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7611589 |
Methods of spin-on wafer cleaning
A method for spin-on wafer cleaning. The method comprises controlling spin speed and vertical water jet pressure. The vertical jet pressure and the spin speed are substantially maintained in...
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7608152 |
Substrate processing apparatus and method
In the vicinity of a rim portion of a spin base 5 , a plurality of supports 7 which abut on a bottom rim portion of a substrate W and support the substrate W are formed projecting toward above...
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7601112 |
Dense fluid cleaning centrifugal phase shifting separation process and apparatus
The present invention is an apparatus and process for cleaning substrates using fluids, including dense fluids. A perforated centrifuge drum operates within a pressure vessel. A dense fluid...
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7585375 |
Method of cleaning a surface
The application of a gel-like material is disclosed for cleaning a surface having foreign matter thereon, such gel-like material produced by magnetically treating and mixing two solutions, the...
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7578887 |
Apparatus for and method of processing substrate
An apparatus for processing a substrate through successive steps including spin-drying the substrate with a single processing facility while preventing the substrate from being contaminated by a...
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7572342 |
Method and apparatus for cleaning semiconductor photolithography tools
A system for cleaning semiconductor lithography tools provides for cycling a polished-side down semiconductor wafer through the lithography tool using conventional automated robotics for loading...
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7527698 |
Method and apparatus for removing a liquid from a surface of a substrate
A method and apparatus for removing a first liquid from a surface of a substrate is provided. A second liquid is supplied to at least part of a surface of a substrate having a rotary movement. The...
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7517414 |
Method of cleaning and degreasing surfaces
The application of a gel-like material is disclosed for cleaning a surface having foreign matter thereon, such gel-like material produced by magnetically treating and mixing two solutions, the...
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7513265 |
High pressure processing method and apparatus
Disclosed is a high pressure processing method for subjecting a processing object to a high pressure processing using a high pressure fluid. In this method, the high pressure fluid is brought into...
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7503983 |
Methods of proximity head brushing
A wafer preparation method is provided for producing a wet region and then a corresponding dry region on the wafer. Brushing produces the wet region on the wafer. As the brushing moves in a...
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7497220 |
Method and apparatus for cleaning a turbofan gas turbine engine
Device for cleaning a gas turbine engine ( 2 ), and in particular an engine of turbofan type. The present invention further relates to a method for cleaning such a engine. The device comprises a...
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7494597 |
Method and apparatus for etching disk-like member
Disclosed are a method and apparatus for etching disk-shaped members, especially a method and apparatus for etching semiconductor wafers. In a method wherein wafers ( 30 ) are rotated and etched in...
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7473026 |
Method for cleaning a rotary mixing device with a cleaning shield
In a method of cleaning a rotary mixing device having a mixer portion and a driving shaft, a shield is located over at least the mixer portion. The mixing device is rotated, expelling material...
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7467635 |
Apparatus and method for substrate processing
A substrate processing apparatus 10 includes a holding table 20 for rotatably holding a wafer W, a nozzle 40 for supplying chemical solutions L 1 and L 2 to the wafer W, at least one light...
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7435302 |
Surface treatment apparatus and method for manufacturing liquid crystal display device
A cleaning apparatus according to the present invention is provided with a brush drive mechanism which brings a brush being rotating closer to a substrate, measures electrical potentials generated...
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7428906 |
Method for cleaning a stationary gas turbine unit during operation
A method for cleaning a stationary gas turbine unit during operation, wherein the unit comprises a turbine, a compressor driven by the turbine, the compressor having an inlet, an air inlet duct...
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7416611 |
Process and apparatus for treating a workpiece with gases
In a method and apparatus for cleaning or processing a workpiece, a process gas is brought into contact with the workpiece by diffusion through a heated liquid layer on the workpiece, and by bulk...
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7410545 |
Substrate processing method of and substrate processing apparatus for freezing and cleaning substrate
A substrate immersed in pure water held inside a processing bath disposed to a cleaning unit 1 and accordingly washed, as it bears an aqueous film on its surface, is transported by a substrate...
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7405164 |
Apparatus and method for removing a photoresist structure from a substrate
In an apparatus and method for removing a photoresist structure from a substrate, a chamber for receiving the substrate includes a showerhead for uniformly distributing a mixture of water vapor and...
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7404863 |
Methods of thinning a silicon wafer using HF and ozone
A method of thinning a silicon wafer in a controllable cost-effective manner with minimal chemical consumption. The wafer is placed into a process chamber, after which ozone gas and HF vapor are...
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7396416 |
Substrate cleaning device
A substrate cleaning device comprises a chamber for cleaning a substrate; a substrate support installed in the chamber providing a surface for supporting the substrate during cleaning thereof; at...
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7364626 |
Substrate processing apparatus and substrate processing method
Substrate cleaning apparatus and method capable of preventing adhesion of particles to a substrate irrespective of being hydrophilic or hydrophobic are provided. Although a cleaning liquid ejected...
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7364625 |
Rinsing processes and equipment
Described are methods of rinsing and processing devices such as semiconductor wafers wherein the device is rinsed with using a surface tension reducing agent; the method may include a subsequent...
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7329321 |
Enhanced wafer cleaning method
A method for removing post-processing residues in a single wafer cleaning system is provided. The method initiates with providing a first heated fluid to a proximity head disposed over a substrate....
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7314529 |
Substrate cleaning apparatus and substrate cleaning method
A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the...
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7300598 |
Substrate processing method and apparatus
The invention relates to a process including a chemical liquid treatment and a rinse liquid treatment on a substrate, more particularly to a technique for reducing consumption of a chemical liquid...
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7300526 |
Method and system for removal of contaminates from phaseshift photomasks
A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The...
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7300524 |
Substrate cleaning method
A substrate cleaning apparatus includes an indexer, a front surface cleaning unit for cleaning the front surface of a substrate, a back surface cleaning unit for cleaning the back surface of the...
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7282086 |
Fluid filter cleaning apparatus
A filter cleaning apparatus for cleaning a filter using cleaning fluid comprises a housing, a filter holder for holding the filter, wherein the filter holder is mountable in the housing, a rotating...
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7275551 |
Device for cleaning food with ozone water, and method of cleaning food using cleaning device
A food washing apparatus of the invention includes an ozonized water generator ( 10 ), a cylindrical washing tank ( 1 ) in which the food materials are put and which can rotate to wash the food...
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7267726 |
Method and apparatus for removing polymer residue from semiconductor wafer edge and back side
A method for cleaning a semiconductor device has the steps of securing a wafer ( 16 ) with a modified chuck ( 11 ) and applying a cleaning solution ( 18 ) to the backside ( 20 ) of the wafer ( 16...
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7263735 |
Washing machine control method and washing machine using the same
A washing machine control method includes executing a dewatering step. The method accelerates a motor to rotate a drum according to a predetermined rate in response to the dewatering execution...
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7252719 |
High pressure processing method
A high-pressure processing apparatus includes a processing vessel including a processing chamber formed therein to perform a certain process onto an object in the processing chamber; fluid feeding...
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7250085 |
Method of wet cleaning a surface, especially of a material of the silicon-germanium type
Method of wet cleaning a surface of at least one material chosen from silicon, silicon-germanium alloys, A(III)/B(V)-type semiconductors and epitaxially grown crystalline materials, such as...
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7247209 |
Dual outlet nozzle for the combined edge bead removal and backside wash of spin coated wafers
An apparatus and method for the improved combined edge bead removal and backside wash of spin coated semiconductor wafers is disclosed. This is preferably accomplished by providing a nozzle having...
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7241372 |
Plating apparatus and plating liquid removing method
A plating apparatus and a plating liquid removing method removes a plating liquid remaining on a substrate-contacting portion, or portions in its vicinity, of a substrate holding member. The...
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7237561 |
Apparatus for cleaning semiconductor wafer including heating using a light source and method for cleaning wafer using the same
An apparatus for cleaning a semiconductor wafer and method for cleaning a wafer using the same wherein, the apparatus includes a chamber on which a wafer is mounted, a revolving chuck mounted in...
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7226514 |
Spin-rinse-dryer
An inventive vertical spin-dryer is provided. The inventive spin-dryer may have a shield system positioned to receive fluid displaced from a substrate vertically positioned within the spin-dryer....
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7220323 |
Cleaning method for magnetic transfer carrier
A cleaning method preventing foreign matter attached to a brush from being transferred back to a magnetic transfer carrier by removing foreign matter attached to a cleaning tool such as the brush...
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7201808 |
Method and apparatus for rotating a semiconductor substrate
An apparatus that includes a rotatable single wafer holding bracket with one or more wafer supports disposed on the single wafer holding bracket, wherein the one or more wafer supports position a...
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7195679 |
Versatile system for wafer edge remediation
The present invention provides a system ( 200, 300 ) for remediating aberrations along the perimeter of a semiconductor wafer ( 202 ). The system includes a cleaning apparatus ( 204 ) within which...
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7185661 |
Reciprocating megasonic probe
A method of cleaning a substrate comprises placing the substrate on a rotating fixture, placing a liquid on at least one side of the substrate, and creating a standing wave of megasonic energy...
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7182821 |
Substrate processing method and substrate processing apparatus
Disclosed is a substrate processing method including a substrate rotating step for rotating a substrate with the substrate held almost horizontally within a chamber; a peripheral edge processing...
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7182820 |
Methods and apparatus for cleaning a hearing aid device
Methods and apparatus for cleaning hearing aid devices are disclosed. Drying is facilitated in hearing instruments through a novel combination of heater and desiccant in an essentially closed...
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7163588 |
Processing a workpiece using water, a base, and ozone
Contaminants such as photoresist are quickly removed from a wafer having metal features, using water, ozone and a base such as ammonium hydroxide. Processing is performed at room temperature to...
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7153370 |
Method of cleaning semiconductor wafer
The present application discloses a method of cleaning a semiconductor wafer by mounting a wafer to a chuck, positioning a gas guard, defining therein a chamber having an open bottom, immediately...
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7144460 |
Ball/roller bearing cleaning method and apparatus thereof
The present ball/roller bearing cleaning method is a method which, using cleaning liquid 24 , cleans a bearing to be cleaned 1 composed of an inner ring 1 b , an outer ring 1 a , a rolling...
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7118631 |
Method for separating substances from particulate solids
A method for separating a substance such as a hydrocarbon from a particulate material such as soil is provided. An aqueous slurry is formed and a shear force is applied to the slurry, such as in a...
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7108001 |
Method and apparatus for rotation of a workpiece in supercritical fluid solutions for removing photo resist, residues and particles therefrom
A supercritical fluid cleaning system uses process fluid for operating rotary motors in the chamber with fluid bearings and fluid load levitation for rotating workpieces and impellers. Rotating...
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7087122 |
Wafer backside plate for use in a spin, rinse, and dry module and methods for making and implementing the same
A method for spinning a wafer to enable rinsing and drying is provided. The method includes engaging the wafer at a wafer processing plane and spinning the wafer. The method further includes moving...
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