Matches 251 - 300 out of 331 < 1 2 3 4 5 6 7 >
Match Document Document Title
4495044 Diamondlike flakes  
A carbon coating (36) is vacuum arc deposited on a smooth surface of a target (10) which is simultaneously ion beam sputtered. The bombarding ions have sufficient energy to create diamond bonds....
4490229 Deposition of diamondlike carbon films  
A diamondlike carbon film is deposited in the surface of a substrate by exposing the surface to an argon ion beam containing a hydrocarbon. The current density in the ion beam is low during initial...
4486286 Method of depositing a carbon film on a substrate and products obtained thereby  
There is disclosed a method for depositing a diamond or diamond-like carbon film on at least one substrate employing a hydrocarbon gas and at least one gas which preferentially removes by chemical...
4460436 Deposition of polymer films by means of ion beams  
A patterned polymer film is deposited on a substrate by pattern-wise exposing a monomer vapor to a beam of ions and dry developing by etching with oxygen plasma.
4457803 Processing method using a focused ion beam  
A processing method using a focused ion beam is proposed which uses a focused ion beam radiation apparatus. When a specimen is irradiated with the focused ion beam in order to be etched, the...
4457950 Process for producing wiring circuit board  
A wiring circuit board with a fine wiring pattern free from disconnection and poor insulation is produced by forming an insulating layer consisting of at least two insulating substances having...
4450031 Ion shower apparatus  
An ion shower apparatus comprising a plasma formation chamber in which plasma is produced so as to produce ions, a single ion extraction grid disposed in one portion of the plasma formation chamber...
4437962 Diamondlike flake composites  
A carbon coating (36) is vacuum arc deposited on a smooth surface of a target (10) which is simultaneously ion beam sputtered. The bombarding ions have sufficient energy to create diamond bonds....
4434038 Sputtering method and apparatus utilizing improved ion source  
Method and apparatus for sputtering an element with a magnetron plasma source where a plasma is formed between two generator cathode surfaces of the source and a generator anode disposed adjacent...
4430183 Method of making coherent multilayer crystals  
A new material consisting of a coherent multilayer crystal of two or more elements where each layer is composed of a single element. Each layer may vary in thickness from about 2 Å to 2500 Å....
4424103 Thin film deposition  
Disclosed is a method and apparatus for thin film deposition comprising bombarding a target obliquely in a vacuum chamber with a linear ion gun. The linear ion gun generates an ion beam which...
4419203 Apparatus and method for neutralizing ion beams  
Apparatus is described for neutralizing high intensity ion beams. A technique for neutralizing a positive ion beam from internally plasma produced electrons is provided whereby electrons are added...
4419201 Apparatus and method for plasma-assisted etching of wafers  
In a plasma-assisted etching apparatus and method designed to pattern aluminum or polysilicon, surfaces in the reaction chamber are coated with a layer of aluminum oxide. Contamination of wafers...
4416755 Apparatus and method for producing semiconducting films  
Apparatus and method for producing semiconducting films on a substrate in a vacuum chamber comprising a plasma generator, means for directing and accelerating an ion beam from the plasma to a...
4412905 Vacuum deposition apparatus  
A vacuum deposition apparatus including a cathode, an anode associated with the substrate to be coated and permanent magnet means whose lines of force are directed substantially parallel to the...
4411733 SPER Device for material working  
A segmented plasma excitation and recombination (SPER) device is employed in a deposition scheme in which the plasma generated in the gap between adjacent electrodes is formed into a beam of...
4407061 Fabrication procedure using arsenate glasses  
A fabrication technique is described for making various devices in which a certain type of glass is used as a surface protection layer. The glass layers are formed by particle bombardment...
4407933 Alignment marks for electron beam lithography  
In a fabrication sequence for VLSI MOS devices, an advantageous alignment mark for a wafer to be directly processed by electron beam lithography is made of tantalum disilicide protected by a...
4407712 Hollow cathode discharge source of metal vapor  
A hollow cathode discharge device is disclosed for ion plating a substrate with high temperature metal vapor. A hollow cathode tube is adapted to receive pellets of the high temperature metal at a...
4404233 Ion implanting method  
The ion implantation is performed in a manner to vary the angle between an ion beam and an article to be implanted with ions, whereby it can be accomplished with remarkable ease while providing the...
4389299 Sputtering device  
The present application discloses a sputtering device comprising a target electrode having a target and a flat magnet located under the target and constituted by an annular magnetic pole having one...
4381453 System and method for deflecting and focusing a broad ion beam  
A method and system for deflecting a broad ion plasma beam which includes an ion source for forming an ion plasma, an extraction means for extracting a broad ion plasma beam from the ion plasma,...
4376688 Method for producing semiconductor films  
A method for producing semiconducting films on a substrate wherein a plasma of a reactive gas is generated and an ion beam from the plasma is directed and accelerated toward a target of material of...
4358783 Superconducting thin films  
This invention relates to granular metal and metal oxide superconducting films formed by ion beam sputter deposition. Illustratively, the films comprise irregularly shaped, randomly oriented, small...
4351712 Low energy ion beam oxidation process  
A surface reaction process for controlled oxide growth is disclosed using a directed, low energy ion beam for compound or oxide formation. The technique is evaluated by fabricating Ni-oxide-Ni and...
4278890 Method and means of directing an ion beam onto an insulating surface for ion implantation or sputtering  
A beam of ions is directed under control onto an insulating surface by supplying simultaneously a stream of electrons directed at the same surface in a quantity sufficient to neutralize the overall...
4260466 Method of producing magnetic recording medium  
A method of producing a magnetic recording layer on a support comprising simultaneously depositing a ferromagnetic material and a polymer on a support using a vapor deposition technique such as...
4250009 Energetic particle beam deposition system  
An energetic particle beam is accelerated towards a sputtering target. The target is located at an angle to the path of the beam (although it need not be). The target material which is dislodged by...
4248687 Method of forming transparent heat mirrors on polymeric substrates  
Transparent heat-mirrors are disclosed which are formed from tin-doped indium oxide films or antimony-doped tin oxide films deposited onto polymeric substrates. Low temperature deposition...
4235662 Layer of crystalline silicon having (111) orientation on (111) surface of lithium aluminum  
Low strain heteroepitaxy of (111) silicon on (111) lithium aluminum between the reconstructed 7×7 surface of (111) silicon and a 6×6 array of aluminum atoms on the surface of the (111) lithium...
4218495 Schottky barrier type solid-state element  
A Schottky barrier type solid-state element and a method of producing the same, the Schottky barrier type solid-state element comprising a Schottky barrier type element portion consisting of a...
4173522 Method and apparatus for producing carbon coatings by sputtering  
A method for producing carbon coatings by sputtering comprises placing the target material to be sputtered which is made of a fibrous carbon material such as paper, velvet, wood, etc. which has...
4161418 Ionized-cluster-beam deposition process for fabricating p-n junction semiconductor layers  
A p-n junction type solid-state element having at least a pair of p-n junction type semiconductor layers formed of a p-type semiconductor and an n-type semiconductor joined with each other and a...
4152478 Ionized-cluster deposited on a substrate and method of depositing ionized cluster on a substrate  
The present ion source called "Vaporized-Metal Cluster Ion Source" is adapted to produce ionized vapor aggregate (ionized cluster) instead of atomic or molecular ions in conventional ion sources....
4147573 Method of depositing III-V compounds on group IV element wafers by the cluster ion technique  
A method of producing a compound semiconductor wafer which comprises cleaning the surface of a monocrystalline substrate of a group-IV element semiconductor by ion beam etching in a high vacuum,...
4145481 Process for producing elevated temperature corrosion resistant metal articles  
A process for providing coatings on metal articles whereby the articles will be resistant to corrosion at elevated temperatures. The process involves the application of an overlay on an article...
4140546 Method of producing a monocrystalline layer on a substrate  
A monocrystalline layer is vapor-deposited on a substrate surface while substantially simultaneously such surface is irradiated with an ion beam having ions with a kinetic energy of at least 10...
4120700 Method of producing p-n junction type elements by ionized cluster beam deposition and ion-implantation  
A p-n junction type solid-state element having a substrate, a substrate electrode coated on the substrate, a p-n junction type semiconductor layer coated on the substrate having the substrate...
4112137 Process for coating insulating substrates by reactive ion plating  
An insulating substrate, such as a glass windscreen, is coated with a conductive coating of an oxide of at least one metal by a process in which the substrate is subjected, in a rarefied oxygen...
4108751 Ion beam implantation-sputtering  
Material is deposited onto and implanted into a substrate by directing a beam of ions against a target, comprised of the material to be deposited, so as to sputter neutral particles and ionized...
4091138 Insulating film, sheet, or plate material with metallic coating and method for manufacturing same  
This invention provides a method for forming a dense, electrically conductive, metallic coating having a sufficient adherence without use of an adhesive on an insulating film, sheet, or plate such...
4057476 Thin film photovoltaic diodes and method for making same  
Photovoltaic diodes prepared by the methods of the invention include p-n (or n-p) heterojunction or homojunction diodes as well as Schottky barrier diodes where both elements of the diode comprise...
4045318 Method of transferring a surface relief pattern from a poly(olefin sulfone) layer to a metal layer  
This invention pertains to a method of transferring a surface relief pattern from a poly(olefin sulfone) layer to a metal layer wherein the poly(olefin sulfone) layer is exposed to ultra violet...
4033843 Simple method of preparing structurally high quality PbSnTe films  
The method of the present invention comprises depositing by sputtering, from a single target or source, a thin high quality single crystal film in a predictable and repeatable manner having the...
4028206 Method for cool deposition of layers of materials onto a substrate  
In systems in which material is deposited on a substrate in such a way that substantial heating of the substrate by radiant transmission occurs, such heating is reduced by first depositing a...
4010291 Method of making a low resistance indium oxide conductive film  
A low resistance indium oxide conductive film is made on a substrate in an atmosphere for vacuum evaporation or sputtering where aqueous vapor or gas mixed with the vapor is introduced or wherein...
4006268 Vapor collimation in vacuum deposition of coatings  
An improved method is disclosed for coating substrates, such as turbine engine parts, at high rates by a physical vapor deposition process. The substrate to be coated and a vapor source, such as a...
3953619 Method for ionization electrostatic plating  
In ionization electrostatic plating, a cathode is incorporated separately of the article subjected to plating which has conventionally been adapted to function as makeshift cathode. The electric...
3941630 Method of fabricating a charged couple radiation sensing device  
Method of fabricating an image sensing array, such as one of the charge coupled device (CCD) type, with a set of transparent insulated conductors over the image receiving surface. A transparent...
3898496 Means for obtaining a metal ion beam from a heavy-ion cyclotron source  
A simple method for producing a high intensity metal ion beam from a high-powered Penning-type ion source in a cyclotron is provided. A small amount of an inert support gas maintains the usual...
Matches 251 - 300 out of 331 < 1 2 3 4 5 6 7 >