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7417016 |
Composition for the removing of sidewall residues
The present invention relates to a composition for the removal of so-called “sidewall residues” from metal surfaces, in particular from aluminium or aluminium-containing surfaces, in particular...
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7416611 |
Process and apparatus for treating a workpiece with gases
In a method and apparatus for cleaning or processing a workpiece, a process gas is brought into contact with the workpiece by diffusion through a heated liquid layer on the workpiece, and by bulk...
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7415983 |
Method of cleaning articles in a dish machine using an acidic detergent
An acidic detergent composition can be used for removing soils on articles in a dish machine. The acidic detergent composition may be inserted into a dish machine dispenser and a use solution may...
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7410902 |
Composition for cleaning semiconductor device
A sulfur-containing detergent composition for cleaning a semiconductor device having an aluminum wire, wherein the sulfur-containing detergent composition is capable of forming a protective film...
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7404863 |
Methods of thinning a silicon wafer using HF and ozone
A method of thinning a silicon wafer in a controllable cost-effective manner with minimal chemical consumption. The wafer is placed into a process chamber, after which ozone gas and HF vapor are...
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7402552 |
Non-corrosive cleaning composition for removing plasma etching residues
A non-corrosive cleaning composition for removing residues from a substrate. The composition comprises: (a) water; (b) at least one hydroxylammonium compound; (c) at least one basic compound,...
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7402258 |
Methods of removing metal contaminants from a component for a plasma processing apparatus
Methods of removing metal contaminants from a component for a plasma processing apparatus are provided. The method includes cleaning a surface of the component with a cleaning liquid that includes...
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7402213 |
Stripping and removal of organic-containing materials from electronic device substrate surfaces
Described herein is a method of removing an organic-containing material from an exposed surface of a large substrate (at least 0.25 m 2 ). The substrate may comprise an electronic device. The...
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7399365 |
Aqueous fluoride compositions for cleaning semiconductor devices
The present invention relates to dilute fluoride solutions and methods for cleaning plasma etch residue from semiconductor substrates including such dilute solutions. The compositions and methods...
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7396417 |
Method for removing laser scales
A degreasing method for descaling or removing laser scales from iron-containing metal part surface by treating the iron-containing metal part surfaces that is optionally tainted with laser scales...
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7387964 |
Copper polishing cleaning solution
A cleaning solution for removing copper complex residues from the surface of polishing pads and wafer substrates includes an amine pH-adjusting agent, which can be a unidentate or bidentate amine...
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7384901 |
Process for cleaning aluminum and aluminum alloy surfaces with nitric acid and chromic acid-free compositions
A process for cleaning (e.g., desmutting) an aluminum surface, using compositions free of nitric acid and chromic acid and comprising, in one embodiment, an oxidant and at least one mineral acid...
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7377984 |
Method for cleaning a photomask
Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to...
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7368019 |
Method for preventing elution of lead and/or nickel from copper alloy piping material such as valve or pipe joint and copper alloy piping material, and fluid for use in cleaning piping material
A technique is provided to precludes elution of the nickel by infallibly removing the nickel adhering to the inner surface of plumbing hardware, realize a treatment for efficient (treating...
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7367343 |
Method of cleaning a surface of a cobalt-containing material, method of forming an opening to a cobalt-containing material, semiconductor processing method of forming an integrated circuit comprising a copper-containing conductive line, and a cobalt-containing film cleaning solution
The invention includes methods of cleaning a surface of a cobalt-containing material, methods of forming an opening to a cobalt-containing material, semiconductor processing methods of forming an...
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7364625 |
Rinsing processes and equipment
Described are methods of rinsing and processing devices such as semiconductor wafers wherein the device is rinsed with using a surface tension reducing agent; the method may include a subsequent...
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7351391 |
System and method for converting the spent remnants of a first pickling acid solution into a usable second pickling acid solution
A system and method of economically converting a spent first pickling acid solution that contains hydrochloric acid, water and ferrous chloride into a suitable second pickling solution. Sulfuric...
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7347951 |
Method of manufacturing electronic device
A method of manufacturing an electronic device comprises forming a wiring material layer made of aluminum or an aluminum alloy on the surface of an insulating film on a substrate, patterning the...
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7344602 |
Scale conditioning agents and treatment method
An improved scale conditioning composition and method is disclosed that results in improved dissolution and disruption of tube scale, hardened sludge and other deposits composed primarily of highly...
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7335268 |
Inorganic compound for removing polymers in semiconductor processes
An inorganic compound for removing polymers after a semiconductor etching process and related methods and apparatus are disclosed. An example compound includes DIW, H 2 SO 4 , H 2 O 2 and HF. An...
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7318870 |
Method of cleaning semiconductor substrate
A cleaning method for a semiconductor substrate including placing the semiconductor substrate into a cleaning chamber and injecting ozone gas (O 3 ) into the cleaning chamber. This process operates...
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7314688 |
Method of producing a reflection mask blank, method of producing a reflection mask, and method of producing a semiconductor device
A reflection mask blank and a method of producing a reflection mask blank by forming, on a substrate, at least a multilayer reflection film for reflecting exposure light and an absorber layer...
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7314529 |
Substrate cleaning apparatus and substrate cleaning method
A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the...
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7309683 |
Cleaning composition and method of cleaning a semiconductor device using the same
A cleaning composition comprises an alkali solution, pure water, and a surfactant represented by the following chemical formula: R1-OSO 3 —HA + wherein R1 is one selected from a group consisting...
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7306681 |
Method of cleaning a semiconductor substrate
A cleaning method and cleaning recipes are disclosed. The present invention relates to a method for cleaning a semiconductor substrate and cleaning recipes. The present invention utilizes a first...
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7300527 |
Method for activating surface of base material and apparatus thereof
A method for activating the surface of a base material and an apparatus thereof, which is suited to be utilized for pretreatment in electrochemical treatment such as, for example, electroplating or...
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7285492 |
Method for processing substrate
A substrate processing method can securely form a metal film by electroless plating on an exposed surface of a base metal, such as interconnects, with increased throughput and without the formation...
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7282099 |
Dense phase processing fluids for microelectronic component manufacture
Method for processing an article by contacting the article with a dense fluid. The article is introduced into a sealable processing chamber and the processing chamber is sealed. A dense fluid is...
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7276449 |
Gas assisted method for applying resist stripper and gas-resist stripper combinations
A method for moving resist stripper across the surface of a semiconductor substrate includes applying a wet chemical resist stripper, such as an organic or oxidizing wet chemical resist stripper,...
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7270597 |
Method and system for chemical mechanical polishing pad cleaning
In one embodiment, a method for cleaning a chemical mechanical polishing (CMP) pad is provided. The CMP pad surface has a residue thereon. Chemicals are applied onto the surface of the CMP pad and...
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7270130 |
Semiconductor device cleaning employing heterogeneous nucleation for controlled cavitation
The present invention provides a method for cleaning semiconductor devices through heterogeneous nucleation of cavitation bubbles. Heterogeneous nucleation is performed by applying sonic energy to...
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7267726 |
Method and apparatus for removing polymer residue from semiconductor wafer edge and back side
A method for cleaning a semiconductor device has the steps of securing a wafer ( 16 ) with a modified chuck ( 11 ) and applying a cleaning solution ( 18 ) to the backside ( 20 ) of the wafer ( 16...
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7261780 |
Ceramic susceptor and a method of cleaning the same
An object of the present invention is to provide a ceramic susceptor for considerably reducing the count number of metal atoms on the surface of a semiconductor after the semiconductor is treated,...
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7255749 |
Substrate cleaning method and substrate cleaning apparatus
In a cleaning treatment of a substrate using an aqueous solution of ammonium fluoride or a mixture of an aqueous solution of ammonium fluoride and hydrofluoric acid as a cleaning liquid, the...
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7250114 |
Methods of finishing quartz glass surfaces and components made by the methods
Methods of surface finishing a component useful for a plasma processing apparatus are provided. The component includes at least one plasma-exposed quartz glass surface. The method includes...
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7250085 |
Method of wet cleaning a surface, especially of a material of the silicon-germanium type
Method of wet cleaning a surface of at least one material chosen from silicon, silicon-germanium alloys, A(III)/B(V)-type semiconductors and epitaxially grown crystalline materials, such as...
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7247579 |
Cleaning methods for silicon electrode assembly surface contamination removal
Silicon electrode assembly decontamination cleaning methods and solutions, which control or eliminate possible chemical attacks of electrode assembly bonding materials, comprise ammonium fluoride,...
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7247208 |
Microelectronic cleaning compositions containing ammonia-free fluoride salts
Ammonia-free, HF-free cleaning compositions for cleaning photoresist and plasma ash residues from microelectronic substrates, and particularly to such cleaning compositions useful with and having...
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7241920 |
Filterable surfactant composition
An improved aqueous soluble surfactant which has particular utility for incorporating in etchants for semiconductor devices is provided. The surfactant comprises a combination of a linear...
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7232528 |
Surface treatment agent for copper and copper alloy
The surface treatment agent for copper and copper alloys contains hydrogen peroxide, a mineral acid, an azole compound, silver ion and a halide ion. The surface treatment agent for copper and...
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7229506 |
Process for pickling martensitic or ferritic stainless steel
A process for pickling martensitic or ferritic stainless steel, preferably in the form of wires, tubes or rods, wherein the stainless steel is placed in contact with a pickling solution which has a...
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7228865 |
FRAM capacitor stack clean
An embodiment of the invention is a method of cleaning a material stack 2 that has a hard mask top layer 8 . The method involves cleaning the material stack 2 with a fluorine-based plasma...
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7226513 |
Silicon wafer cleaning method
This invention provides a cleaning method of silicon wafer for obtaining a silicon wafer in which micro roughness thereof under spatial frequency of 20/μm is 0.3 to 1.5 nm 3 in terms of power...
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7220322 |
Cu CMP polishing pad cleaning
A polishing pad is cleaned of Cu CMP by-products, subsequent to planarizing a wafer, to reduce pad-glazing by applying to the polishing pad surface a composition comprising about 0.1 to about 3.0...
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7217464 |
Method of manufacturing electrodeposited copper foil with carrier foil for high-temperature heat-resistance and electrodeposited copper foil with carrier foil for high-temperature heat-resistance obtained by the manufacturing method
The object is to provide a method of manufacturing electrodeposited copper foil with a carrier foil for high-temperature heat-resistance in which the peeling of the carrier foil is easy even by...
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7216653 |
Cleaning solution and cleaning method of a semiconductor device
A cleaning method for removing foreign bodies during the fabrication of semiconductor devices including treating a substrate with a cleaning solution including an oxidizer to form a chemical oxide...
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7211553 |
Processing of substrates with dense fluids comprising acetylenic diols and/or alcohols
A dense cleaning fluid for removing contaminants from a substrate and a method comprising same is disclosed herein. In one embodiment of the present invention, the dense cleaning fluid comprises a...
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7211156 |
Method for cleaning a ceramic member for use in a system for producing semiconductors, a cleaning agent and a combination of cleaning agents
The present invention provides a method for cleaning a ceramic member for use in a system for producing semiconductors. The method has the step of cleaning the ceramic member with an organic acid...
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7208455 |
Method to increase electromigration resistance of copper using self-assembled organic thiolate monolayers
Methods and solutions for forming self assembled organic monolayers that are covalently bound to metal interfaces are presented along with a device containing a self assembled organic monolayer....
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7208454 |
Cleaning solution for removing anti-reflective coating composition
A cleaning solution for a cured anti-reflective layer (AFC layer) component and a method of cleaning an anti-reflective layer component by using the same, wherein the cleaning solution comprises...
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