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6676741 |
Methods for producing enhanced interference pigments
Methods and apparatus are provided for uniformly depositing a coating material from a vaporization source onto a powdered substrate material to form a thin coalescence film of the coating material...
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6676814 |
Substrate coated with an MgO layer
A method for manufacturing a display panel substrate has the steps of flowing a working gas along and out of a slit defined between two sputtering targets of Mg and toward the substrate thereby...
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6673130 |
Method of fabrication of electrodes and electrolytes
Fuel cell stacks contain an electrolyte layer surrounded on top and bottom by an electrode layer. Porous electrodes are prepared which enable fuel and oxidant to easily flow to the respective...
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6669795 |
Methods of fabricating high transition temperature SMA, and SMA materials made by the methods
A method of fabricating ternary TiNi-based alloys to achieve substantially higher phase-change transition temperatures in the resulting SMA materials and which have optimal thermo-mechanical...
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6663761 |
Fine pattern forming method, developing/washing device used for the same, plating method using the same, and manufacturing method of thin film magnetic head using the same
The invention provides a fine pattern forming method in which a pattern interval of a resist pattern is narrowed, and a fine pattern forming material can be certainly formed on a surface of the...
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6662429 |
Device for measuring the filling level in a container using thermoelements
In a device for measuring the filling level, thermoelements ( 20 ) are used which are disposed on a sheet-shaped support ( 25 ). The thermoelements ( 20 ) consist of two different materials and are...
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6663753 |
Method of making coated article including DLC inclusive layer over low-E coating
A substrate is coated with a low-E coating system including at least one infrared (IR) reflective layer. A diamond-like carbon (DLC) inclusive protective coating system (e.g., including at least...
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6660136 |
Method of forming a non-volatile resistance variable device and method of forming a metal layer comprising silver and tungsten
The invention includes methods of forming a non-volatile resistance variable device and methods of forming a metal layer comprising silver and tungsten. A method of forming a non-volatile...
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6660135 |
Staged aluminum deposition process for filling vias
A semiconductor metallization process for providing complete via fill on a substrate, free of voids, and a planar metal surface, free of grooves. In one aspect, a refractory layer is deposited onto...
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6656332 |
Replicating method for surface finish inspection
A method of inspecting the surface finish of a component comprising providing an original surface to be inspected. A release agent is applied onto the original surface and an epoxy mixture is...
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6652718 |
Use of RF biased ESC to influence the film properties of Ti and TiN
A method of depositing thin films comprising Ti and TiN within vias and trenches having high aspect ratio openings of 6:1 is disclosed. The Ti and TiN layers are formed on an integrated circuit...
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6649030 |
Physical vapor deposition of radiopaque markings on a graft
Physical vapor deposition of radiopaque markings onto a graft is described. A graft is placed into a chamber, and a radiopaque material is vaporized and then deposited onto the graft. The chamber...
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6632583 |
Optical recording medium and production method of the same
The present invention relates to an optical recording medium having a protective layer and a phase-change recording layer on a substrate, said protective layer containing a metallic oxysulfide and...
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6632483 |
Ion gun deposition and alignment for liquid-crystal applications
The present invention includes a method of forming an aligned film on a substrate. The film is deposited and aligned in a single step by a method comprising the step of bombarding a substrate with...
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6631336 |
Nondestructive method of quality control of high-voltage systems and device for use of the method
A method and device applicable to HV generators and X-ray tubes, and a computer program and support for the program. In the method a determination is made of a scale of values representing the...
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6627253 |
Magnetic recording media for longitudinal recording, process for producing the same and magnetic memory apparatus
A magnetic recording medium for longitudinal recording with a low media noise, a high S/N ratio and high reliabilities in corrosion resistance is disclosed. By making a magnetic layer from a...
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6627050 |
Method and apparatus for depositing a tantalum-containing layer on a substrate
A method of forming a tantalum-containing layer on a substrate is described. The tantalum-containing layer is formed using a physical vapor deposition technique wherein a magnetic field in...
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6620299 |
Process and device for the coating of substrates by means of bipolar pulsed magnetron sputtering and the use thereof
Process and device for coating substrates utilizing bipolar pulsed magnetron sputtering in the frequency range between 10 and 100 kHz, wherein the device includes at least three magnetron sources....
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6620527 |
Hillock-free aluminum wiring layer and method of forming the same
A hillock-free wiring layer and method of forming the same are provided. The wiring layer includes at least two aluminum (Al) layers formed on a substrate, and each of the Al layers includes Al...
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6620282 |
Method and apparatus for solid bonding, a conductor bonding method, a packaging method, and a bonding agent and a method for manufacturing a bonding agent
A method and apparatus for solid bonding without using a bonding agent are provided. A surface of metal, glass, or other bond members 16 a and 16 b is fluorinated by exposure to a mixture of HF...
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6610181 |
Method of controlling the formation of metal layers
The present invention is directed to a method of controlling the formation of metal layers. In one illustrative embodiment, the method comprises depositing a layer of metal above a structure,...
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6607640 |
Temperature control of a substrate
A method of improving the temperature control of a clamped substrate mounted on a substrate support that is biased, the substrate support having a passage therethrough to permit a flow of backside...
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6605197 |
Method of sputtering copper to fill trenches and vias
The present disclosure pertains to a method of filling features (typically trenches or vias) on a semiconductor workpiece surface with copper using sputtering techniques previously believed...
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6605198 |
Apparatus for, and method of, depositing a film on a substrate
An electrical field between a positive anode and a negative target in a cavity and a magnetic field in the cavity cause electrons from the target to ionize neutral gas (e.g. argon) atoms in the...
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6599400 |
Method for the manufacture of coatings and an article
The invention relates to a method for the manufacture of coatings having a low coefficient of friction on articles such as mechanical components and tools, with a layer sequence of carbon and a...
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6596132 |
Production of ternary shape-memory alloy films by sputtering using a hot pressed target
A method for producing thin film deposits of ternary shape-memory alloys using an ion sputtering deposition process comprising using a hot pressed metal powder composition target.
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6596133 |
Method and system for physically-assisted chemical-vapor deposition
An apparatus and method for the deposition of thin film material layers provides improved use of processing chamber space for enhanced processing capability in the fabrication of microelectronic...
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6596368 |
Organic substrate having optical layers deposited by magnetron sputtering and method for preparing it
An organic substrate having optically-active layers deposited by magnetron sputtering and a preparation process for it are provided. Gas pressure used for carrying out better adhesion by sputtering...
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6596417 |
Magnetic recording medium with a Ga3Pt5 structured underlayer and a cobalt-based magnetic layer
The present invention provides a longitudinal magnetic recording media having a substrate, a Co or Co alloy based magnetic layer arid an underlayer disposed between the substrate and the magnetic...
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6592724 |
Method for producing NiTiHf alloy films by sputtering
Disclosed is a method for producing ternary shape-memory alloy films employing sputtering process techniques using krypton as a process gas.
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6592725 |
Fabrication method for spin valve sensor with insulating and conducting seed layers
A method is described comprising forming an insulating polycrystalline seed layer in a first chamber by reactively pulsed DC magnetron sputtering, then forming an insulating amorphous-like seed...
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6592948 |
Method for masking selected regions of a substrate
Described herein is a method for providing a clean edge at the interface of a portion of a substrate coated with a coating system and an adjacent portion of the substrate which is uncoated. The...
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6589398 |
Pasting method for eliminating flaking during nitride sputtering
The present invention pertains to methods for preventing metal or metal-derived material from flaking during sputter processing of substrates. Methods of the invention are particularly useful for...
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6585864 |
Coating system for high temperature stainless steel
A method for protecting high temperature stainless steel from coking and corrosion at elevated temperatures in corrosive environments, such as during ethylene production, by coating the stainless...
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6586070 |
Thin film TiSixNy protective layer
A overcoat layer of TiSi x N y for use on a magnetic thin film disk is disclosed. The overcoat of the invention has high hardness, provides corrosion protection and has low surface energy which...
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6585871 |
Method of film deposition on substrate surface and substrate produced by the method
A method of film deposition is disclosed, which eliminates the conventional problem that a coating film having a component concentration gradient in the thickness direction and thus having a...
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6582567 |
Method of growing epitaxial layers using magnetron sputter source in MBE apparatus
A magnetron sputter source is adapted to fit into a K-cell port in a molecular beam epitaxy apparatus. The MSE source has a protruding cylindrical body for insertion into the K-cell port. The...
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6582569 |
Process for sputtering copper in a self ionized plasma
A DC magnetron sputter reactor for sputtering copper, its method of use, and shields and other parts promoting self-ionized plasma (SIP) sputtering, preferably at pressures below 5 milliTorr,...
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6582568 |
First stage salicidation of cobalt during cobalt deposition or subsequent Ti or Tin cap deposition using energy from a directional plasma
The present invention concerns an apparatus comprising a fixture and a sputtering device. The fixture may be configured to position a semiconductor wafer in a plasma. The sputtering device may be...
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6579423 |
Light transmitting electromagnetic wave filter and process for producing the same
A light transmitting electromagnetic wave filter comprising a transparent and a light transmitting electromagnetic wave shield film having a laminate structure composed of 2n+1 (n≧1) layers in...
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6579425 |
System and method for forming base coat and thin film layers by sequential sputter depositing
A system and method are provided to sequentially deposit a silicon dioxide base coat barrier layer adjacent a thin silicon film, to minimize the formation of water and —OH radicals. Both the base...
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6576095 |
Protective coating for a magneto-optical disc
A magneto-optical disc includes protective overcoats that significantly improve the durability of the disc. In particular, the protective overcoat involves a carbon layer over the magnetic, optical...
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6572940 |
Coatings with a silver layer
A glass sheet includes a coating comprising at least one silver layer and inner and outer antireflection layers. The glass sheet is formed by a magnetron sputtering process. The inner...
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6569294 |
Sputtering target assembly and method for depositing a thickness gradient layer with narrow transition zone
Selective deposition of a layer of a material, such as a thick protective overcoat, onto a selected substrate area, such as the inner or CSS landing zone, is achieved using a sputtering target...
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6569293 |
Magnetron sputtered boron films for increasing hardness of a metal surface
A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those...
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6565718 |
Magnetic recording medium with high density, thin dual carbon overcoats
A magnetic recording medium is formed with dual carbon-containing protective layers having a combined thickness of less than about 100 Å with high corrosion resistance and superior magnetic...
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6558517 |
Physical vapor deposition methods
The invention includes chemical vapor deposition and physical vapor deposition methods of forming high k ABO 3 comprising dielectric layers on a substrate, where “A” is selected from the group...
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6558749 |
Method for manufacturing a workpiece with wear-protective coating
Method for manufacturing a workpiece with wear protective coating starts with depositing a first hard material layer selected from the group consisting of TiN, TiCN, TiAlN, TiAlCN or the workpiece....
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6555221 |
Method for forming an ultra microparticle-structure
A method for forming an ultra microparticle-structure composed of ultra microparticles including the steps of: forming on a substrate higher wettability parts and lower wettability parts to a...
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6554970 |
Arrangement and method for improving vacuum in a very high vacuum system
The invention concerns an arrangement for improving vacuum in a very high vacuum system (ultrahigh vacuum) comprising a metal chamber releasing gas at its surface, consisting of a coating deposited...
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