic recording disk manufacturing system  
This invention presents a magnetic recording disk where an anisotropy-allowing layer to allow magnetic anisotropy to a magnetic recording layer is provided between a substrate and the magnetic...
7109642 Composite piezoelectric apparatus and method  
The present invention relates to composite piezoelectric apparatus, transducers and methods of manufacture. In an embodiment, a composite piezoelectric apparatus has a sacrificial base and pillar...
7094479 Surface-coated cutting tool member having hard coating layer exhibiting superior wear resistance during high speed cutting operation and method for forming hard coating layer on surface of cutting tool  
A surface-coated cutting tool member includes a tungsten carbide based cemented carbide substrate, a titanium carbonitride based cermet substrate, or a cubic boron nitride based sintered substrate;...
7090947 Phase shifter film and process for the same  
In the formation of a halftone type phase shift mask, a reactive gas introduction inlet and an inert gas introduction inlet are provided so as to introduce the respective gases separately and by...
7087142 Method for determining a critical size of an inclusion in aluminum or aluminum alloy sputtering target  
The present invention relates to a method for determining a critical size for a diameter of an Al 2 O 3 inclusion ( 38 ) in an Al or Al alloy sputter target ( 42 ) to prevent arcing during...
7082673 Method of manufacturing magnetoresistive device capable of preventing a sense current from flowing into dead regions of a magnetoresistive element, and method of manufacturing thin-film magnetic head  
A magnetoresisive device comprises: an MR element having two surfaces that face toward opposite directions and two side portions that face toward opposite directions; two bias field applying layers...
7081186 Combined coating process comprising magnetic field-assisted, high power, pulsed cathode sputtering and an unbalanced magnetron  
A PVD process for coating substrates, wherein the substrate is pre-treated in the vapor of a pulsed, magnetic field-assisted cathode sputtering operation, and during pre-treatment a magnetic field...
7052584 Method of forming a capacitor  
A method of forming a capacitor having a capacitor dielectric layer comprising ABO 3 , where “A” is selected from the group consisting of Sn and Group IIA metal elements and mixtures thereof,...
7049009 Silver selenide film stoichiometry and morphology control in sputter deposition  
A method of sputter depositing silver selenide and controlling the stoichiometry and nodular defect formations of a sputter deposited silver-selenide film. The method includes depositing...
7045208 Synthetic resin molded material and method for its production  
A synthetic resin molded material characterized in that a thin film made of an oxide of at least one metal selected from the group consisting of Si, Zr, Ti, Ta, Hf, Mo, W. Nb, Sn, In, Al and Zn, is...