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7604013 |
Substrate cleaning method and developing apparatus
A cleaning method highly effectively cleans a surface of a semiconductor wafer by removing a dissolution product, produced when a surface of a semiconductor wafer is processed by a developing...
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7584761 |
Wafer edge surface treatment with liquid meniscus
A method for cleaning an edge surface of a semiconductor substrate is disclosed. The proximity head unit is positioned so that the flow head portion and the collection head portion of the proximity...
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7568490 |
Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids
An apparatus and method are disclosed in which a semiconductor substrate having a surface containing contaminants is cleaned or otherwise subjected to chemical treatment using a foam. The...
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7544253 |
Method and apparatus for flushing asphalt feeding devices
A vehicle mounted patching system for patching potholes and the like and incorporating method and apparatus for removing and flushing asphalt emulsion from the feed lines of the patcher which...
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7527698 |
Method and apparatus for removing a liquid from a surface of a substrate
A method and apparatus for removing a first liquid from a surface of a substrate is provided. A second liquid is supplied to at least part of a surface of a substrate having a rotary movement. The...
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7520285 |
Apparatus and method for processing a substrate
A method for processing a substrate is provided which includes applying fluid onto a surface of the substrate from a portion of a plurality of inlets and removing at least the fluid from the...
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7475696 |
Dishwasher having valved third-level sprayer
A dishwasher has multiple wash zones which are each supplied by a wash liquid supply. An interior tub configured to provide an interior wash chamber for washing dishes is divisible into three wash...
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7464719 |
Multi-menisci processing apparatus
A substrate preparation apparatus is provided. The apparatus includes a housing configured to be installed in a substrate fabrication facility. The housing includes a manifold for use in preparing...
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7426932 |
Spray fill device and method for using the same
A spray fill device for delivering water to a washing machine is provided. The spray fill device includes a body defining an inlet, an outlet port, a mounting port, and a plurality of outlet...
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7422024 |
Ultrasonic shower cleaning apparatus of double-side cleaning type
An ultrasonic shower cleaning apparatus is disclosed which is capable of efficiently cleaning both surfaces of an article and configured to have a reduced size enabling an installation space...
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7406972 |
Substrate proximity processing structures
An apparatus for generating a fluid meniscus to process a substrate is provided. The apparatus includes a manifold head with a manifold surface having a plurality of conduits configured to generate...
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7383843 |
Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer
Among the many embodiment, in one embodiment, a method for processing a substrate is disclosed which includes generating a fluid layer on a surface of the substrate, the fluid layer defining a...
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7383601 |
Substrate brush scrubbing and proximity cleaning-drying sequence using compatible chemistries, and method, apparatus, and system for implementing the same
In one embodiment, a substrate preparation system is provided. The system includes a brush, a front head, and a back head. The brush is configured to brush scrub a back surface of a substrate using...
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7367345 |
Apparatus and method for providing a confined liquid for immersion lithography
A method for processing a substrate is provided which includes generating a meniscus on the surface of the substrate and applying photolithography light through the meniscus to enable...
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7350316 |
Meniscus proximity system for cleaning semiconductor substrate surfaces
A system and apparatus for cleaning a substrate is provided. The system includes a first head configured as a bar shape that extends approximately a diameter of the substrate. The first head is...
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7314529 |
Substrate cleaning apparatus and substrate cleaning method
A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the...
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7313934 |
Detergent injecting device for washer
A laundry aid dispenser for a washing machine includes a top cover disposed above a washtub for receiving clothes, a receiving cavity defined by an upper wall, a bottom wall, opposing sidewalls,...
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7278434 |
Cleaning device with toggle for increasing ozone dissolution in water for cleaning vegetables and fruits
A cleaning device with a toggle serves for increasing ozone dissolution in water for cleaning vegetables and fruits. The cleaning device is placed in a washing barrel. The cleaning device comprises...
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7267129 |
Device and process for liquid treatment of wafer-shaped articles
A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, near the edge, in which the liquid is applied to a first surface, flows essentially radially to the...
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7264007 |
Method and apparatus for cleaning a substrate using megasonic power
A method for processing a substrate is provided that includes generating a fluid meniscus on a surface of the substrate and applying acoustic energy to the fluid meniscus. The method also includes...
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7252097 |
System and method for integrating in-situ metrology within a wafer process
A system and method for processing a wafer includes applying a process to the wafer. The process being supported by a surface tension gradient device. A result of the process is monitored. The...
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7240679 |
System for substrate processing with meniscus, vacuum, IPA vapor, drying manifold
One of many embodiments of a substrate preparation system is provided which includes a drying system, the drying system including at least one proximity head for drying a substrate. The system also...
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7234477 |
Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces
One of many embodiments of a substrate preparation system is provided which includes a head having a head surface where the head surface is proximate to a surface of the substrate. The system also...
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7211555 |
Process for preparing fine zeolite particles
A process for efficiently preparing fine zeolite particles comprising synthesizing zeolite in the presence of an alkaline earth metal-containing compound and/or with controlling the preparation...
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7188632 |
Cleaning and sanitizing system
A high pressure water stream ( 14 ) is discharged onto a surface to be cleaned. An ozone/water stream ( 16 ) is discharged on the same surface for sanitizing the surface. The high pressure water...
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7172674 |
Device for liquid treatment of wafer-shaped articles
A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, in which a mask is kept at a defined short distance to the wafer-shaped article such that liquid...
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7165563 |
Method and apparatus to decouple power and cavitation for megasonic cleaning applications
An apparatus and a method is provided for decoupling a cavitation in a liquid from an acoustic energy used to induce the cavitation. Broadly speaking, a pressure adjustment is used to control an...
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7069937 |
Vertical proximity processor
A method for processing a substrate is provided which includes generating a fluid meniscus on the surface of the vertically oriented substrate, and moving the fluid meniscus over the surface of the...
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7000623 |
Apparatus and method for substrate preparation implementing a surface tension reducing process
Methods and systems for preparing a substrate implementing a surface tension reducing process are provided. In one example, a substrate preparation system includes a chuck which fingers for edge...
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6964724 |
Etching and cleaning methods and etching and cleaning apparatuses used therefor
An etching/cleaning apparatus is provided, which makes it possible to effectively remove an unnecessary material or materials existing on a semiconductor wafer without damaging the device area with...
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6945259 |
Substrate cleaning method and substrate cleaning apparatus
A substrate cleaning apparatus is provided that includes a cleaning cup for receiving a to-be-cleaned substrate, a table in the cleaning cup, a first, second, and third nozzles, a pure water...
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6910487 |
Method and apparatus for liquid-treating and drying a substrate
The present invention is related to a method and apparatus for liquid treating and drying a substrate, such as a semiconductor wafer, the method comprising the step of immersing a substrate or a...
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6901938 |
Substrate cleaning apparatus
The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a gas-liquid mixture by mixing a liquid and a pressurized gas, to discharge the gas-liquid mixture to a...
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6863741 |
Cleaning processing method and cleaning processing apparatus
Where a substrate such as a semiconductor wafer held in a process space in a process chamber consisting of an outside chamber and an inside chamber is subjected to a cleaning processing, a chemical...
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6851435 |
Method and apparatus for localized liquid treatment of the surface of a substrate
A method and apparatus for dispensing a liquid on the surface of a localized zone of a substrate, for example for cleaning of etching purposes. Along with the liquid, a gaseous tensio-active...
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6843259 |
Solution treatment unit
The present invention relates to a solution treatment unit for supplying a treatment solution to a substrate to treat the substrate within a treatment container, and an inner container surrounding...
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6823876 |
Methodology of rotational etching tool maintenance
A method of cleaning and maintenance used for a rotational etching tool, combining the physical characteristics of water (splashed off after striking the surface of a spinning wafer) and a PM...
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6817369 |
Device and method for cleaning substrates
The inventive device for cleaning substrates, especially semiconductor wafers, comprises a treatment basin for receiving at least one substrate, a cover for sealing said treatment basin, a first...
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6805754 |
Device and method for processing substrates
A device and method for processing substrates, whereby medium consumption and processing time are reduced. According to the inventive method, liquid is conducted to a surface of the substrate that...
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6792958 |
System for processing substrate with liquid
There is provided a system in which transportation, assembly and maintenance can be easily carried out. The system comprises: a case carrying unit for carrying in/out a case accommodating therein...
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6758227 |
Medical instrument washer
A medical instrument washer is provided which includes a rack drawably fitted in a washing tub, for setting washing objects thereon, a flow passage having one end located on a rear side of the...
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6745783 |
Cleaning processing method and cleaning processing apparatus
To provide a cleaning processing method and a cleaning processing apparatus which can improve cleaning efficiency. The apparatus is structured to install processing units 11 a- 11 d which...
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6742531 |
In-sink dishwater with self-aligning liquid feed system
A dish-cleaning appliance comprising a sink having a bowl defining a wash chamber with an open top for providing access to the wash chamber. A liquid recirculation system is provided for spraying...
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6712080 |
Flushing system for removing lubricant coking in gas turbine bearings
A flushing system for flushing away any coking material which may have built up in the bearing of a gas turbine. Three fluid tanks respectively contain a solvent for dissolving the coked material,...
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6708717 |
Flushing system for air conditioning drainage pipes
A flushing system for air conditioning drainage pipes including a pipe assembly, a valve for selectively blocking the pass of the upstream drain line and a connection for a pressurized fluid...
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6705330 |
Dishwashing machine with liquor distribution valve
Dishwashing machine with a distribution valve ( 5 ) which is arranged on the delivery-side section of the washing liquor circulation pump and is provided with at least two outlets ( 51, 52, 53 )...
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6705332 |
Hard floor surface cleaner utilizing an aerated cleaning liquid
A hard floor surface cleaning apparatus includes an aerator, a rotating scrub medium engaging the hard floor surface, a fluid conveyor, and a fluid recovery device. The aerator is configured to...
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6698444 |
Freeing of seized valves
In order to free a seized valve, an inspection port is formed in a wall of the valve body and the areas where the valve is seized are determined. One or more injection ports are formed in the valve...
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6668844 |
Systems and methods for processing workpieces
Workpieces requiring low levels of contamination, such as semiconductor wafers, are loaded into a rotor within a process chamber. The process chamber has a horizontal drain opening in its...
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6648006 |
Valve and a method of closing a valve
Valve ( 1 ) with a through-going axial bore ( 4 ), a first spindle ( 5 ) axially displaceable in the bore ( 4 ), an elastic/flexible seal ( 10 ) placed at the one end surface ( 6 ) of the first...
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