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7585385 Plasma processing apparatus, control method thereof and program for performing same  
A plasma processing apparatus includes a processing chamber for accommodating therein an object to be processed, a plurality of bar-shaped magnets rotatably installed standing around the processing...
7582569 Distributor and distributing method, plasma processing system and method, and process for fabricating LCD  
A distributor ( 30 ) includes a square waveguide ( 31 ) to be connected to a microwave oscillator ( 20 ) and a square waveguide ( 41 ) having a plurality of openings ( 43 ) formed in a narrow wall...
7527713 Variable quadruple electromagnet array in plasma processing  
A quadruple electromagnetic coil array coaxially arranged in a rectangular array about a chamber axis outside the sidewalls of a plasma sputter reactor, preferably in back of an RF coil within the...
7506609 System for generating a local electron-cyclotron microwave low-pressure plasma at a predetermined location within a processing chamber  
In an arrangement for generating a local electron-cyclotron-microwave-low pressure plasma at a certain location within a gas-filled process chamber, a microwave supply means providing a microwave...
7493869 Very large area/volume microwave ECR plasma and ion source  
The present invention is an apparatus and method for producing very large area and large volume plasmas. The invention utilizes electron cylcotron resonances in conjunction with permanent magnets...
7485204 ECR plasma source and ECR plasma device  
An ECR plasma source of the invention is constructed of: a plasma generating chamber ( 10 ) having a generally rectangular section in a plane normal to a plasma flow; magnetic coils ( 20, 21 )...
7478609 Plasma process apparatus and its processor  
A plasma processing apparatus and a processing apparatus having a widened process condition range allowing plasma generation are obtained by increasing microwave propagation efficiency. The plasma...
7458335 Uniform magnetically enhanced reactive ion etching using nested electromagnetic coils  
A magnetic field-enhanced plasma reactor is disclosed, comprising a reaction chamber for applying a plasma to a substrate, a plurality of primary electromagnets disposed about said reaction...
7444955 Apparatus for directing plasma flow to coat internal passageways  
An apparatus for coating surfaces of a workpiece is configured to establish a pressure gradient within internal passageways through the workpiece, so that the coating within the internal...
7434537 Device for the coating of objects  
An apparatus for coating objects having a single microwave source, two or more coating chambers, and an impedance structure or a waveguide structure. The coating chambers are connected to the...
7430985 Plasma processing equipment  
Plasma processing equipment capable of increasing the heat resistance of a wave guide by using a high dielectric material, comprising a processing container 44 formed to allow vacuuming, a...
7392760 Microwave-excited plasma processing apparatus  
A microwave-excited plasma processing apparatus shows a wide pressure range and a wide applicable electric power range for normal electric discharges as a result of using slits cut through a...
7338575 Hydrocarbon dielectric heat transfer fluids for microwave plasma generators  
A process and apparatus for cooling a plasma tube generally includes flowing a hydrocarbon dielectric heat transfer fluid into a space defined by the plasma tube and a concentric tube surrounding...
7323080 Apparatus for treating substrate  
The present is directed to an apparatus for etching the top edge and bottom of a wafer. The apparatus includes a substrate support part for supporting a wafer and a movable protect part for...
7320331 In-situ plasma cleaning device for cylindrical surfaces  
An in-situ plasma cleaning device (PCD) performs an atomic surface cleaning process to remove contaminants and/or to modify the cylindrical surfaces of both the target and substrate. The atomic...
7320941 Plasma stabilization method and plasma apparatus  
There is disclosed a plasma technique in which a plasma generation technique frequently used in various fields including a semiconductor manufacturing process is used, and generation of plasma...
7316199 Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber  
A magnetic field generator for producing a magnetic field that accelerates plasma formation is placed proximate a reaction chamber of semiconductor substrate processing system. The magnetic field...
7305935 Slotted antenna waveguide plasma source  
A high density plasma generated by microwave injection using a windowless electrodeless rectangular slotted antenna waveguide plasma source has been demonstrated. Plasma probe measurements indicate...
7296533 Radial antenna and plasma device using it  
A plasma device includes a first conductive plate ( 31 ) in which a plurality of slots ( 36 ) are formed, a second conductive plate ( 32 ) having a microwave inlet ( 35 ) and disposed opposite to...
7288485 Device and method for anisotropic plasma etching of a substrate, particularly a silicon element  
A method and a device suitable for its execution are provided for the anisotropic plasma etching of a substrate, especially a silicon element. The device has a chamber and a plasma source for...
7243610 Plasma device and plasma generating method  
A plasma device includes a slot antenna ( 30 ) for supplying a high frequency electromagnetic field (F) supplied through a feeding part into a processing vessel ( 11 ). The feeding part has a...
7234413 Plasma processing apparatus  
In a plasma processing apparatus, microwaves being transmitted in a waveguide pass through a microwave transmitted window via first and second slot antennas provided in a magnetic field side, so as...
7210424 High-density plasma processing apparatus  
A high-density plasma processing apparatus includes a processing chamber, having a susceptor for supporting an object to be processed positioned therein and a dielectric window positioned on the...
7171919 Diamond film depositing apparatus using microwaves and plasma  
Disclosed herewith is a diamond film depositing apparatus using microwaves and plasma. The apparatus comprises a rectangular wave guide ( 125 ), a mode transition coupler ( 120 ), an antenna rod (...
7161110 Melting and vaporizing apparatus and method  
An apparatus and method for heating materials or substances in an oven at an oven temperature below their melting and/or vaporization points to either melt and/or vaporize the substance. Substances...
7156046 Plasma CVD apparatus  
A plasma CVD apparatus in which microwave power is supplied into a reaction chamber provided inside an annular waveguide through an antenna provided on the inner peripheral part of the waveguide to...
7067034 Method and apparatus for plasma forming inner magnetic bucket to control a volume of a plasma  
A plasma confinement arrangement for controlling the volume of a plasma while processing a substrate inside a process chamber includes a chamber within which a plasma is both ignited and sustained...
6965287 Low reflection microwave window  
A microwave window for transmitting microwave radiation includes a solid body and a flange. The solid body includes a first surface and a second surface spaced apart from each other in a first...
6963043 Asymmetrical focus ring  
An asymmetrical focus ring varies the flow-field, which aids in normalizing pressure gradients across the wafer being processed, thereby improving the process. Embodiments of the present invention...
6916400 Device for the plasma treatment of gases  
Provided is a device for the microwave-sustained plasma treatment of gases, which comprises a hollow structure forming a waveguide intended to be connected to a microwave generator, and means for...
6866747 Plasma processing apparatus  
On one side of a microwave entrance window that is exposed to the atmosphere, a slot plate having slots and a resonant unit are provided. The slot plate and the resonant unit are integrally placed...
6863835 Magnetic barrier for plasma in chamber exhaust  
A plasma chamber apparatus and method employing a magnet system to block the plasma within the chamber interior from reaching the exhaust pump. An exhaust channel between the chamber interior and...
6805770 Technique for improving uniformity of magnetic fields that rotate or oscillate about an axis  
Techniques used in systems that employ pairs of coils arranged around an axis to make a magnetic field that rotates around an axis to reduce or eliminate the effects of corners where adjacent ones...
6764575 Magnetron plasma processing apparatus  
When a substrate 30 is to be subjected to a magnetron plasma process, a dipole ring magnet 21 is provided, in which a large number of anisotropic segment magnets 22 are arranged in a...
6719875 Plasma process apparatus  
The plasma process apparatus is capable of uniformalizing the density of a plasma generated thereby and a self-bias voltage associated therewith. This apparatus include two parallel plates...
6709546 Device and method for etching a substrate by using an inductively coupled plasma  
A device and a method for etching a substrate, in particular a silicon body, by using an inductively coupled plasma. A high-frequency electromagnetic alternating field is generated using an ICP...
6706141 Device to generate excited/ionized particles in a plasma  
A device to generate excited and/or ionized particles in plasma with a generator to generate an electromagnetic wave and at least one plasma zone, in which the excited and/or ionized particles are...
6656540 Method for forming metallic film and apparatus for forming the same  
The present invention provides methods and apparatus for the formation of a thin noble metal film which can achieve a high rate of film growth, can use inexpensive raw materials, and do not allow...
6652763 Method and apparatus for large-scale diamond polishing  
A method and apparatus for the polishing of diamond surfaces, wherein the diamond surface is subjected to plasma-enhanced chemical etching using an atomic oxygen polishing plasma source, are...
6573190 Dry etching device and dry etching method  
A dry etching apparatus and method which can uniformly and stably generate a high-density plasma over a wide range, and can cope with increase of wafer diameter and making the pattern finer in etch...
6506687 Dry etching device and method of producing semiconductor devices  
A technique of dry etching the surface of a wafer by using a dry etching apparatus in which the distance between a wafer and a surface facing the wafer is set to the half or less of the diameter of...
6503364 Plasma processing apparatus  
In the plasma processing apparatus for generating plasma in a processing chamber and processing a wafer by mutual action of electromagnetic waves radiated from a UHF band antenna installed in the...
6475333 Discharge plasma processing device  
A discharge plasma processing device comprising a chamber with an evacuation system, a magnetic field generation system and an electric field application system with which the feature of operation...
6444087 Plasma etching system  
A plasma etching system using a ground electrode made of silicon carbide and a cover made of a dielectric material not containing aluminum, where the cover is laid over the substrate electrode,...
6431114 Method and apparatus for plasma processing  
The present invention aims to decrease reflected waves in a vacuum chamber to suppress standing waves, thereby easily controlling a plasma density so that uniform treatment can be performed. An...
6390019 Chamber having improved process monitoring window  
A process chamber 35 for processing a substrate 30 and monitoring the process conducted on the substrate 30 , comprises a support 45 , a gas distributor, and an exhaust 85 . The process...
6332947 Plasma processing apparatus and plasma processing method using the same  
A plasma processing apparatus is provided with at least one waveguide portion for introducing microwaves, an electron heating space chamber formed on a downstream side with respect to a dielectric...
6312556 Beat frequency modulation for plasma generation  
An apparatus and method for providing a modulated-bias plasma are described. In particular, an RF source or collector includes one or more sources to provide differing driving frequencies or bias...
6305315 ECR plasma apparatus  
An ECR plasma apparatus is formed of a vacuum chamber, a cavity disposed at a side surface of the vacuum chamber to which microwave is introduced, an electromagnetic coil disposed around the...
6268582 ECR plasma CVD apparatus  
An ECR plasma CVD apparatus includes a cavity for producing an ECR plasma, a vacuum chamber connected to the cavity, a base plate holder for holding a base plate or substrate, an electrode plate,...
Matches 1 - 50 out of 153 1 2 3 4 >