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7622007 Substrate processing apparatus and semiconductor device producing method  
Disclosed is a substrate processing apparatus which comprises reaction tubes ( 3,4 ) for processing multiple substrates ( 27 ), a heater ( 5 ) for heating the substrates, and gas introducing...
7618494 Substrate holding structure and substrate processing device  
The object of the present invention is to prevent damage due to thermal stress induced into a substrate holding table in a substrate holding structure for holding a substrate to be processed. In...
7618516 Method and apparatus to confine plasma and to enhance flow conductance  
The embodiments of the present invention generally relate to annular ring used in a plasma processing chamber. In one embodiment, the annular ring includes an inner wall, an upper outer wall, a...
7615133 Electrostatic chuck module and cooling system  
An electrostatic chuck module for a semiconductor manufacturing apparatus which can be cooled with water and in which there is no penetration leak includes an electrostatic chuck plate of alumina...
7601224 Method of supporting a substrate in a gas cushion susceptor system  
An apparatus and method to position a wafer onto a wafer holder and to maintain a uniform wafer temperature is disclosed. The wafer holder or susceptor comprises a recess or pocket whose surface...
7585386 Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method  
A plasma processing apparatus for performing a plasma process on a target substrate includes a process container configured to accommodate the target substrate and to reduce pressure therein. A...
7582186 Method and apparatus for an improved focus ring in a plasma processing system  
A focus ring configured to be coupled to a substrate holder comprises a first surface exposed to a process; a second surface, opposite the first surface, for coupling to an upper surface of the...
7582166 Holder for supporting wafers during semiconductor manufacture  
An improved wafer holder design is described which has manufacturing and performance advantages over present state-of-the-art holders used in various wafer processing applications. The new wafer...
7582167 Apparatus for reducing entrapment of foreign matter along a moveable shaft of a substrate support  
In one embodiment, the invention is a guard ring for reducing particle entrapment along a moveable shaft of a substrate support. In one embodiment, the guard ring comprises a substantially annular...
7582184 Plasma processing member  
A plasma processing member includes a ceramic base, a plasma generating electrode embedded in the ceramic base, and an electrode power supply member connected to the plasma generating electrode....
7579573 Thermal activation method and thermal activation device for a heat-sensitive adhesive sheet  
A thermal head has heating elements that can be selectively driven independently from one another during a driving operation to directly heat, and thereby thermally activate, regions of a...
7542263 Overlay correction by reducing wafer slipping after alignment  
A method and apparatus for correcting overlay errors in a lithography system. During lithographic exposure, features being exposed on the wafer need to overlay existing features on the wafer....
7537673 Plasma processing apparatus  
Disclosed herein is a plasma processing apparatus, which generates plasma within a vacuum chamber to process semiconductor substrates using the plasma. The apparatus comprises a substrate mounting...
7513954 Plasma processing apparatus and substrate mounting table employed therein  
A plasma processing apparatus includes a processing container for receiving a substrate to be processed and processing the substrate by a plasma of a processing gas, a substrate mounting table,...
7503980 Substrate supporting apparatus  
A substrate supporting apparatus includes a plate member of an aluminum alloy having a flat upper surface, bottomed pits formed in the plate member, and spacer members held in the pits,...
7501605 Method of tuning thermal conductivity of electrostatic chuck support assembly  
A method of tuning the thermal conductivity of an electrostatic chuck (ESC) support assembly comprises measuring the temperature at a plurality of sites on a support assembly surface in which each...
7449071 Wafer holder with peripheral lift ring  
A wafer holder for supporting a wafer within a CVD processing chamber includes a vertically moveable lift ring configured to support the bottom peripheral surface of the wafer, and an inner plug...
7442275 Lateral temperature equalizing system for large area surfaces during processing  
In many processes used in fabricating semiconductors the wafer is seated on the top surface of a pedestal and heated in a high energy process step, such as plasma etching. The pedestal, chuck or...
7427329 Temperature control for single substrate semiconductor processing reactor  
A reactor for heat treatment of a substrate having a process chamber within a substrate enclosing structure, and a support structure configured to position a substrate at a predetermined spacing...
7422637 Processing chamber configured for uniform gas flow  
An apparatus and method for performing uniform gas flow in a processing chamber is provided. In one embodiment, an apparatus is an edge ring that includes an annular body having an annular seal...
7422655 Apparatus for performing semiconductor processing on target substrate  
An apparatus for performing a semiconductor process on a target substrate (W) includes a lifting mechanism ( 48 ) disposed in a worktable ( 38 ) to assist transfer of the target substrate. The...
7396432 Composite shadow ring assembled with dowel pins and method of using  
A composite shadow ring that is constructed of an upper ring and a lower ring assembled together by a plurality of dowel pins and a method for using the ring. The upper ring and the lower ring each...
7393417 Semiconductor-manufacturing apparatus  
On a wafer holding area 50 on the upper surface of a susceptor 22, a wafer W is supported by a wafer support 54 such that a gap with a predetermined distance is formed between the wafer W and...
7393433 Plasma processing apparatus, semiconductor manufacturing apparatus and electrostatic chucking unit used thereof  
A wiring member which becomes substantially symmetrical on the plane of an electrostatic chuck unit is connected to the tip end of an RF introduction rod between the RF introduction rod and the...
7393418 Susceptor  
A susceptor at least a surface thereof being coated with SiC, includes a recess where an wafer is mounted, the recess having an round portion disposed on a lower portion of an outer circumferential...
7390367 Housing assembly for an induction heating device including liner or susceptor coating  
A housing assembly for an induction heating device defines a processing chamber and includes a susceptor and a thermally conductive liner. The susceptor surrounds at least a portion of the...
7390366 Apparatus for chemical vapor deposition  
An apparatus for CVD is disclosed. Processing gas is injected to an upper center portion of a wafer supporting member by a gas focus ring installed at an inner side surface of a reaction chamber....
7381276 Susceptor pocket with beveled projection sidewall  
An apparatus for holding a semiconductor substrate comprises a plate having a pocket which holds the substrate, wherein the pocket comprises a lower surface and an inner edge. The inner edge...
7381293 Convex insert ring for etch chamber  
A new and improved insert ring for a wafer support inside a processing chamber for the processing, particularly dry etching, of semiconductor wafer substrates. The insert ring includes a generally...
7364624 Wafer handling apparatus and method of manufacturing thereof  
A wafer processing device or apparatus, i.e., a heater or an electrostatic chuck, comprises a planar support platen, a support shaft having centrally located bore, and a pair of electrical...
RE40264 Multi-temperature processing  
The present invention provides a technique, including a method and apparatus, for etching a substrate in the manufacture of a device. The apparatus includes a chamber and a substrate holder...
7361230 Substrate processing apparatus  
In the substrate processing apparatus, a ceramic module for mounting a substrate has a flat plate portion having an electric circuitry and a ceramic base body, and as at least a part of a surface...
7347901 Thermally zoned substrate holder assembly  
A thermally zoned substrate holder including a substantially cylindrical base having top and bottom surfaces configured to support a substrate. A plurality of temperature control elements are...
7337745 Electrode, susceptor, plasma processing apparatus and method of making the electrode and the susceptor  
A susceptor 24 includes a heater 38 disposed in a planar state, upper and lower ceramic-metal composites 40 A and 40 B disposed so as to sandwich the heater 38 from above and from below,...
7338578 Step edge insert ring for etch chamber  
An insert ring for a wafer support inside a processing chamber for the processing, particularly dry etching, of semiconductor wafer substrates. The insert ring has a generally step-shaped...
7335267 Heat treating apparatus having rotatable heating unit  
An apparatus includes a stationary supporting base for mounting a semiconductor wafer thereon, and a rotatable heating unit having a plurality of heating lamps located above the wafer. The...
7335278 Plasma processing apparatus and plasma processing method  
An electrostatic chuck 108 is provided on a lower electrode 106 provided inside a processing chamber 102 of an etching apparatus 100, and a conductive inner ring body 112 a and an...
7332038 Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substrates  
A device for depositing crystalline layers onto one or more substrates in a process chamber, including: a reverse-heatable support plate which forms a wall of the process chamber and which is...
7320733 Electron bombardment heating apparatus and temperature controlling apparatus and control method thereof  
An electron bombardment heating apparatus, in which thermions emitted from filaments 9 are accelerated and impinge upon a heating plate 2 , so as to heat the heating plate 2 , wherein a...
7311782 Apparatus for active temperature control of susceptors  
A method and an apparatus utilized for thermal processing of substrates during semiconductor manufacturing. The method includes heating the substrate to a predetermined temperature using a heating...
7311797 Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor  
Components of semiconductor processing apparatus comprise thermal sprayed yttria-containing coatings that provide erosion, corrosion and/or corrosion-erosion resistance in plasma atmospheres. The...
7303998 Plasma processing method  
A plasma processing method for processing a sample by reducing a pressure within a processing chamber, including mounting the sample on a sample holder disposed in the processing chamber, and...
7304264 Micro thermal chamber having proximity control temperature management for devices under test  
A temperature unit to control a temperature of a device under test using a fluid includes a block disposed opposite the device under test and which defines a gap therebetween and through which the...
7297895 Apparatus for removal of minute particles from a surface using thermophoresis to prevent particle redeposition  
A method and apparatus for removing minute particles from a surface of a sample are provided that prevent redeposition of the particles onto the surface. By combining thermophoresis with laser...
7297894 Method for multi-step temperature control of a substrate  
A method of changing the temperature of a substrate during processing of the substrate includes providing the substrate on a substrate holder, the substrate holder including a temperature...
7279048 Semiconductor manufacturing apparatus  
To provide a semiconductor manufacturing device, which is provided with a wafer holder capable of improving the cooling rate of a heater and retaining the homogeneity of the temperature...
7252738 Apparatus for reducing polymer deposition on a substrate and substrate support  
An adjustable RF coupling ring is capable of reducing a vertical gap between a substrate and a hot edge ring in a vacuum processing chamber. The reduction of the gap reduces polymer deposits on the...
7252737 Pedestal with integral shield  
Generally, a substrate support member for supporting a substrate is provided. In one embodiment, a substrate support member for supporting a substrate includes a body coupled to a lower shield. The...
7250094 Heat treatment apparatus  
A processing gas is prevented from entering into a space below a placement table. A supporting surface for supporting the lower face of a placement table is provided at an inner circumferential...
7244311 Heat transfer system for improved semiconductor processing uniformity  
A plasma processing system and methods for processing a substrate using a heat transfer system are provided. The heat transfer system, which is capable of producing a high degree of processing...
Matches 1 - 50 out of 201 1 2 3 4 5 >