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7383601 |
Substrate brush scrubbing and proximity cleaning-drying sequence using compatible chemistries, and method, apparatus, and system for implementing the same
In one embodiment, a substrate preparation system is provided. The system includes a brush, a front head, and a back head. The brush is configured to brush scrub a back surface of a substrate using...
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7377002 |
Scrubber box
A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank,...
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7353560 |
Proximity brush unit apparatus and method
An apparatus is provided for producing a wet region and corresponding dry region on a wafer. A proximity brush unit delivers fluids with a rotatable brush to produce the wet region on the wafer. As...
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7325268 |
Wheel cleaner apparatus
An automatic wheel cleaner apparatus providing cleaning of the inner side of a motor vehicle wheel having an inflated tire mounted thereto (a mounted wheel) prior to attachment of adhesively...
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7302727 |
Pressed powder pan cleaning machine
An apparatus is provided for cleaning residual powder and other contaminants from external surfaces of pressed powder cosmetic pans before the pans are adhered into the compact. A feed chute feeds...
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7231682 |
Method and apparatus for simultaneously cleaning the front side and back side of a wafer
A method for cleaning a semiconductor substrate is provided. The method initiates with transferring the semiconductor substrate into a chamber. Then, a first side of the semiconductor substrate is...
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7176676 |
Apparatuses and methods for monitoring rotation of a conductive microfeature workpiece
Apparatuses and methods for monitoring microfeature workpiece rotation during processing, such as brushing, by monitoring characteristics corresponding to a state of a magnetic field proximate to...
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7162765 |
Seal system for irrigated scrubber mandrel assembly
An improved cleaning fluid supply housing assembly for a cascade-type substrate scrubber having a sliding piston configured with a flange with recesses so that the piston is out of contact with the...
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7160172 |
Multi-station disk finishing apparatus and method
Multi-disk processing system and method of continuous finishing of memory media disks for digital data storage systems in preparation for magnetic memory coating, comprising four main sub-systems:...
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7137164 |
Glass washing machine with broken glass removal system
A glass sheet washing machine with a broken glass removal system includes a support, a liquid container or reservoir, a pump, a liquid applicator, and a liquid permeable member. The support...
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7007333 |
System and method for a combined contact and non-contact wafer cleaning module
A system and a method for cleaning and rinsing a wafer includes at least three rollers that are capable of supporting a wafer by an edge of the wafer. At least one of the rollers is driven and...
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6942737 |
Substrate cleaning apparatus and method
A substrate is supported at a plurality of edge positions thereof, to be in horizontal posture, by support pins erected on a spin chuck. A two-fluid nozzle is fixed to a position spaced from and...
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6907637 |
Edge wheel assembly in a substrate processing brush box
An edge wheel assembly for use in a semiconductor wafer fabrication brush box is provided. The edge wheel assembly is configured to support and to rotate a semiconductor wafer in a vertical...
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6865764 |
Fixture for assembling a post-CMP cleaning brush
A fixture for assembling a post-CMP cleaning brush. The post-CMP cleaning brush is provided with a brush core and an outer brush, and the outer brush is provided with a hollow portion. The fixture...
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6851436 |
Substrate processing using a fluid re-circulation system in a wafer scrubbing system
A system and method for re-circulating processing fluids in a substrate processing system is provided. A fluid re-circulation system for a brush box processing tool includes a supply tank into...
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6851152 |
Substrate cleaning apparatus
A substrate cleaning apparatus allows an end face and/or a bevel face of a substrate to be scrub-cleaned in a simple and effective manner. The apparatus has a plurality of rotatable substrate...
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6851151 |
Brush drive assembly in a substrate processing brush box
A modular brush drive assembly used in a brush box for processing a substrate is provided. The modular brush drive assembly includes a pair of brush drives. Each of the pair of brush drives has a...
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6820298 |
Wafer scrubbing device having brush assembly and mounting assembly forming spherical joint
A brush mounting system for a wafer scrubbing device includes a brush mandrel and a mounting assembly on which the brush mandrel is mounted. The mounting assembly includes a mounting member adapted...
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6813796 |
Apparatus and methods to clean copper contamination on wafer edge
A new apparatus is provided that can be applied to clean outer edges of semiconductor substrates. Under the first embodiment of the invention, a brush is mounted on the surface of the substrate...
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6810548 |
Cleaning apparatus
A cleaning apparatus of the present invention includes a roll brush for scrubbing the surface of the substrate, and an ultrasonic nozzle for blowing an aqueous cleaning solution against the surface...
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6804851 |
Holder for semiconductor wafers in a brush-cleaning installation
A holder in a brush-cleaning installation, preferably for combined use in the brush-cleaning and centrifugal-drying process, contains a carrier part from which there extend, in a spider-shaped...
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6740170 |
Apparatus and method for cleaning peripheral part of substrate
A cleaning apparatus ( 9 ) for cleaning a peripheral part of a substrate holds a peripheral part of a substrate ( 1 ) between the elastic porous member ( 29 ) of an upper cleaning roller ( 16 ) and...
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6739013 |
Wafer cleaning apparatus
A wafer cleaning apparatus includes a wafer supporting device for supporting a wafer to be cleaned, and sponges for cleaning the wafer. The sponges are arranged in contact with either surface of...
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6733596 |
Substrate cleaning brush preparation sequence, method, and system
A method for cleaning top and bottom surfaces of a semiconductor substrate is provided. The method includes scrubbing top and bottom surfaces of the semiconductor wafer with top and bottom brushes,...
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6728989 |
Labyrinth seal for bearing in brush mounting assembly for semiconductor wafer scrubber
A wafer scrubbing unit includes a mounting assembly for a scrubber brush. The mounting assembly has a rotary flow through tube through which cleaning liquid is delivered to the brush. A stationary...
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6711775 |
System for cleaning a semiconductor wafer
A method and a system are provided for cleaning a surface of a wafer. The method starts by scrubbing the surface of the wafer with a cleaning brush that applies a chemical solution to the surface...
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6676493 |
Integrated planarization and clean wafer processing system
A wafer processing module is provided. In one example, the wafer processing module includes a sub-aperture CMP processing system and a pad exchange system including a pad magazine for storing CMP...
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6671917 |
Wheel cleaning apparatus
A wheel cleaning apparatus for a wheelchair comprising a roller-assembly frame 50 L which includes a first receiving roller 21 L and a second receiving roller 22 L which can do seesaw movement...
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6625836 |
Apparatus and method for cleaning substrate
A substrate cleaning apparatus and method for a liquid crystal display panel capable of removing foreign substances attached to the lower and upper surfaces of a substrate as well as onto the side...
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6625835 |
Disk cascade scrubber
A cascaded disk scrubbing system and method are provided. The cascaded disk scrubbing system includes an array of rows of brush pairs. Each row includes a plurality of counter-rotating brush pairs...
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6620242 |
Device for applying and/or spreading liquid or pasty substances for coating surfaces
The invention relates to a device for applying and/or spreading liquid or pasty substances for coating surfaces, especially paists, varnishes and lacquers on the surface of objects ( 2 ). The...
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6618889 |
Disk-shaped workpiece washing apparatus
The washing apparatus is based on a process comprising the steps of extracting a plurality of workpieces W to be washed from rows of workpieces arranged longitudinally and at certain intervals in a...
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6615433 |
Apparatus for detecting wetness of a semiconductor wafer cleaning brush
The present invention provides a wafer cleaning apparatus. In an advantageous embodiment, the wafer cleaning apparatus includes cleaning brushes mounted within a brush box and a sensor associated...
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6594847 |
Single wafer residue, thin film removal and clean
A system is provided for use in semiconductor wafer cleaning operations. The cleaning system has a top cap and a bottom cap. The top cap seals on a top surface contact ring of a wafer, and the...
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6594846 |
Poultry cone cleaning device
The cones used to position poultry carcasses on poultry processing lines must be cleaned frequently. In order to clean the cones, a cone cleaning device is provided. A stainless steel frame holds...
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6588043 |
Wafer cascade scrubber
A cascaded wafer scrubbing system and method are provided. The cascaded wafer scrubbing system includes an array of rows of brush pairs. Each row includes a plurality of counter-rotating brush...
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6585826 |
Semiconductor wafer cleaning method to remove residual contamination including metal nitride particles
A method of removing residual contamination including metal nitride particles from semiconductor wafer surfaces including the steps of: providing at least one semiconductor wafer with metal nitride...
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6578227 |
Pad for use in a critical environment
A cleaning/polishing pad has a first surface with raised, substantially nubs, having a length greater than a width, arranged adjacent each other forming laterally alternating rows of nubs and...
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6575177 |
Semiconductor substrate cleaning system
A modular semiconductor substrate cleaning system is provided that processes vertically oriented semiconductor substrates. The system features a plurality of cleaning modules that may include a...
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6572710 |
Brush force control method for a substrate cleaning apparatus
A method of cleaning a substrate supported on an upper end of a spindle by first positioning a brush at a fixed elevation over the substrate. Next, the spindle is moved upward to bring the...
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6560809 |
Substrate cleaning apparatus
A substrate cleaning apparatus comprises a side surface cleaning member and a peripheral edge cleaning member. The side surface cleaning member includes a cylindrical scrub cleaning body having a...
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6557202 |
Wafer scrubbing brush core having an internal motor and method of making the same
A brush core and method of making a brush core are provided. The brush core is configured to be implemented in substrate preparation systems. The brush core is connected between a first end and a...
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6550091 |
Double-sided wafer edge scrubbing apparatus and method for using the same
A substrate cleaning system incorporating an edge scrubbing roller is disclosed. The system includes a cleaning station having a first brush and a second brush. The second brush is oriented...
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6547886 |
Method and apparatus for degreasing steel strip
A steel strip is degreased with low power consumption by subjecting the steel strip to electrolytic washing in a degreasing apparatus including an electrolytic washing apparatus in which electrodes...
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6544343 |
Method for cleaning substrates
A washer includes driving and scrubbing rollers that press against the opposing surfaces of a substrate, which may be, e.g., a small form factor disk. The driving rollers and scrubbing rollers are...
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6543084 |
Wafer scrubbing brush core
A brush core and the method for making a brush core for use in substrate scrubbing are provided. The substrate can be any substrate that may need to undergo a scrubbing operation to complete a...
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6537381 |
Method for cleaning and treating a semiconductor wafer after chemical mechanical polishing
A method is provided for cleaning a surface of a semiconductor wafer after a CMP operation. In one example, an improved cleaning chemical (ICC) is applied to the surface of the wafer. The ICC is...
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6523210 |
Surface charge controlling apparatus for wafer cleaning
An apparatus for performing a wafer cleaning method includes providing a plurality of sponge portions mounted on a common body for movement relative to a surface of a wafer to be cleaned, each...
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6467120 |
Wafer cleaning brush profile modification
A wafer cleaning brush roller having uniform and non-uniform protrusions via compression. The protrusions are formed by an inner PVA sponge compressed through an outer sleeve formed of a resilient...
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6464796 |
Methods for applying fluid through a brush interflow distributor
A method of applying a fluid to a brush is provided. The method includes outputting a flow of fluid from a shaft to an area between the shaft and a distributor where the flow of fluid is restricted...
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