Matches 1 - 50 out of 157 1 2 3 4 >


Match Document Document Title
9038567 Plasma processing apparatus  
The object of the invention is to provide a plasma processing apparatus having enhanced plasma processing uniformity. The plasma processing apparatus comprises a processing chamber 1, means 13 and...
9021984 Plasma processing apparatus and semiconductor device manufacturing method  
A plasma processing apparatus includes a processing chamber; a lower electrode provided in the processing chamber and having a base made of a conductive metal to which a high frequency power is...
8991331 Integrated steerability array arrangement for minimizing non-uniformity and methods thereof  
A method for providing steerability in a plasma processing environment during substrate processing is provided. The method includes managing, power distribution by controlling power being...
8968514 Gas distributing device and substrate processing apparatus including the same  
A gas distribution device for a substrate treating apparatus includes a plurality of plasma source electrodes having a first side surface; a plurality of plasma ground electrodes having a second...
8904957 Plasma processor and plasma processing method  
An etching chamber 1 incorporates a focus ring 9 so as to surround a semiconductor wafer W provided on a lower electrode 4. The plasma processor is provided with an electric potential control DC...
8877002 Internal member of a plasma processing vessel  
An internal member of a plasma processing vessel includes a base material and a film formed by thermal spraying of ceramic on a surface of the base material. The film is formed of ceramic which...
8869742 Plasma processing chamber with dual axial gas injection and exhaust  
An electrode is exposed to a plasma generation volume and is defined to transmit radiofrequency power to the plasma generation volume, and includes an upper surface for holding a substrate in...
8869741 Methods and apparatus for dual confinement and ultra-high pressure in an adjustable gap plasma chamber  
A plasma processing system having a plasma processing chamber configured for processing a substrate is provided. The plasma processing system includes at least an upper electrode and a lower...
8858754 Plasma processing apparatus  
There is provided a plasma processing apparatus capable of easily exhausting a processing gas introduced in a space above a vertically movable upper electrode. The plasma processing apparatus...
8858712 Electrode for use in plasma processing apparatus and plasma processing apparatus  
An electrode for use in a plasma processing apparatus is provided above a lower electrode within a processing chamber so as to face the lower electrode serving as a mounting table configured to...
8845806 Shower plate having different aperture dimensions and/or distributions  
A shower plate is adapted to be attached to the showerhead and includes a front surface adapted to face the susceptor; and a rear surface opposite to the front surface. The shower plate has...
8845856 Edge ring assembly for plasma etching chambers  
An edge ring assembly used in a plasma etching chamber includes a dielectric coupling ring and a conductive edge ring. In one embodiment, the dielectric coupling ring has an annular projection...
8833299 Divided annular rib type plasma processing apparatus  
A plasma stream-derived deposited matter formed on an annular rib for droplet capture in a plasma processing apparatus is prevented from falling into a plasma generation portion and causing a...
8733282 Plasma processing apparatus  
The object of the invention is to provide a plasma processing apparatus having enhanced plasma processing uniformity. The plasma processing apparatus comprises a processing chamber 1, means 13 and...
8724288 Electrostatic chuck and vacuum processing apparatus  
An electrostatic chuck is provided which is arranged that, at the time of performing processing treatments of irradiating light to a to-be-processed substrate while holding the translucent...
8702902 Device for generating a plasma discharge for patterning the surface of a substrate  
Device for generating a plasma discharge for patterning the surface of a substrate, comprising a first electrode having a first discharge portion and a second electrode having a second discharge...
8652298 Triode reactor design with multiple radiofrequency powers  
Methods, systems, and computer programs are presented for semiconductor manufacturing are provided. One wafer processing apparatus includes: a top electrode; a bottom electrode; a first radio...
8652342 Semiconductor fabrication apparatuses to perform semiconductor etching and deposition processes and methods of forming semiconductor device using the same  
A semiconductor fabrication apparatus and a method of fabricating a semiconductor device using the same performs semiconductor etching and deposition processes at an edge of a semiconductor...
8629370 Assembly for delivering RF power and DC voltage to a plasma processing chamber  
A triaxial rod assembly for providing both RF power and DC voltage to a chuck assembly that supports a workpiece in a processing chamber during a manufacturing operation. In embodiments, a rod...
8622021 High lifetime consumable silicon nitride-silicon dioxide plasma processing components  
A method of increasing mean time between cleans of a plasma etch chamber and chamber parts lifetimes is provided. Semiconductor substrates are plasma etched in the chamber while using at least one...
8617352 Electrode assembly for the removal of surface oxides by electron attachment  
An apparatus and a method comprising same for removing metal oxides from a substrate surface are disclosed herein. In one particular embodiment, the apparatus comprises an electrode assembly that...
8613827 Plasma treatment system  
A plasma treatment system for treating a workpiece with a downstream-type plasma. The processing chamber of the plasma treatment system includes a chamber lid having a plasma cavity disposed...
8580079 Electrode carrier assemblies  
In accordance with one embodiment of the present disclosure, an electrode carrier assembly is provided including an electrode carrying annulus and a plurality of electrode mounting members. The...
8573152 Showerhead electrode  
A showerhead electrode, a gasket set and an assembly thereof in plasma reaction chamber for etching semiconductor substrates are provided with improved a gas injection hole pattern, positioning...
8547085 Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamber  
An arrangement for measuring process parameters within a processing chamber is provided. The arrangement includes a probe arrangement disposed in an opening of an upper electrode. Probe...
8536071 Gasket with positioning feature for clamped monolithic showerhead electrode  
An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing...
8528498 Integrated steerability array arrangement for minimizing non-uniformity  
An integrated steerability array arrangement for managing plasma uniformity within a plasma processing environment to facilitate processing of a substrate is provided. The arrangement includes an...
8500952 Plasma confinement rings having reduced polymer deposition characteristics  
Plasma confinement ring assemblies are provided that include confinement rings adapted to reach sufficiently high temperatures on plasma-exposed surfaces of the rings to avoid polymer deposition...
8496781 Plasma processing apparatus  
The invention provides a plasma processing apparatus which is based upon a dry etching apparatus and which can inhibit the contamination of a work piece caused by sputtering onto a wall of a...
8491750 Adjustable confinement ring assembly  
A plasma confinement assembly for a semiconductor processing chamber is provided. The assembly includes a plurality of confinement rings disposed over each other, and each of the plurality of...
8480850 Plasma treatment system  
A plasma treatment system for treating a workpiece with a downstream-type plasma. The processing chamber of the plasma treatment system includes a chamber lid having a plasma cavity disposed...
8470126 Wiggling control for pseudo-hardmask  
An apparatus for etching features in an etch layer is provided. A plasma processing chamber is provided, comprising a chamber wall, a chuck, a pressure regulator, an electrode or coil, a gas...
8453600 Substrate processing apparatus  
Disclosed is a substrate processing apparatus, comprising a processing chamber to accommodate one or more substrates, a gas supply section to supply processing gas into the processing chamber, a...
8449715 Internal member of a plasma processing vessel  
An internal member of a plasma processing vessel includes a base material and a film formed by thermal spraying of ceramic on a surface of the base material. The film is formed of ceramic which...
8443756 Showerhead electrodes and showerhead electrode assemblies having low-particle performance for semiconductor material processing apparatuses  
Showerhead electrodes for a semiconductor material processing apparatus are disclosed. An embodiment of the showerhead electrodes includes top and bottom electrodes bonded to each other. The top...
8419960 Plasma processing apparatus and method  
A plasma processing apparatus performs a process on a substrate by using plasma. The plasma processing apparatus includes a processing chamber; a mounting table which is located in the processing...
8418649 Composite showerhead electrode assembly for a plasma processing apparatus  
A showerhead electrode for a plasma processing apparatus includes an elastomeric sheet adhesive bond between mating surfaces of an electrode and a backing member to accommodate stresses generated...
8402918 Showerhead electrode with centering feature  
A showerhead electrode includes inner and outer steps at an outer periphery thereof, the outer step cooperating with a clamp ring which mechanically attaches the electrode to a backing plate.
8397668 Plasma processing apparatus  
The object of the invention is to provide a plasma processing apparatus having enhanced plasma processing uniformity. The plasma processing apparatus comprises a processing chamber 1, means 13 and...
8382939 Plasma processing chamber with enhanced gas delivery  
A method and apparatus for providing flow into a processing chamber are provided. In one embodiment, a vacuum processing chamber is provided that includes a substrate support pedestal disposed in...
8372238 Multiple-electrode plasma processing systems with confined process chambers and interior-bussed electrical connections with the electrodes  
Apparatus for treating products with plasma generated from a source gas. The apparatus includes a vacuum chamber, a plurality of juxtaposed electrodes arranged in adjacent pairs inside the vacuum...
8349126 Apparatus for etching edge of wafer  
An apparatus for etching an edge of a wafer includes a chamber, a chuck disposed inside the chamber upon which the wafer is disposed, a plate spaced apart from the wafer and disposed above the...
8343307 Showerhead assembly  
A method and apparatus for removing native oxides from a substrate surface is provided. In one embodiment, the apparatus for removing native oxides from a substrate surface includes a showerhead...
8308969 Plasma system for improved process capability  
A plasma system for substrate processing comprising, a conducting electrode (b, bb) on which one or more substrates (d) can be held; a second conducting electrode (a) placed adjacent but separated...
8272346 Gasket with positioning feature for clamped monolithic showerhead electrode  
An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing...
8267041 Plasma treating apparatus  
A plasma treating apparatus adapted to provide a predetermined plasma treatment to an object W to be treated comprises a processing chamber 12 configured to be capable of being vacuumed, an object...
8261692 Substrate processing apparatus and reaction container  
A substrate processing apparatus comprises a reaction chamber which is to accommodate stacked substrates, a gas introducing portion, and a buffer chamber, wherein the gas introducing portion is...
8251012 Substrate processing apparatus and semiconductor device producing method  
Disclosed is a substrate processing apparatus, including: a processing container; a gas supply section to supply a desired processing gas to the processing container; a gas exhaust section to...
8197637 Semiconductor fabrication apparatuses to perform semiconductor etching and deposition processes and methods of forming semiconductor device using the same  
A semiconductor fabrication apparatus and a method of fabricating a semiconductor device using the same performs semiconductor etching and deposition processes at an edge of a semiconductor...
8186300 Plasma processing apparatus  
A plasma processing apparatus for processing a surface of a to-be-processed substrate includes a processing chamber, a first electrode provided in the processing chamber, a second electrode...

Matches 1 - 50 out of 157 1 2 3 4 >