Matches 1 - 50 out of 200 1 2 3 4 >
Match Document Document Title
7387081 Plasma reactor including helical electrodes  
A device for forming an ion sheath in a plasma to deposit coatings on a non-conducting substrate. The device comprises a tubular reaction chamber having an outer surface wound helically with a...
7381291 Dual-chamber plasma processing apparatus  
A dual-chamber plasma processing apparatus comprises two reaction spaces which are equipped with different gas inlet lines and different RF systems. Each reaction space is provided with an RF wave...
7347915 Plasma in-situ treatment of chemically amplified resist  
A method for creating semiconductor devices by etching a layer over a wafer is provided. A photoresist layer is provided on a wafer. The photoresist layer is patterned. The wafer is placed in a...
7337745 Electrode, susceptor, plasma processing apparatus and method of making the electrode and the susceptor  
A susceptor 24 includes a heater 38 disposed in a planar state, upper and lower ceramic-metal composites 40 A and 40 B disposed so as to sandwich the heater 38 from above and from below,...
7318879 Apparatus to manufacture semiconductor  
An apparatus to manufacture a semiconductor includes a plasma-limiting device to limit a plasma region in a reaction chamber. The plasma-limiting device includes a first limiting device to limit...
7316761 Apparatus for uniformly etching a dielectric layer  
Apparatus for plasma etching a layer of material upon a substrate comprising an anode having a first region protruding from a second region, wherein the second region defines a plane and the first...
7306707 Adaptable processing element for a processing system and a method of making the same  
The present invention presents an adaptable processing element for use in a processing system having multiple configurations. The processing element comprises a primary component and at least one...
7296534 Hybrid ball-lock attachment apparatus  
The present invention uses hybrid ball-lock devices as an alternate for threaded fasteners. Parts of the fastener exposed directly to the plasma act as a shield for the remaining pieces of the...
7294283 Penning discharge plasma source  
The preferred embodiments described herein provide a Penning discharge plasma source. The magnetic and electric field arrangement, similar to a Penning discharge, effectively traps the electron...
7288166 Plasma processing apparatus  
A plasma processing apparatus for manufacturing a semiconductor device includes an apparatus for applying bias powers to a substrate to be processed and a material adjacent to the substrate, an...
7282111 System and method for monitoring particles contamination in semiconductor manufacturing facilities  
Provided is a particle monitoring system capable of detecting a level of polymer particle contamination on inner walls of a process chamber. Also disclosed is a method of monitoring the level of...
7281491 Dielectric-coated electrode, plasma discharge treatment apparatus and method for forming thin film  
A dielectric-coated electrode having a conductive base material coated with a dielectric on a surface thereof, the dielectric including a first metal atom and a second metal atom. As for an ionic...
7273533 Plasma processing system with locally-efficient inductive plasma coupling  
An inductively coupled plasma source is provided with a peripheral ionization source for producing a high-density plasma in a vacuum chamber for semiconductor wafer coating or etching. The source...
7270713 Tunable gas distribution plate assembly  
A gas distribution plate assembly and a method for distributing gas in a processing chamber are provided. In one embodiment, a gas distribution plate assembly includes a tuning plate coupled to a...
7255773 Plasma processing apparatus and evacuation ring  
A plasma processing apparatus having an evacuation ring with high plasma resistance and capable of minimizing abnormal discharge is provided. A processing chamber 100 includes a ceiling unit 110...
7217337 Plasma process chamber and system  
The present invention relates to a plasma process chamber, which includes: an upper housing having a gas inlet connected to a gas source, and a gas shower head placed in the upper housing; and a...
7204913 In-situ pre-coating of plasma etch chamber for improved productivity and chamber condition control  
A semiconductor processing chamber having a silicon containing pre-coat is provided. The chamber includes a top electrode in communication with a power supply and a processing chamber defined...
7182842 Device for amplifying the current of an abnormal electrical discharge and system for using an abnormal electrical discharge comprising one such device  
A device ( 1 ) for amplifying the current of an abnormal electrical discharge, characterized in that it comprises an electrode which is positively polarized ( 2 ) and associated with a magnetic...
7176402 Method and apparatus for processing electronic parts  
An electronic part processing method for peeling off a resin coating of an electronic part having a terminal section. The method includes a step of irradiating, with plasma, a coated wire having...
7165506 Method and device for plasma-treating the surface of substrates by ion bombardment  
In an ion etching method for reducing a substrate thickness, an electric arc is generated in a vacuum chamber such that the electric arc is locally separated from the substrate and circulates about...
7153444 Apparatus and method for radio frequency de-coupling and bias voltage control in a plasma reactor  
Provided is a method and apparatus for controlling a bias voltage over a wide range and for de-coupling dual radio frequency (RF) currents to allow for independent control of plasma density and ion...
7138034 Electrode member used in a plasma treating apparatus  
In a plasma treating apparatus, a ceramic porous substance having a three-dimensional network structure in which a frame portion formed of ceramic containing alumina is provided continuously like a...
7104217 Plasma processing apparatus  
The present invention provides a plasma processing apparatus having an electrode plate arranging therein, an upper electrode to which a dielectric member or a cavity portion is provided, a...
7102872 Electrostatic chuck  
An ESC (Electrostatic Chuck) to chuck an object by electrostatic force, having an ESC main body supporting the object; a guide ring supported by the ESC main body and encircling the object; a...
7094314 Atmospheric pressure non-thermal plasma device to clean and sterilize the surfaces of probes, cannulas, pin tools, pipettes and spray heads  
The present invention relates to methods and apparatuses for the use of atmospheric pressure non-thermal plasma to clean and sterilize the surfaces of liquid handling devices.
7033444 Plasma processing apparatus, and electrode structure and table structure of processing apparatus  
An electrode structure used in a plasma processing apparatus which performs a predetermined process on an object (W) to be processed by using a plasma in a process chamber ( 26 ) in which a vacuum...
RE39064 Electronic device manufacturing apparatus and method for manufacturing electronic device  
An electronic device manufacturing apparatus includes: a reaction chamber including a wall having a ground potential level; a reaction gas inlet for introducing a reaction gas into the reaction...
7025856 Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge  
Apparatus for the processing of materials involving placing a material either placed between an radio-frequency electrode and a ground electrode, or which is itself one of the electrodes. This is...
7017594 Atmospheric pressure non-thermal plasma device to clean and sterilize the surfaces of probes, cannulas, pin tools, pipettes and spray heads  
The present invention relates to methods and apparatuses for the use of atmospheric pressure non-thermal plasma to clean and sterilize the surfaces of liquid handling devices.
7013834 Plasma treatment system  
A plasma treatment system for treating a workpiece with a downstream-type plasma. The processing chamber of the plasma treatment system includes a chamber lid having a plasma cavity disposed...
7004107 Method and apparatus for monitoring and adjusting chamber impedance  
A substrate processing system that includes a deposition chamber having a reaction zone, a substrate holder that positions a substrate in the reaction zone, a gas distribution system that includes...
6998014 Apparatus and method for plasma assisted deposition  
Embodiments of the present invention relate to an apparatus and method of plasma assisted deposition by generation of a plasma adjacent a processing region. One embodiment of the apparatus...
6992375 Anchor for device package  
An anchor to hold getter materials in place within a micromechanical device package substrate. First and second cavity faces define an anchor cavity and mechanically retain a getter away from a...
6974523 Hollow anode plasma reactor and method  
The plasma processing apparatus includes a plasma chamber, a first electrode, a second electrode, and a plasma containment device. The plasma containment device has a plurality of slots and is...
6953531 Methods of etching silicon-oxide-containing materials  
The invention encompasses a method of enhancing selectivity of etching silicon dioxide relative to one or more organic substances. A material comprising one or more elements selected from Group...
6949204 Deformation reduction at the main chamber  
A vacuum chamber with a cover with a first section, a second section, and a pocket between the first section and second section is provided. The vacuum chamber has a main cavity to which the first...
6949165 Plasma processing apparatus  
An electrical connection means 45 guides a DC voltage, which is generated in an ion sheath when a plasma is excited, to a first electrode 31 where a substrate W is placed. Hence, the DC voltage...
6948448 Apparatus and method for depositing large area coatings on planar surfaces  
A method and apparatus for depositing a uniform coating on a large area, planar surface using an array of multiple plasma sources and a common reactant gas injector. The apparatus includes at least...
6946053 Plasma reactor  
This invention is a hardware modification which permits greater uniformity of etching to be achieved in a high-density-source plasma reactor (i.e., one which uses a remote source to generate a...
6929712 Plasma processing apparatus capable of evaluating process performance  
A high-frequency current detector of a plasma processing apparatus detects a high-frequency current produced when high-frequency power in the range that does not cause generation of plasma in a...
6923886 Apparatus for plasma treatment of golf balls  
The present invention relates to an improved apparatus for plasma treatment of golf ball surface. The improved apparatus comprises a cylindrical basket shaped rotating tumbler made from aluminum...
6916401 Adjustable segmented electrode apparatus and method  
A segmented electrode apparatus for use in plasma processing in a plasma chamber or as part of a plasma processing system. The apparatus is composed of a plurality of electrode segments each having...
6902648 Plasma etching device  
A plasma etching device including a supply path supplying temperature adjustment gas into a process chamber, wherein the temperature adjustment gas is supplied, and a temperature of an interior of...
6899798 Reusable ceramic-comprising component which includes a scrificial surface layer  
Disclosed herein is a method of roughening a ceramic surface by forming mechanical interlocks in the ceramic surface by a chemical etching process, a thermal etching process, or a laser...
6899787 Plasma processing apparatus and plasma processing system with reduced feeding loss, and method for stabilizing the apparatus and system  
A plasma processing unit has two electrodes for exciting a plasma, a plasma processing chamber, an RF generator, a matching circuit for performing impedance matching between the plasma processing...
6899054 Device for hybrid plasma processing  
A device for hybrid plasma processing, particularly for deposition of thin films and for plasma treatment of samples, in a plasma reactor with pumping system characterized in that at least one...
6896775 High-power pulsed magnetically enhanced plasma processing  
Magnetically enhanced plasma processing methods and apparatus are described. A magnetically enhanced plasma processing apparatus according to the present invention includes an anode and a cathode...
6892669 CVD apparatus  
A CVD apparatus produces plasma to generate radicals and uses the radicals, silane, and the like so as to deposit films on substrates in a vacuum vessel 12. The vacuum vessel has a partitioning...
6884635 Control of power delivered to a multiple segment inject electrode  
An RF power supply system ( 200 ) for use with an electrode ( 60 ) in a plasma reactor system ( 10 ) capable of supporting a plasma ( 32 ) with a plasma load impedance (Z R ), wherein the electrode...
6878233 Workpiece holding mechanism  
According to the present invention, there is provided a holding mechanism of an object to be processed W, which comprises a relay switch to electrically disconnect a detection circuit having the...
Matches 1 - 50 out of 200 1 2 3 4 >