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7611588 |
Methods and compositions for removing metal oxides
The invention relates to methods and compositions for removing metal oxide soils from surfaces. The compositions include an anionic surfactant and a pH adjuster at an acidic pH. In one embodiment,...
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7604011 |
Method and apparatus for semiconductor wafer cleaning using high-frequency acoustic energy with supercritical fluid
An apparatus and a method is provided for using high-frequency acoustic energy with a supercritical fluid to perform a semiconductor wafer (“wafer”) cleaning process. High-frequency acoustic...
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7601227 |
High purification method of jig for semiconductor heat treatment
A method for achieving high purity in a jig for semiconductor heat treatment includes subjecting a semiconductor heat treatment jig made of a substrate having a surface covered with a silicon...
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7592415 |
Infrared solvent stripping process
A process for stripping chemically bonded spinning solvent from a solution-spun nonwoven web comprising the steps of providing a nonwoven web comprising solvent-laden polymeric fibers having...
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7585438 |
Method for the cleaning of filament and fiber spinning devices
Method for the cleaning of spinning devices with a plurality of spinning apertures for the output of molten plastic. With the spinning device in operation, individual dirt-contaminated and/or...
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7578890 |
Method for removing contaminants from silicon wafer surface
Taught is a method of removal surface contaminants, including organic contaminants, metal ions and solid particles, from silicon wafer surface comprising the following steps: (a) submerging the...
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7578889 |
Methodology for cleaning of surface metal contamination from electrode assemblies
Systematic and effective methodology to clean capacitively coupled plasma reactor electrodes and reduce surface roughness so that the cleaned electrodes meet surface contamination specifications...
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7569487 |
Method for atomic layer deposition of materials using a pre-treatment for semiconductor devices
A method for forming atomic layer deposition. The method includes placing a semiconductor substrate (e.g., wafer, LCD panel) including an upper surface in a chamber. The upper surface includes one...
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7556654 |
Methods for cleaning materials
Methods are disclosed for cleaning a material by applying a cleaning composition having one or more biosurfactants and one or more enzymes to the material. During use, the material is agitated with...
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7553803 |
Enhancement of silicon-containing particulate material removal using supercritical fluid-based compositions
A method and composition for removing silicon-containing particulate material, such as silicon nitrides and silicon oxides, from patterned Si/SiO 2 semiconductor wafer surfaces is described. The...
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7546840 |
Method for cleaning reaction container and film deposition system
After semiconductor wafers are loaded into a reaction vessel, and ruthenium (Ru) film or ruthenium oxide film is formed, the interior of the reaction vessel is efficiently cleaned without...
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7544307 |
Metal polishing liquid and polishing method using it
A metal polishing liquid which contains a compound represented by the following formula (1), an aromatic heterocyclic ring compound, and an oxidizing agent, and a chemical mechanical polishing...
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7540926 |
Method of cleaning contaminated surfaces
A method for cleaning contaminated surfaces of surgical waste management equipment. The method includes rinsing surfaces of the equipment with water to remove water soluble contaminants and waste...
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7534469 |
Semiconductor-processing apparatus provided with self-cleaning device
A CVD apparatus comprising an optical unit detecting the mass of contaminants adhering to an inner surface of a CVD reactor by irradiating an inner surface of the reactor with light having...
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7531470 |
Method and apparatus for electronic device manufacture using shadow masks
Electronic devices are formed on a substrate that is advanced stepwise through a plurality of deposition vessels. Each deposition vessel includes a source of deposition material and has at least...
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7531047 |
Method of removing residue from a substrate after a DRIE process
The present disclosure provides a method of cleaning a semiconductor substrate after a DRIE etch process, wherein residue from the DRIE process is removed without damaging the substrate. The...
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7527743 |
Apparatus and method for etching insulating film
An apparatus and a method for etching insulating film prevents generation of spots by spraying etchant on a lower surface of the substrate as well as the upper surface.
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7520946 |
Apparatus and process for the dry removal of the scale found on the surface of metal products
An apparatus and process for the dry removal of the scale from the surface of a metal product comprising at least one heating area that does not reduce the specific surface of the material to be...
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7507300 |
Method and apparatus for cleaning a photoactive and/or hydrophilic surface
A method of cleaning a photoactive and/or hydrophilic surface includes contacting the surface with conditioned water and optionally a cleaning agent solution. A device for cleaning a photoactive...
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7503982 |
Method for cleaning semiconductor substrate
A method for cleaning a semiconductor substrate having a contact angle between the surface thereof and water dropped thereon of at least 70 degrees comprises contacting the semiconductor surface...
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7501026 |
Liquid hard surface cleaning composition
The present invention relates to a process of cleaning a hard surface, said process comprising the step of applying a liquid hard surface cleaner composition onto said hard surface in the form of a...
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7482282 |
Use of dilute hydrochloric acid in advanced interconnect contact clean in nickel semiconductor technologies
A method for cleaning oxide from the interconnects of a semiconductor that are comprised of nickel (Ni) silicide or nickel-silicide alloys where nickel is the primary metallic component is...
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7470767 |
Preparation of ultrapure polymeric articles
Ultrapure olefinic polymeric articles of manufacture can be prepared by a process comprising: providing olefinic polymeric material containing impurities, subjecting the olefinic polymeric material...
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7470330 |
Method for dissolving oilfield scale
A method of removing metal scale from surfaces that includes contacting the surfaces with a first aqueous solution of a chelating agent, allowing the chelating agent to dissolve the metal scale,...
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7468106 |
Removal of niobium second phase particle deposits from pickled zirconium-niobium alloys
The present invention provides a method for removing niobium-rich second-phase-particle (SPP) deposits from zirconium-niobium alloy components. The method comprises washing a freshly pickled and...
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7468105 |
CMP cleaning composition with microbial inhibitor
An antimicrobial cleaning composition and methods for cleaning semiconductor substrates, particularly after chemical mechanical planarization or polishing, are provided. In one embodiment, the...
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7465431 |
Nanoscalar pyrogenically produced yttrium-zirconium mixed oxide
Nanoscalar, pyrogenically produced yttrium-zirconium mixed oxide which has a BET surface area of between 1 and 600 m 2 /g, a total chloride content of less than 0.05 wt. % and does not exhibit a...
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7462249 |
Surface treatment process for metal articles
A surface treatment process for a metal article includes the following steps. Firstly, a metal article, made of at least one of copper and an alloy thereof, is provided. Secondly, a surface of the...
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7462248 |
Method and system for cleaning a photomask
A method for cleaning a photomask includes cleaning the photomask with a chemical cleaner, introducing a solution to the photomask, the solution is configured to react with residuals generated from...
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7459421 |
Cleaning and conditioning composition and method
A cleaning composition and method for the removal of contaminants, such as, oil and grease from a surface, particularly concrete and asphalt. The composition includes an absorptive material,...
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7459029 |
Cleaning method, cleaning apparatus and electro optical device
A cleaning apparatus of organic substances attached to a vapor-deposition mask for low molecular weight organic EL devices comprises a first stage for treating a vapor-deposition mask with a...
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7448397 |
Apparatus for applying disparate etching solutions to interior and exterior surfaces
Described are methods, systems, and chemistries for cleaning various components of semiconductor process equipment. A method in accordance with one embodiment cleans articles with differently...
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7442675 |
Cleaning composition and method of cleaning semiconductor substrate
A cleaning composition comprises at least quaternary ammonium hydroxide, a water-soluble organic solvent, water, an anticorrosive, and potassium hydroxide of 1 mass percent or less of a total...
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7435355 |
Liquid-based gravity-driven etching-stop technique for controlling structure dimension
A liquid-based gravity-driven etching-stop technique for controlling structure dimension is provided, where opposite etching trenches in cooperation with an etching-stop solution are used for...
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7435301 |
Cleaning solution of silicon germanium layer and cleaning method using the same
Disclosed are a cleaning solution for preventing damage of a silicon germanium layer when cleaning a semiconductor device including the silicon germanium layer and a cleaning method using the same....
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7431860 |
Etching process
A method for etching a pattern in a material in precise target areas comprising depositing selectively onto the material droplets of a substance for dissolving or reacting chemically with the...
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7422639 |
Method of reducing water spotting and oxide growth on a semiconductor structure
The present invention relates to a method of cleaning and drying a semiconductor structure in a modified conventional gas etch/rinse or dryer vessel.
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7417018 |
Method of cleaning a solid surface by removing organic and/or mineral soils using a microemulsion
The invention relates to a method of cleaning a solid surface comprising the following stages: a) the solid surface is cleaned using a microemulsion-type cleaning composition; e) the cleaned...
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7416611 |
Process and apparatus for treating a workpiece with gases
In a method and apparatus for cleaning or processing a workpiece, a process gas is brought into contact with the workpiece by diffusion through a heated liquid layer on the workpiece, and by bulk...
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7410543 |
Substrate processing method
Resists can be removed while metal contamination of wafers, etc. and generation of particles, and growth of oxide films are suppressed. A substrate processing method comprises feeding a processing...
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7405189 |
Surface treatment composition and method for removing Si component and reduced metal salt produced on the aluminum die cast material in etching process
A surface treatment composition and method for removing Si and reduced metal salt produced during etching of an aluminum die cast material (“ALDC material”) without generation of nitrogen oxide...
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7404863 |
Methods of thinning a silicon wafer using HF and ozone
A method of thinning a silicon wafer in a controllable cost-effective manner with minimal chemical consumption. The wafer is placed into a process chamber, after which ozone gas and HF vapor are...
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7402258 |
Methods of removing metal contaminants from a component for a plasma processing apparatus
Methods of removing metal contaminants from a component for a plasma processing apparatus are provided. The method includes cleaning a surface of the component with a cleaning liquid that includes...
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7402213 |
Stripping and removal of organic-containing materials from electronic device substrate surfaces
Described herein is a method of removing an organic-containing material from an exposed surface of a large substrate (at least 0.25 m 2 ). The substrate may comprise an electronic device. The...
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7402212 |
Apparatus and method for cleaning a glass substrate before photoresist coating
A method for cleaning a glass substrate before photoresist coating, which method can remove oxide compounds and organic residues from the surface of a metal layer of the glass substrate, comprises...
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7399366 |
Product and processes for preventing the occurrence of rust stains resulting from irrigation systems using water containing iron ions and for cleaning off rust stains resulting from using said irrigation systems
Several products and processes for preventing the occurrence of rust stains resulting from irrigation systems using water having iron ions, such as well water, and for cleaning off rust stains...
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7399365 |
Aqueous fluoride compositions for cleaning semiconductor devices
The present invention relates to dilute fluoride solutions and methods for cleaning plasma etch residue from semiconductor substrates including such dilute solutions. The compositions and methods...
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7384901 |
Process for cleaning aluminum and aluminum alloy surfaces with nitric acid and chromic acid-free compositions
A process for cleaning (e.g., desmutting) an aluminum surface, using compositions free of nitric acid and chromic acid and comprising, in one embodiment, an oxidant and at least one mineral acid...
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7377984 |
Method for cleaning a photomask
Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to...
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7377982 |
Method for the removal of airborne molecular contaminants using water gas mixtures
The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the...
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