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7360546 |
Cleaning apparatus for semiconductor wafer
A cleaning apparatus for a semiconductor wafer comprising: a double container including an inner container with an upper opening for accommodating a substrate to be cleaned and an outer container...
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7306680 |
Method of cleaning by removing particles from surfaces, a cleaning apparatus and a lithographic projection apparatus
A lithographic mask is placed in a chamber which is then sealed. The gas pressure in the chamber is reduced to dislodge contaminant particles on the mask surface.
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7293567 |
Application of acoustic and vibrational energy for fabricating bumped IC die and assembly of PCA's
A method and apparatus are disclosed for improving a screen printing process by applying vibrational energy to assist in the print release, cleaning, and drying processes. The vibrational energy or...
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7282099 |
Dense phase processing fluids for microelectronic component manufacture
Method for processing an article by contacting the article with a dense fluid. The article is introduced into a sealable processing chamber and the processing chamber is sealed. A dense fluid is...
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7279050 |
One-piece bottom edge wipe sponge for cleaning a photoreceptor drum
A one-piece sponge cleans and removes coating material from the bottom edge, inside and outside surface of a photoreceptor drum. The one-piece sponge has an inner sponge section and an outer sponge...
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7264680 |
Process and apparatus for treating a workpiece using ozone
A method for cleaning a semiconductor workpiece having a metal layer in a processing chamber includes the steps of introducing a liquid solution including dissolved carbon dioxide onto the...
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7258747 |
Multi-motion stainbrush
A method of using an electric stainbrush for cleaning inanimate surfaces is provided. The electric stainbrush includes a handle having a motor disposed therein, a head having a longitudinal axis,...
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7255749 |
Substrate cleaning method and substrate cleaning apparatus
In a cleaning treatment of a substrate using an aqueous solution of ammonium fluoride or a mixture of an aqueous solution of ammonium fluoride and hydrofluoric acid as a cleaning liquid, the...
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7250086 |
Method of using a solid rinse additive dispenser for dispensing a use solution in a dishwashing machine
A preferred embodiment method for dispensing a use solution from a solid product into a dishwashing machine includes placing a solid product in a dispenser. The product dispenser ( 10 ) for...
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7235141 |
Lift-off method and chemical liquid tank
A lift-off procedure is provided which enables prevention of damage to a wiring pattern caused by contact of a metal being peeled off from a wafer with a wiring pattern at a time of lift-off...
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7226512 |
Load lock system for supercritical fluid cleaning
A substrate is transferred from an environment at about vacuum into a load lock through a first door. The substrate is then sealed within the load lock. The pressure within the load lock is raised...
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7208049 |
Process solutions containing surfactants used as post-chemical mechanical planarization treatment
Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of...
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7195021 |
In-situ cleaning of light source collector optics
A method for cleaning optics in a chamber. The method can include introducing a first etchant into a chamber that encloses an optical component and a source of electromagnetic radiation that is...
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7172975 |
Process for the wet chemical treatment of semiconductor wafers
A process for the wet chemical treatment of semiconductor wafers, in which the semiconductor wafers are treated with treatment liquids, has the semiconductor wafers firstly treated with an aqueous...
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7163588 |
Processing a workpiece using water, a base, and ozone
Contaminants such as photoresist are quickly removed from a wafer having metal features, using water, ozone and a base such as ammonium hydroxide. Processing is performed at room temperature to...
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7141124 |
Processes and compositions for use in garment restoration
The present invention relates to process and methods, as well as compositions and systems for use in laundering smoke-damaged garments. In particular, the present invention utilizes ozonated water...
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7077915 |
Method of and apparatus for washing photomask and washing solution for photomask
Organic matter and metal impurities present on the surface of a photomask are removed. Foreign matter still adhering to the surface of the photomask is removed with H 2 gas dissolved water. The...
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7055534 |
Golf grip cleaning wipe
Articles, solutions, and methods for enhancing the grasping of and cleaning athletic equipment grips, in particular a golf club grip. These articles, solutions, and methods preferably comprise a...
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7052375 |
Method of making carrier head backing plate having low-friction coating
Planarizing machines, carrier heads for planarizing machines and methods for planarizing microelectronic-device substrate assemblies in mechanical or chemical-mechanical planarizing processes. In...
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7045022 |
Removal of adherent molten metal from surfaces
The present invention provides a method and process for removing adherent molten metal from a surface by applying a non-wetting agent for the metal to the surface or to the adherent molten metal....
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7037380 |
Method for cleaning chamber of deposition apparatus for organic EL device production
A compound such as Alq 3 accumulated on the inner surface of a chamber at the time of organic EL device production and wasted is recovered and recycled, whereby the production cost is reduced. The...
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7033068 |
Substrate processing apparatus for processing substrates using dense phase gas and sonic waves
Embodiments of the invention are directed to substrate processing apparatuses and methods for processing substrates. In one embodiment, a substrate processing apparatus includes a processing...
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7017594 |
Atmospheric pressure non-thermal plasma device to clean and sterilize the surfaces of probes, cannulas, pin tools, pipettes and spray heads
The present invention relates to methods and apparatuses for the use of atmospheric pressure non-thermal plasma to clean and sterilize the surfaces of liquid handling devices.
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7005010 |
Multi-process system
A system for processing a workpiece includes an inner chamber pivotably supported within an outer chamber. The inner chamber has an opening to allow liquid to drain out. A motor pivots the inner...
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7001470 |
Cleaning process for photomasks
A photomask provided with a light-shielding coating on a surface of a glass substrate is cleaned with O 3 gas solved water to eliminate organic substances adhered on a surface of the photomask (S...
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6939836 |
Surfactant system
The invention relates to an aqueous composition comprising in combination an alkyl pyrrolidone, such as a C8-C18 linear alkyl pyrrolidone, and an alkyl polysaccharide such as an alkyl...
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6939408 |
Method for surface preparation of workpieces utilizing fluid separation techniques
A method for preparing a workpiece surface utilizing two more fluids of differing density and miscibility which create one or more fluid interfaces wherein the fluids are chosen such that the...
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6926012 |
Method for supercritical processing of multiple workpieces
An apparatus for supercritical processing of multiple workpieces comprises a transfer module, first and second supercritical processing modules, and a robot. The transfer module includes an...
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6913027 |
Resist stripping method and apparatus
A method and an apparatus capable of stripping resist efficiently in a short amount of time. A stripping solution under high pressure is jetted from a nozzle to a rotating wafer. The resist layer...
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6911097 |
Photoresist stripper using nitrogen bubbler
Provided is a process and apparatus characterized by a gas distribution plate in which a gas supply manifold directs gas bubbles from the bottom of a process tank upward and between wafers...
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6907890 |
Capillary drying of substrates
An apparatus and method for drying substrates. The inventive apparatus comprises: an object support member for supporting at least one substrate in a process tank having one or more support...
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6899767 |
Method of cleaning processing chamber of semiconductor processing apparatus
A method of cleaning the interior of a processing chamber first performs a halogenation treatment by supplying a treatment gas containing a halogenating gas into the processing chamber and heating...
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6875285 |
System and method for dampening high pressure impact on porous materials
System and method for reducing damage to a semiconductor substrate when using cleaning fluids at elevated pressures to clean the semiconductor substrates. A preferred embodiment comprises applying...
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6869487 |
Process and apparatus for treating a workpiece such as a semiconductor wafer
A novel chemistry, system and application technique reduces contamination of semiconductor wafers and similar substrates and enhances and expedites processing. A stream of liquid chemical is...
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6858089 |
Apparatus and method for semiconductor wafer cleaning
An improved method for removing contaminant particles from a surface of a semiconductor wafer includes forming a sacrificial film on the surface of the wafer and then removing the sacrificial film...
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6845779 |
Edge gripping device for handling a set of semiconductor wafers in an immersion processing system
A microelectronic substrate handling device comprising first and second support structures spaced from each other, the first support structure having a series of upper teeth defining a series of...
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6824622 |
Cleaner and method for removing fluid from an object
A cleaner and method for removing excess residual cleaning fluid from an object, particularly a semiconductor wafer, before or as the wafer is removed from a cleaning chamber of a CMP cleaner, for...
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6821352 |
Compositions for removing etching residue and use thereof
A composition for removing etching residue and a method using same are disclosed herein. In one aspect, there is provided a method for removing etching residue from a substrate comprising:...
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6799586 |
Substrate processing method
An outer covering wall ( 26 ) and an inner covering wall ( 27 ), which are capable of surrounding a rotor ( 24 ), can be horizontally moved. A wafer carrier waiting portion ( 30 ) is disposed right...
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6799585 |
Use of solutions containing enzymes for cleaning fermentation or storage tanks
A process is presented for cleaning fermentation or storage tanks with an enzyme-containing formulation containing one or more laccases, peroxidases, oxireductases, transferases, isomerases,...
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6799583 |
Methods for cleaning microelectronic substrates using ultradilute cleaning liquids
A method of cleaning a surface of an article using cleaning liquids in combination with acoustic energy. Preferably, an ultradilute concentration of a cleaning enhancement substance, such as...
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6782898 |
Ring-shaped part washing method and washing jig used in the method
In a ring shaped part washing method an ultrasonic vibration plate 33 is disposed in a washing tank 23 filled with a washing fluid 31 , and ultrasonic waves generated by the ultrasonic...
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6776853 |
Cleaning method and method for manufacturing liquid crystal device
In a cleaning apparatus 500 , as a pre-cleaning step, cleaning is performed in a first and a second backup cleaning bath 602 and 603 using a hydrocarbon-based cleaning liquid composed of a...
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6753306 |
Germicidal and disinfectant composition
A germicide and disinfectant composition contains detergent and at least two enzymes adapted to cause lysis in glycoprotein in infectious agents. These germicidal and disinfectant compositions are...
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6752192 |
Label release and separation system
A system for releasing and separating labels from containers has a releaser for mixing the containers with introduced fluids and for providing the containers with a sufficient retention time and...
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6746543 |
Apparatus for and method of cleaning objects to be processed
A cleaning apparatus and a cleaning method for cleaning a object are provided. In the cleaning apparatus, a drying chamber 42 and a cleaning bath 41 are separated from each other up and down,...
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6736148 |
Automated semiconductor processing system
An automated semiconductor processing system has an indexer bay perpendicularly aligned with a process bay within a clean air enclosure. An indexer in the indexer bay provides stocking or storage...
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6732749 |
Particle barrier drain
A system and method for reducing the amount of contaminants that come into contact with wafer substrates during the production of integrated circuit devices. The system allows for uniform overflow...
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6726777 |
Cleaning method and apparatus using fluid spraying
Cleaning fluid is sprayed upwards from under a substantially horizontally-held object to be cleaned for cleaning the underside of the object. At this time, an accelerating fluid accelerates the...
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6701941 |
Method for treating the surface of a workpiece
An apparatus for supplying a mixture of a treatment liquid and ozone for treatment of a surface of a workpiece, and a corresponding method are set forth. The preferred embodiment of the apparatus...
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