Matches 51 - 100 out of 331 < 1 2 3 4 5 6 7 >
Match Document Document Title
6676741 Methods for producing enhanced interference pigments  
Methods and apparatus are provided for uniformly depositing a coating material from a vaporization source onto a powdered substrate material to form a thin coalescence film of the coating material...
6669824 Dual-scan thin film processing system  
A deposition system is described. The deposition system includes a deposition source that generates deposition flux comprising neutral atoms and molecules. A shield defining an aperture is...
6663753 Method of making coated article including DLC inclusive layer over low-E coating  
A substrate is coated with a low-E coating system including at least one infrared (IR) reflective layer. A diamond-like carbon (DLC) inclusive protective coating system (e.g., including at least...
6641704 Method for manufacturing an optical filter having laminate film  
A plurality of composite target materials containing a plurality of metal elements and oxygen, wherein the mix ratio of the metal elements is different individually for each of the target...
6635124 Method of depositing a thermal barrier coating  
A process of forming a ceramic coating on a component. The process generally entails placing the component in a coating chamber containing oxygen and an inert gas, heating a surface of the...
6620527 Hillock-free aluminum wiring layer and method of forming the same  
A hillock-free wiring layer and method of forming the same are provided. The wiring layer includes at least two aluminum (Al) layers formed on a substrate, and each of the Al layers includes Al...
6613240 Method and apparatus for smoothing thin conductive films by gas cluster ion beam  
A method and apparatus is disclosed that provided for the successful and precise smoothing of conductive films on insulating films or substrates. The smoothing technique provides a smooth surface...
6610179 System and method for controlling deposition thickness using a mask with a shadow that varies with respect to a target  
A system and method for controlling a deposition thickness distribution over a substrate. A motor rotates the substrate, and at least one sensor senses the deposition thickness of the substrate at...
6593150 Methods and apparatus for depositing magnetic films  
Methods and systems are provided for depositing a magnetic film using one or more long throw magnetrons, and in some embodiments, an ion assist source and/or ion beam source. The long throw...
6592725 Fabrication method for spin valve sensor with insulating and conducting seed layers  
A method is described comprising forming an insulating polycrystalline seed layer in a first chamber by reactively pulsed DC magnetron sputtering, then forming an insulating amorphous-like seed...
6579420 Apparatus and method for uniformly depositing thin films over substrates  
A thin film deposition apparatus and method are disclosed in this invention. The apparatus includes a depositing thin-film particle source, a beam-defining aperture between the particle source and...
6555221 Method for forming an ultra microparticle-structure  
A method for forming an ultra microparticle-structure composed of ultra microparticles including the steps of: forming on a substrate higher wettability parts and lower wettability parts to a...
6554968 Method for measuring and controlling beam current in ion beam processing  
A method for producing film thickness control of ion beam sputter deposition films. Great improvements in film thickness control is accomplished by keeping the total current supplied to both the...
6537606 System and method for improving thin films by gas cluster ion beam processing  
The present invention provides apparatus and methods to carry out the task of both reducing the surface roughness (smoothing) and improving the thickness uniformity of, preferably, but not limited...
6537429 Diamond coatings on reactor wall and method of manufacturing thereof  
A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a diamond containing surface and process for manufacture thereof.
6527918 Method and apparatus for low voltage plasma doping using dual pulses  
A pulsed plasma doping system separates the plasma ignition function from the ion implantation function. An ignition voltage pulse is supplied to an ionizable gas and an implantation voltage pulse...
6495010 Differentially-pumped material processing system  
A differentially pumped deposition system is described that includes a deposition source, such as a magnetron sputtering source, that is positioned in a first chamber. The deposition source...
6482763 Suboxide fuel cell catalyst for enhanced reformate tolerance  
The present invention provides fuel cell electrode catalysts comprising alternating platinum-containing layers and layers containing suboxides of a second metal, where the catalyst demonstrates an...
6479111 Process for production of ultrathin protective overcoats  
A target of fullerene is placed with a substrate in a vacuum chamber. A charged beam, i.e., an electron beam or an ion beam, is directed at the target with a power adequate to emit fullerene...
6478931 Apparatus and method for intra-layer modulation of the material deposition and assist beam and the multilayer structure produced therefrom  
A method of producing a multilayer structure that has reduced interfacial roughness and interlayer mixing by using a physical-vapor deposition apparatus. In general the method includes forming a...
6475557 Method for manufacturing optical filter  
A method for manufacturing an optical filter capable of manufacturing an optical filter in such a manner that the transmission wavelength varies linearly with respect to the angle θ in the...
6472122 Method of applying insulation for coating implantable components and other microminiature devices  
A protective, biocompatible coating or encapsulation material protects and insulates a component or device intended to be implanted in living tissue. The coating or encapsulation material comprises...
6464891 Method for repetitive ion beam processing with a carbon containing ion beam  
A method is provided for a repetitive deposition and etch of a substrate using a carbon containing ion beam in a gridded ion source. The method includes the actual ion beam processing step combined...
6456173 Method and system for wafer-level tuning of bulk acoustic wave resonators and filters  
A method and system for tuning a bulk acoustic wave device at the wafer level by adjusting the device thickness. In particular, the device thickness has a non-uniformity profile across the device...
6451176 Electrostatic particle trap for ion beam sputter deposition  
A method and apparatus for the interception and trapping of or reflection of charged particulate matter generated in ion beam sputter deposition. The apparatus involves an electrostatic particle...
6447653 Method of shaping a flux mask and process of sputtering with the shaped flux mask  
The present invention provides a method for shaping a mask to reduce coating non-uniformity in the radial direction. A test run of the ion beam sputtering system coats a stationary glass plate...
6447652 Thin-film forming method and thin-film forming apparatus  
A Raman spectrum of a thin film which must be formed is measured in a thin-film forming step for forming the thin film on a member to be processed in an atmosphere, the pressure of which has been...
6440276 Process for producing thin film gas sensors with dual ion beam sputtering  
A process for making a stoichiometric and crystalline thin film CuO catalytic layer atop a gas sensing layer for the detection of dilute sulfur compound gases. The sensing layer is made using dual...
6428657 Magnetic read head sensor with a reactively sputtered pinning layer structure  
A pinning layer structure is provided for a spin valve sensor of a read head which has a reactively deposited nickel oxide first film which underlies a reactively sputter deposited second film of...
6425987 Technique for deposition of multilayer interference thin films using silicon as the only coating material  
A new technique is provided using only one coating material (pure silicon) to deposit thin films in a high vacuum, and using an ion source with a working gas (or gases) to control the refractive...
6413380 Method and apparatus for providing deposited layer structures and articles so produced  
A merged ion beam and plasma vapor deposition chamber and associated manufacturing process are disclosed in which thin film depositions occur in a merged deposition chamber. The chamber utilizes...
6395156 Sputtering chamber with moving table producing orbital motion of target for improved uniformity  
A sputtering chamber has a target that moves with an orbital motion relative to an ion beam. An X-Y assembly allows for target movement in both the horizontal and vertical directions. The X-Y...
6392244 Ion beam deposition of diamond-like carbon overcoats by hydrocarbon source gas pulsing  
Stable operation of an ion beam deposition (IBD) station forming part of a multi-station apparatus and formation therein of a tribologically robust DLC-type i-C:H ultra-thin protective overcoat for...
6383345 Method of forming indium tin oxide thin film using magnetron negative ion sputter source  
A method for forming an indium tin oxide thin film on a substrate in the present invention includes the steps of introducing a mixture of an inert gas and a low electron affinity element in close...
6371135 Method and apparatus for removing a particle from a surface of a semiconductor wafer  
A method is described for removing a particle from a surface of a semiconductor wafer. In general, the method involves positioning an electrically conductive surface near the particle to be...
6372103 Ultrashort pulse laser deposition of thin films  
Short pulse PLD is a viable technique of producing high quality films with properties very close to that of crystalline diamond. The plasma generated using femtosecond lasers is composed of single...
6344115 Pattern forming method using charged particle beam process and charged particle beam processing system  
A pattern forming method using an improved charged particle beam process, and a charged particle beam processing system prevent effectively the corrosion of a workpiece by a reactive gas adsorbed...
6338775 Apparatus and method for uniformly depositing thin films over substrates  
A thin film deposition apparatus and method are disclosed in this invention. The method includes a step of providing a vacuum chamber for containing a thin-film particle source for generating...
6319372 Permanent magnet linear microwave plasma source  
A linear microwave plasma source comprises a leaktight chamber (10) under negative pressure and a microwave injection guide (12) that ends in a 90° elbow (13) opening perpendicularly into the...
6315873 Method of forming a fluoride film  
A method for depositing films of a fluorinated compound is disclosed, wherein a reactive sputtering process allows the use of a metal or other non-fluorinated material as the target material. The...
6306266 Method of making a top spin valve sensor with an in-situ formed seed layer structure for improving sensor performance  
A method constructs first and second seed layers of a seed layer structure in-situ for a top spin valve sensor for increasing magnetoresistive coefficient dr/R of the sensor, reducing a...
6296741 Method of making oxide barrier layer for a spin tunnel junction  
A method forms an aluminum oxide (Al 2 O 3 ) barrier layer for a tunnel junction sensor. A wafer substrate and an aluminum (Al) target are provided in a sputtering chamber which may have first and...
6280584 Compliant bond structure for joining ceramic to metal  
A compliant bond structure 20 comprising wire mesh 25 strands 50 surrounded by compliant metal 40 is useful for bonding a ceramic surface 30 to a metal surface 35. The wire mesh 25 comprises...
6238531 Method and apparatus to improve the properties of ion beam deposited films in an ion beam sputtering system  
An ion beam sputtering system having a chamber, an ion beam source, multiple targets, a shutter, and a substrate stage for securely holding a wafer substrate during the ion beam sputtered...
6238526 Ion-beam source with channeling sputterable targets and a method for channeled sputtering  
The invention provides a sputtering system which consists of an ion beam and a target of a sputterable material. A distinguishing feature of the system of the invention is that the sputtering...
6224718 Target assembly for ion beam sputter deposition with multiple paddles each having targets on both sides  
An ion beam sputtering target assembly has six sputter targets arranged in pairs on three paddles and disposed upon the circumference of a circular holder. The circular holder can be rotated about...
6214772 Process for preparing polycrystalline thin film, process for preparing oxide superconductor, and apparatus therefor  
A method is presented for making a polycrystalline thin film (B) by depositing particles emitted from a target (36) on a substrate base (A) to form the film (B) constituted by the target material...
6210546 Fixture with at least one trough and method of using the fixture in a plasma or ion beam  
Optical components, such as optical semi-isolators, are placed in a fixture that exposes at least a portion of the mounting surface of each optical component when a plasma or ion beam is directed...
6210540 Method and apparatus for depositing thin films on vertical surfaces  
A mask is placed over a center portion of a deposition source to limit angle of the flux from the source. A substrate or device with a vertical surface (referenced to a major surface of the...
6210544 Magnetic film forming method  
Disclosed is a magnetic film forming method of forming a magnetic film on a substrate by preparing a material A formed of oxide of an element T of at least one kind of Fe, Co, and Ni and a material...
Matches 51 - 100 out of 331 < 1 2 3 4 5 6 7 >