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7640072 |
Substrate processing apparatus, control method for the apparatus, and program for implementing the method
A substrate processing apparatus, according to which inspection of various devices in the substrate processing apparatus can be carried out with improved reliability, while reducing the burden on a...
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7632377 |
Dry etching apparatus capable of monitoring motion of WAP ring thereof
An optical monitoring system includes a ring-shaped object suspended by and engaged with a plurality of vertical plunger shafts. Normally, the vertical plunger shafts move upward and downward...
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7632419 |
Apparatus and method for monitoring processing of a substrate
Apparatus for in-situ monitoring of a process in a semiconductor wafer processing system consists of a process chamber having a dome, an enclosure disposed above the chamber, a process monitoring...
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7622006 |
Processed body carrying device, and processing system with carrying device
A main carrying device forming a part of a processing system, comprising a casing ( 40 ) forming a main carrying chamber ( 44 ) having vacuum atmosphere, the casing ( 40 ) further comprising a...
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7622017 |
Processing apparatus and gas discharge suppressing member
A processing apparatus for performing a process on a surface of an object to be processed by applying a high frequency power to an electrode installed in an airtight processing chamber to convert a...
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7620511 |
Method for determining plasma characteristics
Methods for determining characteristics of a plasma are provided. In one embodiment, a method for determining characteristics of a plasma includes obtaining metrics of current and voltage...
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7604010 |
Film formation apparatus and method of using the same
A film formation apparatus for a semiconductor process includes a cleaning gas supply circuit, a concentration measuring section, and an information processor. The cleaning gas supply circuit is...
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7601240 |
Disturbance-free, recipe-controlled plasma processing system and method
A plasma processing system includes a first unit for plasma-processing a sample based on a recipe for plasma processing, and a second unit for modifying the recipe in accordance with a monitored...
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7591923 |
Apparatus and method for use of optical system with a plasma processing system
A plasma processing system and method for operating an optical system in conjunction with a plasma processing system are provided. The plasma processing system includes an optical system in...
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7591922 |
Substrate processing apparatus and substrate processing method
A substrate processing apparatus for supplying a treatment liquid onto the surface of a substrate to treat the same. This apparatus is provided with: a spin chuck for holding and rotating a...
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7585385 |
Plasma processing apparatus, control method thereof and program for performing same
A plasma processing apparatus includes a processing chamber for accommodating therein an object to be processed, a plurality of bar-shaped magnets rotatably installed standing around the processing...
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7585685 |
Method of determining wafer voltage in a plasma reactor from applied bias voltage and current and a pair of constants
The voltage of a wafer on the pedestal of an RF plasma reactor is instantly determined from the applied bias current and the applied bias voltage sampled during plasma processing of the wafer using...
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7582182 |
Method and apparatus for measuring electron density of plasma and plasma processing apparatus
An apparatus for measuring plasma electron density precisely measures electron density in plasma even under a low electron density condition or high pressure condition. This plasma electron density...
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7566368 |
Method and apparatus for an improved upper electrode plate in a plasma processing system
The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate coupled to an upper assembly advantageously...
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7565879 |
Plasma processing apparatus
A plasma processing apparatus having a plasma generating unit, a process chamber including an outer cylinder for withstanding a reduced pressure, and an inner cylinder made of non-magnetic material...
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7563328 |
Method and apparatus for gas injection system with minimum particulate contamination
A gas injection system ( 10 ) is provided for a processing reactor and a method is provided for reducing transport of particulate material onto a substrate ( 12 ) during process gas start-up. The...
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7553679 |
Method of determining plasma ion density, wafer voltage, etch rate and wafer current from applied bias voltage and current
Plasma parameters such as plasma ion density, wafer voltage, etch rate and wafer current in the chamber are determined from external measurements on the applied RF bias electrical parameters such...
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7544269 |
Method and apparatus for electron density measurement
A plasma processing system including a plasma chamber ( 120 ) having a substrate holder ( 128 ) and a monitoring system ( 130 ). The monitoring system ( 130 ) includes a microwave mirror ( 140 )...
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7540923 |
Shower head structure for processing semiconductor
A shower head structure disposed in a device 2 for processing a semiconductor while supplying processing gas to a processing space S for storing a heated processed substrate W, comprising a...
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7537671 |
Self-calibrating optical emission spectroscopy for plasma monitoring
A plasma processing system and plasma monitor therefor is provided in which a plasma monitor housing is coupled to a plasma processing chamber such that a line-of-sight monitoring path extends...
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7534469 |
Semiconductor-processing apparatus provided with self-cleaning device
A CVD apparatus comprising an optical unit detecting the mass of contaminants adhering to an inner surface of a CVD reactor by irradiating an inner surface of the reactor with light having...
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7520956 |
On-wafer monitoring system
An on-wafer monitoring system is placed at a position of a substrate to be treated in a plasma treatment device. The on-wafer monitoring system includes various sensors, a data I/O unit for...
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7507313 |
Film removal method and apparatus
A film removal method and apparatus for removing a film from a substrate are disclosed. The method comprises the steps of disposing a plasma generator and a sucking apparatus over the substrate,...
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7497912 |
Substrate processing apparatus
A cell controller controls the operation of a transport robot to keep a substrate belonging to a succeeding lot carried into a heating part in the fourth transport cycle from being transported out...
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7498106 |
Method and apparatus for controlling etch processes during fabrication of semiconductor devices
A method for controlling etch processes during fabrication of semiconductor devices comprises tests and measurements performed on non-product and product substrates to define an N-parameter CD...
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7485189 |
Thin film deposition device using an FTIR gas analyzer for mixed gas supply
This invention provides a thin film deposition process making it possible to form a thin film having a desired composition with good reproducibility and high efficiency; a thin film deposition...
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7481887 |
Apparatus for controlling gas pulsing in processes for depositing materials onto micro-device workpieces
An apparatus for depositing materials onto a micro-device workpiece includes a gas source system configured to provide a first precursor, a second precursor, and a purge gas. The apparatus can also...
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7479207 |
Adjustable height PIF probe
A plasma probe assembly for use in a plasma processing chamber is provided. A semiconductor probe element with a probe surface at a first end of the semiconductor probe element is provided. An...
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7473332 |
Method for processing semiconductor
A method of processing a semiconductor which includes providing a process gas supply unit for supplying a process gas to a sample stand to hold a sample in a process chamber and to the process...
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7465357 |
Computer-readable medium that contains software for executing a method for cleaning a CVD chamber
The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from...
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7455747 |
Substrate processing apparatus, control method for the apparatus, and program for implementing the method
A substrate processing apparatus, according to which inspection of various devices in the substrate processing apparatus can be carried out with improved reliability, while reducing the burden on a...
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7455790 |
Emission spectroscopic processing apparatus and plasma processing method using it
A plasma processing method using a spectroscopic processing unit which includes separating spectrally plasma radiation emitted from a vacuum process chamber into component spectra, converting the...
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7445689 |
Substrate processing method and substrate processing system
The substrate processing system has an ozone generator that generates and supplies an ozone-containing gas to plural or N (N is a natural number not less than 2) ozone process units. The ozone...
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7440859 |
Method for determining plasma characteristics
Methods for determining characteristics of a plasma are provided. In one embodiment, a method for determining characteristics of a plasma includes obtaining metrics of a plasma at two different...
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7431795 |
Cluster tool and method for process integration in manufacture of a gate structure of a field effect transistor
A method and apparatus for process integration in manufacture of a gate structure of a field effect transistor are disclosed. The method includes assembling an integrated substrate processing...
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7416633 |
Plasma processing apparatus
Described is a vacuum processing apparatus that includes a vacuum container which has a processing chamber inside thereof, wherein a plasma used for processing a sample is formed inside the...
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7361600 |
Semiconductor manufacturing apparatus having a built-in inspection apparatus and a device manufacturing method using said manufacturing apparatus
According to the present invention, a chemical and mechanical polishing apparatus ( 100 ) for a sample such as a wafer includes a built-in inspection apparatus ( 25 ) incorporated therein. The...
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7354524 |
Method and system for processing multi-layer films
A method of processing multi-layer films, the method including: (1) processing a plurality of layers according to selected parameters, (2) determining a plurality of optical characteristics each...
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7350476 |
Method and apparatus to determine consumable part condition
A system for monitoring a condition of a consumable component in a substrate processing system that includes a tapered plug having a first axis, a second axis that intersects the first axis, a top...
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7351292 |
Assembly for processing substrates
An assembly for processing substrates, which processing comprises a vacuum deposition process, such as, for instance, sputtering, CVD or PECVD, which vacuum deposition process is carried out in at...
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7341644 |
Method for predicting consumption of consumable part, method for predicting deposited-film thickness, and plasma processor
There is not known a conventional method for predicting the consumed degree of consumable supplies and the thickness of deposited films without opening a processing chamber. A method for...
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7338581 |
Sputtering apparatus
A sputtering apparatus includes paired targets 31 disposed in a vacuum chamber 30 , substrate holder 33 disposed at a position nearly perpendicular to the paired target 31 and apart from a...
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7331751 |
Vacuum processing method
A vacuum processing method includes an atmospheric transfer step of transferring a wafer in atmospheric air to a vacuum transfer chamber using atmospheric transfer equipment disposed in atmospheric...
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7309395 |
System for forming composite polymer dielectric film
A system for depositing a composite polymer dielectric film on a substrate is disclosed, wherein the composite polymer dielectric film includes a low dielectric constant polymer layer disposed...
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7306696 |
Interferometric endpoint determination in a substrate etching process
In determining an endpoint of etching a substrate, light that is directed toward the substrate is reflected from the substrate. A wavelength of the light is selected to locally maximize the...
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7303648 |
Via etch process
Systems and techniques relating to etching vias in integrated circuit devices, in one implementation, include: providing a dielectric material and a conductive material, removing a first portion of...
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7294205 |
Method for reducing the intrinsic stress of high density plasma films
A layer of reduced stress is formed on a substrate using an HDP-CVD system by delaying or interrupting the application of capacitively coupled RF energy. The layer is formed by introducing a...
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7282111 |
System and method for monitoring particles contamination in semiconductor manufacturing facilities
Provided is a particle monitoring system capable of detecting a level of polymer particle contamination on inner walls of a process chamber. Also disclosed is a method of monitoring the level of...
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7267742 |
Etching apparatus, a method of controlling an etching solution, and a method of manufacturing a semiconductor device
An etching apparatus includes a chamber containing an etching solution including first and second components and water, a concentration of the water in the etching solution is at a specified level...
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7255114 |
Ion sampling system for wafer
An ion sampling method for wafer provides a wafer in a sampling chamber, wherein the wafer surface that is going to be sampled faces upward; spraying an extraction liquid continuously on the wafer...
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