Matches 201 - 250 out of 331 < 1 2 3 4 5 6 7 >
Match Document Document Title
4968529 Process for producing a corrosion resistant permanent magnet  
To obtain an anticorrosive Fe-B-R type permanent magnet; in particular, to reduce deterioration rate of the initial magnetic properties below 10% after the magnet has been kept at 80° C. in 90%...
4952294 Apparatus and method for in-situ generation of dangerous polyatomic gases, including polyatomic radicals  
In-situ generation of dangerous polyatomic gases is achieved by providing a solid elemental or compound source, one or more gaseous feedstock sources, a plasma generated in a partial vacuum, and...
4944754 Method of manufacturing synthetic bone coated surgical implants  
A process is provided for depositing hydroxylapatite on the surface of materials suitable for implantation into animals and humans. In this process, a coating of hydroxylapatite is applied to...
4941915 Thin film forming apparatus and ion source utilizing plasma sputtering  
A thin film forming apparatus comprising a plasma generating chamber into which is introduced a gas to generate plasma; a first target and a second target which are made of a material to be...
4938992 Methods for thermal transfer with a semiconductor  
Thermal transfer between a semiconductor wafer and a platen during vacuum processing is provided through a soft, thermally-conductive polymer layer having a thin, hard surface film. The soft...
4936653 Cerium oxyfluoride antireflection coating for group II-VI photodetectors and process for forming same  
A durable quarter wave antireflection coating for a photodetecting device 20, the photodetecting device being formed within a radiation absorbing layer 22 of HgCdTe which is epitaxially grown upon...
4936959 Method of making cutting tool for aluminum work pieces having enhanced crater wear resistance  
An iron-based cutting tool, useful for machining aluminum-based workpieces at surface speeds at or in excess of 1000 sfm, is fabricated by (i) removing surface impurities from the surface of the...
4933065 Apparatus for applying dielectric or metallic materials  
In an apparatus for applying materials to a substrate (15) disposed in a vacuum chamber (17), having an electron emitter (9) and having magnet coils (30, 39) disposed outside of the vacuum chamber...
4923585 Sputter deposition for multi-component thin films  
Ion beam sputter-induced deposition using a single ion beam and a multicomponent target is capable of reproducibly producing thin films of arbitrary composition, including those which are close to...
4920094 Process for producing superconducting thin films  
A process for producing a superconducting thin film on a surface of a substrate of the present invention comprises the steps of: sputttering a target made of a group IIIa metal and/or an oxide...
4915810 Target source for ion beam sputter deposition  
A target for use in ion beam sputtering is arranged for varying the chemical composition of the deposited film without requiring substantial fabrication of a new target. The target is comprised of...
4911809 Thin film deposition process  
A thin film deposition process comprises the steps of providing a first target area on a magnetron electrode, sputtering particles from said area so that they fall onto a heated substrate body for...
4895630 Rapidly removable undercoating for vacuum deposition of patterned layers onto substrates  
An undercoating for the vacuum deposition of material thereover that can be removed from a substrate by washing with water for one minute or less comprising a water soluble film-forming polymer, a...
4885068 Sheet plasma sputtering method and an apparatus for carrying out the method  
A high-efficient sheet plasma sputtering method and an apparatus for carrying out the method which comprise means for deforming an arc plasma stream into a form of sheet by a magnetic field so that...
4877504 Methods for fabricating electro-optically active niobium dioxide (NbO.sub.2 )  
A reactive ion-beam sputtering technique for fabricating NbO 2 crystalline thin films suitable for use in these electro-optic devices.
4877479 Method and apparatus for ion deposition and etching  
The disclosure relates to maskless deposition and etching and more particularly to maskless deposition and etching of the surface of objects using single and multiple ion sources.
4874493 Method of deposition of metal into cavities on a substrate  
A process for filling cavities in a flat surface on a substrate by metal deposition which includes depositing a film of metal onto the flat surface and cavities in a substantially perpendicular...
4866032 Method and apparatus for producing thin film of high to superconductor compound having large area  
A thin film of a preselected compound having a large area is continuously produced on a substrate by depositing elements constituting the preselected compound from a target member onto the surface...
4855026 Sputter enhanced ion implantation process  
A sputter enhanced ion implantation process is disclosed that uses to advantage the ion beam sputtering phenomenon to deposit layers of coatings on surfaces of interest simultaneously with ion...
4849247 Enhanced adhesion of substrate materials using ion-beam implantation  
A method is provided for improving the adhesion of a substrate material which does not form stable bonds to a bondable material by applying high energy bondable ions to the surface of the substrate...
4849082 Ion implantation of zirconium alloys with hafnium  
An implantation method for the improvement of the corrosion resistance and hydrogen absorption resistance of zirconium alloys in a light water nuclear reactor environment includes the steps of...
4846953 Metal ion source  
A sputtering type of a metal ion source includes a microwave radiation means and a pair of magnetic poles to which a negative electric potential is applied. The magnetic pole acts as an electrode...
4844785 Method for deposition of hard carbon film  
A diamond-like hard carbon film is formed on a substrate by impinging particles of carbon onto a surface of the substrate, bombarding the surface of the substrate with accelerated particles of...
4842945 Stainless steel coated with thin film of carbon containing specified amount in a state of diamond and having an adjustable black transparent color tone  
A stainless steel with black transparent appearance suitable for use as a decorative architectural material. The stainless steel material has a stainless steel substrate and a thin graphite film...
4832979 Process for preparing laser knife  
A process for preparing a laser knife wherein on the surface of a probe portion of a laser knife are coated with a carbon coating of 1 μm to 50 μm in thickness and a protective coating of 1 μm...
4794047 Method of manufacturing magnetic recording medium  
The method of manufacturing a magnetic recording medium according to the present invention comprises a first step in which a ferromagnetic metal layer of a predetermined thickness is formed on a...
4793908 Multiple ion source method and apparatus for fabricating multilayer optical films  
A method of fabricating multiple layer, solid, thin films on a substrate having a surface to be coated, the method providing control over the thickness, stoichiometry, and morphology of each...
4780239 Ion exchange resin for immobilizing radioactive waste  
Disclosed is a method of making an ion exchange material. A ceramic material is ion implanted with sulfur, carbon, phosphorus, or nitrogen, which is oxidized to sulfate, carboxylate or carbonate,...
4776925 Method of forming dielectric thin films on silicon by low energy ion beam bombardment  
A low-energy oxygen and/or nitrogen ion beam with an energy level of about 60 eV is used to form an ultra-thin layer of silicon adduct on unheated silicon substrates. The ion beam is created with a...
4774103 Method of reinforcing a ceramic body of silicon carbide  
Silicon and nitrogen ions are implanted in a ceramic body of silicon carbide and the ceramic body is heated in a nonoxidizing atmosphere, whereby it is reinforced.
4760369 Thin film resistor and method  
Thin film resistors formed from a metal silicon nitride film are provided in which tungsten, titanium, tantalum, and other group IV A, V A, and VII A metals are included. The silicon to metal ratio...
4758304 Method and apparatus for ion etching and deposition  
The disclosure relates to a method and apparatus using ion etching and ion assisted deposition to reform a surface of an object, such as a large lens, from its existing topography to a...
4747922 Confined ion beam sputtering device and method  
A hollow cylindrical target, lined internally with a sputter deposit material and open at both ends, surrounds a substrate on which sputtered deposition is to be obtained. An ion beam received...
4724106 Process for forming organic film  
A process for preparing an organic film comprising the steps of ejecting an organic material in a gaseous state from an injection nozzle into a vacuum region to form clusters due to adiabatic...
4721689 Method for simultaneously forming an interconnection level and via studs  
A method for simultaneously forming a level of interconnection metallurgy over, and inter-level via studs through, an insulating layer of a semiconductor chip. The method comprises the steps of...
4717622 Magnetic recording media  
A magnetic recording medium has a protective layer made of high hardness carbon synthesized under a low-temperature and a low-pressure by blowing hydrocarbon gas plasma onto a magnetic recording...
4717461 System and method for processing workpieces  
A method of processing a plurality of semiconductor wafers from a wafer cassette including a wafer transfer housing and one or more processing chambers. A wafer is removed from its cassette and...
4713157 Combined integrated circuit/ferroelectric memory device, and ion beam methods of constructing same  
Methods for forming targets of ferroelectric, metal nitrate or similar material, methods for depositing such materials using ion beam techniques, and a method for forming a combined and integrated...
4692230 Thin film forming method through sputtering and sputtering device  
A method for forming a thin film wherein plural targets of different materials are alternately sputtered througth the switching of the electric powers supplied thereto, the particles produced from...
4690744 Method of ion beam generation and an apparatus based on such method  
There is provided a method of ion beam generation wherein a plurality of opposing targets are sputtered by plasma generated in a space confined by these targets and ionized particles thereby...
4673475 Dual ion beam deposition of dense films  
A novel dual ion beam sputtering process for depositing thin films of high density is described. One of the ion beams contains relatively heavy sputtering ions, such as argon ions, for ejecting...
4664769 Photoelectric enhanced plasma glow discharge system and method including radiation means  
Plasma enhancement is achieved in a plasma glow system by increasing the number of photoelectric electrons in the plasma glow by producing photoelectrons from the surface of a target in the system...
4652357 Apparatus for and a method of modifying the properties of a material  
Apparatus for and a method of modifying the properties of a material. A single ion beam from a source in a vacuum chamber is deflected by an electrostatic deflection system between a target and a...
4639301 Focused ion beam processing  
An apparatus is described which makes possible the precise sputter etching and imaging of insulating and other targets, using a finely focused beam of ions produced from a liquid metal ion source....
4637869 Dual ion beam deposition of amorphous semiconductor films  
A sputtering process for efficiently preparing amorphous semiconducting films having a reduced number of localized states is disclosed. In particular, hydrogenated semiconductor films free of...
4588490 Hollow cathode enhanced magnetron sputter device  
A plasma sputter etching/deposition system comprising an electron-emitting hollow cathode arc-source combined with a conventional plasma sputter etching/deposition system such as a magnetron. The...
4565618 Apparatus for producing diamondlike carbon flakes  
A vacuum arc between a spot 42 at the face of a graphite cathode 30 and a graphite anode 32 produces a beam 28 of carbon ions and atoms. This beam deposits a carbon coating on an ion beam sputtered...
4560577 Oxidation protection coatings for polymers  
A polymeric substrate 10 is coated with a metal oxide film 22 to provide oxidation protection in low earth orbital environments. The film contains about 4 volume percent polymer to provide...
4522844 Corrosion resistant coating  
Disclosed is a method of coating a substrate with an amorphous metal comprising the step of bombarding a solid piece of the metal with ions of an inert gas in the presence of a magnetic field to...
4517066 Ion beam deposition or etching re rubber-metal adhesion  
Metal to rubber adhesion is improved by metal substrates having a coating thereon such as brass, copper, and the like. The coating is applied by an ion beam sputter deposition or, in the...
Matches 201 - 250 out of 331 < 1 2 3 4 5 6 7 >