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6458213 |
Method and device for automatic cleaning of opto-electronic sensor systems for substance analysis
The invention concerns a method and device for automatic cleaning of opto-electronic measuring systems used in process-technology for the analysis of substances in liquids and gases by means of...
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6454870 |
Chemical removal of a chromium oxide coating from an article
A chromium oxide coating is removed from a surface of an article by cleaning the article in an alkaline degreasing/rust removal solution at a degreasing/rust removal temperature of from about 180°...
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6455479 |
Stripping composition
Disclosed are compositions and methods useful for the removal of polymeric material from substrates, such as electronic devices. The compositions and methods disclosed are particularly suitable for...
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6454868 |
Permanganate desmear process for printed wiring boards
A desmear process for removing resin smeared on an interior wall of a through hole drilled in a resinous substrate, especially resinous substrates made from epoxy, polyimide, cyanate ester resins...
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6454869 |
Process of cleaning semiconductor processing, handling and manufacturing equipment
A process of cleaning semiconductor processing, handling and manufacturing equipment in which such equipment is contacted with a cleaning effective amount of liquid or supercritical carbon dioxide.
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6450181 |
Cleaning solution for electronic materials and method for using same
A cleaning solution for electronic materials contains dissolved oxygen gas at a concentration greater than atmospheric saturation concentration, 0.1-10,000 mg/liter of ammonia, and 0.1-10,000...
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6451124 |
Process for the chemical treatment of semiconductor wafers
A process for the chemical treatment of semiconductor wafers in the presence of HF and then in the presence of ozone, in particular for the cleaning of silicon semiconductor wafers, is such that...
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6451215 |
Method of producing magneto-resistive tunnel junction head
The present invention relates to a method of producing a magneto-resistive tunnel junction head comprising a tunnel multilayered film having a tunnel barrier layer, a ferromagnetic free layer and a...
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6444047 |
Method of cleaning a semiconductor substrate
A method of cleaning a semiconductor substrate is disclosed. The method comprises setting a substrate to-be-treated substantially in parallel to ends of multi-nozzles including an inner tube nozzle...
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6444255 |
Method for producing liquid crystal display and method for cleaning substrate
An electrode substrate is brush cleaned with a hydrogen gas dissolved water, which has an oxidation-reduction potential of −860 mV to −400 mV and a pH of 8 to 12, before applying an alignment...
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6436832 |
Method to reduce polish initiation time in a polish process
High through-put CMP is achieved by the application of a cleaning composition on to an exposed surface of a metal layer prior to polishing the bulk metal layer. Embodiments of the present invention...
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6431186 |
Method of cleaning electronic components
A simple cleaning method which can remove metal, organic and fine particle contaminants on the surface of electronic components, and especially those on silicon bases, and also suppress an increase...
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6431182 |
Plasma treatment for polymer removal after via etch
A method and article of manufacture of a via in a semiconductor layered device. The method can include applying an OH/H containing plasma, such as H 2 O or O 2 or a forming gas, to a via which has...
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6431183 |
Method for treating semiconductor substrates
A system for treatment of semiconductor substrates is comprised of an ozone generating means ( 11 ) , an ejector ( 10 ) which dissolves ozone in a chemical solution or pure water to be used for...
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6432218 |
Multi-step flow cleaning method and multi-step flow cleaning apparatus
A multi-step flow cleaning method and a multi-step flow cleaning apparatus are provided which effectively clean workpieces with a stream of a cleaning solution and to suppress an increase of...
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6430965 |
Process for producing glass substrate for information recording medium and process for producing recording medium using said glass substrate
A process for producing a glass substrate for an information recording medium comprising: (a) polishing a principal surface of a glass substrate to provide a polished glass substrate; (b) washing...
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6431184 |
Apparatus and method for washing substrate
Disclosed is an apparatus for washing a substrate, comprising a spin chuck holding and rotating a substrate, a process solution supply mechanism having a solution discharge port through which a...
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6432219 |
Method for separating layers from articles
A method for separating layers from articles made of high-speed steel and having at least one layer of TiAlN, includes applying an alkaline solution containing hydrogen peroxide, a base as well as...
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6428715 |
Method for producing sliders
A method for producing sliders without alumina overcoat protrusion on the air bearing surface. The method comprises a method for removing alumina protrusion on the air bearing surface of a slider...
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6428628 |
Paint-removing method, paint-removing device, and ship removed of paint
A paint-removing method comprises the steps of putting dimethyl sulfoxide into a tank, raising the dimethyl sulfoxide at a temperature of approximately 35° C. to 189° C. in the tank; and soaking...
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6428625 |
Process for pickling a metal using hydrogen peroxide
In the invention pickling process, steel and nickel or chromium alloys are pickled with an acidic pickling solution employing an oxidant, particularly hydrogen peroxide, and in which liquor is...
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6427703 |
Method and apparatus for removing carbon contamination in a sub-atmospheric charged particle beam lithography system
A cleaning system for use with a micro-column array, electron beam lithography system is described. The cleaning system includes an oxidizer source and an oxidizer distribution mechanism that...
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6425956 |
Process for removing chemical mechanical polishing residual slurry
A process of removing residual slurry resulting from chemical mechanical polishing of a workpiece in which the workpiece is contacted with a composition of a supercritical fluid, said supercritical...
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6425929 |
Metal cleaner-polish
A metal cleaner-polish in the form of a substantially homogeneous liquid slurry containing aliphatic hydrocarbons, finely divided abrasive, and isopropanol as a stabilizer/solvent.
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6425955 |
Process for avoiding foaming during cleaning of metal salts of intermediate length carboxylic acids from surfaces
Aqueous alkaline cleaning solutions are used to remove metal intermediate length carboxylate salts from a solid substrate. Foaming of the aqueous alkaline cleaning solution can be adequately...
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6423675 |
Cleaning-in-place composition and method for using the same
A composition for a cleaning-in-place system is described. The composition has a halogen dioxide and a optionally hydroxide and does not require the use of a detergent to display excellent cleaning...
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6423146 |
Method for cleaning a semiconductor substrate
In a method for cleaning a semiconductor substrate, ozone water is supplied to a cleaning chamber, which contains the substrate, thereby to oxidize the surface thereof, and thus form a thin oxide...
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6423147 |
Method of cleaning a wafer
A method of removing small particles remaining on a surface of a semiconductor wafer and preventing a silicide layer covering the semiconductor wafer from corroding starts by controlling a...
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6422246 |
Method removing residual photoresist
A method for removing residual color photoresist material from a substrate after photoresist development. The method washes the substrate with a high-pressure jet of de-ionized water that contains...
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6419754 |
Endpoint detection and novel chemicals in copper stripping
An endpoint detection system for copper stripping using a colorimetric analysis of the change in concentration of a component is described. Wet copper stripping chemicals are used to strip copper...
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6419757 |
Method for cleaning sintered silicon carbide in wet condition
A sintered silicon carbide has a high density and only small amounts of organic and inorganic impurities on the surface and in the vicinity of the surface, i.e., a density of 2.9 g/cm 2 or more...
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6419755 |
Chemical delacquering process
A chemical delacquering composition, process and system for delacquering substrates such as aluminum scrap in which an aqueous solution containing at least one short-chain organic acid, preferably...
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6416589 |
Carbon-enhanced fluoride ion cleaning
A method and system for cleaning a metal article. The system is used to employ a method that comprises placing the article in a means defining a chamber; subjecting the article to a gaseous...
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6416586 |
Cleaning method
The present invention has as an object thereof to provide a cleaning method which realizes, in the cleaning process, (1) a reduction in the number of processes, (2) a simplification of the cleaning...
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6417147 |
Cleaning agent composition, method for cleaning and use thereof
An object of the present invention is to provide a new cleaning agent composition having excellent cleaning power for the surface contamination of a semiconductor wafer or various precisely worked...
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6416587 |
Apparatus and method for cleaning wafer
A wafer cleaning apparatus includes a rinsing container in which wafers to be cleaned are positioned and four sets of nozzles arranged in the rinsing container to be symmetric with respect to each...
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6409891 |
Low energy plasma cleaning method for cryofilms
Cryofilm/organic contaminants are removed from cryogenically cooled surfaces such as spacecraft cryo-telescope mirrors by sputtering and chemical reaction with a low energy plasma having an average...
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6406550 |
Apparatus and method for sequential removal of oxides from steel
Oxides on the surfaces of metal are reduced by directing reducing gases at them in a forceful and turbulent manner. In a preferred version, the gas is passed through at least two reducing zones...
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6402851 |
Lanthanide oxide dissolution from glass surface
A method and product for computer disk drives. Glass substrates are provided having low content of residual polishing particles on the surfaces thereof. An exemplary method includes reduction of...
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6402852 |
Apparatus and method for continuous removal of oxides from metal
Oxides on the surfaces of metal are reduced by directing reducing gases at them in a forceful and turbulent manner in an enclosure. The oxide-bearing surface is heated to at least 900 degrees F.
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6398875 |
Process of drying semiconductor wafers using liquid or supercritical carbon dioxide
A process of drying a semiconductor wafer which includes at least one microelectric structure disposed thereon which includes contacting a water-containing thin film-covered semiconductor wafer...
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6398874 |
Use of alkoxy N-hydroxyalkyl alkanamide as resist removing agent, composition for removing resist, method for preparing the same and resist removing method using the same
A resist removing agent and a resist removing composition, having an excellent capability for removing a resist and polymer and which does not attack underlying layers, a method for preparing the...
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6399022 |
Simplified ozonator for a semiconductor wafer cleaner
The invention provides water enriched with ozone by generating ozone from oxygen using short-wavelength ultraviolet light and pumping the generated ozone under pressure through a 0.1-micron filter...
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6398876 |
Process for pickling steel
Stainless steel is pickled by a chemical and/or electrochemical pickling process using an acid liquid, containing substantially no nitric acid. The process uses a spent electrolyte solution from an...
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6395097 |
Method and apparatus for cleaning and removing flux from an electronic component package
The present invention is a method for cleaning the cavities in electronic components by providing a semiconductor component having an outside surface and a cavity therein. The component including...
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6394107 |
Use of fluorinated ketones as wet cleaning agents for vapor reactors and vapor reactor components
A method for cleaning a vapor reactor by applying a liquid cleaning agent comprising a fluorinated ketone having about 5 to about 10 carbon atoms and up to two hydrogen atoms is described. The...
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6395101 |
Single semiconductor wafer processor
In a method of processing or drying a semiconductor wafer, the wafer is withdrawn from a fluid bath at an inclined angle, and at a selected withdrawal speed. A solvent vapor is provided at the...
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6391117 |
Method of washing substrate with UV radiation and ultrasonic cleaning
Dirt, particularly of inorganic matter, attached to a substrate, such as a glass substrate for liquid crystal devices, is effectively removed by irradiating the substrate with ultraviolet rays...
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6392417 |
Arrangement and method for detecting the end of life of an aqueous bath utilized in semiconductor processing
Arrangement and method for detecting the end of life of an aqueous bath utilized in semiconductor processing, the bath containing water, an amount of hydrogen peroxide and an amount of a...
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6391118 |
Method for removing particles from surface of article
A method and an apparatus for removing particles from a surface of an article, such as a semiconductor wafer in a clean room. The particles are supplied with an electric charge. Subsequently, an...
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