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7628866 |
Method of cleaning wafer after etching process
A method of cleaning a wafer after an etching process is provided. A substrate having an etching stop layer, a dielectric layer, a patterned metal hard mask sequentially formed thereon is provided....
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7618495 |
Method for pickling a work string using dispersed solvent-in-acid fluid design
A method for cleaning a work string which may have been used to inject drilling muds, cement slurries, cement displacement materials and the like into a well where the work strong may contain...
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7611588 |
Methods and compositions for removing metal oxides
The invention relates to methods and compositions for removing metal oxide soils from surfaces. The compositions include an anionic surfactant and a pH adjuster at an acidic pH. In one embodiment,...
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7601227 |
High purification method of jig for semiconductor heat treatment
A method for achieving high purity in a jig for semiconductor heat treatment includes subjecting a semiconductor heat treatment jig made of a substrate having a surface covered with a silicon...
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7597765 |
Post etch wafer surface cleaning with liquid meniscus
A method for cleaning the surface of a semiconductor wafer is disclosed. A first cleaning solution is applied to the wafer surface to remove contaminants on the wafer surface. The first cleaning...
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7578889 |
Methodology for cleaning of surface metal contamination from electrode assemblies
Systematic and effective methodology to clean capacitively coupled plasma reactor electrodes and reduce surface roughness so that the cleaned electrodes meet surface contamination specifications...
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7578888 |
Method for treating laser-structured plastic surfaces
The present invention relates to a method for treating plastic substrates structured by means of a laser or generation of seed structures on the surface that are suitable for subsequent...
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7559993 |
Process for decoating a washcoat catalyst substrate
The invention relates to a process for decoating a used washcoat carrier substrate to produce a clean, inert carrier or substrate. In a preferred embodiment, a process according to the invention...
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7540926 |
Method of cleaning contaminated surfaces
A method for cleaning contaminated surfaces of surgical waste management equipment. The method includes rinsing surfaces of the equipment with water to remove water soluble contaminants and waste...
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7531043 |
Magnetic disk substrate and production method of magnetic disk
The invention can provide a production method for a magnetic disk substrate capable of reducing the number of surface defects of a glass substrate. When a magnetic disk is produced by using the...
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7531047 |
Method of removing residue from a substrate after a DRIE process
The present disclosure provides a method of cleaning a semiconductor substrate after a DRIE etch process, wherein residue from the DRIE process is removed without damaging the substrate. The...
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7524383 |
Method and system for passivating a processing chamber
A method and system for passivating a processing chamber is provided, whereby the processing chamber is exposed to one or more cycles of citric acid, or nitric acid. The processing chamber is...
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7507300 |
Method and apparatus for cleaning a photoactive and/or hydrophilic surface
A method of cleaning a photoactive and/or hydrophilic surface includes contacting the surface with conditioned water and optionally a cleaning agent solution. A device for cleaning a photoactive...
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7470330 |
Method for dissolving oilfield scale
A method of removing metal scale from surfaces that includes contacting the surfaces with a first aqueous solution of a chelating agent, allowing the chelating agent to dissolve the metal scale,...
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7470631 |
Methods for fabricating residue-free contact openings
A two-step via cleaning process that removes metal polymer and oxide polymer residues from a via with substantially no damage to the via or underlying structures on a semiconductor substrate. The...
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7468106 |
Removal of niobium second phase particle deposits from pickled zirconium-niobium alloys
The present invention provides a method for removing niobium-rich second-phase-particle (SPP) deposits from zirconium-niobium alloy components. The method comprises washing a freshly pickled and...
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7468105 |
CMP cleaning composition with microbial inhibitor
An antimicrobial cleaning composition and methods for cleaning semiconductor substrates, particularly after chemical mechanical planarization or polishing, are provided. In one embodiment, the...
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7462248 |
Method and system for cleaning a photomask
A method for cleaning a photomask includes cleaning the photomask with a chemical cleaner, introducing a solution to the photomask, the solution is configured to react with residuals generated from...
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7462249 |
Surface treatment process for metal articles
A surface treatment process for a metal article includes the following steps. Firstly, a metal article, made of at least one of copper and an alloy thereof, is provided. Secondly, a surface of the...
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7448397 |
Apparatus for applying disparate etching solutions to interior and exterior surfaces
Described are methods, systems, and chemistries for cleaning various components of semiconductor process equipment. A method in accordance with one embodiment cleans articles with differently...
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7422639 |
Method of reducing water spotting and oxide growth on a semiconductor structure
The present invention relates to a method of cleaning and drying a semiconductor structure in a modified conventional gas etch/rinse or dryer vessel.
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7419768 |
Methods of fabricating integrated circuitry
The invention includes methods of fabricating integrated circuitry and semiconductor processing polymer residue removing solutions. In one implementation, a method of fabricating integrated...
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7416612 |
Process for removal of paint from plastic substrates
A process for removing paint from a plastic substrate that typically includes immersing and optionally agitating the painted plastic substrate in a first chemical fluid, removing the substrate from...
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7410544 |
Method for cleaning electroless process tank
A method for cleaning a metal plating tank is provided herein. In accordance with the method, the tank is exposed to a first acid ( 103 ), after which the tank is exposed to a second acid in the...
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7399365 |
Aqueous fluoride compositions for cleaning semiconductor devices
The present invention relates to dilute fluoride solutions and methods for cleaning plasma etch residue from semiconductor substrates including such dilute solutions. The compositions and methods...
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7396417 |
Method for removing laser scales
A degreasing method for descaling or removing laser scales from iron-containing metal part surface by treating the iron-containing metal part surfaces that is optionally tainted with laser scales...
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7384901 |
Process for cleaning aluminum and aluminum alloy surfaces with nitric acid and chromic acid-free compositions
A process for cleaning (e.g., desmutting) an aluminum surface, using compositions free of nitric acid and chromic acid and comprising, in one embodiment, an oxidant and at least one mineral acid...
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7377984 |
Method for cleaning a photomask
Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to...
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7377983 |
Prevention of deposits on ceramics
A method to prevent deposits on a ceramic surface comprising: (1) pretreating the surface by applying an aqueous solution containing from about 200 ppm to about 1000 ppm by weight of an amphoteric...
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7368019 |
Method for preventing elution of lead and/or nickel from copper alloy piping material such as valve or pipe joint and copper alloy piping material, and fluid for use in cleaning piping material
A technique is provided to precludes elution of the nickel by infallibly removing the nickel adhering to the inner surface of plumbing hardware, realize a treatment for efficient (treating...
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7364625 |
Rinsing processes and equipment
Described are methods of rinsing and processing devices such as semiconductor wafers wherein the device is rinsed with using a surface tension reducing agent; the method may include a subsequent...
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7351295 |
Cleaning and polishing rusted iron-containing surfaces
A method for cleaning and polishing a rusted iron-containing metal surface is disclosed. The metal surface is contacted with a composition containing fluorometallate anions of a Group IVB metal.
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7337788 |
Compositions useful for cleaning solvent-based paint from paint delivery installations
Uncured solvent-based paint may be flushed from a paint delivery installation using a substantially non-aqueous composition containing one or more organic solvents and a polymer having acid and/or...
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7329322 |
Exhaust apparatus, semiconductor device manufacturing system and method for manufacturing semiconductor device
In an exhaust pipe, a rotating shaft takeoff connection is provided so as to support a rotating shaft for rotating a switching valve fixed thereon. The rotating shaft extends to the outside of the...
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7314529 |
Substrate cleaning apparatus and substrate cleaning method
A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the...
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7306681 |
Method of cleaning a semiconductor substrate
A cleaning method and cleaning recipes are disclosed. The present invention relates to a method for cleaning a semiconductor substrate and cleaning recipes. The present invention utilizes a first...
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7264681 |
Cleaning apparatus and cleaning method
A cleaning apparatus and a cleaning method wherein cleaning and drying can be carried out in the same cleaning apparatus without the risk of reverse contamination of the cleaned object after the...
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7264679 |
Cleaning of chamber components
In a method of cleaning a surface of a substrate processing chamber component to remove process deposits, the component surface is cooled to a temperature below about −40° C. to fracture the...
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7261780 |
Ceramic susceptor and a method of cleaning the same
An object of the present invention is to provide a ceramic susceptor for considerably reducing the count number of metal atoms on the surface of a semiconductor after the semiconductor is treated,...
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7251959 |
Washwater neutralization system for glass forming line
A neutralization system for controlling the pH of the washwater used to clean and maintain polyacrylic bound glass forming equipment. The neutralization system introduces a base solution to a...
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7252718 |
Forming a passivating aluminum fluoride layer and removing same for use in semiconductor manufacture
A composition for the cleaning of residues from substrates can contain from about 0.01 percent by weight to about 5 percent by weight of one or more fluoride compounds, from about 20 percent by...
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7252096 |
Methods of simultaneously cleaning and disinfecting industrial water systems
On-Line and Off-Line methods of simultaneously cleaning and disinfecting an industrial water system are described and claimed. The methods involve the addition to the water of the industrial water...
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7250085 |
Method of wet cleaning a surface, especially of a material of the silicon-germanium type
Method of wet cleaning a surface of at least one material chosen from silicon, silicon-germanium alloys, A(III)/B(V)-type semiconductors and epitaxially grown crystalline materials, such as...
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7247208 |
Microelectronic cleaning compositions containing ammonia-free fluoride salts
Ammonia-free, HF-free cleaning compositions for cleaning photoresist and plasma ash residues from microelectronic substrates, and particularly to such cleaning compositions useful with and having...
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7244316 |
Methods of making gas sensors and sensors formed therefrom
A two-step chemical treatment method for chemically conditioning a sensor element comprising an electrolyte in ionic communication with a first electrode and a second electrode is described. The...
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7228865 |
FRAM capacitor stack clean
An embodiment of the invention is a method of cleaning a material stack 2 that has a hard mask top layer 8 . The method involves cleaning the material stack 2 with a fluorine-based plasma...
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7229506 |
Process for pickling martensitic or ferritic stainless steel
A process for pickling martensitic or ferritic stainless steel, preferably in the form of wires, tubes or rods, wherein the stainless steel is placed in contact with a pickling solution which has a...
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7226897 |
Water soluble barrier film conformal coating composition
A composition having a first nonionic nonylphenol surfactant having an HLB value ranging from about 10 to about 15, a second nonionic nonylphenol surfactant having an HLB value ranging from about...
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7226513 |
Silicon wafer cleaning method
This invention provides a cleaning method of silicon wafer for obtaining a silicon wafer in which micro roughness thereof under spatial frequency of 20/μm is 0.3 to 1.5 nm 3 in terms of power...
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7211156 |
Method for cleaning a ceramic member for use in a system for producing semiconductors, a cleaning agent and a combination of cleaning agents
The present invention provides a method for cleaning a ceramic member for use in a system for producing semiconductors. The method has the step of cleaning the ceramic member with an organic acid...
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