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6749691 |
Methods of cleaning discolored metallic arrays using chemical compositions
Methods of removing discoloration from a metal surface of an electronic device are presented the methods comprising the steps of exposing a metallic surface of an electronic device to a first...
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6746543 |
Apparatus for and method of cleaning objects to be processed
A cleaning apparatus and a cleaning method for cleaning a object are provided. In the cleaning apparatus, a drying chamber 42 and a cleaning bath 41 are separated from each other up and down,...
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6743300 |
Multistep single chamber parts proceeding method
The present invention is directed to a controlled environment processing chamber or chambers in which solvents and/or solutions used for processing a material or object can be introduced. The...
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6739073 |
Method and apparatus for performing multiple cleaning and vacuum drying operations in enclosed vessels
A method for performing multiple cleaning and vacuum drying operations in enclosed vessels uses cleaning and vacuum drying apparatus, low-dissolved-air cleaning solution, and drain-to-vacuum...
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6736147 |
Semiconductor-processing device provided with a remote plasma source for self-cleaning
A plasma CVD device includes a reaction chamber, a remote plasma discharge chamber that is provided remotely from the reaction chamber, and piping that links the reaction chamber and the remote...
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6735812 |
Dual mode carpet cleaning apparatus utilizing an extraction device and a soil transfer cleaning medium
An apparatus performing multiple different cleaning operations for cleaning fabrics, floor coverings, and bare floor surfaces is disclosed. A device according to the present invention selectively...
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6729338 |
Vacuum transfer system and method for food grade product
A vacuum transfer system for transferring food grade products. A biased ball in a cage with a substantially uninterrupted cage wall is utilized as a check valve. The ball may be biased by a weight...
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6723173 |
Truck body for combined transport and maintenance of portable toilets
A payload transporter, including a truck frame, a body having at least one waste storage tank storage tank, and a vacuum system, wherein the vacuum system is used to remove waste material from a...
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6723172 |
Method and system for processing semiconductor wafers
A method for processing semiconductor wafers includes processing a semiconductor wafer in a processing chamber having upper and lower chambers, decoupling the upper chamber from the lower chamber,...
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6715497 |
Treatment to eliminate polysilicon defects induced by metallic contaminants
A method and apparatus are provided for eliminating contaminants including metallic and/or hydrocarbon-containing contaminants on a surface of a semiconductor substrate by heating a semiconductor...
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6702939 |
Sewer cleaning tool
A sewer-cleaning tool includes a sleeve is sized to have an inside diameter incrementally greater than the outside diameter of the pipe. A sleeve is sized to have an inside diameter incrementally...
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6692579 |
Method for cleaning semiconductor structures using hydrocarbon and solvents in a repetitive vapor phase/liquid phase sequence
A method for cleaning a semiconductor structure using vapor phase condensation with a thermally vaporized cleaning agent, a hydrocarbon vaporized by pressure variation, or a combination of the two....
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6689225 |
Toroidal vortex vacuum cleaner with alternative collection apparatus
Disclosed are improved vacuum cleaning apparatus that utilize toroidal vortex air flow in order to establish a pressure differential capable of attracting debris. These systems and its derivatives...
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6682606 |
System and method of treating a porous material of a vehicle
The present invention involves a system and method of treating a porous material of a vehicle wherein the porous material has microorganisms. The method includes providing first and second...
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6673161 |
Substrate handling end effector
A substrate handling end effector is provided. The substrate handling end effector has a vacuum chuck to support a semiconductor substrate thereon. A vacuum passage and a liquid passage are located...
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6673159 |
Cleaning brush and method for removing contaminates from a photoconductor film
A method and a cleaning brush for removing contaminants from and extending the life of a photoconductor film wherein the cleaning brush has end sections having a reduced coefficient of friction...
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6666926 |
Method and apparatus for cleaning a computer mouse device
A method for cleaning a computer mouse device with a computer mouse ball located in an interior ball cavity that has a plurality of mouse contact rollers includes removing the computer mouse ball...
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6660101 |
Method and apparatus for cleaning film deposition device
This cleaning method and cleaning apparatus for a film deposition apparatus includes a processing container 4 accommodating a mounting table 10 for mounting an object W to be processed, a...
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6648979 |
Apparatus and method for wafer cleaning
A semiconductor wafer is cleaned while a sponge or brush is pressed against the wafer with a constant forced applied utilizing a bias in a constant force pencil. The wafer is cleaned in the state...
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6645310 |
Method for cleaning industrial pipe systems
A method for cleaning industrial pipe systems, preferably pipe systems used in food industry, such as meat, fish and vegetable industry. The method for cleaning industrial pipe systems, includes...
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6643894 |
High efficiency vacuum cleaning apparatus and method
A high efficiency vacuum cleaner includes a debris transport passage and a plurality of debris inlets maintained in generally parallel spaced relationship with the floor. The total area of the...
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6644571 |
Containment apparatus for collecting fragments of foam insulation
An apparatus comprises a containment chamber, a foam inlet, a vacuum port, and an air inlet. The containment chamber is a walled structure having a foam inlet. The surrounding of the foam inlet is...
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6638364 |
System to clean and disinfect carpets, fabrics, and hard surfaces using electrolyzed alkaline water produced from a solution of NaCl
A system and method for cleaning and disinfecting soft surfaces such as carpets, fabrics and the like and for cleaning and disinfecting hard surfaces such as plaster, drywall, concrete, linoleum,...
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6635119 |
Method of cleaning pressurized containers containing liquified petroleum gas
The present invention relates to a method of cleaning a container having an amount of liquefied petroleum gas contained therein. The container is first inspected thoroughly for leaks. Heated...
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6632288 |
Method for cleaning copper surfaces
In a method for cleaning a copper surface of a semiconductor wafer or article, nitrogen gas is bubbled or dissolved into a strong alkaline solution, displacing dissolved oxygen from the solution. A...
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6629538 |
Method for cleaning semiconductor wafers in a vacuum environment
A method of dry cleaning surfaces of a semiconductor wafer includes the steps of placing a processed wafer in a vacuum environment and positioning a pad near each of a front surface and a back...
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6626188 |
Method for cleaning and preconditioning a chemical vapor deposition chamber dome
The present invention relates generally to the field of semiconductor device manufacturing, and more specifically to a method for cleaning and preconditioning a dome in a chemical vapor deposition...
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6626187 |
Method of reconditioning reaction chamber
A method of reconditioning the reaction chamber of an etching reactor and controlling critical dimensions of an etch layer. After dry-cleaning or preventive maintenance, gaseous nitrogen and...
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6620258 |
Method for washing instruments used in semiconductor industry
The invention relates to a method for washing instruments used in semiconductor industry with an inflammable and/or explosive washing liquid. The instruments washed applying the method are placed...
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6620259 |
Method for cleaning containment enclosures with double containment and a removable cleaning receptacle
The present invention relates to a method for cleaning containment enclosures, and in particular for dedusting them. The invention is implemented with double containment; and suctioning is...
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6620260 |
Substrate rinsing and drying method
The wafers W are dipped and rinsed in pure water in the processing bath 60, and then dichloromethane is fed into the processing bath 60, thereby changing the state of the wafer W from being...
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6620256 |
Non-plasma in-situ cleaning of processing chambers using static flow methods
An improved, non-plasma, static method for removing accumulated films and solid residues from interior surfaces of processing chambers used in thermal or plasma CVD treatment processes. The method...
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6616772 |
Methods for wafer proximity cleaning and drying
A method for preparing a semiconductor wafer surface is provided which includes providing a plurality of source inlets and a plurality of source outlets and applying isopropyl alcohol (IPA) vapor...
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6605156 |
Robotic floor cleaning device
A robotic floor cleaning device comprises a chassis ( 10 ), motor-driven wheels ( 11 ) supporting the chassis ( 10 ), a motor-driven suction fan ( 9 ), a dirty air inlet ( 2 ) and a motor-driven...
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6598316 |
Apparatus to reduce contaminants from semiconductor wafers
A line for processing semiconductor wafers into integrated circuits (ICs) is provided with an input-output (I-O) chamber to help purge residual contamination from the wafers before they are...
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6596232 |
Device processing apparatus and method having positive pressure with two partitions to minimize leakage
A method and an apparatus are disclosed to effectively flow the fluid through the lumen device during the cleaning, disinfecting or sterilizing process, preferably with the use of two interfaces...
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6596091 |
Method for sweeping contaminants from a process chamber
A method for preparing a chamber prior to semiconductor processing includes the step of flowing a non-reactive gas, preferably argon, through the chamber at a pressure below 4 Torr to sweep...
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6596090 |
Method for transferring filter rods containing pulverulent, granular and analogous ingredients
A method of transporting rod-shaped tobacco smoke filters, which carry solid particles, along an elongated path from a sender to a receiving station, includes transporting the filters from the...
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6596088 |
Method for removing the circumferential edge of a dielectric layer
A method for removing the circumferential edge of a dielectric layer on a semiconductor wafer is disclosed. First, a semiconductor wafer having a dielectric layer on its upper surface is provided....
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6592679 |
Clean method for vacuum holding of substrates
A system for preventing contaminants and particulates from coming into contact with a back side of a workpiece as the workpiece is vacuum held on a chuck or robotic end effector.
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6588601 |
Apparatus for removing fines from oil tanks
An apparatus for removing fines from the bottom of a tank includes an extraction device having an internal chamber along with a vacuum arrangement which, when activated, lowers the pressure within...
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6589356 |
Method for cleaning a silicon-based substrate without NH4OH vapor damage
A method for cleaning a silicon-based substrate in an ammonia-containing solution without incurring any damages to the silicon surface by NH 4 OH vapor is described. The method can be conducted by...
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6589360 |
Drying system for drying semiconductor wafers and method of drying wafers using the same
A method of and system for drying a wafer offer a short cycle of operation, and minimize the amount of time that the wafer is exposed to external air. The drying system includes a process bath, a...
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6588122 |
Method for treating surfaces of substrates and apparatus
A method and apparatus for the treatment of surfaces of substrates of organic or inorganic materials, reactive fragments such as radicals or ions are produced by ultraviolet radiation from at least...
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6589354 |
Method and apparatus for in-situ lithography mask cleaning
A method and system for in-situ cleaning of a reticle. Ionized gas is directed onto the reticle by a delivery device. The ionized gas neutralizes electro-static attraction between the reticle and...
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6585830 |
Method for cleaning tungsten from deposition wall chambers
An unwanted tungsten film deposit on a Chemical Vapor Deposition chamber is cleaned by adding a mixture of at least two cleaning gases into the chamber at a predetermined temperature and pressure...
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6585827 |
Apparatus and method of use for cleaning a hard floor surface utilizing an aerated cleaning liquid
A method of cleaning a hard floor surface with a surface maintenance vehicle including the steps of generating a foam-like aerated cleaning liquid, selectively conveying the foam-like aerated...
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6565669 |
Vibrating wafer particle cleaner
A vibrating wafer particle cleaner for cleaning a semiconductor wafer. The cleaner removes particles from the surfaces of the wafer by vibrating the wafer inside an enclosure and passing a filtered...
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6565758 |
Systems and methods for dispensing, collecting and processing wash fluid
A system for dispensing, collecting, and processing wash fluid includes a first movable support frame including a first tank that stores clean wash fluid, a first pump that pressurizes the clean...
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6562144 |
Wafer cleaning method
A method is provided for cleaning a surface of a wafer. First, the wafer is placed in a closed cleaning chamber, and then a cleaning agent is infused into the cleaning chamber to a predetermined...
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