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7628162 |
Dish washer and blower cover thereof
A blower cover assembly of a dishwasher includes an attaching cap contacting a door liner, a guide sleeve extending frontward from the attaching cap, and a guide rib formed on an inner...
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7617831 |
Wash booth for containers
A wash booth ( 1 ) for containers comprises a platform ( 3 ) for supporting a container ( 2 ), a wall ( 4 ) equipped with a watertight door ( 5 ) and means for washing the inside walls of the...
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7604013 |
Substrate cleaning method and developing apparatus
A cleaning method highly effectively cleans a surface of a semiconductor wafer by removing a dissolution product, produced when a surface of a semiconductor wafer is processed by a developing...
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7578304 |
Cleaning and drying apparatus for substrate holder chuck and method thereof
A cleaning and drying apparatus is provided for a substrate holder chuck equipped with a holding members 31 ( 32, 33 ) having a plurality of holding grooves 31 a ( 32 a, 33 a ) for holding a...
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7534305 |
Method for controlling resin regeneration of dishwasher
A method of controlling a dishwasher having a water softening function performed by a water softener is disclosed. The method includes the steps of loading in the dishwasher an item to be washed,...
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7520284 |
Apparatus for developing photoresist and method for operating the same
A first proximity head is configured to define a meniscus of a photoresist developer solution on a substrate. The meniscus is to be defined between a bottom of the first proximity head and the...
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7513262 |
Substrate meniscus interface and methods for operation
An apparatus for processing a substrate with a fluid meniscus to be applied to a surface of the substrate is provided which includes a docking surface configured to be placed adjacent to an edge of...
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7506457 |
Substrate treating apparatus
A substrate treating apparatus for drying substrates by moving the substrates out of a treating liquid into a solvent atmosphere. The apparatus includes a treating tank for storing the treating...
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7467634 |
No contact spray apparatus cleaning device
The invention is an automatic no contact machine for cleaning and drying tips, air caps, retainers and cups on spray apparatus when changing liquid or when the apparatus will be idle, or to remove...
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7464719 |
Multi-menisci processing apparatus
A substrate preparation apparatus is provided. The apparatus includes a housing configured to be installed in a substrate fabrication facility. The housing includes a manifold for use in preparing...
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7434588 |
Spin cleaning and drying apparatus and method of spin cleaning and drying
The present invention provides a spin cleaning and drying apparatus of single-wafer processing type which cleans a substrate with a cleaning liquid from a rinse nozzle while rotating the substrate...
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7406972 |
Substrate proximity processing structures
An apparatus for generating a fluid meniscus to process a substrate is provided. The apparatus includes a manifold head with a manifold surface having a plurality of conduits configured to generate...
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7386944 |
Method and apparatus for drying a wafer, and an apparatus for cleaning and drying a wafer
A method an apparatus for drying a wafer, and an apparatus for cleaning and drying a wafer are provided. In the apparatus for cleaning and drying a wafer, the wafer is dipped into a cleaning...
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7383844 |
Meniscus, vacuum, IPA vapor, drying manifold
A head is provided which includes a first surface of the head capable of being in close proximity to the wafer surface, and includes a first conduit region on the head where the first conduit...
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7383843 |
Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer
Among the many embodiment, in one embodiment, a method for processing a substrate is disclosed which includes generating a fluid layer on a surface of the substrate, the fluid layer defining a...
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7367345 |
Apparatus and method for providing a confined liquid for immersion lithography
A method for processing a substrate is provided which includes generating a meniscus on the surface of the substrate and applying photolithography light through the meniscus to enable...
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7350315 |
Edge wheel dry manifold
A apparatus for drying a substrate includes a vacuum manifold positioned adjacent to an edge wheel. The edge wheel includes an edge wheel groove for receiving a peripheral edge of a substrate, and...
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7347005 |
Ventilation system for household appliances in particular for washing machines
Ventilation system for household appliances, in particular for washing machines, including a device having at least a chamber for housing an impeller, a suction duct, through which a first fluid,...
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7343922 |
Wafer drying apparatus
A wafer drying method includes submerging a wafer in a cleaning solution in a dry chamber. An organic liquid vapor from an organic liquid is supplied into the dry chamber at a first volumetric...
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7293571 |
Substrate proximity processing housing and insert for generating a fluid meniscus
An apparatus for generating a fluid meniscus to be formed on a surface of a substrate is provided including a housing where the housing includes a housing surface to be placed proximate to a...
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7264008 |
Apparatus for cleaning a wafer
An apparatus for cleaning a wafer includes a plurality of holders for contacting and securing peripheral portions of a wafer, and for rotating the wafer, a first plate disposed to face a first...
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7264007 |
Method and apparatus for cleaning a substrate using megasonic power
A method for processing a substrate is provided that includes generating a fluid meniscus on a surface of the substrate and applying acoustic energy to the fluid meniscus. The method also includes...
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7255115 |
Apparatus for cleaning semiconductor wafers
An apparatus for cleaning semiconductor wafers includes a chamber, a bubbler having a vapor generating part for generating alcohol vapor and a spray pipe for spraying the alcohol vapor into the...
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7252097 |
System and method for integrating in-situ metrology within a wafer process
A system and method for processing a wafer includes applying a process to the wafer. The process being supported by a surface tension gradient device. A result of the process is monitored. The...
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7240679 |
System for substrate processing with meniscus, vacuum, IPA vapor, drying manifold
One of many embodiments of a substrate preparation system is provided which includes a drying system, the drying system including at least one proximity head for drying a substrate. The system also...
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7234477 |
Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces
One of many embodiments of a substrate preparation system is provided which includes a head having a head surface where the head surface is proximate to a surface of the substrate. The system also...
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7111797 |
Non-contact fluid particle cleaner and method
A fluid particle cleaner and method are disclosed. The invention provides a partition to a side of a fluid nozzle to form: a central cavity configured to define the fluid departing the surface into...
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7107701 |
Substrate drying method and apparatus
There are provided a substrate drying method and apparatus by which an attachment amount of particles to surfaces of substrates can be reduced when the substrates are exposed from pure water, and...
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7100304 |
Megasonic cleaner and dryer
An apparatus for drying a generally flat substrate that has been cleaned has a rotatable support for supporting the substrate, a substrate drying assembly, and a controller. The substrate drying...
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7040328 |
Fluid/air burst washing system
A combination fluid and air washing apparatus for washing a vehicle's viewing surface. The apparatus includes a housing, a nozzle assembly with at least one fluid nozzle and at least one air nozzle...
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7003899 |
System and method for modulating flow through multiple ports in a proximity head
A method of forming a dynamic liquid meniscus includes forming a meniscus at a first size, the meniscus being formed between a proximity head and a first surface and changing the meniscus to a...
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6960265 |
Apparatus and method for collecting metallic impurity on a semiconductor wafer
An apparatus and method for automatically collecting metallic impurities of a semiconductor wafer. In one aspect, an apparatus includes an air tight process chamber including a loading unit for...
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6949146 |
Ultrasonic cleaning module for singulated electronic packages
The invention provides an ultrasonic cleaning module and a method for cleaning singulated electronic packages. The module comprises a cutting chuck having a surface with a plurality of cutting...
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6939410 |
Apparatus and method for collecting impurities on a semiconductor wafer
An apparatus for collecting impurities on a semiconductor wafer includes an airtight process chamber, a rotary chuck disposed in the process chamber for rotating and horizontally supporting the...
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6932094 |
Slurry tank autocleaner
A slurry tank autocleaner for cleaning an empty slurry tank. A first pipe is inserted in the interior of the slurry tank, where the first pipe has an open end located inside the slurry tank. A...
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6910487 |
Method and apparatus for liquid-treating and drying a substrate
The present invention is related to a method and apparatus for liquid treating and drying a substrate, such as a semiconductor wafer, the method comprising the step of immersing a substrate or a...
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6907890 |
Capillary drying of substrates
An apparatus and method for drying substrates. The inventive apparatus comprises: an object support member for supporting at least one substrate in a process tank having one or more support...
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6904702 |
Method and apparatus for drying substrate
The substrate drying apparatus has a substrate processing vessel 1 , a substrate supporting section for supporting plural substrates 2 in a standing condition and lined up condition in the...
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6895981 |
Cross flow processor
A centrifugal processor includes an elongated inlet and outlet in fluid communication with a rotor housing having an eccentric bowl. A rotor having fan blades and adapted to hold flat media is...
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6854473 |
Method and apparatus for executing plural processes on a microelectronic workpiece at a single processing station
An apparatus for processing a microelectronic workpiece is set forth. The apparatus comprises a workpiece support adapted to hold the microelectronic workpiece and a processing container adapted to...
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6824622 |
Cleaner and method for removing fluid from an object
A cleaner and method for removing excess residual cleaning fluid from an object, particularly a semiconductor wafer, before or as the wafer is removed from a cleaning chamber of a CMP cleaner, for...
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6823879 |
Apparatus for cleaning pipes
The present invention is an apparatus that cleans contaminants from pipes. The apparatus comprises a high velocity pump, a cleaning solution tank, a first line that selectively connects said...
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6792693 |
Wafer dryer system for PRS wet bench
A wafer dryer system which is suitable for drying rinse water from substrates in the event of a system malfunction or failure during or after rinsing of the substrates. The wafer dryer system...
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6790291 |
Method of and apparatus for processing substrate
In a substrate processing apparatus for use in performing a reduced-pressure pull up drying method, a liquid drainage pipe ( 46 ) for draining a drainage liquid containing an organic solvent from a...
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6779534 |
Apparatus and method for drying washed objects
An apparatus and a method for drying washed objects being capable of drying the objects in a reduced period of time, effectively preventing contamination of the objects, and preventing energy loss...
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6746543 |
Apparatus for and method of cleaning objects to be processed
A cleaning apparatus and a cleaning method for cleaning a object are provided. In the cleaning apparatus, a drying chamber 42 and a cleaning bath 41 are separated from each other up and down,...
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6732750 |
Semiconductor wafer cleaning apparatus and method of using the same
A semiconductor wafer cleaning apparatus and method uses only one inner bath for chemical solution and de-ionized water cleaning, and includes a marangoni dryer for cleaning and drying...
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6681499 |
Substrate drying method for use with a surface tension effect dryer with porous vessel walls
A processor and method for rinsing and drying of semiconductor substrates includes a process vessel contained within an outer containment vessel. A diluted organic vapor creates a Marangoni effect...
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6676768 |
Methods, compositions and apparatus for cleaning surfaces
The present invention comprises methods, compositions and apparatus for cleaning the surfaces within vessels that have restricted points of entry, and in particular, the surfaces within oxygen...
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6673163 |
Apparatus and method for cleaning a semiconductor substrate
There is proposed an apparatus and method for cleaning a semiconductor substrate, which make it possible to minimize the adhesion of mist in a cleaning tank at the occasion of cleaning a...
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