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5997698 |
Process for fabricating soft magnetic thin films
An Fe--Zr--N base thin film composed of a metal nitride is formed by reactive sputtering. At the reactive sputtering step, the stress of the thin film is controlled by causing relative movement of...
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5993617 |
Functional product
A functional product having a transparent oxide layer and a silver layer alternately laminated on a transparent substrate in a total number of (2n+1) layers, where n≥1, wherein an oxide film...
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5993616 |
Method for producing a magneto-optical recording medium
This invention provides a method for producing a magneto-optical recording medium with a laminated film composed of a plurality of magnetic layers made of alloys of rare earth metals-transition...
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5989395 |
Ferroelectric thin film and method of manufacturing the same
A ferroelectric thin film includes lead titanate including La and at least an element which forms a six-coordinate bond with oxygen atoms and which is selected from the group consisting of Mg and...
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5985105 |
Method of sputtering protective overcoats with improved corrosion resistance
A protective overcoat with improved corrosion resistance is sputter deposited on a magnetic thin film medium to effectively cover and seal the side walls of high aspect ratio roughness features....
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5985104 |
Sputtered mask defined with highly selective side wall chemical etching
An improved process is provided for making a milling mask for milling notches in a first pole piece of a write head. The making of the milling mask involves two process steps, namely: (1) sputter...
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5981049 |
Coated tool and method of manufacturing the same
A coated tool includes a base material and a wear-resistant coating film formed on the base material. The composition of the wear-resistant coating film is expressed as (Ti x ,Al y ,V z )(C u ,N v...
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5981387 |
Method for forming silicide film in semiconductor device
Disclosed is a method for forming a silicide film on bit lines or word lines in a semiconductor device. The method includes the steps of: placing a substrate within a reacting chamber, the...
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5976326 |
Method of sputtering selected oxides and nitrides for forming magnetic media
A Co--Pt based magnetic alloy which has been sputtered with an oxide or nitride of a primary constituent of the magnetic layer, e.g., CoO below about 10 at. %, provides improved coercivity,...
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5972179 |
Silicon IC contacts using composite TiN barrier layer
The specification describes a composite TiN barrier layer structure formed by depositing a first TiN layer by CVD to obtain good step coverage, followed by a second TiN layer formed by PVD to...
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5972178 |
Continuous process for forming improved titanium nitride barrier layers
A continuous process for the deposition of robust titanium-containing barrier layers comprises sputtering in a single substrate sputtering chamber a first layer of titanium, sputtering a layer of...
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5972527 |
Transparent electrically conductive layer, electrically conductive transparent substrate and electrically conductive material
A transparent electrically conductive layer having practically sufficient electrical conductivity and light transmittance and having excellent resistance to moist heat and etching properties, and...
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5968673 |
Solid electrolyte thin film and method for producing the same
The present invention relates to a solid electrolyte thin film and a manufacturing method for the same. The solid electrolyte thin film of the present invention comprises yttrium stabilized...
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5968326 |
Composite inorganic-polymer thin film cation-selective membrane, method of fabricating same and applications
A composite membrane is disclosed fabricated by depositing an inorganic ion-conducting thin film on a cation-selective organic polymer membrane substrate using Pulse Laser Deposition (PLD) or...
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5961791 |
Process for fabricating a semiconductor device
A via 42 is formed in an ILD layer 40 of a semiconductor device 30, using an etch chemistry which is highly selective to an underlying transition metal oxy-nitride film 38. In one form, film 38 is...
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5958508 |
Process for forming a semiconductor device
A metal-semiconductor layer (26) is formed over an insulating layer (20) such that the metal-semiconductor layer (26) is graded to have varying amounts of the semiconductor and metal throughout the...
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5954927 |
Method of manufacturing magnetic recording medium
A method of manufacturing a magnetic recording medium by using an in-line sputtering apparatus to successively form, on a substrate, at least one underlying layer, a first magnetic CoPt-based film,...
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5952086 |
Titanium target for sputtering and method of manufacturing same
A titanium target for sputtering high in film making efficiency in a contact hole. The crystallization on the target face is caused to be orientated so that the X-ray diffraction strength of the...
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5948233 |
Method of manufacturing an electric component which can be mounted on the surface of a printed circuit board
Electric component which can be mounted on the surface of a printed circuit board as well as a method of manufacturing such components. The invention relates to an electric component (surface...
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5948216 |
Method for making thin film tantalum oxide layers with enhanced dielectric properties and capacitors employing such layers
The present applicants have discovered a method for making thin films comprising tantalum oxide that enhances the dielectric constant with or without TiO 2 doping. Specifically, applicants have...
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5944963 |
Method of coating a substrate with a SiC.sub.x film
The invention provides a silicon carbide sputtering target comprising non-stoichiometric silicon carbide, SiC x , where x is the molar ratio of carbon to silicon and x is greater than about 1.1 but...
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5942089 |
Method for sputtering compounds on a substrate
A method and apparatus for monitoring and controlling deposition of metal, insulating compounds or other compounds on a substrate by sputtering techniques includes maintaining pulsed, constant,...
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5942090 |
Methods of producing a laminate
A method for forming an oxide film on a substrate by a sputtering process using a target comprising a metal as the main component, wherein sputtering is carried out in an atmosphere which contains...
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5938897 |
Method of manufacturing phase-shifting photomask blank
A phase-shifting photomask blank is made by sputtering a target of molybdenum silicide with a sputtering gas to which nitric monoxide is added in a ratio of 2.65-6.47% by volume. A nitrided-oxide...
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5922177 |
Magneto-optical recording medium and producing method thereof
A method to produce a magneto-optical recording medium which includes a readout layer having in-plane magnetization at room temperature and in which a transition occurs from in-plane magnetization...
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5916423 |
P1 notched write head with minimum overmilled p1 and p2
A magnetic head is provided which has first and second notches in a first pole piece layer adjacent first and second corners at the base of a gap layer wherein the gap layer does not undercut a...
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5916456 |
Diamond treatment for passivating stress surface defects
A surface of a diamond, particularly a diamond window, is treated by depositing a layer of a carbide-forming metal such as titanium, on the surface and thereafter removing the layer. The treatment...
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5914152 |
Magnetic recording medium and process for making same
A magnetic recording medium comprised of (i) a non-magnetic substrate such as glass or carbon, (ii) a silicon layer preferably having a thickness of about 20-3,000 angstroms, formed on the...
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5911858 |
Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors
A method for coating (flat or non-flat) optical substrates with high-reflectivity multi-layer coatings for use at Deep Ultra-Violet ("DUV") and Extreme Ultra-Violet ("EUV") wavelengths. The method...
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RE36224 |
Microwave plasma processing process and apparatus
A microwave plasma processing process and apparatus useful in the fabrication of integrated circuit (IC) or similar semiconductor devices, wherein the object or material to be processed, such as a...
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5904996 |
Method of manufacturing a magnetic field sensor
A method of manufacturing a magnetic field sensor having a stacked structure of: an exchange-biasing layer (2) comprising nickel oxide on a substrate (1) and a magnetic layer (3) which is...
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5900324 |
Magnetic recording media, methods for producing the same and magnetic recorders
Disclosed are magnetic recording media comprising, on a substrate, two or more CrPt based magnetic layers and one or more CrMo based non-magnetic spacer layers between the magnetic layers and...
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5897751 |
Method of fabricating boron containing coatings
Hard coatings are fabricated from boron nitride, cubic boron nitride, and multilayer boron/cubic boron nitride, and the fabrication thereof involves magnetron sputtering in a selected atmosphere....
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5897752 |
Wafer bias ring in a sustained self-sputtering reactor
A plasma reactor for physical vapor deposition (PVD), also known as sputtering, which is adapted so that the atomic species sputtered from the target can self-sustain the plasma without the need of...
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5885425 |
Method for selective material deposition on one side of raised or recessed features
An apparatus and method provide deposition on a surface by angled sputtering using a collimation grid having angled vanes which limit the distribution of trajectories of particles in at least one...
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5876684 |
Methods and apparati for producing fullerenes
Fullerenes are synthesized by subjecting carbon in the form of particulates or as the carbon of a liquid or gaseous hydrocarbon, that can be continuously fed to a variety of intense,...
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5876861 |
Sputter-deposited nickel layer
Disclosed is a nickel layer formed on a substrate by sputtering, in which nickel layer a percent ratio of an X-ray diffraction peak intensity of the (200) plane of the nickel layer to that of the...
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5873983 |
Method for minimizing substrate to clamp sticking during thermal processing of thermally flowable layers
A method for forming and thermally processing upon a substrate a low melting temperature metal containing conductor layer. There is first provided a substrate. The substrate is fixtured within a...
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5868910 |
Giant magnetoresistant single film alloys
A single layer film is deposited onto a substrate at room temperature from two sources, one source being a magnetic material, the other being a non-magnetic or weakly-magnetic material. The film is...
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5866263 |
Adsorbent lid construction
An absorbent lid or cover for a hermetic enclosure comprises a coating applied via sputtering to at least a portion of at least one surface of the lid and consisting of at least one elemental metal...
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5863661 |
Method of enhancing the c-axis perpendicular orientation of barium hexaferrite thin films and barium hexaferrite thin film recording media produced thereby
A method of making c-axis perpendicularly oriented barium hexaferrite thin films by the crystallization of amorphous barium hexaferrite on a platinum underlayer is provided. Using a thin underlayer...
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5858181 |
Physical vapor deposition of titanium nitride on a nonconductive substrate
A process for physical vapor deposition of a refractory coating such as titanium nitride on a nonconductive substrate such as a ceramic substrate and the coated substrate produced thereby. The...
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5851363 |
Multilayer film materials system
Pt/Co multilayer materials systems having a thin metal interlayer possess superior room temperature coercivity, a square polar Kerr hysteresis loop, sufficient polar Kerr rotation, and are suitable...
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5851938 |
Glass material variable in volume by irradiation with ultraviolet light
A glass material variable in volume by irradiation with ultraviolet light has a GeO 2 --SiO 2 glass composition having a GeO 2 content of 0.5 to 90 mol %, and is in the form of a thin film...
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5852303 |
Amorphous matrices having dispersed cesium
A composition of matter in the form of an amorphous matrix having cesium dispersed therein is disclosed. The composition is capable of cold cathode emission, thus emitting electrons at wide range...
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5851364 |
Method for forming aluminum contacts
A process for making an aluminum contact comprising sputter depositing in a contact opening in a semiconductor substrate a first layer of titanium, forming a thin layer of titanium oxide thereover,...
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5851366 |
Adhering metal to glass
A method of improving adherence of a metal film deposited directly on a silicate glass substrate for a display panel. The method comprises chemically treating the surface of the glass to alter its...
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5849163 |
Process for formation of epitaxial film
A process for forming an epitaxial film on a biased substrate by sputtering a target to which a bias voltage and a plasma-generating high-frequency power are applied, wherein the film formation is...
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5837332 |
Method and apparatus for preparing crystal thin films by using a surface acoustic wave
A method and apparatus for preparing thin films, a device, an electronic and magnetic apparatus, an information recording and reproducing apparatus, an information processing apparatus and a...
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5837357 |
Magnetic recording medium having a carbon protective layer and method for manufacturing the same
A magnetic recording medium is provided that includes a non-magnetic base, a magnetic layer laminated on a non-magnetic base, a carbon protective layer containing hydrogen and laminated on the...
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