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7186301 |
Device and method for cleaning photomask
Disclosed herein is a device and a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat...
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7183246 |
Cleaning/disinfectant composition to clean surfaces
A composition and method for cleaning surfaces having deposits, such as drink water tanks, supply water wells, water filter systems, and distributor water lines. The composition contains in...
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7182821 |
Substrate processing method and substrate processing apparatus
Disclosed is a substrate processing method including a substrate rotating step for rotating a substrate with the substrate held almost horizontally within a chamber; a peripheral edge processing...
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7172657 |
Cleaning method of treatment equipment and treatment equipment
In a state of the inside of a treatment chamber of treatment equipment being evacuated, therein a cleaning gas containing trifluoroaceticacid (TFA) as a cleaning agent is supplied. Metal such as...
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7169235 |
Cleaning method and polishing apparatus employing such cleaning method
A method is suitable for cleaning substrates, after polishing, that require a high degree of cleanliness, such as semiconductor wafers, glass substrates, or liquid crystal displays. The method...
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7166419 |
Compositions substrate for removing etching residue and use thereof
Compositions containing certain organic solvents and a fluorine source are capable of removing photoresist and etching residue.
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7163588 |
Processing a workpiece using water, a base, and ozone
Contaminants such as photoresist are quickly removed from a wafer having metal features, using water, ozone and a base such as ammonium hydroxide. Processing is performed at room temperature to...
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7156927 |
Transition flow treatment process and apparatus
A method is provided for treating an object. In this method, a treating chemical is introduced to a bath under conditions effective to at least partially envelop the object to be treated in eddy...
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7153370 |
Method of cleaning semiconductor wafer
The present application discloses a method of cleaning a semiconductor wafer by mounting a wafer to a chuck, positioning a gas guard, defining therein a chamber having an open bottom, immediately...
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7153369 |
Method of chemical mechanical polishing
It is an object of the invention to provide an aqueous dispersion for CMP that produces no scratches on polishing surfaces and that polishes with an adequate rate, when used for polishing of copper...
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7141121 |
Semiconductor washing solution and method of producing semiconductor device using the same
The invention provides a semiconductor washing solution which can suppress occurrence of variation of the shape of a semiconductor device when the semiconductor device is washed and can maintain a...
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7138066 |
Gear surface treatment procedure
A method of surface treating heat treated members to remove oxide scale. The heat treated members are subjected to a staged series of discrete chemical and physical cleaning steps yielding a...
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7138069 |
Method of surface-finishing stainless steel after descaling
A new surface finishing process for stainless steel where beautiful, bright and milky white coloured surface is obtainable even for such grades as high carbon containing 13 chromium steel and high...
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7132017 |
Low-pressure cleaning system using high velocity high volume air
A method for cleaning a heat exchanging coil in an air conditioning unit using a low-pressure cleaning system to remove foreign particles that have accumulated on the heat exchanging coil. The...
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7129029 |
Compositions substrate for removing etching residue and use thereof
Compositions containing certain organic solvents and a fluorine source are capable of removing photoresist and etching residue.
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7129167 |
Methods and systems for a stress-free cleaning a surface of a substrate
A method of cleaning a substrate includes receiving a substrate and applying a stress-free cleaning process to the top surface of the substrate. The substrate includes a top surface that is...
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7125784 |
Method of forming isolation film in semiconductor device
The present invention relates to a method for forming an isolation film in a semiconductor device. After a trench for isolation is formed, a polymer film is stripped by a post cleaning process...
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7125457 |
Method for removing oxide from cracks in turbine components
A method for removing an oxide material from a crack in a substrate, the method includes: applying a slurry paste comprising a fluoride salt to the crack; heating the slurry paste and the crack to...
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7115171 |
Method for removing engine deposits from turbine components and composition for use in same
A method and cleaning composition for removing engine deposits from turbine components, in particular turbine disks and turbine shafts. This method comprises the following steps: (a) providing a...
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7097713 |
Method for removing a composite coating containing tantalum deposition and arc sprayed aluminum from ceramic substrates
A method for removing a metallic layer from the surface of a ceramic substrate, the method including the steps of immersing the metallic coated ceramic substrate in a solution of up to 31%...
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7094355 |
Local dry etching method
This invention provides a local dry etching method comprising the step of removing an oxide film formed on the surface of a semiconductor water before unevenness on the semiconductor wafer is...
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7083684 |
Method of removing sealant used for the protection of electric or electronic part
A sealant used for the protection of an electric or electronic part is removed by contacting the sealant with tetramethylammonium hydroxide, tetrabutylammonium fluoride or the like for thereby...
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7083897 |
Method of fabricating a poly fuse
A new method is provided to create a polysilicon fuse. The invention provides for applying a first oxide plasma treatment to the surface of the created polysilicon fuse, creating a thin layer of...
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7077918 |
Stripping apparatus and method for removal of coatings on metal surfaces
A coating is stripped off a work piece by applying a chromous and aluminiforous coat directly on the work piece and stripping the work piece with an alkaline solution containing a strong oxidant. A...
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7077915 |
Method of and apparatus for washing photomask and washing solution for photomask
Organic matter and metal impurities present on the surface of a photomask are removed. Foreign matter still adhering to the surface of the photomask is removed with H 2 gas dissolved water. The...
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7075053 |
Device for determining the position of a scraper
A device for determining the position of a scraper which is displaceable for the transport of coating material in a supply path of thereof, the coating material comprises a sensor responding to the...
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7074726 |
Substrate treating method and substrate treating apparatus
In a substrate treating unit, a removal liquid supplying mechanism supplies a removal liquid to the surface of a substrate. In order to retain the removal liquid on the surface of the substrate for...
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7056872 |
Solution composition for removing a remaining photoresist resin
Cleaning solutions for removing photoresist resins remaining on the underlying layer patterns formed by photolithography process using the photoresist patterns as etching mask. The cleaning...
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7049275 |
Photoresist stripping composition and cleaning composition
The photoresist stripping composition of the present invention contains at least one oxymethylamine compound represented by the following formula 1:
wherein R 1 to R 3 are as defined in the...
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7048803 |
Method of dissolving scale
A method of dissolving scale comprises contacting the scale with a solution of an alkali metal bisulfate. Another method of dissolving scale comprises contacting the scale with a solution of an...
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7045022 |
Removal of adherent molten metal from surfaces
The present invention provides a method and process for removing adherent molten metal from a surface by applying a non-wetting agent for the metal to the surface or to the adherent molten metal....
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7040967 |
Multi-step, in-situ pad conditioning system and method for chemical mechanical planarization
An arrangement for performing a multi-step polishing process on a single stage chemical mechanical planarization (CMP) apparatus utilizes an in-situ conditioning operation to continuously clean and...
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7041629 |
Stripper for special steel
The inventive aqueous pickling agent on the basis of sulfuric acid or phosphoric acid and hydrogen fluoride for stainless steels, which pickling agent is free of wetting and emulsifying agents,...
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7037381 |
Method for removing ceramic coatings from component surfaces
Method for stripping ceramic coatings from the surfaces of articles. The apparatus includes a dedicated pressure vessel, such as an autoclave, which is maintained at an elevated temperature....
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7033068 |
Substrate processing apparatus for processing substrates using dense phase gas and sonic waves
Embodiments of the invention are directed to substrate processing apparatuses and methods for processing substrates. In one embodiment, a substrate processing apparatus includes a processing...
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7025896 |
Process for treating solid surface and substrate surface
Ruthenium, osmium and their oxides can be etched simply and rapidly by supplying an atomic oxygen-donating gas, typically ozone, to the aforementioned metals and their oxides through catalysis...
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7018481 |
Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle
There is disclosed a substrate treating method comprising supplying a treating solution onto a substrate, and continuously discharging a first cleaning solution to the substrate from a first...
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7018937 |
Compositions for removal of processing byproducts and method for using same
A composition and methods for using the composition in removing processing byproducts is provided. The composition can be non-aqueous or semi-aqueous. The non-aqueous composition includes a...
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7018965 |
Aqueous compositions for cleaning gas turbine compressor blades
The present invention is directed to a gas turbine cleaner. The composition of the present invention includes a glycol alkyl ether compound, an alkoxylated surfactant with an alkyl chain length of...
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7018483 |
Machine and method for thermal cleaning and separation of metal parts
Thermal cleaning and separation of metal parts is performed by a stator from an electric motor. Windings embedded in an organic, insulating material are placed and heated to 250°–500° C. under...
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7015183 |
Resist remover composition
The present invention relates to a resist remover composition for removing resists during manufacturing processes of semiconductor devices such as integrated circuits, large scale integrated...
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7014788 |
Surface treatment method and equipment
A method for treating material surface utilizing atomic hydrogen. The method includes utilizing atomic hydrogen by mixing halogen and/or halide to a gas which is used for generating, atomic...
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7011713 |
Cascade extracting and solvent refreshing method for recycling jelly cables
The method of continuously collecting jelly compounds from jelly filled cable is performed by recycling operation of a solvent by repeatedly heating, cleaning and condensing the recycling solvent...
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7011716 |
Compositions and methods for drying patterned wafers during manufacture of integrated circuitry products
Drying of patterned wafers is achieved in a manner effecting removal of water from the patterned wafers without collapse or deterioration of the pattern structures thereof. The drying is carried...
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7005010 |
Multi-process system
A system for processing a workpiece includes an inner chamber pivotably supported within an outer chamber. The inner chamber has an opening to allow liquid to drain out. A motor pivots the inner...
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7005011 |
Method of removing iron oxide deposits from the surface of titanium components
Disclosed is a method and solvent composition capable of removing iron oxide deposits from the surface of titanium components without substantially damaging the underlying titanium component. Iron...
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6994611 |
Method and system for cleaning a chemical mechanical polishing pad
A method and a system are provided for cleaning a CMP pad. The method starts by applying chemicals onto the surface of the CMP pad. The chemicals are then allowed to react with a residue that may...
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6984613 |
Post chemical mechanical polishing cleaning solution for 2.45T CoFeNi structures of thin film magnetic heads
The present invention is directed to methods for polishing and cleaning a wafer having CoFeNi structures within alumina fill to achieve corrosion-free, smooth, and planar surface. A preferred...
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6982006 |
Method and apparatus for treating a substrate with an ozone-solvent solution
A general method and apparatus for treating materials at high speed comprises the steps of dissolving a relatively high concentration ozone gas in a solvent at a relatively low predetermined...
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6982242 |
Aqueous detergent composition and method of use
An aqueous detergent composition is provided containing phosphoric acid or salt thereof, an organic phosphate surfactant, a nonionic surfactant, and water. The aqueous detergent composition may be...
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