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8158311 |
Method for managing light exposure mask and light exposure mask
An object of the present invention is to provide a method for managing a light exposure mask wherein: a mask inspection or a wafer inspection, in order to manage a contamination of a light exposure...
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8147713 |
Composition and method for scale removal and leak detection
A method and composition for scale removal and leak detection is disclosed. The composition comprises a scale-removal agent and a fluorescing agent.
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8141386 |
Method for fabricating a glass substrate for an information recording medium, and magnetic disk using the same
A method for fabricating a glass substrate containing SiO2 as a main ingredient thereof for an information recording medium which ensures removal of abrasive or foreign mater adhered to the glass...
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8128754 |
Ferric pickling of silicon steel
The pickling process designed for pickling electrical steel strip in a continuous fashion comprising immersing the strip in at least one pickling tub. The pickling tub contains a mixture of HCl,...
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8075701 |
Processes for reconditioning multi-component electrodes
A process for reconditioning a multi-component electrode comprising a silicon electrode bonded to an electrically conductive backing plate is provided. The process comprises: (i) removing metal...
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8062430 |
Process for cleaning filters
Filters used in the beverage industry fouled by polyphenol-protein complexes and carbohydrate polymers can be cleaned by treating the filters either with the following methods: Solubilization of at...
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8062429 |
Methods of cleaning semiconductor devices at the back end of line using amidoxime compositions
The present invention relates to aqueous compositions comprising amidoxime compounds and methods for cleaning plasma etch residue from semiconductor substrates including such dilute aqueous...
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8063006 |
Aqueous cleaning composition for semiconductor copper processing
The invention relates to an aqueous cleaning composition for wafers with copper wires that have been treated by chemical mechanical planarization in an integrated circuit processing, comprising 0.1...
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8052797 |
Method for removing foreign matter from substrate surface
A method for removing inorganic foreign matters from the surface of a substrate made of silicon or glass or the surface of an inorganic coating formed on the surface of the substrate, which...
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8038799 |
Substrate processing apparatus and substrate processing method
A substrate processing apparatus and a substrate processing method, with which a resist can be removed satisfactorily from the substrate and a processing solution used for removing the resist can...
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8038803 |
Method of descaling metallic devices
Methods are provided for descaling metallic components devices such as stents. The devices or components are cleaned under ultrasound in a cleaning solution of ammonium hydrogen fluoride at a...
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8038798 |
Method of and apparatus for cleaning substrate
A substrate cleaning apparatus is capable of individually setting a threshold value for use in making a check of a resistivity during a rinsing process on a recipe setting screen in each process...
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8029623 |
Acid removal in cleaning processes
Embodiments of the present disclosure include cleaning processes, cleaning machines, and methods of preventing acidification of a cleaning composition in a cleaning process. The cleaning process...
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8021490 |
Substrate cleaning processes through the use of solvents and systems
A method for removing common contaminates or residues which include but are not limited to ionic residues, particulate residues and moisture from semiconductor wafers used in the manufacture of IC...
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8021491 |
Method for selectively removing coatings from metal substrates
A method for selectively removing an aluminum-poor overlay coating from a substrate of a component, which as a result of its low aluminum content is highly resistant to a selective stripping...
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8021494 |
Method for the decontamination of an oxide layer-containing surface of a component or a system of a nuclear facility
A method of decontaminating an oxide layer-comprising surface of a component or a system of a nuclear facility. An acidic water film is produced on the surface, the film of water is brought into...
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8016948 |
Method of removing contaminants from a coating surface comprising an oxide or fluoride of a group IIIB metal
Disclosed herein is a cleaning method useful in removing contaminants from a surface of a coating which comprises an oxide or fluoride of a Group III B metal. Typically the coating overlies an...
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8016996 |
Method of producing a sparged cleaning liquid onboard a mobile surface cleaner
A method is provided, which includes moving a mobile floor cleaning machine along a floor. Onboard the mobile floor cleaning machine, a liquid is sparged by electrolysis. The sparged liquid is...
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8007594 |
Method for manufacturing semiconductor device
A method for manufacturing a semiconductor device includes the step of conducting a cleaning process for a wafer formed with copper wiring lines to remove contaminations produced on a back surface...
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8007593 |
Remover compositions
A remover composition containing 1,3-propanediamine (a), 1-hydroxyethylidene-1, 1-diphosphonic acid (b) and water, wherein the remover composition contains the component (a) in an amount of from...
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7985297 |
Method of cleaning a quartz part
A cleaning solution for a quartz part and a method for cleaning the quartz part are provided. The cleaning solution includes from about 5 to about 35 wt % of an ammonium compound, from about 7 to...
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7964109 |
Method of cleaning a surface of a cobalt-containing material, method of forming an opening to a cobalt-containing material, semiconductor processing method of forming an integrated circuit comprising a copper-containing conductive line, and a cobalt-containing film cleaning solution
The invention includes methods of cleaning a surface of a cobalt-containing material, methods of forming an opening to a cobalt-containing material, semiconductor processing methods of forming an...
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7959788 |
***WITHDRAWN PATENT AS PER THE LATEST USPTO WITHDRAWN LIST***
Method of producing a sparged cleaning liquid onboard a mobile surface cleaner
A method is provided, which includes moving a mobile floor cleaning machine along a floor. Onboard the mobile floor cleaning machine, a liquid is sparged by electrolysis. The sparged liquid is...
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7955440 |
Method for cleaning silicon wafer and apparatus for cleaning the silicon wafer
After a water film is formed on a wafer front surface in a chamber, the water film is supplied sequentially with an oxidizing component of an oxidation gas, an organic acid component of an organic...
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7947130 |
Troika acid semiconductor cleaning compositions and methods of use
Semiconductor processing compositions for use with silicon wafers having an insulating layers and metallization layers on the wafers comprising water and one or more Troika acids which is also...
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7942980 |
Starch removal process
Starch is removed from the surface of an article using a multi-step method that includes presoaking the article in an acidic solution to remove the starch from the surface of the article and...
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7942975 |
Ceramic sprayed member-cleaning method
A ceramic sprayed member-cleaning method which is capable of reliably suppressing desorption and attachment of water. The surface of a ceramic sprayed member and water are chemically bonded to each...
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7938911 |
Process for cleaning a semiconductor wafer using a cleaning solution
Semiconductor wafers are cleaned using a cleaning solution containing an alkaline ammonium component in an initial composition, wherein the semiconductor wafer is brought into contact with the...
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7922822 |
Method for cleaning and sterilizing endoscopic camera
A cleaning and sterilizing method for removing organic matter adhered to the surface of an endoscopic camera instrument, and effectively exhibiting bacteria-killing and virus-killing effects of...
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7896970 |
Semiconductor substrate cleaning liquid and semiconductor substrate cleaning process
A semiconductor substrate cleaning liquid composition is provided that includes one or more types selected from the group consisting of a compound having at least two sulfonic acid groups per...
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7887641 |
Neutral or alkaline medium chain peroxycarboxylic acid compositions and methods employing them
The present invention relates to medium chain peroxycarboxylic acid compositions of neutral or alkaline pH, to methods of making these compositions, and to methods employing these compositions. The...
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RE42128 |
Compositions for removing residue from a substrate and use thereof
Compositions containing certain organic solvents and a fluorine source are capable of removing photoresist and etching residue.
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7879153 |
Method for cleaning metal nanoparticles
It relates to a method for removing a surfactant, organic materials and chlorine ions remained on the surface of metal nanoparticles, prepared on an organic solvent phase including a surfactant....
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7867404 |
Method for converting electrical components
A method for removing an undesirable material from an electronic or electrical component and introducing a desirable material in place of the undesirable material. The method can include the...
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7851373 |
Processing systems and methods for semiconductor devices
Systems and methods for processing semiconductor devices are disclosed. A preferred embodiment comprises a processing method that includes providing a processing system including a first container...
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7850786 |
Method of improving corrosion resistance of stainless steel surfaces by a process of passivation
Described is a space-conserving integrated fluid delivery system particularly useful for gas distribution in semiconductor processing equipment. The system includes integrated fluid flow network...
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7837805 |
Methods for treating surfaces
Some embodiments include methods of treating surfaces with aerosol particles. The aerosol particles may be formed as liquid particles, and then passed through a chamber under conditions which...
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7828908 |
Acid cleaning and corrosion inhibiting compositions comprising gluconic acid
A biodegradable acid cleaning composition for cleaning stainless steel, and other surfaces is disclosed. The composition comprises urea sulfate in combination with gluconic acid which serves as a...
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7820025 |
Methods of synthesizing an oxidant and applications thereof
Novel devices for synthesizing ferrate and uses thereof are described. One aspect of the invention relates to devices and systems for synthesizing ferrate at a site proximal to the site of use.
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7799140 |
Process for the removal of photoreceptor coatings using a stripping solution
The disclosed embodiments are directed to processes for removing photoreceptor coatings from a substrate, wherein the photoreceptor coatings disposed over a substrate of an electrophotographic...
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7789971 |
Treatment of substrate using functionalizing agent in supercritical carbon dioxide
During the processing of substrates, the substrate surface may be subjected to a cleaning process using supercritical CO2. Surface matter may remain, for example, because it is only minimally...
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7779785 |
Production method for semiconductor device and substrate processing apparatus
Disclosed is a producing method of a semiconductor device comprising a first step of supplying a first reactant to a substrate to cause a ligand-exchange reaction between a ligand of the first...
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7771542 |
Compositions and methods for removing lead from metal surfaces
The invention provides an aqueous composition that includes a hydroxy-substituted mono-, di-, or tri-carboxylic acid; phosphoric acid; a surfactant; and water. The invention further provides a...
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7767028 |
Cleaning hardware kit for composite showerhead electrode assemblies for plasma processing apparatuses
Apparatus to clean silicon electrode assembly surfaces which controls or eliminates possible chemical attack of electrode assembly bonding materials, and eliminates direct handling contact with the...
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7754609 |
Cleaning processes for silicon carbide materials
The cleaning of silicon carbide materials on a large-scale is described. Certain silicon carbide materials in the form of wafer-lift pins, wafer-rings and/or wafer-showerheads are cleaned by using...
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7736439 |
Method for cleaning a polysilicon fraction
The present invention relates to a method for cleaning polycrystalline silicon fragments to a metal content of <100 ppbw, wherein a polysilicon fraction is added to an aqueous cleaning solution...
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7727337 |
Simplified method for cleaning production tools used for metal forming
Chemical method of cleaning metallic residue from forming tools utilizing the application of a caustic material including base or mild acid to the tool for a short period of time. The caustic...
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7722777 |
Method of preparing core rods for optical fiber preforms
Core rods or other glass components associated with optical fiber preforms are cleaned by loading them into a number of first sleeves, and partially obstructing entrance and exit ends of the...
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7722746 |
Self-cleaning chlorine generator with pH control
A water treatment system includes a circulation pump and an electrolytic chamber in fluid communication with a main body of water. Electrolytic plates within the electrolytic chamber generate...
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7718008 |
Method for cleaning photo mask
The present invention provides a method for cleaning a photo mask without the need for removal of the pellicle mounted on the photo mask, without the large scale equipment for washing with a...
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