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7619301 |
GaAs semiconductor substrate and fabrication method thereof
A GaAs semiconductor substrate includes a surface layer. When an atomic ratio is to be calculated using a 3d electron spectrum of Ga atoms and As atoms measured at the condition of 10° for the...
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7611588 |
Methods and compositions for removing metal oxides
The invention relates to methods and compositions for removing metal oxide soils from surfaces. The compositions include an anionic surfactant and a pH adjuster at an acidic pH. In one embodiment,...
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7601227 |
High purification method of jig for semiconductor heat treatment
A method for achieving high purity in a jig for semiconductor heat treatment includes subjecting a semiconductor heat treatment jig made of a substrate having a surface covered with a silicon...
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7597765 |
Post etch wafer surface cleaning with liquid meniscus
A method for cleaning the surface of a semiconductor wafer is disclosed. A first cleaning solution is applied to the wafer surface to remove contaminants on the wafer surface. The first cleaning...
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7591955 |
Method for forming an etched soft edge metal foil and the product thereof
A metal processing method includes etching to remove material from a thin metal part. A pattern of etch resistant material is used to prevent etching of the metal in desired locations. The etch...
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7578889 |
Methodology for cleaning of surface metal contamination from electrode assemblies
Systematic and effective methodology to clean capacitively coupled plasma reactor electrodes and reduce surface roughness so that the cleaned electrodes meet surface contamination specifications...
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7575694 |
Method of selectively stripping a metallic coating
A process for chemically stripping a metallic coating on an external surface of a substrate without attacking an internal surface defined by an internal passage within the substrate. Processing...
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7563377 |
Method for removing iron deposits in a water system
A method and composition and system which for the oxidation, clean up, removal and control of iron and iron deposits in water and the removal of iron deposits and bacterial bio-films from surfaces...
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7562662 |
Cleaning solution and cleaning method of a semiconductor device
A cleaning method for removing foreign bodies during the fabrication of semiconductor devices including treating a substrate with a cleaning solution including an oxidizer to form a chemical oxide...
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7553803 |
Enhancement of silicon-containing particulate material removal using supercritical fluid-based compositions
A method and composition for removing silicon-containing particulate material, such as silicon nitrides and silicon oxides, from patterned Si/SiO 2 semiconductor wafer surfaces is described. The...
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7541094 |
Firepolished quartz parts for use in semiconductor processing
Described are methods and chemistries for preparing firepolished quartz parts for use in semiconductor processing. The quartz parts in need of preparation include newly manufactured parts as well...
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7531492 |
Composition for the removal of sidewall residues
A composition for the production of semiconductors, comprising H2SiF6 and/or HBF4 in a total amount of 10-500 mg/kg, 1-17 % by weight of H2S04, 1-15% by weight of H202, optionally in combination...
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7531047 |
Method of removing residue from a substrate after a DRIE process
The present disclosure provides a method of cleaning a semiconductor substrate after a DRIE etch process, wherein residue from the DRIE process is removed without damaging the substrate. The...
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7531043 |
Magnetic disk substrate and production method of magnetic disk
The invention can provide a production method for a magnetic disk substrate capable of reducing the number of surface defects of a glass substrate. When a magnetic disk is produced by using the...
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7524801 |
Process for removing contaminant from a surface and composition useful therefor
Particulate and metal ion contamination is removed from a surface, such as a semiconductor wafer containing copper damascene or dual damascene features, employing a fluoride-free aqueous...
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7521405 |
Process solutions containing surfactants
Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain embodiments, the process solution may reduce...
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7507323 |
Self-cleaning chlorine generator with pH control
A water treatment system includes a circulation pump and an electrolytic chamber in fluid communication with a main body of water. Electrolytic plates within the electrolytic chamber generate...
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7507300 |
Method and apparatus for cleaning a photoactive and/or hydrophilic surface
A method of cleaning a photoactive and/or hydrophilic surface includes contacting the surface with conditioned water and optionally a cleaning agent solution. A device for cleaning a photoactive...
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7503982 |
Method for cleaning semiconductor substrate
A method for cleaning a semiconductor substrate having a contact angle between the surface thereof and water dropped thereon of at least 70 degrees comprises contacting the semiconductor surface...
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7494597 |
Method and apparatus for etching disk-like member
Disclosed are a method and apparatus for etching disk-shaped members, especially a method and apparatus for etching semiconductor wafers. In a method wherein wafers ( 30 ) are rotated and etched in...
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7470330 |
Method for dissolving oilfield scale
A method of removing metal scale from surfaces that includes contacting the surfaces with a first aqueous solution of a chelating agent, allowing the chelating agent to dissolve the metal scale,...
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7468106 |
Removal of niobium second phase particle deposits from pickled zirconium-niobium alloys
The present invention provides a method for removing niobium-rich second-phase-particle (SPP) deposits from zirconium-niobium alloy components. The method comprises washing a freshly pickled and...
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7462249 |
Surface treatment process for metal articles
A surface treatment process for a metal article includes the following steps. Firstly, a metal article, made of at least one of copper and an alloy thereof, is provided. Secondly, a surface of the...
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7462248 |
Method and system for cleaning a photomask
A method for cleaning a photomask includes cleaning the photomask with a chemical cleaner, introducing a solution to the photomask, the solution is configured to react with residuals generated from...
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7452475 |
Cleaning process and apparatus for silicate materials
A method for treating a surface of a quartz substrate includes preparing a substrate to provide a working surface having an initial roughness; and then ultrasonically acid-etching the working...
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7448397 |
Apparatus for applying disparate etching solutions to interior and exterior surfaces
Described are methods, systems, and chemistries for cleaning various components of semiconductor process equipment. A method in accordance with one embodiment cleans articles with differently...
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7435355 |
Liquid-based gravity-driven etching-stop technique for controlling structure dimension
A liquid-based gravity-driven etching-stop technique for controlling structure dimension is provided, where opposite etching trenches in cooperation with an etching-stop solution are used for...
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7431860 |
Etching process
A method for etching a pattern in a material in precise target areas comprising depositing selectively onto the material droplets of a substance for dissolving or reacting chemically with the...
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7431853 |
Selective etching of oxides from substrates
A method and system for release etching a micro-electrical-mechanical-systems (MEMS) device from a substrate. In one aspect, the invention is a method comprising (a) supporting at least one...
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7422639 |
Method of reducing water spotting and oxide growth on a semiconductor structure
The present invention relates to a method of cleaning and drying a semiconductor structure in a modified conventional gas etch/rinse or dryer vessel.
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7419614 |
Method of etching and cleaning objects
A method of etching and cleaning objects contained in a vessel, includes etching the objects by providing etching solution into the vessel, forcing out the etching solution from the vessel by...
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7417016 |
Composition for the removing of sidewall residues
The present invention relates to a composition for the removal of so-called “sidewall residues” from metal surfaces, in particular from aluminium or aluminium-containing surfaces, in particular...
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7416611 |
Process and apparatus for treating a workpiece with gases
In a method and apparatus for cleaning or processing a workpiece, a process gas is brought into contact with the workpiece by diffusion through a heated liquid layer on the workpiece, and by bulk...
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7415983 |
Method of cleaning articles in a dish machine using an acidic detergent
An acidic detergent composition can be used for removing soils on articles in a dish machine. The acidic detergent composition may be inserted into a dish machine dispenser and a use solution may...
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7410902 |
Composition for cleaning semiconductor device
A sulfur-containing detergent composition for cleaning a semiconductor device having an aluminum wire, wherein the sulfur-containing detergent composition is capable of forming a protective film...
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7404863 |
Methods of thinning a silicon wafer using HF and ozone
A method of thinning a silicon wafer in a controllable cost-effective manner with minimal chemical consumption. The wafer is placed into a process chamber, after which ozone gas and HF vapor are...
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7402552 |
Non-corrosive cleaning composition for removing plasma etching residues
A non-corrosive cleaning composition for removing residues from a substrate. The composition comprises: (a) water; (b) at least one hydroxylammonium compound; (c) at least one basic compound,...
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7402258 |
Methods of removing metal contaminants from a component for a plasma processing apparatus
Methods of removing metal contaminants from a component for a plasma processing apparatus are provided. The method includes cleaning a surface of the component with a cleaning liquid that includes...
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7402213 |
Stripping and removal of organic-containing materials from electronic device substrate surfaces
Described herein is a method of removing an organic-containing material from an exposed surface of a large substrate (at least 0.25 m 2 ). The substrate may comprise an electronic device. The...
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7399365 |
Aqueous fluoride compositions for cleaning semiconductor devices
The present invention relates to dilute fluoride solutions and methods for cleaning plasma etch residue from semiconductor substrates including such dilute solutions. The compositions and methods...
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7396417 |
Method for removing laser scales
A degreasing method for descaling or removing laser scales from iron-containing metal part surface by treating the iron-containing metal part surfaces that is optionally tainted with laser scales...
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7387964 |
Copper polishing cleaning solution
A cleaning solution for removing copper complex residues from the surface of polishing pads and wafer substrates includes an amine pH-adjusting agent, which can be a unidentate or bidentate amine...
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7384901 |
Process for cleaning aluminum and aluminum alloy surfaces with nitric acid and chromic acid-free compositions
A process for cleaning (e.g., desmutting) an aluminum surface, using compositions free of nitric acid and chromic acid and comprising, in one embodiment, an oxidant and at least one mineral acid...
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7377984 |
Method for cleaning a photomask
Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to...
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7368019 |
Method for preventing elution of lead and/or nickel from copper alloy piping material such as valve or pipe joint and copper alloy piping material, and fluid for use in cleaning piping material
A technique is provided to precludes elution of the nickel by infallibly removing the nickel adhering to the inner surface of plumbing hardware, realize a treatment for efficient (treating...
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7367343 |
Method of cleaning a surface of a cobalt-containing material, method of forming an opening to a cobalt-containing material, semiconductor processing method of forming an integrated circuit comprising a copper-containing conductive line, and a cobalt-containing film cleaning solution
The invention includes methods of cleaning a surface of a cobalt-containing material, methods of forming an opening to a cobalt-containing material, semiconductor processing methods of forming an...
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7364625 |
Rinsing processes and equipment
Described are methods of rinsing and processing devices such as semiconductor wafers wherein the device is rinsed with using a surface tension reducing agent; the method may include a subsequent...
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7351391 |
System and method for converting the spent remnants of a first pickling acid solution into a usable second pickling acid solution
A system and method of economically converting a spent first pickling acid solution that contains hydrochloric acid, water and ferrous chloride into a suitable second pickling solution. Sulfuric...
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7347951 |
Method of manufacturing electronic device
A method of manufacturing an electronic device comprises forming a wiring material layer made of aluminum or an aluminum alloy on the surface of an insulating film on a substrate, patterning the...
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7344602 |
Scale conditioning agents and treatment method
An improved scale conditioning composition and method is disclosed that results in improved dissolution and disruption of tube scale, hardened sludge and other deposits composed primarily of highly...
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