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7387081 |
Plasma reactor including helical electrodes
A device for forming an ion sheath in a plasma to deposit coatings on a non-conducting substrate. The device comprises a tubular reaction chamber having an outer surface wound helically with a...
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7381291 |
Dual-chamber plasma processing apparatus
A dual-chamber plasma processing apparatus comprises two reaction spaces which are equipped with different gas inlet lines and different RF systems. Each reaction space is provided with an RF wave...
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7347915 |
Plasma in-situ treatment of chemically amplified resist
A method for creating semiconductor devices by etching a layer over a wafer is provided. A photoresist layer is provided on a wafer. The photoresist layer is patterned. The wafer is placed in a...
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7337745 |
Electrode, susceptor, plasma processing apparatus and method of making the electrode and the susceptor
A susceptor 24 includes a heater 38 disposed in a planar state, upper and lower ceramic-metal composites 40 A and 40 B disposed so as to sandwich the heater 38 from above and from below,...
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7318879 |
Apparatus to manufacture semiconductor
An apparatus to manufacture a semiconductor includes a plasma-limiting device to limit a plasma region in a reaction chamber. The plasma-limiting device includes a first limiting device to limit...
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7316761 |
Apparatus for uniformly etching a dielectric layer
Apparatus for plasma etching a layer of material upon a substrate comprising an anode having a first region protruding from a second region, wherein the second region defines a plane and the first...
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7306707 |
Adaptable processing element for a processing system and a method of making the same
The present invention presents an adaptable processing element for use in a processing system having multiple configurations. The processing element comprises a primary component and at least one...
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7296534 |
Hybrid ball-lock attachment apparatus
The present invention uses hybrid ball-lock devices as an alternate for threaded fasteners. Parts of the fastener exposed directly to the plasma act as a shield for the remaining pieces of the...
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7294283 |
Penning discharge plasma source
The preferred embodiments described herein provide a Penning discharge plasma source. The magnetic and electric field arrangement, similar to a Penning discharge, effectively traps the electron...
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7288166 |
Plasma processing apparatus
A plasma processing apparatus for manufacturing a semiconductor device includes an apparatus for applying bias powers to a substrate to be processed and a material adjacent to the substrate, an...
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7282111 |
System and method for monitoring particles contamination in semiconductor manufacturing facilities
Provided is a particle monitoring system capable of detecting a level of polymer particle contamination on inner walls of a process chamber. Also disclosed is a method of monitoring the level of...
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7281491 |
Dielectric-coated electrode, plasma discharge treatment apparatus and method for forming thin film
A dielectric-coated electrode having a conductive base material coated with a dielectric on a surface thereof, the dielectric including a first metal atom and a second metal atom. As for an ionic...
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7273533 |
Plasma processing system with locally-efficient inductive plasma coupling
An inductively coupled plasma source is provided with a peripheral ionization source for producing a high-density plasma in a vacuum chamber for semiconductor wafer coating or etching. The source...
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7270713 |
Tunable gas distribution plate assembly
A gas distribution plate assembly and a method for distributing gas in a processing chamber are provided. In one embodiment, a gas distribution plate assembly includes a tuning plate coupled to a...
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7255773 |
Plasma processing apparatus and evacuation ring
A plasma processing apparatus having an evacuation ring with high plasma resistance and capable of minimizing abnormal discharge is provided. A processing chamber 100 includes a ceiling unit 110...
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7217337 |
Plasma process chamber and system
The present invention relates to a plasma process chamber, which includes: an upper housing having a gas inlet connected to a gas source, and a gas shower head placed in the upper housing; and a...
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7204913 |
In-situ pre-coating of plasma etch chamber for improved productivity and chamber condition control
A semiconductor processing chamber having a silicon containing pre-coat is provided. The chamber includes a top electrode in communication with a power supply and a processing chamber defined...
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7182842 |
Device for amplifying the current of an abnormal electrical discharge and system for using an abnormal electrical discharge comprising one such device
A device ( 1 ) for amplifying the current of an abnormal electrical discharge, characterized in that it comprises an electrode which is positively polarized ( 2 ) and associated with a magnetic...
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7176402 |
Method and apparatus for processing electronic parts
An electronic part processing method for peeling off a resin coating of an electronic part having a terminal section. The method includes a step of irradiating, with plasma, a coated wire having...
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7165506 |
Method and device for plasma-treating the surface of substrates by ion bombardment
In an ion etching method for reducing a substrate thickness, an electric arc is generated in a vacuum chamber such that the electric arc is locally separated from the substrate and circulates about...
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7153444 |
Apparatus and method for radio frequency de-coupling and bias voltage control in a plasma reactor
Provided is a method and apparatus for controlling a bias voltage over a wide range and for de-coupling dual radio frequency (RF) currents to allow for independent control of plasma density and ion...
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7138034 |
Electrode member used in a plasma treating apparatus
In a plasma treating apparatus, a ceramic porous substance having a three-dimensional network structure in which a frame portion formed of ceramic containing alumina is provided continuously like a...
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7104217 |
Plasma processing apparatus
The present invention provides a plasma processing apparatus having an electrode plate arranging therein, an upper electrode to which a dielectric member or a cavity portion is provided, a...
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7102872 |
Electrostatic chuck
An ESC (Electrostatic Chuck) to chuck an object by electrostatic force, having an ESC main body supporting the object; a guide ring supported by the ESC main body and encircling the object; a...
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7094314 |
Atmospheric pressure non-thermal plasma device to clean and sterilize the surfaces of probes, cannulas, pin tools, pipettes and spray heads
The present invention relates to methods and apparatuses for the use of atmospheric pressure non-thermal plasma to clean and sterilize the surfaces of liquid handling devices.
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7033444 |
Plasma processing apparatus, and electrode structure and table structure of processing apparatus
An electrode structure used in a plasma processing apparatus which performs a predetermined process on an object (W) to be processed by using a plasma in a process chamber ( 26 ) in which a vacuum...
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RE39064 |
Electronic device manufacturing apparatus and method for manufacturing electronic device
An electronic device manufacturing apparatus includes: a reaction chamber including a wall having a ground potential level; a reaction gas inlet for introducing a reaction gas into the reaction...
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7025856 |
Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge
Apparatus for the processing of materials involving placing a material either placed between an radio-frequency electrode and a ground electrode, or which is itself one of the electrodes. This is...
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7017594 |
Atmospheric pressure non-thermal plasma device to clean and sterilize the surfaces of probes, cannulas, pin tools, pipettes and spray heads
The present invention relates to methods and apparatuses for the use of atmospheric pressure non-thermal plasma to clean and sterilize the surfaces of liquid handling devices.
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7013834 |
Plasma treatment system
A plasma treatment system for treating a workpiece with a downstream-type plasma. The processing chamber of the plasma treatment system includes a chamber lid having a plasma cavity disposed...
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7004107 |
Method and apparatus for monitoring and adjusting chamber impedance
A substrate processing system that includes a deposition chamber having a reaction zone, a substrate holder that positions a substrate in the reaction zone, a gas distribution system that includes...
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6998014 |
Apparatus and method for plasma assisted deposition
Embodiments of the present invention relate to an apparatus and method of plasma assisted deposition by generation of a plasma adjacent a processing region. One embodiment of the apparatus...
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6992375 |
Anchor for device package
An anchor to hold getter materials in place within a micromechanical device package substrate. First and second cavity faces define an anchor cavity and mechanically retain a getter away from a...
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6974523 |
Hollow anode plasma reactor and method
The plasma processing apparatus includes a plasma chamber, a first electrode, a second electrode, and a plasma containment device. The plasma containment device has a plurality of slots and is...
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6953531 |
Methods of etching silicon-oxide-containing materials
The invention encompasses a method of enhancing selectivity of etching silicon dioxide relative to one or more organic substances. A material comprising one or more elements selected from Group...
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6949204 |
Deformation reduction at the main chamber
A vacuum chamber with a cover with a first section, a second section, and a pocket between the first section and second section is provided. The vacuum chamber has a main cavity to which the first...
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6949165 |
Plasma processing apparatus
An electrical connection means 45 guides a DC voltage, which is generated in an ion sheath when a plasma is excited, to a first electrode 31 where a substrate W is placed. Hence, the DC voltage...
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6948448 |
Apparatus and method for depositing large area coatings on planar surfaces
A method and apparatus for depositing a uniform coating on a large area, planar surface using an array of multiple plasma sources and a common reactant gas injector. The apparatus includes at least...
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6946053 |
Plasma reactor
This invention is a hardware modification which permits greater uniformity of etching to be achieved in a high-density-source plasma reactor (i.e., one which uses a remote source to generate a...
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6929712 |
Plasma processing apparatus capable of evaluating process performance
A high-frequency current detector of a plasma processing apparatus detects a high-frequency current produced when high-frequency power in the range that does not cause generation of plasma in a...
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6923886 |
Apparatus for plasma treatment of golf balls
The present invention relates to an improved apparatus for plasma treatment of golf ball surface. The improved apparatus comprises a cylindrical basket shaped rotating tumbler made from aluminum...
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6916401 |
Adjustable segmented electrode apparatus and method
A segmented electrode apparatus for use in plasma processing in a plasma chamber or as part of a plasma processing system. The apparatus is composed of a plurality of electrode segments each having...
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6902648 |
Plasma etching device
A plasma etching device including a supply path supplying temperature adjustment gas into a process chamber, wherein the temperature adjustment gas is supplied, and a temperature of an interior of...
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6899798 |
Reusable ceramic-comprising component which includes a scrificial surface layer
Disclosed herein is a method of roughening a ceramic surface by forming mechanical interlocks in the ceramic surface by a chemical etching process, a thermal etching process, or a laser...
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6899787 |
Plasma processing apparatus and plasma processing system with reduced feeding loss, and method for stabilizing the apparatus and system
A plasma processing unit has two electrodes for exciting a plasma, a plasma processing chamber, an RF generator, a matching circuit for performing impedance matching between the plasma processing...
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6899054 |
Device for hybrid plasma processing
A device for hybrid plasma processing, particularly for deposition of thin films and for plasma treatment of samples, in a plasma reactor with pumping system characterized in that at least one...
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6896775 |
High-power pulsed magnetically enhanced plasma processing
Magnetically enhanced plasma processing methods and apparatus are described. A magnetically enhanced plasma processing apparatus according to the present invention includes an anode and a cathode...
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6892669 |
CVD apparatus
A CVD apparatus produces plasma to generate radicals and uses the radicals, silane, and the like so as to deposit films on substrates in a vacuum vessel 12. The vacuum vessel has a partitioning...
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6884635 |
Control of power delivered to a multiple segment inject electrode
An RF power supply system ( 200 ) for use with an electrode ( 60 ) in a plasma reactor system ( 10 ) capable of supporting a plasma ( 32 ) with a plasma load impedance (Z R ), wherein the electrode...
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6878233 |
Workpiece holding mechanism
According to the present invention, there is provided a holding mechanism of an object to be processed W, which comprises a relay switch to electrically disconnect a detection circuit having the...
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