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7531047 Method of removing residue from a substrate after a DRIE process  
The present disclosure provides a method of cleaning a semiconductor substrate after a DRIE etch process, wherein residue from the DRIE process is removed without damaging the substrate. The...
7462248 Method and system for cleaning a photomask  
A method for cleaning a photomask includes cleaning the photomask with a chemical cleaner, introducing a solution to the photomask, the solution is configured to react with residuals generated from...
7410544 Method for cleaning electroless process tank  
A method for cleaning a metal plating tank is provided herein. In accordance with the method, the tank is exposed to a first acid ( 103 ), after which the tank is exposed to a second acid in the...
7402212 Apparatus and method for cleaning a glass substrate before photoresist coating  
A method for cleaning a glass substrate before photoresist coating, which method can remove oxide compounds and organic residues from the surface of a metal layer of the glass substrate, comprises...
7399366 Product and processes for preventing the occurrence of rust stains resulting from irrigation systems using water containing iron ions and for cleaning off rust stains resulting from using said irrigation systems  
Several products and processes for preventing the occurrence of rust stains resulting from irrigation systems using water having iron ions, such as well water, and for cleaning off rust stains...
7377984 Method for cleaning a photomask  
Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to...
7368019 Method for preventing elution of lead and/or nickel from copper alloy piping material such as valve or pipe joint and copper alloy piping material, and fluid for use in cleaning piping material  
A technique is provided to precludes elution of the nickel by infallibly removing the nickel adhering to the inner surface of plumbing hardware, realize a treatment for efficient (treating...
7329322 Exhaust apparatus, semiconductor device manufacturing system and method for manufacturing semiconductor device  
In an exhaust pipe, a rotating shaft takeoff connection is provided so as to support a rotating shaft for rotating a switching valve fixed thereon. The rotating shaft extends to the outside of the...
7275550 Apparatus and method for cleaning and pressure testing tubular structures  
An apparatus and method for cleaning and pressure testing tube structures comprising a cleaning fluid supply pump and a pressurization pump alternately in fluid communication with a feed header...
7264681 Cleaning apparatus and cleaning method  
A cleaning apparatus and a cleaning method wherein cleaning and drying can be carried out in the same cleaning apparatus without the risk of reverse contamination of the cleaned object after the...
7252717 Method and apparatus for cleaning machines  
A method of cleaning a lubrication system of a machine includes removing existing lubricant and circulating a cleaning fluid through the lubrication system. After the cleaning fluid has been...
7250085 Method of wet cleaning a surface, especially of a material of the silicon-germanium type  
Method of wet cleaning a surface of at least one material chosen from silicon, silicon-germanium alloys, A(III)/B(V)-type semiconductors and epitaxially grown crystalline materials, such as...
7229506 Process for pickling martensitic or ferritic stainless steel  
A process for pickling martensitic or ferritic stainless steel, preferably in the form of wires, tubes or rods, wherein the stainless steel is placed in contact with a pickling solution which has a...
7228865 FRAM capacitor stack clean  
An embodiment of the invention is a method of cleaning a material stack 2 that has a hard mask top layer 8 . The method involves cleaning the material stack 2 with a fluorine-based plasma...
7204890 Process for removing fine particulate soil from hard surfaces  
Many prior art processes for cleaning predominantly organic hard surfaces have been found to be considerably less effective in removing very fine particles on such surfaces than are the best...
7192489 Method for polymer residue removal following metal etching  
A method for removing polymer containing residues from a semiconductor wafer including metal containing features including providing a semiconductor wafer having a process surface including metal...
7186301 Device and method for cleaning photomask  
Disclosed herein is a device and a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat...
7160396 Washing method  
A washing method has a nonaqueous washing process of washing an object to be washed using a nonaqueous solution, an intermediate washing process of washing the object to be washed using a solution...
7156927 Transition flow treatment process and apparatus  
A method is provided for treating an object. In this method, a treating chemical is introduced to a bath under conditions effective to at least partially envelop the object to be treated in eddy...
7067016 Chemically assisted mechanical cleaning of MRAM structures  
A method for post-etch cleaning of a substrate with MRAM structures and MJT structures and materials is disclosed. The method includes inserting the substrate into a first brush box configured for...
7052553 Wet cleaning of electrostatic chucks  
A non-destructive and simple method for cleaning a new or used electrostatic chuck comprises a wet cleaning process, which removes contaminants deposited on a surface of the electrostatic chuck.
6936112 Heat exchanger cleaning process  
Disclosed is a novel process for cleaning and restoring the operating efficiency of organic liquid chemical exchangers in a safe and effective manner and in a very short period of time, without a...
6893509 Method of cleaning vessels in a refinery  
Disclosed is a novel process for interior cleaning and by cleaning, removing noxious gas and/or restoring the operating efficiency of organically contaminated hydrocarbon processing equipment in a...
6878215 Chemical removal of a metal oxide coating from a superalloy article  
A method of removing a virgin metal oxide coating from the surface of a superalloy gas turbine engine component. The component bearing the applied metal oxide coating is contacted with an aqueous...
6872263 Cleaning system and method for dynamic devices in a refinery  
Disclosed is a novel process for interior cleaning and by cleaning, removing noxious gas and/or restoring the operating efficiency of organically contaminated hydrocarbon processing dynamic devices...
6855210 Composition and method for stripping coatings from substrates  
A composition and method for stripping and cleaning organic coatings from substrates, comprising a solution of high-boiling alcohols, preferably polyglycols, a surfactant, preferably a nonylphenol...
6843856 Cleaning agent and method for cleaning ultrafiltration membranes in electrophoretic dip coating installations  
Aqueous cleaning agent and its use in a process for cleaning ultrafiltration membranes in ultrafiltration units of electro-dipcoating plants, which cleaning agent contains electro-dipcoating...
6834656 Plasma process for removing polymer and residues from substrates  
A process for removing polymers formed during etching and etch residues from a semiconductor substrate by exposing the substrate to plasmas of neutral chemistry. The plasma generates atomic...
6833032 Automatic deliming process  
An automatic deliming process for a steam oven cooker is described. The process initiates a deliming procedure after a predetermined time of normal operation, which period of time is determined by...
6821352 Compositions for removing etching residue and use thereof  
A composition for removing etching residue and a method using same are disclosed herein. In one aspect, there is provided a method for removing etching residue from a substrate comprising:...
6814816 Indicator kit  
The invention provides method for the evaluation of washing or cleaning techniques on a substrate comprising: i. applying a selective indicator system on the substrate to be evaluated; ii. washing...
6797074 Wafer edge cleaning method and apparatus  
A method and apparatus is provided for removing material from the edge of a disk. In one embodiment, the edge of the disk is contacted with etchant via an etchant containing swab or trough (which...
6793740 Method for cleaning pressurized containers containing moisture sensitive chemicals  
The present invention relates to a method for cleaning a pressurized container having at least one chemical contained therein. The pressurized container may be any type of container able to store...
6770150 Process for removing deposits from enclosed chambers  
Alkaline and acid cleaning solutions ( 180, 182 ), are used sequentially for removing organic and inorganic residues, respectively, from the chamber. The two cleaning solutions are stored in...
6706121 Device and method for the treatment of semiconductor wafers  
In a method of treating substrates a treatment fluid is fed into a collection vessel after treatment, at least a portion of the treatment fluid is withdrawn from the collection vessel and returned...
6660100 Method for removing paint from plastic parts  
In a process for removing the paint from plastic components provided with coats of paint, the plastic components are first crushed to a bulk material size of the crushed plastic pieces. The plastic...
6648983 Process of cleaning enamel surfaces  
A process of cleaning an enamel surface with a liquid acidic composition comprising an enamel safe buffering system, wherein said buffering system comprises a salt having an anion selected from the...
6638365 Method for obtaining clean silicon surfaces for semiconductor manufacturing  
A method of preparing a silicon surface for a subsequent processing said such as thermal oxidation, or metal silicide formation, via use of a novel wet chemical clean procedure, has been developed....
6635118 Aqueous cleaning of polymer apply equipment  
This invention relates to water-based alkaline cleaning solutions and their use as an environmentally safer replacement of organic solvents to remove photoresist, polyimide residue and other...
6632291 Methods and compositions for cleaning, rinsing, and antimicrobial treatment of medical equipment  
The present invention relates to methods for cleaning, rinsing, and/or antimicrobial treatment of medical carts, medical cages, and other medical instruments, devices or equipment. The method for...
6627001 Method for cleaning a semiconductor wafer  
A semiconductor wafer cleaning method is provided. After cleaning the wafer with a chemical cleaning solution, the wafer is placed in a cleansing tank that fills with deionized water. A neutralizer...
6623564 Method of recovering synthetic substrates  
The present invention relates to a method of removing a layer of material from a synthetic resin or an organic acid ester of cellulose comprising: washing the layer from the substrate with an...
6599461 Method for producing nonslip floor coverings  
The invention relates to a method of manufacturing non-slip floor coverings made of mineral materials, such as, for example, natural stone, fine stoneware, artificial stone or ceramics. This method...
6582524 Method for washing wafer and apparatus used therefor  
A method including the consecutive steps of: dipping a wafer in a washing solution in a washing chamber; replacing the washing solution by a first chemical solution in the washing chamber receiving...
6579380 Method and apparatus for cleaning molds used in the glass fabrication industry  
A method of removing graphite from metal molds used in the glass fabrication industry, the method including placing a metal glass-fabricating mold with graphite bonded thereto in a chamber,...
6562145 Method of cleaning a surface with a system having a two compartment container for neutralizing used cleaning solutions  
A cleaning unit (A) includes a movable cart ( 20 ) which carries a cleaning system for cleaning baked-on residues from walls ( 10 ) of a sterilizer chamber ( 12 ). Alkaline and acid cleaning...
6550487 Apparatus for removing deposits from enclosed chambers  
A cleaning unit (A) includes a movable cart ( 20 ) which carries a cleaning system for cleaning baked-on residues from walls ( 10 ) of a sterilizer chamber ( 12 ). The cleaning system includes a...
6530381 Process for the wet-chemical surface treatment of a semiconductor wafer  
A process for the wet-chemical surface treatment of a semiconductor wafer following a mechanical surface treatment, in particular following a mechanical surface treatment in a lapping machine,...
6500388 Automatically analyzing apparatus  
An automatically analyzing apparatus includes a plurality of reaction containers for reacting a sample with a reagent, and a reaction container washing unit for washing the reaction containers...
6468362 Method and apparatus for cleaning/drying hydrophobic wafers  
A method and an apparatus that uses a surfactant to clean a hydrophobic wafer is provided. In a first aspect, the method may clean and dry a wafer without applying pure DI water to the wafer. In a...
Matches 1 - 50 out of 238 1 2 3 4 5 >