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7632359 Cleaning liquid and nozzle plate cleaning method  
A weakly alkali cleaning liquid suitable for use in the case of cleaning and removing inks adhered to a nozzle plate, in an ink jet printer using inks in which inorganic pigments and metal oxides...
7629265 Cleaning method for use in semiconductor device fabrication  
A novel cleaning method for preventing defects and particles resulting from post tungsten etch back or tungsten chemical mechanical polish is provided. The cleaning method comprises providing a...
7628866 Method of cleaning wafer after etching process  
A method of cleaning a wafer after an etching process is provided. A substrate having an etching stop layer, a dielectric layer, a patterned metal hard mask sequentially formed thereon is provided....
7594971 Method of cleaning and sterilizing medical instruments  
A novel method of cleaning and disinfecting organically contaminated articles such as, for instance, medical instruments, wherein the cleaning cycle consists of two sections divided by removal and...
7582212 Method of removing silicon dioxide from waste liquid, method of cleaning membrane tube and method of processing waste water  
A method of removing silicon dioxide from a waste liquid is described. A solution containing fluoride ions is added into the waste liquid to form a reaction product. A method of cleaning a membrane...
7566347 Cleaning process utilizing an organic solvent and a pressurized fluid solvent  
A cleaning method and system that utilize an organic cleaning solvent and pressurized fluid solvent is disclosed. The method and system have no conventional evaporative hot air drying cycle....
7559993 Process for decoating a washcoat catalyst substrate  
The invention relates to a process for decoating a used washcoat carrier substrate to produce a clean, inert carrier or substrate. In a preferred embodiment, a process according to the invention...
7540926 Method of cleaning contaminated surfaces  
A method for cleaning contaminated surfaces of surgical waste management equipment. The method includes rinsing surfaces of the equipment with water to remove water soluble contaminants and waste...
7537705 Method for treating feedwater  
A method for treating feedwater is provided. The method includes steps of introducing a treatment composition into a feedwater stream to provide a treated feedwater stream containing scale...
7531047 Method of removing residue from a substrate after a DRIE process  
The present disclosure provides a method of cleaning a semiconductor substrate after a DRIE etch process, wherein residue from the DRIE process is removed without damaging the substrate. The...
7507299 Apparatuses, systems and processes for surface cleaning  
Described and claimed are apparatuses and systems for surface cleaning comprising a pump and an applicator connected to the pump through which one or more cleaning agents can be applied to the...
7470330 Method for dissolving oilfield scale  
A method of removing metal scale from surfaces that includes contacting the surfaces with a first aqueous solution of a chelating agent, allowing the chelating agent to dissolve the metal scale,...
7462248 Method and system for cleaning a photomask  
A method for cleaning a photomask includes cleaning the photomask with a chemical cleaner, introducing a solution to the photomask, the solution is configured to react with residuals generated from...
7462249 Surface treatment process for metal articles  
A surface treatment process for a metal article includes the following steps. Firstly, a metal article, made of at least one of copper and an alloy thereof, is provided. Secondly, a surface of the...
7435301 Cleaning solution of silicon germanium layer and cleaning method using the same  
Disclosed are a cleaning solution for preventing damage of a silicon germanium layer when cleaning a semiconductor device including the silicon germanium layer and a cleaning method using the same....
7410544 Method for cleaning electroless process tank  
A method for cleaning a metal plating tank is provided herein. In accordance with the method, the tank is exposed to a first acid ( 103 ), after which the tank is exposed to a second acid in the...
7402212 Apparatus and method for cleaning a glass substrate before photoresist coating  
A method for cleaning a glass substrate before photoresist coating, which method can remove oxide compounds and organic residues from the surface of a metal layer of the glass substrate, comprises...
7399366 Product and processes for preventing the occurrence of rust stains resulting from irrigation systems using water containing iron ions and for cleaning off rust stains resulting from using said irrigation systems  
Several products and processes for preventing the occurrence of rust stains resulting from irrigation systems using water having iron ions, such as well water, and for cleaning off rust stains...
7377984 Method for cleaning a photomask  
Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to...
7377983 Prevention of deposits on ceramics  
A method to prevent deposits on a ceramic surface comprising: (1) pretreating the surface by applying an aqueous solution containing from about 200 ppm to about 1000 ppm by weight of an amphoteric...
7368057 Method and system for removing residual water from excess washcoat by ultrafiltration  
A washcoat coating composition is disclosed that includes at least one water insoluble organic solvent and at least one polymer, such as an epoxy acrylic copolymer. A method of removing residual...
7368019 Method for preventing elution of lead and/or nickel from copper alloy piping material such as valve or pipe joint and copper alloy piping material, and fluid for use in cleaning piping material  
A technique is provided to precludes elution of the nickel by infallibly removing the nickel adhering to the inner surface of plumbing hardware, realize a treatment for efficient (treating...
7361231 System and method for mid-pressure dense phase gas and ultrasonic cleaning  
Workpieces are loaded into a cleaning chamber. The cleaning chamber is pressurized with a first dense-phase cleaning fluid, the temperature and pressure of the first dense-phase fluid being...
7337788 Compositions useful for cleaning solvent-based paint from paint delivery installations  
Uncured solvent-based paint may be flushed from a paint delivery installation using a substantially non-aqueous composition containing one or more organic solvents and a polymer having acid and/or...
7331354 Cleaning of tray columns which have been used for rectificatively treating liquids comprising (meth)acrylic acid and/or esters thereof  
In process for cleaning tray columns which are used for the purposes of rectifiying liquids comprising (meth)acrylic compounds, a basic liquid is conveyed downward through the tray column and a gas...
7329322 Exhaust apparatus, semiconductor device manufacturing system and method for manufacturing semiconductor device  
In an exhaust pipe, a rotating shaft takeoff connection is provided so as to support a rotating shaft for rotating a switching valve fixed thereon. The rotating shaft extends to the outside of the...
7314529 Substrate cleaning apparatus and substrate cleaning method  
A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the...
7267728 System and method for cleaning and/or treating vehicles and the surfaces of other objects  
The present invention relates to a system and method for cleaning and/or treating a surface, preferably surfaces such as ceramic, steel, plastic, glass and/or painted surfaces such as the exterior...
7264681 Cleaning apparatus and cleaning method  
A cleaning apparatus and a cleaning method wherein cleaning and drying can be carried out in the same cleaning apparatus without the risk of reverse contamination of the cleaned object after the...
7261847 Process for the functional regeneration of the porosity of moulds used for moulding ceramic objects  
A process for the functional regeneration of the porosity of the materials used to make molds ( 2 ) for moulding ceramic objects, when the pores have been damaged by use of the mold ( 2 ),...
7252720 Removal of prion infectivity  
Prion infectivity adsorbed onto substrates (for example, chromatographic columns used to fractionate blood plasma) is removed by treatment with 2M sodium chloride. Optionally, the substrate is...
7252096 Methods of simultaneously cleaning and disinfecting industrial water systems  
On-Line and Off-Line methods of simultaneously cleaning and disinfecting an industrial water system are described and claimed. The methods involve the addition to the water of the industrial water...
7247208 Microelectronic cleaning compositions containing ammonia-free fluoride salts  
Ammonia-free, HF-free cleaning compositions for cleaning photoresist and plasma ash residues from microelectronic substrates, and particularly to such cleaning compositions useful with and having...
7244316 Methods of making gas sensors and sensors formed therefrom  
A two-step chemical treatment method for chemically conditioning a sensor element comprising an electrolyte in ionic communication with a first electrode and a second electrode is described. The...
7228865 FRAM capacitor stack clean  
An embodiment of the invention is a method of cleaning a material stack 2 that has a hard mask top layer 8 . The method involves cleaning the material stack 2 with a fluorine-based plasma...
7229506 Process for pickling martensitic or ferritic stainless steel  
A process for pickling martensitic or ferritic stainless steel, preferably in the form of wires, tubes or rods, wherein the stainless steel is placed in contact with a pickling solution which has a...
7226897 Water soluble barrier film conformal coating composition  
A composition having a first nonionic nonylphenol surfactant having an HLB value ranging from about 10 to about 15, a second nonionic nonylphenol surfactant having an HLB value ranging from about...
7208049 Process solutions containing surfactants used as post-chemical mechanical planarization treatment  
Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of...
7198052 Mobile flushing unit and process  
In one embodiment of the invention, a method of cleaning a workpiece is disclosed. The method comprises providing a mobile flushing unit and servicing the workpiece as follows: a) connecting a...
7198680 Process for cleaning surfaces of medical equipment  
A method for cleaning contaminated surfaces of surgical waste management equipment. The method includes rinsing surfaces of the equipment with water to remove water soluble contaminants and waste...
7186300 Compositions and methods for treating surfaces  
The present invention relates to methods of treating surfaces, to protect or clean said surfaces. The invention more particularly relates to the treatment of interior walls or surfaces,...
7186301 Device and method for cleaning photomask  
Disclosed herein is a device and a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat...
7169235 Cleaning method and polishing apparatus employing such cleaning method  
A method is suitable for cleaning substrates, after polishing, that require a high degree of cleanliness, such as semiconductor wafers, glass substrates, or liquid crystal displays. The method...
7163588 Processing a workpiece using water, a base, and ozone  
Contaminants such as photoresist are quickly removed from a wafer having metal features, using water, ozone and a base such as ammonium hydroxide. Processing is performed at room temperature to...
7125456 Method for cleaning a washing device of an offset printing machine  
The invention relates to a method for cleaning a washing device ( 5 ) of an offset printing machine, according to which at least one washing device of said offset machine, which comprises a spray...
7097715 Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent  
The present invention relates generally to cleaning systems, and more specifically to substrate cleaning systems, such as textile cleaning systems, utilizing an organic cleaning solvent and a...
7077918 Stripping apparatus and method for removal of coatings on metal surfaces  
A coating is stripped off a work piece by applying a chromous and aluminiforous coat directly on the work piece and stripping the work piece with an alkaline solution containing a strong oxidant. A...
7077915 Method of and apparatus for washing photomask and washing solution for photomask  
Organic matter and metal impurities present on the surface of a photomask are removed. Foreign matter still adhering to the surface of the photomask is removed with H 2 gas dissolved water. The...
7071153 Method of enhancing a soiled porous surface and maintenance thereof  
The present invention is directed to a method of enhancing the appearance of a soiled porous surface. The inventive method includes applying a concentrated, alkaline, cleaning composition to the...
7067016 Chemically assisted mechanical cleaning of MRAM structures  
A method for post-etch cleaning of a substrate with MRAM structures and MJT structures and materials is disclosed. The method includes inserting the substrate into a first brush box configured for...