|
Match
|
Document |
Document Title |
|
|
7618495 |
Method for pickling a work string using dispersed solvent-in-acid fluid design
A method for cleaning a work string which may have been used to inject drilling muds, cement slurries, cement displacement materials and the like into a well where the work strong may contain...
|
|
|
7614407 |
Prime coat, indicia and clear coat removal process for a golf ball
A process for removing the coating layers from finished golf balls is disclosed herein. The process involves soaking the golf balls in a removal solution and then subjecting the golf balls to...
|
|
|
7611588 |
Methods and compositions for removing metal oxides
The invention relates to methods and compositions for removing metal oxide soils from surfaces. The compositions include an anionic surfactant and a pH adjuster at an acidic pH. In one embodiment,...
|
|
|
7594971 |
Method of cleaning and sterilizing medical instruments
A novel method of cleaning and disinfecting organically contaminated articles such as, for instance, medical instruments, wherein the cleaning cycle consists of two sections divided by removal and...
|
|
|
7588644 |
Method and apparatus for cleaning pipeline pigs
A method of cleaning pipeline pigs of a material that is to be recycled includes providing a vessel having an interior. A manifold is placed within the vessel interior, the manifold having a...
|
|
|
7588036 |
Chamber clean method using remote and in situ plasma cleaning systems
A process for removing unwanted deposition build-up from one or more interior surfaces of a substrate processing chamber. According to one embodiment the process comprises performing a substrate...
|
|
|
7566369 |
Method of de-coating metallic coated scrap pieces
Method of de-coating metallic coated scrap pieces, the metallic coated scrap pieces comprising a metallic core layer and a metallic coating layer of which the liquidus temperature of the metallic...
|
|
|
7556048 |
In-situ removal of surface impurities prior to arsenic-doped polysilicon deposition in the fabrication of a heterojunction bipolar transistor
A process for cleaning the silicon surface of a semiconductor device material layer. The surface undergoes a pre-clean process followed by exposure to a nitrogen-containing gas. A polysilicon layer...
|
|
|
7552503 |
Apparatus and method for cleaning a surface with high pressure air
A cleaning apparatus and method which includes spraying high pressure air obliquely onto a cleaning surface from an air nozzle disposed in the vicinity of the cleaning surface of a cleaning object...
|
|
|
7534307 |
Methods for processing wafer surfaces using thin, high velocity fluid layer
Among the many embodiment, in one embodiment, a method for processing a substrate is disclosed which includes generating a fluid layer on a surface of the substrate, the fluid layer defining a...
|
|
|
7534306 |
Steam humidifier and method
The steam humidifier fed with a premix of natural gas and forced air under low pressure (less than 1 psi) includes a main frame, a movable lower frame, a two part evaporation canister, releasably...
|
|
|
7531047 |
Method of removing residue from a substrate after a DRIE process
The present disclosure provides a method of cleaning a semiconductor substrate after a DRIE etch process, wherein residue from the DRIE process is removed without damaging the substrate. The...
|
|
|
7531045 |
Method for removing haze in a photo mask
An apparatus for removing haze in a photo mask includes sealed chamber having a bake module disposed therein to support a photo mask, a reactant gas feed line to feed a reactant gas into the...
|
|
|
7530359 |
Plasma treatment system and cleaning method of the same
A plasma treatment apparatus has a reaction vessel ( 11 ) provided with a top electrode ( 13 ) and a bottom electrode ( 14 ), and the first electrode is supplied with a VHF band high frequency...
|
|
|
7527698 |
Method and apparatus for removing a liquid from a surface of a substrate
A method and apparatus for removing a first liquid from a surface of a substrate is provided. A second liquid is supplied to at least part of a surface of a substrate having a rotary movement. The...
|
|
|
7524383 |
Method and system for passivating a processing chamber
A method and system for passivating a processing chamber is provided, whereby the processing chamber is exposed to one or more cycles of citric acid, or nitric acid. The processing chamber is...
|
|
|
7517413 |
Remediation of microfloral and biofilm development from laundering devices
Methods, improved compositions and kits are employed that provide dosing and cleaning solutions containing a halogen-based oxidant effectively delivered to remediate microfloral and biofilm...
|
|
|
7507297 |
Cleaning method and cleaning apparatus
A cleaning effect is improved by cleaning a component that has a recess structure by using a cleaning medium of a liquefied gas or a supercritical fluid. By the cleaning method of removing adhering...
|
|
|
7494549 |
Substrate treatment apparatus and substrate treatment method
A substrate treatment apparatus for removing an unnecessary substance from a surface of a substrate. The apparatus is provided with: an oxidation liquid supply mechanism for supplying an oxidation...
|
|
|
7481893 |
Cleaning textiles
Cleaning media based on liquid CO 2 and including from 0.01 to 5% by weight of the formulation of a cleaning additive which is at least one C 6 to C 24 hydrocarbyl ester of a multi-carboxylic...
|
|
|
7442319 |
Poly etch without separate oxide decap
The use of an ammonium hydroxide spike to a hot tetra methyl ammonium hydroxide (TMAH) solution to form an insitu poly oxide decapping step in a polysilicon (poly) etch process, results in a single...
|
|
|
7422639 |
Method of reducing water spotting and oxide growth on a semiconductor structure
The present invention relates to a method of cleaning and drying a semiconductor structure in a modified conventional gas etch/rinse or dryer vessel.
|
|
|
7419614 |
Method of etching and cleaning objects
A method of etching and cleaning objects contained in a vessel, includes etching the objects by providing etching solution into the vessel, forcing out the etching solution from the vessel by...
|
|
|
7416612 |
Process for removal of paint from plastic substrates
A process for removing paint from a plastic substrate that typically includes immersing and optionally agitating the painted plastic substrate in a first chemical fluid, removing the substrate from...
|
|
|
7416611 |
Process and apparatus for treating a workpiece with gases
In a method and apparatus for cleaning or processing a workpiece, a process gas is brought into contact with the workpiece by diffusion through a heated liquid layer on the workpiece, and by bulk...
|
|
|
7413613 |
Method for activating electron source surface of field emission display
A method for activating surface of electron emission source of a field emission display. After a cathode structure is fabricated and sintered with high temperature, the surface of electron emission...
|
|
|
7412979 |
Selective removal or application of a coating on a portion of a container
The present invention relates to an apparatus and method for removing a coating material from a predetermined first portion of a container, while retaining the coating on a second portion of the...
|
|
|
7410545 |
Substrate processing method of and substrate processing apparatus for freezing and cleaning substrate
A substrate immersed in pure water held inside a processing bath disposed to a cleaning unit 1 and accordingly washed, as it bears an aqueous film on its surface, is transported by a substrate...
|
|
|
7410543 |
Substrate processing method
Resists can be removed while metal contamination of wafers, etc. and generation of particles, and growth of oxide films are suppressed. A substrate processing method comprises feeding a processing...
|
|
|
7405164 |
Apparatus and method for removing a photoresist structure from a substrate
In an apparatus and method for removing a photoresist structure from a substrate, a chamber for receiving the substrate includes a showerhead for uniformly distributing a mixture of water vapor and...
|
|
|
7404863 |
Methods of thinning a silicon wafer using HF and ozone
A method of thinning a silicon wafer in a controllable cost-effective manner with minimal chemical consumption. The wafer is placed into a process chamber, after which ozone gas and HF vapor are...
|
|
|
7402213 |
Stripping and removal of organic-containing materials from electronic device substrate surfaces
Described herein is a method of removing an organic-containing material from an exposed surface of a large substrate (at least 0.25 m 2 ). The substrate may comprise an electronic device. The...
|
|
|
7387689 |
Methods for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces
Methods for processing substrate through a head that is configured to be placed in close non-contact proximity to a surface of a substrate are provided. One method includes applying a first fluid...
|
|
|
7377984 |
Method for cleaning a photomask
Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to...
|
|
|
7377982 |
Method for the removal of airborne molecular contaminants using water gas mixtures
The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the...
|
|
|
7368020 |
Reduced particle contamination manufacturing and packaging for reticles
A method of transporting a reticle is disclosed. The reticle is placed in a reticle carrier that has an ionizer. Moreover, the reticle may be attached with a pellicle. The pellicle consists of a...
|
|
|
7364625 |
Rinsing processes and equipment
Described are methods of rinsing and processing devices such as semiconductor wafers wherein the device is rinsed with using a surface tension reducing agent; the method may include a subsequent...
|
|
|
7341067 |
Method of managing the cleaning of heat transfer elements of a boiler within a furnace
A method of cleaning a heat transfer element within a boiler furnace is provided. The method includes the steps of allowing a furnace to operate and deposit ash on a heat transfer element,...
|
|
|
7332042 |
Process for treatment and extraction of organic cork compounds by a dense fluid under pressure
Process for the treatment of cork or a cork-based material particularly with a view towards extracting contaminating organic compounds, in which said cork or said cork-based material is put into...
|
|
|
7331354 |
Cleaning of tray columns which have been used for rectificatively treating liquids comprising (meth)acrylic acid and/or esters thereof
In process for cleaning tray columns which are used for the purposes of rectifiying liquids comprising (meth)acrylic compounds, a basic liquid is conveyed downward through the tray column and a gas...
|
|
|
7329321 |
Enhanced wafer cleaning method
A method for removing post-processing residues in a single wafer cleaning system is provided. The method initiates with providing a first heated fluid to a proximity head disposed over a substrate....
|
|
|
7318870 |
Method of cleaning semiconductor substrate
A cleaning method for a semiconductor substrate including placing the semiconductor substrate into a cleaning chamber and injecting ozone gas (O 3 ) into the cleaning chamber. This process operates...
|
|
|
7288156 |
Methods for cleaning a substrate
The invention provides a water supplying apparatus and method thereof which has a high capacity of peeling and removing a disused material such as a resist film and the like, and can efficiently...
|
|
|
7287534 |
Cleaning of apparatus in which meth(acrylic) acid-containing organic solvents have been treated and/or generated
A process for cleaning apparatus in which (meth)acrylic acid-containing organic solvents have been treated and/or generated and contain fouling and/or polymer and residues of organic solvent, in...
|
|
|
7270717 |
Compositions and methods for cleaning contaminated articles
Disclosed are compositions and methods for cleaning contaminated articles based on the provision of a zeotropic composition comprising (a) at least one flammable solvent having a boiling point at a...
|
|
|
7264680 |
Process and apparatus for treating a workpiece using ozone
A method for cleaning a semiconductor workpiece having a metal layer in a processing chamber includes the steps of introducing a liquid solution including dissolved carbon dioxide onto the...
|
|
|
7264679 |
Cleaning of chamber components
In a method of cleaning a surface of a substrate processing chamber component to remove process deposits, the component surface is cooled to a temperature below about −40° C. to fracture the...
|
|
|
7247208 |
Microelectronic cleaning compositions containing ammonia-free fluoride salts
Ammonia-free, HF-free cleaning compositions for cleaning photoresist and plasma ash residues from microelectronic substrates, and particularly to such cleaning compositions useful with and having...
|
|
|
7244315 |
Microelectronic device drying devices and techniques
Improved methods of rinsing and drying microelectronic devices by way of an immersion processing apparatus are provided for effectively cleaning microelectronic devices. Methods and arrangements...
|
|
|
7229506 |
Process for pickling martensitic or ferritic stainless steel
A process for pickling martensitic or ferritic stainless steel, preferably in the form of wires, tubes or rods, wherein the stainless steel is placed in contact with a pickling solution which has a...
|