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7618495 |
Method for pickling a work string using dispersed solvent-in-acid fluid design
A method for cleaning a work string which may have been used to inject drilling muds, cement slurries, cement displacement materials and the like into a well where the work strong may contain...
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7614407 |
Prime coat, indicia and clear coat removal process for a golf ball
A process for removing the coating layers from finished golf balls is disclosed herein. The process involves soaking the golf balls in a removal solution and then subjecting the golf balls to...
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7611588 |
Methods and compositions for removing metal oxides
The invention relates to methods and compositions for removing metal oxide soils from surfaces. The compositions include an anionic surfactant and a pH adjuster at an acidic pH. In one embodiment,...
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7604702 |
Method, apparatus, and system for bi-solvent based cleaning of precision components
A bi-solvent cleaning system for cleaning precision components without the use of VOC solvents. The bi-solvent cleaning system provides for is a two mode operation for cleaning and rinsing...
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7601227 |
High purification method of jig for semiconductor heat treatment
A method for achieving high purity in a jig for semiconductor heat treatment includes subjecting a semiconductor heat treatment jig made of a substrate having a surface covered with a silicon...
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7594971 |
Method of cleaning and sterilizing medical instruments
A novel method of cleaning and disinfecting organically contaminated articles such as, for instance, medical instruments, wherein the cleaning cycle consists of two sections divided by removal and...
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7592415 |
Infrared solvent stripping process
A process for stripping chemically bonded spinning solvent from a solution-spun nonwoven web comprising the steps of providing a nonwoven web comprising solvent-laden polymeric fibers having...
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7588644 |
Method and apparatus for cleaning pipeline pigs
A method of cleaning pipeline pigs of a material that is to be recycled includes providing a vessel having an interior. A manifold is placed within the vessel interior, the manifold having a...
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7588036 |
Chamber clean method using remote and in situ plasma cleaning systems
A process for removing unwanted deposition build-up from one or more interior surfaces of a substrate processing chamber. According to one embodiment the process comprises performing a substrate...
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7578890 |
Method for removing contaminants from silicon wafer surface
Taught is a method of removal surface contaminants, including organic contaminants, metal ions and solid particles, from silicon wafer surface comprising the following steps: (a) submerging the...
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7578889 |
Methodology for cleaning of surface metal contamination from electrode assemblies
Systematic and effective methodology to clean capacitively coupled plasma reactor electrodes and reduce surface roughness so that the cleaned electrodes meet surface contamination specifications...
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7578888 |
Method for treating laser-structured plastic surfaces
The present invention relates to a method for treating plastic substrates structured by means of a laser or generation of seed structures on the surface that are suitable for subsequent...
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7578887 |
Apparatus for and method of processing substrate
An apparatus for processing a substrate through successive steps including spin-drying the substrate with a single processing facility while preventing the substrate from being contaminated by a...
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7566347 |
Cleaning process utilizing an organic solvent and a pressurized fluid solvent
A cleaning method and system that utilize an organic cleaning solvent and pressurized fluid solvent is disclosed. The method and system have no conventional evaporative hot air drying cycle....
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7556697 |
System and method for carrying out liquid and subsequent drying treatments on one or more wafers
Systems for processing microelectronic substrates in a process chamber that incorporate improved technology for transitioning from a wet process to a dry process (especially transitioning from...
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7556048 |
In-situ removal of surface impurities prior to arsenic-doped polysilicon deposition in the fabrication of a heterojunction bipolar transistor
A process for cleaning the silicon surface of a semiconductor device material layer. The surface undergoes a pre-clean process followed by exposure to a nitrogen-containing gas. A polysilicon layer...
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7550090 |
Oxygen plasma clean to remove carbon species deposited on a glass dome surface
A method for in-situ cleaning of a dielectric dome surface having been used in pre-clean processes is provided. Carbon containing deposits are removed by providing a plasma of one or more oxidizing...
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7547364 |
Spray device for cooling cattle in sheds and method of using the same
A sprayer device including a generator for generating an air stream having a predetermined velocity and a nozzle unit for the discharge of liquid therefrom, whereby to produce a mist stream capable...
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7544254 |
System and method for cleaning an ion implanter
This disclosure provides an approach for cleaning an ion implanter. In this disclosure, there is a vacuum device having an in-take port adapted to receive a contaminant removing hose. The vacuum...
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7540926 |
Method of cleaning contaminated surfaces
A method for cleaning contaminated surfaces of surgical waste management equipment. The method includes rinsing surfaces of the equipment with water to remove water soluble contaminants and waste...
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7534324 |
Felt and equipment surface conditioner
Deposition of contamination by deposits of resinous material on paper making equipment is undesirable. This invention prevents or retards such contamination by treating the equipment, especially...
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7534308 |
Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
A cleaning system that utilizes an organic cleaning solvent and pressurized fluid solvent is disclosed. The system has no conventional evaporative hot air drying cycle. Instead, the system utilizes...
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7534306 |
Steam humidifier and method
The steam humidifier fed with a premix of natural gas and forced air under low pressure (less than 1 psi) includes a main frame, a movable lower frame, a two part evaporation canister, releasably...
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7531047 |
Method of removing residue from a substrate after a DRIE process
The present disclosure provides a method of cleaning a semiconductor substrate after a DRIE etch process, wherein residue from the DRIE process is removed without damaging the substrate. The...
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7531045 |
Method for removing haze in a photo mask
An apparatus for removing haze in a photo mask includes sealed chamber having a bake module disposed therein to support a photo mask, a reactant gas feed line to feed a reactant gas into the...
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7530359 |
Plasma treatment system and cleaning method of the same
A plasma treatment apparatus has a reaction vessel ( 11 ) provided with a top electrode ( 13 ) and a bottom electrode ( 14 ), and the first electrode is supplied with a VHF band high frequency...
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7527698 |
Method and apparatus for removing a liquid from a surface of a substrate
A method and apparatus for removing a first liquid from a surface of a substrate is provided. A second liquid is supplied to at least part of a surface of a substrate having a rotary movement. The...
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7524383 |
Method and system for passivating a processing chamber
A method and system for passivating a processing chamber is provided, whereby the processing chamber is exposed to one or more cycles of citric acid, or nitric acid. The processing chamber is...
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7520939 |
Integrated bevel clean chamber
A method and apparatus for cleaning the bevel of a semiconductor substrate. The apparatus generally includes a cell body having upstanding walls and a fluid drain basin, a rotatable vacuum chuck...
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7514493 |
Strippable containment and decontamination coating composition and method of use
A method for containing at least a portion of radioisotopes, radionuclides, heavy metal or combination thereof contaminating a substrate wherein a containment composition is applied to the...
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7514046 |
Methods and systems for processing microscale devices for reuse
This invention provides methods and systems for flushing, washing, and priming microscale devices for reuse. Washing and priming methods include flowing solutions from a manifold to flush wells and...
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7513260 |
In-situ continuous coke deposit removal by catalytic steam gasification
A coke removal system removes coke deposits from the walls of a high temperature passage in which hydrocarbon fuel is present. The system includes a carbon-steam gasification catalyst and a water...
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7507697 |
Method for the oxidative cleaning of food processing equipment
A method for cleaning the surfaces of food processing equipment that are heavily soiled with food processing byproducts, such as grease, starch and proteinaceous materials. The cleaning method...
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7507300 |
Method and apparatus for cleaning a photoactive and/or hydrophilic surface
A method of cleaning a photoactive and/or hydrophilic surface includes contacting the surface with conditioned water and optionally a cleaning agent solution. A device for cleaning a photoactive...
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7507299 |
Apparatuses, systems and processes for surface cleaning
Described and claimed are apparatuses and systems for surface cleaning comprising a pump and an applicator connected to the pump through which one or more cleaning agents can be applied to the...
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7507297 |
Cleaning method and cleaning apparatus
A cleaning effect is improved by cleaning a component that has a recess structure by using a cleaning medium of a liquefied gas or a supercritical fluid. By the cleaning method of removing adhering...
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7503983 |
Methods of proximity head brushing
A wafer preparation method is provided for producing a wet region and then a corresponding dry region on the wafer. Brushing produces the wet region on the wafer. As the brushing moves in a...
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7494597 |
Method and apparatus for etching disk-like member
Disclosed are a method and apparatus for etching disk-shaped members, especially a method and apparatus for etching semiconductor wafers. In a method wherein wafers ( 30 ) are rotated and etched in...
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7494550 |
Fluid delivery ring and methods for making and implementing the same
A method for rinsing a semiconductor wafer in a module utilizing a fluid delivery ring is provided. The method includes providing a process bowl having a generally circular shape bottom wall, a...
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7494549 |
Substrate treatment apparatus and substrate treatment method
A substrate treatment apparatus for removing an unnecessary substance from a surface of a substrate. The apparatus is provided with: an oxidation liquid supply mechanism for supplying an oxidation...
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7493904 |
Liquid processing apparatus and liquid processing method
A liquid processing apparatus comprises a liquid processing section for applying a liquid processing to wafers W, a carrier delivery section for delivering the carrier housing the wafers W, a...
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7479198 |
Methods for forming nanofiber adhesive structures
A method for forming a nanofiber adhesive structure includes, in one embodiment, providing a plurality of generally parallel fiber bundles secured in a first binder and in which each of the fiber...
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7470767 |
Preparation of ultrapure polymeric articles
Ultrapure olefinic polymeric articles of manufacture can be prepared by a process comprising: providing olefinic polymeric material containing impurities, subjecting the olefinic polymeric material...
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7470330 |
Method for dissolving oilfield scale
A method of removing metal scale from surfaces that includes contacting the surfaces with a first aqueous solution of a chelating agent, allowing the chelating agent to dissolve the metal scale,...
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7468106 |
Removal of niobium second phase particle deposits from pickled zirconium-niobium alloys
The present invention provides a method for removing niobium-rich second-phase-particle (SPP) deposits from zirconium-niobium alloy components. The method comprises washing a freshly pickled and...
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7468105 |
CMP cleaning composition with microbial inhibitor
An antimicrobial cleaning composition and methods for cleaning semiconductor substrates, particularly after chemical mechanical planarization or polishing, are provided. In one embodiment, the...
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7465360 |
Methods for removing a dispersed lubricious coating from a substrate
The present invention relates generally to methods of removal of a lubricious coating. In more specific aspects, the invention relates to methods of removal of aqueous polymers comprising...
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7462249 |
Surface treatment process for metal articles
A surface treatment process for a metal article includes the following steps. Firstly, a metal article, made of at least one of copper and an alloy thereof, is provided. Secondly, a surface of the...
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7462248 |
Method and system for cleaning a photomask
A method for cleaning a photomask includes cleaning the photomask with a chemical cleaner, introducing a solution to the photomask, the solution is configured to react with residuals generated from...
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7459029 |
Cleaning method, cleaning apparatus and electro optical device
A cleaning apparatus of organic substances attached to a vapor-deposition mask for low molecular weight organic EL devices comprises a first stage for treating a vapor-deposition mask with a...
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