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8136189 |
Method for controlling washing course of washing machine
A method for controlling operation of a washing machine is provided. The method may include performing heated washing courses at different temperatures while also selectively controlling an...
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8133327 |
Substrate processing method, storage medium and substrate processing apparatus
Provided is a substrate processing method that prevents generation of watermarks on a substrate and can be performed at a low cost. The method controls the ambient humidity around the substrate...
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8097088 |
Methods for processing substrates in a dual chamber processing system having shared resources
Methods for processing substrates in dual chamber processing systems comprising first and second process chambers that share resources may include performing a first internal chamber clean in each...
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8071528 |
Cleaning compositions with water insoluble conversion agents and methods of making and using them
The present invention relates to cleaning compositions comprising conversion agents and methods of using them. The conversion agents of the present invention comprise water insoluble compounds such...
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8038803 |
Method of descaling metallic devices
Methods are provided for descaling metallic components devices such as stents. The devices or components are cleaned under ultrasound in a cleaning solution of ammonium hydrogen fluoride at a...
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8025737 |
Substrate cleaning apparatus and method employed therein
A substrate cleaning apparatus for cleaning a front-side clean target surface 1a and a back-side clean target surface 1b of a edge portion of a substrate 1 by wiping surfaces 12a, 12b of a cleaning...
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8016948 |
Method of removing contaminants from a coating surface comprising an oxide or fluoride of a group IIIB metal
Disclosed herein is a cleaning method useful in removing contaminants from a surface of a coating which comprises an oxide or fluoride of a Group III B metal. Typically the coating overlies an...
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8007594 |
Method for manufacturing semiconductor device
A method for manufacturing a semiconductor device includes the step of conducting a cleaning process for a wafer formed with copper wiring lines to remove contaminations produced on a back surface...
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8002897 |
At-home integrated cleaning and disinfection system and method for dental hardware
An at-home integrated cleaning and disinfection system for dental hardware, for consumer use includes a compact and portable base unit sized for at-home use by a consumer, the base unit including a...
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7998406 |
Multiple enzyme cleaner for surgical instruments and endoscopes
The liquid composition is based on surfactants and enzymes, and is particularly useful for manual cleaning of instruments. In manual and ultrasonic application the composition in use concentration...
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7977298 |
Laundry articles
An article comprising a first pouch made of a water-soluble material containing a first solid and/or liquid composition and a second pouch made of a water-soluble material containing a second solid...
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7962976 |
Method of treating a stain or soiled area of a fabric using a laundry stain and soil pretreatment sheet
A laundry stain and soil pretreatment sheet including a water soluble or water dispersible carrier layer, preferably polyvinyl alcohol, a removable separator layer, and a layer of cleaning agent...
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7955440 |
Method for cleaning silicon wafer and apparatus for cleaning the silicon wafer
After a water film is formed on a wafer front surface in a chamber, the water film is supplied sequentially with an oxidizing component of an oxidation gas, an organic acid component of an organic...
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7947130 |
Troika acid semiconductor cleaning compositions and methods of use
Semiconductor processing compositions for use with silicon wafers having an insulating layers and metallization layers on the wafers comprising water and one or more Troika acids which is also...
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7931877 |
Needleless hub disinfection device
A device for disinfecting a portion of an implement such as a needleless hub or injection port. The device includes a body shaped to engage the implement with the portion to be disinfected exposed....
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7905963 |
Apparatus and method for washing polycrystalline silicon
Disclosed is a polycrystalline silicon washing apparatus that sequentially immerses polycrystalline silicon into a plurality of acid baths each of which is filled with an acid to wash the...
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7858029 |
Multiple enzyme cleaner for surgical instruments and endoscopes
The liquid composition is based on surfactants and enzymes, and is particularly useful for manual cleaning of instruments. In manual and ultrasonic application the composition in use concentration...
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7846257 |
Method for cleaning substrate processing apparatus, substrate processing apparatus, program and recording medium having program recorded therein
The substrate processing apparatus includes a plurality of processing chambers. A given processing chamber is cleaned by first executing first processing during which voltage application control is...
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7846259 |
Parts washing apparatus with centrifugal filter
A parts washing apparatus comprising a basin having a drain, a reservoir located below the drain, and a solvent filtering and recirculating system. This system comprises a centrifuge filter...
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7837804 |
Substrate cleaning method, substrate cleaning equipment, computer program, and program recording medium
In a dry process after a cleaning process using a cleaning-liquid nozzle and a rinse process using a side rinse nozzle are performed on a wafer W, the wafer W is turned, feeding of pure water to a...
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7793670 |
Fixture for optical elements for use in cleaning processes
A fixture for optical elements includes a washing bar, a holder and a vacuum pump. The washing bar includes an inner channel and a connecting portion in communication with the inner channel. A hole...
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7736439 |
Method for cleaning a polysilicon fraction
The present invention relates to a method for cleaning polycrystalline silicon fragments to a metal content of <100 ppbw, wherein a polysilicon fraction is added to an aqueous cleaning solution...
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7678199 |
Substrate cleaning method
A method is provided for reducing the amount of film fragments discharged into a processing liquid circulation system during removal of films from wafers, thereby reducing the frequency of filter...
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7669519 |
Spray head
A spray head for use with or in combination with a beverage making apparatus. The spray head receives liquid from a liquid dispensing path of the beverage making apparatus and distributes liquid...
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7670438 |
Method of removing particles from wafer
A method of removing particles from a wafer is provided. The method is adopted after a process for removing unreactive metal of a salicide process or after a salicide process and having oxide...
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7628866 |
Method of cleaning wafer after etching process
A method of cleaning a wafer after an etching process is provided. A substrate having an etching stop layer, a dielectric layer, a patterned metal hard mask sequentially formed thereon is provided....
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7614407 |
Prime coat, indicia and clear coat removal process for a golf ball
A process for removing the coating layers from finished golf balls is disclosed herein. The process involves soaking the golf balls in a removal solution and then subjecting the golf balls to...
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7572342 |
Method and apparatus for cleaning semiconductor photolithography tools
A system for cleaning semiconductor lithography tools provides for cycling a polished-side down semiconductor wafer through the lithography tool using conventional automated robotics for loading...
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7553803 |
Enhancement of silicon-containing particulate material removal using supercritical fluid-based compositions
A method and composition for removing silicon-containing particulate material, such as silicon nitrides and silicon oxides, from patterned Si/SiO2 semiconductor wafer surfaces is described. The...
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7537705 |
Method for treating feedwater
A method for treating feedwater is provided. The method includes steps of introducing a treatment composition into a feedwater stream to provide a treated feedwater stream containing scale...
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7507297 |
Cleaning method and cleaning apparatus
A cleaning effect is improved by cleaning a component that has a recess structure by using a cleaning medium of a liquefied gas or a supercritical fluid. By the cleaning method of removing adhering...
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7491362 |
Multiple enzyme cleaner for surgical instruments and endoscopes
The liquid composition is based on surfactants and enzymes, and is particularly useful for manual cleaning of instruments. In manual and ultrasonic application the composition in use concentration...
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7469703 |
Stain-removal brush
An motorized stain-removal brush is provided. A method of using motorized stain-removal brush for cleaning inanimate surfaces is also provided. The motorized stain-removal brush includes a handle...
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7467635 |
Apparatus and method for substrate processing
A substrate processing apparatus 10 includes a holding table 20 for rotatably holding a wafer W, a nozzle 40 for supplying chemical solutions L1 and L2 to the wafer W, at least one light...
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7467633 |
Enhanced solubilization using extended chain surfactants
The present invention provides a surfactant blend that includes an extended chain surfactant and high HLB nonionic surfactant. The surfactant blend may be incorporated into household and...
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7462248 |
Method and system for cleaning a photomask
A method for cleaning a photomask includes cleaning the photomask with a chemical cleaner, introducing a solution to the photomask, the solution is configured to react with residuals generated from...
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7435302 |
Surface treatment apparatus and method for manufacturing liquid crystal display device
A cleaning apparatus according to the present invention is provided with a brush drive mechanism which brings a brush being rotating closer to a substrate, measures electrical potentials generated...
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7435301 |
Cleaning solution of silicon germanium layer and cleaning method using the same
Disclosed are a cleaning solution for preventing damage of a silicon germanium layer when cleaning a semiconductor device including the silicon germanium layer and a cleaning method using the same....
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7416611 |
Process and apparatus for treating a workpiece with gases
In a method and apparatus for cleaning or processing a workpiece, a process gas is brought into contact with the workpiece by diffusion through a heated liquid layer on the workpiece, and by bulk...
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7417018 |
Method of cleaning a solid surface by removing organic and/or mineral soils using a microemulsion
The invention relates to a method of cleaning a solid surface comprising the following stages: a) the solid surface is cleaned using a microemulsion-type cleaning composition; e) the cleaned...
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7410543 |
Substrate processing method
Resists can be removed while metal contamination of wafers, etc. and generation of particles, and growth of oxide films are suppressed. A substrate processing method comprises feeding a processing...
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7410545 |
Substrate processing method of and substrate processing apparatus for freezing and cleaning substrate
A substrate immersed in pure water held inside a processing bath disposed to a cleaning unit 1 and accordingly washed, as it bears an aqueous film on its surface, is transported by a substrate...
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7404863 |
Methods of thinning a silicon wafer using HF and ozone
A method of thinning a silicon wafer in a controllable cost-effective manner with minimal chemical consumption. The wafer is placed into a process chamber, after which ozone gas and HF vapor are...
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7393795 |
Methods for post-etch deposition of a dielectric film
Methods for post-etch deposition on a dielectric film are provided in the present invention. In one embodiment, the method includes providing a substrate having a low-k dielectric layer disposed...
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7360546 |
Cleaning apparatus for semiconductor wafer
A cleaning apparatus for a semiconductor wafer comprising: a double container including an inner container with an upper opening for accommodating a substrate to be cleaned and an outer container...
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7306680 |
Method of cleaning by removing particles from surfaces, a cleaning apparatus and a lithographic projection apparatus
A lithographic mask is placed in a chamber which is then sealed. The gas pressure in the chamber is reduced to dislodge contaminant particles on the mask surface.
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7293567 |
Application of acoustic and vibrational energy for fabricating bumped IC die and assembly of PCA's
A method and apparatus are disclosed for improving a screen printing process by applying vibrational energy to assist in the print release, cleaning, and drying processes. The vibrational energy or...
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7282099 |
Dense phase processing fluids for microelectronic component manufacture
Method for processing an article by contacting the article with a dense fluid. The article is introduced into a sealable processing chamber and the processing chamber is sealed. A dense fluid is...
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7279050 |
One-piece bottom edge wipe sponge for cleaning a photoreceptor drum
A one-piece sponge cleans and removes coating material from the bottom edge, inside and outside surface of a photoreceptor drum. The one-piece sponge has an inner sponge section and an outer sponge...
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7264680 |
Process and apparatus for treating a workpiece using ozone
A method for cleaning a semiconductor workpiece having a metal layer in a processing chamber includes the steps of introducing a liquid solution including dissolved carbon dioxide onto the...
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