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7390381 |
Information recording medium and method of manufacturing the same
An information recording medium that is excellent in repeated-rewriting performance and is deteriorated less in crystallization sensitivity with time is provided, with respect to which high density...
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7381661 |
Method for the production of a substrate with a magnetron sputter coating and unit for the same
According to the invention, the distribution of material amounts deposited on the substrate may be optimized for magnetron sputter coating in which a magnetron magnetic field pattern ( 9 ) is...
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7378002 |
Aluminum sputtering while biasing wafer
An aluminum sputtering process including RF biasing the wafer and a two-step aluminum fill process and apparatus used therefor to fill aluminum into a narrow via hole by sputtering under two...
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7378001 |
Magnetron sputtering
A magnetron sputtering apparatus has a controller for selectively releasing the spread of plasma on a substrate on a support. The controller can also contain the plasma when the substrate is to be...
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7374648 |
Single piece coil support assemblies, coil constructions and methods of assembling coil constructions
The invention includes a coil support assembly having an insulator interfacing a surface of a shield disposed within a processing chamber. The insulator has an extension which extends through the...
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7368041 |
Method for controlling plasma density or the distribution thereof
Method for manufacturing magnetron sputter-coated workpieces includes placing a substrate adjacent a magnetron source having a target cathode, generating above the target cathode, at least one...
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7354505 |
Epitaxial ferromagnetic Ni3FeN
An epitaxial Ni 3 FeN film with unique magnetic properties such as single magnetic domain (even in a large scale 0.5″×0.5″), which rotates coherently in response to the desired switching field...
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7347919 |
Sputter source, sputtering device, and sputtering method
According to the invention, when targets are sputtered, each of them moves with respect to a substrate; and therefore, the entire area of the substrate is opposed to the targets during sputtering,...
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7338582 |
Method for manufacturing manganese oxide nanostructure and oxygen reduction electrode using said manganese oxide nanostructure
It is an object of the present invention to provide an oxygen reduction electrode having excellent oxygen reduction catalysis ability. In a method of manufacturing a manganese oxide nanostructure...
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7338581 |
Sputtering apparatus
A sputtering apparatus includes paired targets 31 disposed in a vacuum chamber 30 , substrate holder 33 disposed at a position nearly perpendicular to the paired target 31 and apart from a...
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7335426 |
High strength vacuum deposited nitinol alloy films and method of making same
A vacuum deposition method for fabricating high-strength nitinol films by sputter depositing nickel and titanium from a heated sputtering target, and controlling the sputter deposition process...
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7335282 |
Sputtering using an unbalanced magnetron
A sputtering process and magnetron especially advantageous for low-pressure plasma sputtering or sustained self-sputtering, in which the magnetron has a reduced area but full target coverage. The...
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7332061 |
Integration of multiple frequency band FBAR filters
A method and system for forming FBAR filters for different frequency bands with film stacks of different thicknesses, where at least some layers of different thicknesses are formed substantially at...
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7316867 |
Method for manufacturing a multi-layered thin film for use as an anode in a lithium secondary battery
A thin film for an anode of a lithium secondary battery having a current collector and an anode active material layer formed thereon is provided. The anode active material layer is a multi-layered...
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7316763 |
Multiple target tiles with complementary beveled edges forming a slanted gap therebetween
A target assembly composed of multiple target tiles bonded in an array to a backing plate of another material. The edges of the tile within the interior of the array are formed with complementary...
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7315128 |
Magnetically enhanced capacitive plasma source for ionized physical vapor deposition
A capacitive plasma source for iPVD is immersed in a strong local magnetic field, and maybe a drop-in replacement for an inductively coupled plasma (ICP) source for iPVD. The source includes an...
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7309405 |
Method of forming ITO film
Disclosed is a method of forming an ITO film by optimized sequential sputter deposition of seed and bulk layers having different sputter process conditions, which is applicable to various display...
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7300558 |
Rapid cycle time gas burster
An apparatus for rapidly establishing at least one preselected gas pressure in a process chamber comprising:
(a) a chamber defining an interior space adapted to be maintained at a reduced...
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7300557 |
Device for targeted application of deposition material to a substrate
The invention relates to a device for the targeted application of deposition material onto a substrate, especially for focusing the sputter flux onto a narrow angular range in a PVD-system. The...
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7294283 |
Penning discharge plasma source
The preferred embodiments described herein provide a Penning discharge plasma source. The magnetic and electric field arrangement, similar to a Penning discharge, effectively traps the electron...
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7294241 |
Method to form alpha phase Ta and its application to IC manufacturing
A method of sputtering a Ta layer comprised of alpha phase Ta on a Cu layer. An embodiment includes a Ta sputter deposition on a Cu surface at a substrate temperature less than 200° C. Another...
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7282123 |
Composite sputter target and phosphor deposition method
The invention is a novel sputter target and deposition method for multi-element thin film phosphors for thick film dielectric electroluminescent displays in which the deposited phosphors provide a...
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7279201 |
Methods and apparatus for forming precursors
This invention relates to a method of forming a precursor for chemical vapour deposition including the steps of: (a) forming metal ions at a source, (b) introducing the ions into a reaction...
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7279078 |
Thin-film coating for wheel rims
A process for coating a non-uniform, thin-film, dichroic pattern to a wheel rim or motorcycle part. The thin-film coating adds a colored or iridescent pattern to the wheel rim or motorcycle part,...
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7273534 |
Optical device substrate film-formation apparatus, optical disk substrate film-formation method, substrate holder manufacture method, substrate holder, optical disk and a phase-change recording type of optical disk
In an optical disk substrate film-formation apparatus which prepared an optical disk by forming a thin film on a substrate, the optical disk substrate is held by a holder section. A contact support...
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7261797 |
Passive bipolar arc control system and method
A method and system for controlling arcs in a DC sputtering system with a passive circuit is presented. The arc control system includes a sputtering chamber that houses an anode and a sputtering...
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7247221 |
System and apparatus for control of sputter deposition process
A method and apparatus for sputter deposition in which both a pulsed DC power supply and an RF power supply apply power to the target in the sputter deposition equipment. The pulsed DC power supply...
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7235160 |
Hollow cathode sputtering apparatus and related method
The present invention provides an improved hollow cathode method for sputter coating a substrate. The method of the invention comprises providing a channel for gas to flow through, the channel...
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7235159 |
Methods for producing and using catalytic substrates for carbon nanotube growth
A catalyst material for carbon nanotube synthesis includes a uniform dispersion of host particles on a substrate. The host particles themselves include catalyst nanoparticles that are effective to...
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7232506 |
System and method for feedforward control in thin film coating processes
A system and method for feedforward control in thin film coating processes. A standard PID feedback control system that continuously monitors two or more process variables in a reactive sputtering...
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7229532 |
Sputtering apparatus
A sputtering apparatus for forming a film by a physical gas-phase growth on a substrate having a irregular or flat shape is provided including three or more axes for independently varying a...
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7223322 |
Moving magnetic/cathode arrangement and method
A magnetron sputtering electrode for use with a magnetron sputtering device, wherein the magnetron sputtering electrode comprises a cathode body, a drive unit coupled to the cathode body, a target...
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7201827 |
Process and structure to fabricate spin valve heads for ultra-high recording density application
A method for forming a bottom spin-valve GMR sensor having ultra-thin layers of high density and smoothness and possessing oxygen surfactant layers as a result of the layers being sputtered in a...
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7198699 |
Sputter coating apparatus including ion beam source(s), and corresponding method
A coating apparatus deposits a first coating (single or multi-layered) onto a first side of a substrate (e.g., glass substrate) passing through the apparatus, and a second coating (single or...
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7186319 |
Multi-track magnetron exhibiting more uniform deposition and reduced rotational asymmetry
A multi-track magnetron having a convolute shape and asymmetric about the target center about which it rotates. A plasma track is formed as a closed loop between opposed inner and outer magnetic...
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7182843 |
Rotating sputtering magnetron
The magnet arrangement and resulting rotating sputtering magnetron design of an embodiment provides magnetic flux density and distribution to penetrate thick production ferrous targets. Further,...
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7182842 |
Device for amplifying the current of an abnormal electrical discharge and system for using an abnormal electrical discharge comprising one such device
A device ( 1 ) for amplifying the current of an abnormal electrical discharge, characterized in that it comprises an electrode which is positively polarized ( 2 ) and associated with a magnetic...
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7179500 |
Sub-micron electrolyte thin film on nano-porous substrate by oxidation of metal film
A fluid impermeable thin film is fabricated on a porous substrate by depositing a material having a certain spatial oxidation expansion. After deposition, the material is oxidized whereby the...
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7179352 |
Vacuum treatment system and process for manufacturing workpieces
A process is disclosed for manufacturing coated substantially plane workpieces, in which the workpieces are guided to a vacuum treatment area guided by a control. The treatment atmosphere is...
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7179351 |
Methods and apparatus for magnetron sputtering
In one embodiment, a magnetron sputtering apparatus forms a closed plasma loop and an open plasma loop within the closed plasma loop. The open plasma loop allows for relatively uniform erosion on...
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7179350 |
Reactive sputtering of silicon nitride films by RF supported DC magnetron
An asymmetric alternating voltage (preferably 40 KHz) is provided between a pair of targets having a coaxial (preferably frusto-conical) relationship to (1) deposit the material in a uniform...
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7172681 |
Process for producing rubber-based composite material
Disclosed is a process for producing a rubber-based composite material, including the steps of forming, by sputtering, an adhesion film on a substrate to be mated with a rubber for constituting the...
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7169271 |
Magnetron executing planetary motion adjacent a sputtering target
A small magnet assembly is scanned in a retrograde planetary or epicyclic path about the back of a target being plasma sputtered including an orbital rotation about the center axis of the target...
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7166199 |
Magnetron sputtering systems including anodic gas distribution systems
The present invention provides a magnetron sputtering system using a gas distribution system which also serves as a source of anodic charge to generate plasma field. The sputtering system is...
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7156961 |
Sputtering apparatus and film forming method
The present invention is to provide a sputtering apparatus and a thin film formation method which make it possible to form respective layers of a multilayer film having a clean interface at a...
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7156960 |
Method and device for continuous cold plasma deposition of metal coatings
A method for the deposition of a metal layer on a substrate ( 1 ) uses a cold plasma inside an enclosure ( 7 ) heated to avoid the formation of a metal deposit at its surface. The enclosure has an...
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7153542 |
Assembly line processing method
An apparatus for sequential processing of a workpiece comprises an assembly line processing system. The apparatus comprises multiple workpieces moving in an assembly line fashion under multiple...
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7153399 |
Method and apparatus for producing uniform isotropic stresses in a sputtered film
The invention provides a method and apparatus for producing uniform, isotropic stresses in a sputtered film. In the presently preferred embodiment, a new sputtering geometry and a new domain of...
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7150810 |
Sputtering target and method for fabricating the same
A sputtering target includes a backing plate, a copper target provided on the backing plate, and a protection layer formed of a corrosion-resistant metal on the surface of the copper target The...
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7147759 |
High-power pulsed magnetron sputtering
Magnetically enhanced sputtering methods and apparatus are described. A magnetically enhanced sputtering source according to the present invention includes an anode and a cathode assembly having a...
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