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6851435 |
Method and apparatus for localized liquid treatment of the surface of a substrate
A method and apparatus for dispensing a liquid on the surface of a localized zone of a substrate, for example for cleaning of etching purposes. Along with the liquid, a gaseous tensio-active...
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6846424 |
Plasma-assisted dry etching of noble metal-based materials
A process for removing and/or dry etching noble metal-based material structures, e.g., iridium for electrode formation for a microelectronic device. Etch species are provided by plasma formation...
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6843860 |
Method and device for pickling hot-rolled special steel strips
The invention relates to a method for pickling hot-rolled special steel strips ( 1 ) having an austenite, ferrite and/or martensite structure. The inventive method is carried out in a pickling line...
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6843855 |
Methods for drying wafer
Apparatuses and methods of processing a substrate. The apparatus includes a wet-cleaning chamber, a drying chamber, and a substrate transferring chamber which transfers a substrate to and from the...
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6841525 |
Dilute cleaning composition and method for using same
A cleaning method in a semiconductor fabrication process includes providing a dilute composition consisting essentially of phosphoric acid and acetic acid and exposing a surface, e.g., aluminum, to...
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6840250 |
Nextgen wet process tank
A process tank for processing a plurality of wafers having a diameter, the process tank comprising: two substantially vertical side walls being a first distance apart; wherein the first distance is...
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6840249 |
Method for cleaning a semiconductor device
In order to clean a semiconductor device having a dielectric layer deposited on a top surface of a lower metal wiring of the semiconductor device, and a contact hole or a via hole formed in the...
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6841311 |
Cleaning process for phase shift masks
A new sequence and chemical composition for cleaning the surface of a halftone shift masks that use MoSiON as shifter material is provided. For purposes of repair or rework, the pellicle is removed...
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6837943 |
Method and apparatus for cleaning a semiconductor substrate
A stripping solution is supplied onto the surface of a substrate and an alternating magnetic flux is applied to the substrate. The alternating magnetic flux induces a current in a conductive...
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6837941 |
Cleaning and handling methods of electronic component and cleaning apparatus thereof
A cleaning apparatus of an electronic component of the present invention comprises: means for supplying cleaning water to an object to be cleaned such as alumina titanium carbide wafer, a sponge...
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6837944 |
Cleaning and drying method and apparatus
A method of cleaning semiconductor wafers before the epitaxial deposition comprising (A) etching silicon wafers with HF; (B) rinsing the etched wafers with ozonated ultrapure water; (C) treating...
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6833109 |
Method and apparatus for storing a semiconductor wafer after its CMP polishing
In an apparatus, after completion of a CMP (i.e., chemical mechanical polishing) operation of a semiconductor wafer, the thus polished wafer is temporarily stored in a water tank before it is...
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6833081 |
Method of metal etching post cleaning
A method of metal etching post cleaning. A substrate with a surface covered by a patterned metal layer and a patterned resist layer in order is provided, subsequently, oxygen-plasma ashing is...
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6833032 |
Automatic deliming process
An automatic deliming process for a steam oven cooker is described. The process initiates a deliming procedure after a predetermined time of normal operation, which period of time is determined by...
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6830629 |
Method for treating brass
Brass articles having leachable lead are contacted with an aqueous caustic solution that contains a chelating agent. A brass article can optionally be post-treated by contacting it with an aqueous...
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6831048 |
Detergent composition
A cleaning composition comprising (1) at least one of fluoride salts and hydrogendifluoride salts; (2) an organic solvent having a hetero atom or atoms; and (3) water; a method of cleaning metal...
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6830627 |
Copper cleaning compositions, processes and products derived therefrom
The present invention is a persulfate microetchant composition especially useful for removing impurities from copper surfaces during fabrication of microelectronic packages. The microetchant...
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6827090 |
Process for removing deposits from water-carrying systems and devices for water supply
Process for removing deposits from water-carrying systems and devices for water supply, or from their individual parts, in which the deposits are dissolved by means of an aqueous treatment solution...
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6824623 |
Graffiti remover, paint stripper, degreaser
A terpene-free cleaning composition containing: (a) an oil-soluble anionic surfactant; (b) a water-soluble anionic surfactant; (c) a primary solvent consisting of a C 1-4 alkyl ester; (d) a...
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6821351 |
Hydrofluoric acid generating composition and method of treating surfaces
The present invention relates to compositions, kits and processes for the brightening of metal surfaces by the application of the chemical compositions. These compositions act to release...
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6821349 |
Method and apparatus for removing a liquid from a surface
A method and an apparatus for removing a liquid, i.e. a wet processing liquid, from at least one surface of at least one substrate is disclosed. A liquid is supplied on a surface of substrate....
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6821454 |
Method for removing water from surfaces
Method for removing water from surfaces of various materials, comprising the steps of covering said surface with a composition having specific weight higher than that of water and subsequently...
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6821355 |
Automatic eyewear cleaner
An automatic eyeglass cleaner is provided in accordance with the invention. A specially formulated cleaning and conditioning solution is also provided for use with the automatic cleaner. A tank in...
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6810887 |
Method for cleaning semiconductor fabrication equipment parts
A process for cleaning semiconductor fabrication equipment parts includes determining a definition for a clean part including multiple maximum acceptable impurity levels; determining an initial...
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6805754 |
Device and method for processing substrates
A device and method for processing substrates, whereby medium consumption and processing time are reduced. According to the inventive method, liquid is conducted to a surface of the substrate that...
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6805750 |
Surface preparation process for deposition of ceramic coating
A method of surface cleaning and controlled oxidation of superalloys is described. The method provides a thin homogeneous layer of relatively pure alpha alumina which is suited to receive and...
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6805135 |
Cleaning fluid and cleaning method for component of semiconductor-treating apparatus
A cleaning solution is used to remove a byproduct derived from a decomposed substance of a process gas containing C and F. The cleaning solution contains 75 wt % N-methyl-2-pyrrolidone, 15 wt %...
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6805753 |
Method to separate silicone seal by thermal degradation
A method for removing silicone sealant from glass-ceramic surfaces is provided. The method includes heating the sealant to a temperature greater than 325 degrees Celsius so that it thermally...
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6802321 |
Master medium cleaning method
The foreign matter adhered to the data bearing surface of a master medium is removed by use of a dry, non-contact removal process, so as to facilitate the performance of a high transfer quality...
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6800142 |
Method for removing photoresist and post-etch residue using activated peroxide followed by supercritical fluid treatment
Methods for cleaning semiconductor wafers are presented. Contaminants, particularly photoresist and post-etch residue, are removed from semiconductor wafers. A wafer or wafers is first treated with...
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6799585 |
Use of solutions containing enzymes for cleaning fermentation or storage tanks
A process is presented for cleaning fermentation or storage tanks with an enzyme-containing formulation containing one or more laccases, peroxidases, oxireductases, transferases, isomerases,...
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6799583 |
Methods for cleaning microelectronic substrates using ultradilute cleaning liquids
A method of cleaning a surface of an article using cleaning liquids in combination with acoustic energy. Preferably, an ultradilute concentration of a cleaning enhancement substance, such as...
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6800326 |
Method of treating a surface of a surface of a substrate containing titanium for an ornament
A method for treating surfaces of titanium or titanium alloys which includes the steps of applying a treatment for removing surface adhesion substances from the surface and then forming a...
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6796316 |
Atomic layer deposition (ALD) thin film deposition equipment having cleaning apparatus and cleaning method
An atomic layer desposition (ALD) thin film deposition equipment having a cleaning apparatus, this equipment including a reactor in which a wafer is mounted and a thin film is deposited on the...
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6796315 |
Method to remove particulate contamination from a solution bath
A method of cleaning particulates from a solution bath including at least partially filling a deionized water (DIW) bath for rinsing at least one wafer following chemically cleaning the at least...
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6797245 |
Apparatus for washing and disinfecting-sterilizing endoscope
A washing vessel capable of housing an endoscope is formed in an apparatus body. A washing solution containing a detergent is spurted against the endoscope arranged within the washing vessel for...
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6793738 |
Method for processing acid treatment solution, solution processed thereby, and method for treating articles therewith
A method for preparing a solution for treating an article, a treatment solution made thereby, and a method for treating an article with the solution are presented with, for example, the treatment...
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6793716 |
Method and installation for cleaning a particulate filter on a motor vehicle
The particulate filter is disassembled in order to separate it from the exhaust line and the filtering support of the particulate filter is contacted with a cleaning solution, for example contained...
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6793736 |
Method of providing high flux of point of use activated reactive species for semiconductor processing
A method for providing a high flux of point of use activated reactive species for semiconductor processing wherein a workpiece is exposed to a gaseous atmosphere containing a transmission gas that...
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6789554 |
Removing toner from printed material
Toner xerographically adhered to a material, such as a sheet of paper, may be removed using a solvent-based or solventless approach. The application of ultrasonic tamping, scraping and brushing may...
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6786977 |
Gas-expanded liquids, methods of use thereof, and systems using gas-expanded liquids for cleaning integrated circuits
Gas-expanded liquids, methods of use thereof, and systems of using gas-expanded liquids are provided. One exemplary system, among others, includes: a gas-expanded liquid system comprising a gas and...
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6786975 |
Method of cleaning printhead in inkjet printer
A method of cleaning a printhead in an inkjet printer by removing organic debris deposits from the printhead, uses anyone of the liquid mixes of NaOCl (sodium hypochlorite) and H 2 O (water), H 2 O...
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6783599 |
Method of cleaning contaminants from the surface of a substrate
Contaminants are removed from a surface of a substrate by applying a fluid to the surface; lowering the temperature of the fluid to form a solid layer of the fluid and entrap contaminants therein;...
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6780212 |
Surface finishing composition
A finishing composition for a variety of surfaces, including, without limitation, paints, metals, plastics and fiberglass, comprises water, wax, soap, scent, hair conditioner, mineral spirits and...
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6776852 |
Process of removing holefill residue from a metallic surface of an electronic substrate
A process of removing excess holefill material from a surface of an electronic substrate in which the holefill residue is contacted with a swelling agent followed by planarizing of the surface in...
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6776853 |
Cleaning method and method for manufacturing liquid crystal device
In a cleaning apparatus 500 , as a pre-cleaning step, cleaning is performed in a first and a second backup cleaning bath 602 and 603 using a hydrocarbon-based cleaning liquid composed of a...
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6777379 |
Cleaning solution and method of cleaning anti-reflective coating composition using the same
A cleaning solution for a cured anti-reflective layer (AFC layer) component and a method of cleaning an anti-reflective layer component by using the same, wherein the cleaning solution comprises...
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6773873 |
pH buffered compositions useful for cleaning residue from semiconductor substrates
A semi-aqueous cleaning formulation useful for removing particles from semiconductor wafer substrates formed during a dry etching process for semiconductor devices, the cleaning formulation...
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6772771 |
Decoke enhancers for transfer line exchangers
In a steam cracking operation the formation of coke is a problem which needs to be overcome. While significant work has been done on decoking of furnaces little work has been done regarding...
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6770115 |
Process for magnesium granules
A method and apparatus of reclaiming magnesium from post consumer scrap and/or secondary magnesium turnings by feeding the post consumer scrap and/or secondary magnesium turnings into a rotary tray...
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