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7601112 |
Dense fluid cleaning centrifugal phase shifting separation process and apparatus
The present invention is an apparatus and process for cleaning substrates using fluids, including dense fluids. A perforated centrifuge drum operates within a pressure vessel. A dense fluid...
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7566347 |
Cleaning process utilizing an organic solvent and a pressurized fluid solvent
A cleaning method and system that utilize an organic cleaning solvent and pressurized fluid solvent is disclosed. The method and system have no conventional evaporative hot air drying cycle....
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7550090 |
Oxygen plasma clean to remove carbon species deposited on a glass dome surface
A method for in-situ cleaning of a dielectric dome surface having been used in pre-clean processes is provided. Carbon containing deposits are removed by providing a plasma of one or more oxidizing...
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7547364 |
Spray device for cooling cattle in sheds and method of using the same
A sprayer device including a generator for generating an air stream having a predetermined velocity and a nozzle unit for the discharge of liquid therefrom, whereby to produce a mist stream capable...
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7518128 |
Lithographic apparatus comprising a cleaning arrangement, cleaning arrangement and method for cleaning a surface to be cleaned
A cleaning arrangement is provided for use in an EUV lithographic apparatus, for example an EUV lithographic apparatus with a Sn source. The cleaning arrangement includes a gas source for a...
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7513260 |
In-situ continuous coke deposit removal by catalytic steam gasification
A coke removal system removes coke deposits from the walls of a high temperature passage in which hydrocarbon fuel is present. The system includes a carbon-steam gasification catalyst and a water...
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7507297 |
Cleaning method and cleaning apparatus
A cleaning effect is improved by cleaning a component that has a recess structure by using a cleaning medium of a liquefied gas or a supercritical fluid. By the cleaning method of removing adhering...
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7503951 |
Fume chamber
A system for measuring fume generation rates and total fume emissions of welding and allied processes includes a fume collection chamber and an automated welding assembly. The fume collection...
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7462842 |
Device, EUV lithographic device and method for preventing and cleaning contamination on optical elements
The invention relates to a method for preventing contamination on the surfaces of optical elements comprising a multi-layer system, during the exposure thereof to radiation at signal wave lengths...
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7431853 |
Selective etching of oxides from substrates
A method and system for release etching a micro-electrical-mechanical-systems (MEMS) device from a substrate. In one aspect, the invention is a method comprising (a) supporting at least one...
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7416611 |
Process and apparatus for treating a workpiece with gases
In a method and apparatus for cleaning or processing a workpiece, a process gas is brought into contact with the workpiece by diffusion through a heated liquid layer on the workpiece, and by bulk...
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7410543 |
Substrate processing method
Resists can be removed while metal contamination of wafers, etc. and generation of particles, and growth of oxide films are suppressed. A substrate processing method comprises feeding a processing...
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7404863 |
Methods of thinning a silicon wafer using HF and ozone
A method of thinning a silicon wafer in a controllable cost-effective manner with minimal chemical consumption. The wafer is placed into a process chamber, after which ozone gas and HF vapor are...
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7364625 |
Rinsing processes and equipment
Described are methods of rinsing and processing devices such as semiconductor wafers wherein the device is rinsed with using a surface tension reducing agent; the method may include a subsequent...
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7361233 |
Methods of hydrogen cleaning of metallic surfaces
The pulsed partial pressure hydrogen cleaning of cobalt-based alloys in turbine components is achieved by disposing the component within a vacuum furnace and heating the component. Upon heating to...
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7318870 |
Method of cleaning semiconductor substrate
A cleaning method for a semiconductor substrate including placing the semiconductor substrate into a cleaning chamber and injecting ozone gas (O 3 ) into the cleaning chamber. This process operates...
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7311785 |
Automatic air-blown cleaning device for liquid crystal display component in LCD assembly and method thereof
An automatic air-blown cleaning apparatus for cleaning a liquid crystal display (LCD) component in an LCD assembly process. The automatic air-blown cleaning apparatus has an assembly station for...
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7288156 |
Methods for cleaning a substrate
The invention provides a water supplying apparatus and method thereof which has a high capacity of peeling and removing a disused material such as a resist film and the like, and can efficiently...
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7282099 |
Dense phase processing fluids for microelectronic component manufacture
Method for processing an article by contacting the article with a dense fluid. The article is introduced into a sealable processing chamber and the processing chamber is sealed. A dense fluid is...
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7276138 |
Vapor generating and recovery apparatus
A vapor generating and recovery apparatus including a housing having an open top, a closed bottom and a plurality of sidewalls therebetween defining a boiling sump with a treating solution therein....
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7270717 |
Compositions and methods for cleaning contaminated articles
Disclosed are compositions and methods for cleaning contaminated articles based on the provision of a zeotropic composition comprising (a) at least one flammable solvent having a boiling point at a...
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7267727 |
Processing of semiconductor components with dense processing fluids and ultrasonic energy
Method for processing an article with a dense processing fluid in a processing chamber while applying ultrasonic energy during processing. The dense fluid may be generated in a separate...
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7264680 |
Process and apparatus for treating a workpiece using ozone
A method for cleaning a semiconductor workpiece having a metal layer in a processing chamber includes the steps of introducing a liquid solution including dissolved carbon dioxide onto the...
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7247210 |
Methods for treating CIP equipment and equipment for treating CIP equipment
A method for treating CIP equipment is provided according to the present invention. The CIP equipment includes process equipment. The method includes steps of treating the CIP equipment with a...
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7234476 |
Method of cleaning CVD equipment processing chamber
A method of remote plasma cleaning a processing chamber of CVD equipment, which has high cleaning rates, low cleaning operational cost and high efficiency, is provided. The method comprises...
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7201807 |
Method for cleaning a deposition chamber and deposition apparatus for performing in situ cleaning
Disclosed are a method for cleaning a deposition chamber by removing attached metal oxides, and a deposition apparatus for performing in situ cleaning. A first gas and a second gas are provided...
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7189291 |
Method for the removal of airborne molecular contaminants using oxygen gas mixtures
The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the...
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7141123 |
Method of and apparatus for removing contaminants from surface of a substrate
A cleanling apparatus for removing contaminants from the surface of a substrate includes two parts: one which produces an aerosol including frozen particles and directs the aerosol onto the surface...
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7138065 |
Method for removing at least one area of a layer of a component consisting of metal or a metal compound
The invention relates to a method for removing an area of a layer of a component consisting of metal or a metal compound. According to prior art, corrosion products of a component are removed in a...
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7127831 |
Methods and systems for processing a substrate using a dynamic liquid meniscus
A system and method of moving a meniscus from a first surface to a second surface includes forming a meniscus between a head and a first surface. The meniscus can be moved from the first surface to...
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7124764 |
Method for removing impurities from porous materials
The present invention discloses a method for removing impurities from a porous material by flowing a supercritical fluid with or without a modifier therein over a to-be-cleaned porous material...
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7112652 |
Solvents useful in the preparation of polymers containing hydrophilic and hydrophobic monomers
This invention relates to solvents which may be used to extract polymers that are made of hydrophilic and hydrophobic monomers.
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7104268 |
Megasonic cleaning system with buffered cavitation method
A wafer cleaning method and system including a combined high frequency signal, a low frequency signal, and in one embodiment a biased voltage signal, allows cleaning particles and impurities off of...
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7087124 |
Cleaning and sanitizing system
A high pressure water stream ( 14 ) is discharged onto a surface to be cleaned. An ozone/water stream ( 16 ) is discharged on the same surface for sanitizing the surface. The high pressure water...
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7087123 |
Cleaning and sanitizing system
A high pressure water stream ( 14 ) is discharged onto a surface to be cleaned. An ozone/water stream ( 16 ) is discharged on the same surface for sanitizing the surface. The high pressure water...
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7060993 |
Device, EUV-lithographic device and method for preventing and cleaning contamination on optical elements
The invention relates to a method for preventing contamination on the surfaces of optical elements comprising a multi-layer system, during the exposure thereof to radiation at signal wave lengths...
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7052553 |
Wet cleaning of electrostatic chucks
A non-destructive and simple method for cleaning a new or used electrostatic chuck comprises a wet cleaning process, which removes contaminants deposited on a surface of the electrostatic chuck.
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7044662 |
Developing photoresist with supercritical fluid and developer
An apparatus for developing a polymeric film without the need for a water rinse step is disclosed. An object having a surface supporting a polymeric film is placed onto a support region within a...
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7001470 |
Cleaning process for photomasks
A photomask provided with a light-shielding coating on a surface of a glass substrate is cleaned with O 3 gas solved water to eliminate organic substances adhered on a surface of the photomask (S...
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6988327 |
Methods and systems for processing a substrate using a dynamic liquid meniscus
A system and method of moving a meniscus from a first surface to a second surface includes forming a meniscus between a head and a first surface. The meniscus can be moved from the first surface to...
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6953042 |
Apparatus and process for supercritical carbon dioxide phase processing
The present invention provides an apparatus for cleaning a workpiece with a cleaning medium that is maintained at a single fluid phase. The apparatus comprises means for providing the cleaning...
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6949145 |
Vapor-assisted cryogenic cleaning
The present invention is directed towards the use of a reactive gas or vapor of a reactive liquid prior to or in combination with cryogenic cleaning to remove contaminants from the semiconductor...
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6939409 |
Cleaning method and etching method
A cleaning method and an etching method for removing, by cleaning grease components and silicon micro pieces hard to remove, used for an apparatus and a carrier for manufacturing a semiconductor...
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6936114 |
Steam cleaning system and method for semiconductor process equipment
Disclosed are systems and methods for removing stubborn contaminants, aluminum fluoride and aluminum chloride in particular, from components of semiconductor-processing equipment. One embodiment...
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6936112 |
Heat exchanger cleaning process
Disclosed is a novel process for cleaning and restoring the operating efficiency of organic liquid chemical exchangers in a safe and effective manner and in a very short period of time, without a...
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6935351 |
Method of cleaning CVD device and cleaning device therefor
A cleaning method for CVD apparatus wherein by-products such as SiO 2 and Si 3 N 4 adhered to and deposited on surfaces of the inner wall, electrodes and other parts of a reaction chamber at the...
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6932092 |
Method for cleaning plasma enhanced chemical vapor deposition chamber using very high frequency energy
A method for cleaning a plasma enhanced chemical vapor deposition chamber. The method includes introducing a cleaning gas into the plasma enhanced chemical vapor deposition chamber, forming a...
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6929015 |
Process for the at least partial elimination of carbon deposits in a heat exchanger
The invention proposes a process and device for the at least partial elimination of carbon deposits in a heat exchanger in which an oxidation treatment is carried out comprising at least one...
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6923189 |
Cleaning of CVD chambers using remote source with cxfyoz based chemistry
A method and apparatus for cleaning a processing chamber are provided. The cleaning method includes the use of a remote plasma source to generate reactive species and an in situ RF power to...
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6913653 |
Cleaning and etching methods and their apparatuses
A cleaning method for removing fats, oils, and silicon small particles, which are conventionally difficult to remove, adhering to devices and carriers used to manufacture a semiconductor wafer or a...
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