|
Match
|
Document |
Document Title |
|
|
8172951 |
Method of cleaning with an aqueous composition containing a semiconductor
The use of an aqueous composition comprising a semiconductor as cleaning agent for surfaces in the outdoors field and indoors field is proposed.
|
|
|
8163101 |
Method of cleaning contaminated surfaces
A method for cleaning contaminated surfaces of surgical waste management equipment. The method includes rinsing surfaces of the equipment with water to remove water soluble contaminants and waste...
|
|
|
8153057 |
Method and device for preventing corrosion in hot water systems
Disclosed is a method of controlling a real-time oxidation-reduction potential in a hot water system to inhibit corrosion in the hot water system. The method includes defining one or more...
|
|
|
8133327 |
Substrate processing method, storage medium and substrate processing apparatus
Provided is a substrate processing method that prevents generation of watermarks on a substrate and can be performed at a low cost. The method controls the ambient humidity around the substrate...
|
|
|
8133854 |
Liquid acidic hard surface cleaning composition
The present invention relates to a liquid acidic hard surface cleaning composition comprising an acid system, wherein the acid system comprises formic acid and acetic acid.
|
|
|
8133325 |
Dry cleaning method for plasma processing apparatus
This dry cleaning method for a plasma processing apparatus is a dry cleaning method for a plasma processing apparatus that includes: a vacuum container provided with a dielectric member; a planar...
|
|
|
8128754 |
Ferric pickling of silicon steel
The pickling process designed for pickling electrical steel strip in a continuous fashion comprising immersing the strip in at least one pickling tub. The pickling tub contains a mixture of HCl,...
|
|
|
8122899 |
Apparatus and method for treating substrate
An apparatus is provided for supplying a plurality of chemicals or gases to the surface of a substrate to clean and dry the substrate. The apparatus includes a substrate support unit with a chuck...
|
|
|
8123866 |
Wafer manufacturing method and device
The invention relates to a device for manufacturing semiconductor material wafers with a sawing device for the sawing of slices attached to a saw holder, a pre-cleaning device arranged in the...
|
|
|
8118945 |
Substrate processing method and substrate processing apparatus
A substrate processing method includes a cleaning processing step, a mixed organic solvent supplying step, and a fluorine organic solvent supplying step. The cleaning processing step is a step of...
|
|
|
8097092 |
Method of cleaning and after treatment of optical surfaces in an irradiation unit
The present invention relates to a method of cleaning and after treatment of optical surfaces in an irradiation unit, said irradiation unit comprising a radiation source (1, 31) emitting...
|
|
|
8083858 |
Method and system for cleaning an artillery gun barrel
The invention relates to a method for cleaning an artillery gun barrel, which is cleaned of gun oil, greases, or combustion residues using a washing liquid and a brush element. The brush element is...
|
|
|
8080110 |
Method and system to stabilize and preserve iron artifacts
A method, system and device to use a dilute alkaline solution held at sub-critical temperature and pressure conditions to remove rapidly chloride ions from corroded iron artifacts.
|
|
|
8076655 |
Method of cleaning optical surfaces of an irradiation unit in a two-step process
The present invention provides a method of cleaning optical surfaces in an irradiation unit in order to remove contaminations deposited on said optical surfaces. The method includes a cleaning step...
|
|
|
8075701 |
Processes for reconditioning multi-component electrodes
A process for reconditioning a multi-component electrode comprising a silicon electrode bonded to an electrically conductive backing plate is provided. The process comprises: (i) removing metal...
|
|
|
8075704 |
Method for the removal of airborne molecular contaminants using oxygen and/or water gas mixtures
The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the...
|
|
|
8075697 |
Particle removal method and composition
A method and cleaning solution for cleaning electronic substrates, such as a semiconductor wafers, hard disks, photomasks or imprint molds. The method comprises the steps of contacting a surface of...
|
|
|
8075696 |
Method of recovering heat transfer in reactor and regenerator effluent coolers
This invention relates to a method for removing fouling from a heat transfer surface, such as a heat exchanger. The method involves conducting a vapor containing a scouring material to the heat...
|
|
|
8070882 |
Method for the wet-chemical treatment of a semiconductor wafer
A method for the wet-chemical treatment of a semiconductor wafer involves: a) rotating a semiconductor wafer; b) applying a cleaning liquid comprising gas bubbles having a diameter of 100 μm or ...
|
|
|
8062430 |
Process for cleaning filters
Filters used in the beverage industry fouled by polyphenol-protein complexes and carbohydrate polymers can be cleaned by treating the filters either with the following methods: Solubilization of at...
|
|
|
8062429 |
Methods of cleaning semiconductor devices at the back end of line using amidoxime compositions
The present invention relates to aqueous compositions comprising amidoxime compounds and methods for cleaning plasma etch residue from semiconductor substrates including such dilute aqueous...
|
|
|
8063006 |
Aqueous cleaning composition for semiconductor copper processing
The invention relates to an aqueous cleaning composition for wafers with copper wires that have been treated by chemical mechanical planarization in an integrated circuit processing, comprising 0.1...
|
|
|
8057604 |
Method and device for descaling metal strip
A method and a device for descaling a metal strip, in which the metal strip is guided in a direction of conveyance through at least one plasma descaling unit in which it is subjected to a plasma...
|
|
|
8052797 |
Method for removing foreign matter from substrate surface
A method for removing inorganic foreign matters from the surface of a substrate made of silicon or glass or the surface of an inorganic coating formed on the surface of the substrate, which...
|
|
|
8052800 |
Method for the removal of an insulative coating using an aqueous solution comprising dimethyl formamide
A method and aqueous composition are provided for removing at least a portion of a coating from the surface of a substrate. The coating comprises an insulative material, and is contacted with an...
|
|
|
8043435 |
Cleaning liquid and cleaning method for electronic material
A cleaning liquid for an electronic material, in particular, a silicon wafer, uses ultra-pure water or hydrogen water as raw material water, and performs cleaning in combination with ultrasonic...
|
|
|
8038799 |
Substrate processing apparatus and substrate processing method
A substrate processing apparatus and a substrate processing method, with which a resist can be removed satisfactorily from the substrate and a processing solution used for removing the resist can...
|
|
|
8038803 |
Method of descaling metallic devices
Methods are provided for descaling metallic components devices such as stents. The devices or components are cleaned under ultrasound in a cleaning solution of ammonium hydrogen fluoride at a...
|
|
|
8038798 |
Method of and apparatus for cleaning substrate
A substrate cleaning apparatus is capable of individually setting a threshold value for use in making a check of a resistivity during a rinsing process on a recipe setting screen in each process...
|
|
|
8030182 |
Semiconductor device manufacturing method and semiconductor manufacturing apparatus
By hydrogen-terminating a semiconductor surface using a solution containing HF2− ions and an oxidant, the hydrogen termination can be quickly carried out. In this case, the semiconductor surface i...
|
|
|
8029623 |
Acid removal in cleaning processes
Embodiments of the present disclosure include cleaning processes, cleaning machines, and methods of preventing acidification of a cleaning composition in a cleaning process. The cleaning process...
|
|
|
8025736 |
Semiconductor device fabrication equipment for performing PEOX process and method including cleaning the equipment with remotely produced plasma
Semiconductor device fabrication equipment performs a PEOX (physical enhanced oxidation) process, and includes a remote plasma generator for cleaning a process chamber of the equipment. After a...
|
|
|
8020315 |
Substrate processing method, substrate processing apparatus, and program storage medium
A substrate processing method which can reduce the number of particles to be left on each substrate is provided. In the substrate processing method, substrates W to be processed are dried, by using...
|
|
|
8021490 |
Substrate cleaning processes through the use of solvents and systems
A method for removing common contaminates or residues which include but are not limited to ionic residues, particulate residues and moisture from semiconductor wafers used in the manufacture of IC...
|
|
|
8021491 |
Method for selectively removing coatings from metal substrates
A method for selectively removing an aluminum-poor overlay coating from a substrate of a component, which as a result of its low aluminum content is highly resistant to a selective stripping...
|
|
|
8021494 |
Method for the decontamination of an oxide layer-containing surface of a component or a system of a nuclear facility
A method of decontaminating an oxide layer-comprising surface of a component or a system of a nuclear facility. An acidic water film is produced on the surface, the film of water is brought into...
|
|
|
8016948 |
Method of removing contaminants from a coating surface comprising an oxide or fluoride of a group IIIB metal
Disclosed herein is a cleaning method useful in removing contaminants from a surface of a coating which comprises an oxide or fluoride of a Group III B metal. Typically the coating overlies an...
|
|
|
8007718 |
System for and method of processing bone material using supercritical fluids
A method of processing bone material using supercritical fluids is disclosed. The method comprises placing the bone material in a processing chamber, adding supercritical fluid to the processing...
|
|
|
8007594 |
Method for manufacturing semiconductor device
A method for manufacturing a semiconductor device includes the step of conducting a cleaning process for a wafer formed with copper wiring lines to remove contaminations produced on a back surface...
|
|
|
8007593 |
Remover compositions
A remover composition containing 1,3-propanediamine (a), 1-hydroxyethylidene-1, 1-diphosphonic acid (b) and water, wherein the remover composition contains the component (a) in an amount of from...
|
|
|
8003586 |
Cleaning solution for an automatic biochemical analyzer
A cleaning solution for automatic biochemical analyzers includes: at least one anionic surfactant, at least one nonionic surfactant, an alkali metal hydroxide, an alkali metal citrate, and a...
|
|
|
7998914 |
Cleaning solution for semiconductor device or display device, and cleaning method
A cleaning solution for semiconductor devices or display devices containing a polyamine of a specified structure having two or more amino groups in adjacent positions of a carbon chain or a salt...
|
|
|
7985297 |
Method of cleaning a quartz part
A cleaning solution for a quartz part and a method for cleaning the quartz part are provided. The cleaning solution includes from about 5 to about 35 wt % of an ammonium compound, from about 7 to...
|
|
|
7981307 |
Method and apparatus for shaping gas profile near bevel edge
A method for etching a bevel edge of a substrate in a processing chamber is provided. The method includes flowing an inert gas into a center region of the processing chamber defined above a center...
|
|
|
7976638 |
High negative zeta potential polyhedral silsesquioxane composition and method for damage free semiconductor wet clean
A composition for removing particulate matter from integrated circuit substrates, including (a) one or more metal ion-free base; (b) a water-soluble metal ion-free onium salt of a polyhedral...
|
|
|
7959739 |
Particle removal cleaning method and composition
A cleaning solution and method for removing submicron particles from the surface and/or the bevel of an electronic substrate such as a hard disk media substrate, or an imprint mold used in the...
|
|
|
7959743 |
Lithium salts of fatty alcohol sulphates for cleaning boreholes, boring devices and borings
The invention relates to a process of cleaning boreholes, boring equipment and borings with an aqueous cleaning of one more lithium salts of alkyl sulfates of formula (I): R—O—SO3−Li+ (I) in which...
|
|
|
7955440 |
Method for cleaning silicon wafer and apparatus for cleaning the silicon wafer
After a water film is formed on a wafer front surface in a chamber, the water film is supplied sequentially with an oxidizing component of an oxidation gas, an organic acid component of an organic...
|
|
|
7947130 |
Troika acid semiconductor cleaning compositions and methods of use
Semiconductor processing compositions for use with silicon wafers having an insulating layers and metallization layers on the wafers comprising water and one or more Troika acids which is also...
|
|
|
7942980 |
Starch removal process
Starch is removed from the surface of an article using a multi-step method that includes presoaking the article in an acidic solution to remove the starch from the surface of the article and...
|