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7368016 |
Substrate processing unit and substrate processing apparatus
A substrate processing unit includes: a vertically-movable substrate holder for holding a substrate; a pan surrounding a periphery of the substrate holder; a cell, located below the substrate...
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7314529 |
Substrate cleaning apparatus and substrate cleaning method
A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the...
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7293570 |
Carbon dioxide snow apparatus
A carbon dioxide snow apparatus of the present invention includes a carbon dioxide snow generation system and a propellant generation system connected to a common carbon dioxide gas source. The...
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7287535 |
Work washing apparatus
A work washing apparatus including a transfer unit for controlling forward and rearward movements of a work, a table moved by the transfer unit, carrying out the washing of the work from upper and...
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7284561 |
Detergent dispenser for a washer system
A detergent dispenser system is disclosed in which a dispensing valve is provided for fluidly connecting to a detergent supply container. A receptacle is connected to the dispensing valve for...
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7270133 |
System and method for cleaning asphalt contact surfaces
Systems and methods for cleaning asphalt contact surfaces are provided. One such system includes a means for determining a dilution ratio appropriate to a particular asphalt contact surface, a...
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7258124 |
Apparatus and method for treating surfaces of semiconductor wafers using ozone
An apparatus and method for treating surfaces of semiconductor wafers with a reactive gas, such as ozone, utilizes streams of gaseous material ejected from a gas nozzle structure to create...
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7255114 |
Ion sampling system for wafer
An ion sampling method for wafer provides a wafer in a sampling chamber, wherein the wafer surface that is going to be sampled faces upward; spraying an extraction liquid continuously on the wafer...
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7252100 |
Systems and methods for processing a set of circuit boards
A circuit board processing system includes a wash tank configured to contain cleaning fluid, and a positioning subsystem configured to immerse a set of circuit boards into the wash tank. The system...
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7252099 |
Wafer cleaning apparatus with multiple wash-heads
A wafer cleaning apparatus with multiple wash-heads is applied in chemical and mechanical polishing process after wafer cleaning. The wafer cleaning apparatus device includes a supporting base,...
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7229522 |
Substrate processing apparatus and substrate processing method
A substrate processing apparatus removes resist films formed on wafers by holding the wafers in a processing vessel and exposing the wafers to a mixed gaseous fluid of steam and an ozone-containing...
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7219677 |
Method and apparatus for supercritical ozone treatment of a substrate
Disclosed is a method and apparatus for treating a substrate with a reaction solvent formed of supercritical ozone in a feed phase. The feed phase can be aqueous, e.g., formed of heated, deionized...
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7211555 |
Process for preparing fine zeolite particles
A process for efficiently preparing fine zeolite particles comprising synthesizing zeolite in the presence of an alkaline earth metal-containing compound and/or with controlling the preparation...
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7198054 |
Dishwasher having a side-by-side rack system
A dishwasher includes a cabinet having arranged therein a central cavity. Slidably supported within the second cavity are first and second dish support rack systems. The first dish support rack...
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7188632 |
Cleaning and sanitizing system
A high pressure water stream ( 14 ) is discharged onto a surface to be cleaned. An ozone/water stream ( 16 ) is discharged on the same surface for sanitizing the surface. The high pressure water...
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7146992 |
Dishwasher pump and filtration system
A dishwasher includes a pump assembly which functions to chop all fluid entrained soil prior to directing fluid to upper and lower wash anms. A flow conduit leading to the upper wash arm is...
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7097717 |
Method and device for collecting particulate contaminants during CO2 blasting decontamination
Disclosed is a method and device for collecting particulate contaminants removed using a CO 2 decontamination medium from an early step of a decontamination process. The device removes particulate...
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7073522 |
Apparatus for applying disparate etching solutions to interior and exterior surfaces
Described are methods, systems, and chemistries for cleaning various components of semiconductor process equipment. A method in accordance with one embodiment cleans articles with differently...
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7069937 |
Vertical proximity processor
A method for processing a substrate is provided which includes generating a fluid meniscus on the surface of the vertically oriented substrate, and moving the fluid meniscus over the surface of the...
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7067033 |
Chemical liquid processing apparatus for processing a substrate
In this disclosure, air flow is formed above chemical liquid film and a move of the chemical liquid is generated by making the air flow into a contact with the surface of chemical liquid. Further,...
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7051743 |
Apparatus and method for cleaning surfaces of semiconductor wafers using ozone
An apparatus and method for cleaning surfaces of semiconductor wafers utilizes streams of gaseous material ejected from a gas nozzle structure to create depressions on or holes through a boundary...
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7047984 |
Device and method for cleaning articles used in the production of semiconductor components
A cleaning device for use in the production of semiconductor components comprises two feed devices with which a fluid medium is guided across a respective surface of an object to be cleaned so that...
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7044143 |
Detergent injection systems and methods for carbon dioxide microelectronic substrate processing systems
Microelectronic substrate processing systems include a microelectronic substrate processing chamber that is configured to contain therein at least one microelectronic substrate. A carbon dioxide...
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7028698 |
Pressure processing apparatus with improved heating and closure system
Apparatus for pressure processing components is disclosed which includes an improved closure system that minimizes dust-generating parts and allows easy access to the chamber. Ports are provided...
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7013660 |
System for forming aerosols and cooling device incorporated therein
The present invention relates a cooling device of the reverse Carnot cycle-type using a refrigerant, and an aerosol generation system including it. The cooling device includes a refrigerator of the...
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6964724 |
Etching and cleaning methods and etching and cleaning apparatuses used therefor
An etching/cleaning apparatus is provided, which makes it possible to effectively remove an unnecessary material or materials existing on a semiconductor wafer without damaging the device area with...
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6945259 |
Substrate cleaning method and substrate cleaning apparatus
A substrate cleaning apparatus is provided that includes a cleaning cup for receiving a to-be-cleaned substrate, a table in the cleaning cup, a first, second, and third nozzles, a pure water...
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6944908 |
Device for keeping optical elements clean, in particular covers for sensors or cameras, in motor vehicles
The invention relates to a device for keeping optical elements clean in motor vehicles, especially sensor or camera covers. This is done according to the present invention by applying a directed...
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6923191 |
Washing agents dispenser device for a domestic washing machine, namely a dishwasher
Dispensing device of washing agents for a household washing machine, in particular a dishwasher, said dispenser having at least a tank for a liquid washing agent and an arrangement for dispensing a...
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6884301 |
Biological cleaning system comprising microbes for digesting oils and/or greases
A method and biological cleaning system are provided for cleaning substrate surfaces of oils and/or greases using a biological cleaning system which utilizes a pre-treatment bath and/or...
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6877518 |
Chemical solution treatment apparatus for semiconductor substrate
A chemical solution treatment apparatus for dissolving and removing ruthenium-based metal adhering to a substrate by a chemical solution, includes: a chemical solution treatment unit; a reservoir...
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6875323 |
Method of chemically decontaminating components of radioactive material handling facility and system for carrying out the same
Ozone gas having a high ozone concentration is generated by a solid electrolyte electrolytic process. An ozone solution is prepared by injecting the ozone gas into an acidic solution of pH 6 or...
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6863079 |
Semiconductor wafer washing system and method of supplying chemicals to the washing tanks of the system
A semiconductor wafer washing system can execute a method in which the washing solution is quickly changed over and over again without the need to alter the structure of the system. The wafer...
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6854473 |
Method and apparatus for executing plural processes on a microelectronic workpiece at a single processing station
An apparatus for processing a microelectronic workpiece is set forth. The apparatus comprises a workpiece support adapted to hold the microelectronic workpiece and a processing container adapted to...
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6851434 |
Composition, apparatus, and method of conditioning scale on a metal surface
A composition and apparatus and method for aqueous spray conditioning of scale on metal surfaces. An aqueous solution having a base composition of an alkali metal hydroxide is used. The aqueous...
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6848457 |
Liquid treatment equipment, liquid treatment method, semiconductor device manufacturing method, and semiconductor device manufacturing equipment
Providing liquid treatment equipment capable of largely reducing a frequency of discarding a treatment solution as a whole and capable of implementing smooth and high quality liquid treatment with...
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6843259 |
Solution treatment unit
The present invention relates to a solution treatment unit for supplying a treatment solution to a substrate to treat the substrate within a treatment container, and an inner container surrounding...
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6823879 |
Apparatus for cleaning pipes
The present invention is an apparatus that cleans contaminants from pipes. The apparatus comprises a high velocity pump, a cleaning solution tank, a first line that selectively connects said...
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6823877 |
Cleaning control method for recording head, cleaning controller performing the method, and recorder incorporating the cleaning controller
In a cleaning controller for a recording head of a recorder connected to an external device, a timer acquires a first time value indicating a current time from the external device, and performs...
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6823876 |
Methodology of rotational etching tool maintenance
A method of cleaning and maintenance used for a rotational etching tool, combining the physical characteristics of water (splashed off after striking the surface of a spinning wafer) and a PM...
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6817369 |
Device and method for cleaning substrates
The inventive device for cleaning substrates, especially semiconductor wafers, comprises a treatment basin for receiving at least one substrate, a cover for sealing said treatment basin, a first...
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6807972 |
Gutter and splash-guard for protecting a wafer during transfer from a single wafer cleaning chamber
A single wafer cleaning chamber that includes a rotatable bracket that can place a wafer beneath an upper end of a catch cup during a wafer cleaning process, a gutter positioned above a wafer...
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6805754 |
Device and method for processing substrates
A device and method for processing substrates, whereby medium consumption and processing time are reduced. According to the inventive method, liquid is conducted to a surface of the substrate that...
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6745783 |
Cleaning processing method and cleaning processing apparatus
To provide a cleaning processing method and a cleaning processing apparatus which can improve cleaning efficiency. The apparatus is structured to install processing units 11 a- 11 d which...
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6712910 |
Rinsewater separable and recyclable heat curing impregnation compositions
The present invention relates to heat curing impregnation sealant compositions, which are readily separable from water upon mixing.
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6705332 |
Hard floor surface cleaner utilizing an aerated cleaning liquid
A hard floor surface cleaning apparatus includes an aerator, a rotating scrub medium engaging the hard floor surface, a fluid conveyor, and a fluid recovery device. The aerator is configured to...
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6701944 |
Detergent dispenser system
A removable cartridge for a detergent dispensing system for a dishwasher comprising: a storage unit containing a plurality of cylindrical or spherical detergent tablets arranged in two or more...
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6632292 |
Selective treatment of microelectronic workpiece surfaces
This invention provides a process for treating a workpiece having a front side, a back side, and an outer perimeter. In accordance with the process, a processing fluid is selectively applied or...
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6630031 |
Surface purification apparatus and surface purification method
By a simple apparatus construction and process, it is made possible to “clean precisely” a surface at the molecular/atomic level, and the purification degree of the surface processed minutely...
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6536460 |
Process line purge system and method
Method and system for purging a process line of a process gas used in a semiconductor wafer fabrication process. Inert gas (e.g., nitrogen gas) is repeatedly charged from an inert gas source into...
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