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7615259 Method and apparatus for processing workpiece  
The present invention is a processing method for applying predetermined processing to a workpiece with said workpiece mounted on a mounting stage arranged in a process chamber in a depressurized...
7601227 High purification method of jig for semiconductor heat treatment  
A method for achieving high purity in a jig for semiconductor heat treatment includes subjecting a semiconductor heat treatment jig made of a substrate having a surface covered with a silicon...
7585372 Method and apparatus for generating gas pulses  
Method and apparatus of producing gas pressure pulses in a dust-deposit cleaning apparatus. The apparatus comprises a combustion chamber and an amplifying horn. According to the method a...
7546840 Method for cleaning reaction container and film deposition system  
After semiconductor wafers are loaded into a reaction vessel, and ruthenium (Ru) film or ruthenium oxide film is formed, the interior of the reaction vessel is efficiently cleaned without...
7540291 Method and device for cleaning a blowing head for plastic films  
In a first phase, after completion of a production process for plastic films, the blowing head is heated by the heater that is present to a temperature above the melting temperature of the plastic...
7534306 Steam humidifier and method  
The steam humidifier fed with a premix of natural gas and forced air under low pressure (less than 1 psi) includes a main frame, a movable lower frame, a two part evaporation canister, releasably...
7531045 Method for removing haze in a photo mask  
An apparatus for removing haze in a photo mask includes sealed chamber having a bake module disposed therein to support a photo mask, a reactant gas feed line to feed a reactant gas into the...
7525010 Process to wash polymers contaminated with polychlorinated biphenyls (PCBs)  
A process of washing plastics contaminated with polychlorinated biphenyls (PCBs) is provided to reduce the concentration of the PCBs. A two-step process includes a first washing step using a...
7513955 Process for the plasma cleaning of a component  
Cracks are conventionally difficult to clean which often leads to damage to other regions of the component for cleaning. According to the invention, a plasma cleaning method is used, whereby a...
7507297 Cleaning method and cleaning apparatus  
A cleaning effect is improved by cleaning a component that has a recess structure by using a cleaning medium of a liquefied gas or a supercritical fluid. By the cleaning method of removing adhering...
7455565 Fabrication of group III-nitride photocathode having Cs activation layer  
Improved photocathodes are provided by a fabrication method including steps of wet chemically cleaning the photocathode emission surface (to reduce the level of cleaning-induced surface damage),...
7429337 Method for removing at least one area of a layer of a component consisting of metal or a metal compound  
The invention relates to a method for removing an area of a layer of a component consisting of metal or a metal compound. According to prior art, corrosion products of a component are removed in a...
7416611 Process and apparatus for treating a workpiece with gases  
In a method and apparatus for cleaning or processing a workpiece, a process gas is brought into contact with the workpiece by diffusion through a heated liquid layer on the workpiece, and by bulk...
7413613 Method for activating electron source surface of field emission display  
A method for activating surface of electron emission source of a field emission display. After a cathode structure is fabricated and sintered with high temperature, the surface of electron emission...
7410611 In-line method and apparatus to prevent fouling of heat exchangers  
The present invention relates to a method and apparatus for the prevention of fouling of process streams by the application of electric charge on process components. The electric charge may be...
7410543 Substrate processing method  
Resists can be removed while metal contamination of wafers, etc. and generation of particles, and growth of oxide films are suppressed. A substrate processing method comprises feeding a processing...
7383841 Method of cleaning substrate-processing device and substrate-processing device  
In a cleaning step of a substrate-processing device, vacuum drawing is made for the space between an inner chamber and an outer chamber that receives the inner chamber. Temperature of the inner...
7377984 Method for cleaning a photomask  
Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to...
7368020 Reduced particle contamination manufacturing and packaging for reticles  
A method of transporting a reticle is disclosed. The reticle is placed in a reticle carrier that has an ionizer. Moreover, the reticle may be attached with a pellicle. The pellicle consists of a...
7364625 Rinsing processes and equipment  
Described are methods of rinsing and processing devices such as semiconductor wafers wherein the device is rinsed with using a surface tension reducing agent; the method may include a subsequent...
7361233 Methods of hydrogen cleaning of metallic surfaces  
The pulsed partial pressure hydrogen cleaning of cobalt-based alloys in turbine components is achieved by disposing the component within a vacuum furnace and heating the component. Upon heating to...
7332042 Process for treatment and extraction of organic cork compounds by a dense fluid under pressure  
Process for the treatment of cork or a cork-based material particularly with a view towards extracting contaminating organic compounds, in which said cork or said cork-based material is put into...
7332041 Residential dishwasher  
A dishwasher that fits within the conventional U.S. residential dishwasher counter space and uses the conventional U.S. residential power supply to achieve within a convenient cycle time the same...
7326305 System and method for decapsulating an encapsulated object  
A system and method for the selective etching or removal of encapsulating material from an encapsulated object, such as a semiconductor, includes depositing an encapsulant-removal agent, such as a...
7306681 Method of cleaning a semiconductor substrate  
A cleaning method and cleaning recipes are disclosed. The present invention relates to a method for cleaning a semiconductor substrate and cleaning recipes. The present invention utilizes a first...
7306680 Method of cleaning by removing particles from surfaces, a cleaning apparatus and a lithographic projection apparatus  
A lithographic mask is placed in a chamber which is then sealed. The gas pressure in the chamber is reduced to dislodge contaminant particles on the mask surface.
7300527 Method for activating surface of base material and apparatus thereof  
A method for activating the surface of a base material and an apparatus thereof, which is suited to be utilized for pretreatment in electrochemical treatment such as, for example, electroplating or...
7288155 Method for the rapid thermal control of a work piece in liquid or supercritical fluid  
A method for cleaning a semiconductor structure including providing a chamber for holding the semiconductor structure and a dense phase fluid, providing a thermal transfer device having a thermal...
7284558 Enhanced megasonic based clean using an alternative cleaning chemistry  
The present invention relates to the use of a C 1 to C 5 alcohol during the cleaning step. With the use of said alcohol, the surface tension of the solution is reduced which allows the...
7264679 Cleaning of chamber components  
In a method of cleaning a surface of a substrate processing chamber component to remove process deposits, the component surface is cooled to a temperature below about −40° C. to fracture the...
7258748 Method and solution for bakery pan deglazing and decarbonizing  
In a method for processing a baking pan, the baking pan is placed in a solution including: water, N-Methyl-2-Pyrrolidone, Ethoxylate of nonylphenol, Monoethanolamine, Triethanolamine and Potassium...
7192490 Method for treating and extracting cork organic compounds, with a dense fluid under pressure  
Process for the treatment of cork or a cork-based material particularly with a view towards extracting contaminating organic compounds, in which said cork or said cork-based material is put into...
7186301 Device and method for cleaning photomask  
Disclosed herein is a device and a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat...
7186299 Method of rinsing and drying semiconductor substrates  
A method for cleaning and drying semiconductor wafers improves device yield by providing more advanced control of the ratio of drying fluid to cleaning fluid, for example the ratio of N2 vapor to...
7182820 Methods and apparatus for cleaning a hearing aid device  
Methods and apparatus for cleaning hearing aid devices are disclosed. Drying is facilitated in hearing instruments through a novel combination of heater and desiccant in an essentially closed...
7172657 Cleaning method of treatment equipment and treatment equipment  
In a state of the inside of a treatment chamber of treatment equipment being evacuated, therein a cleaning gas containing trifluoroaceticacid (TFA) as a cleaning agent is supplied. Metal such as...
7163588 Processing a workpiece using water, a base, and ozone  
Contaminants such as photoresist are quickly removed from a wafer having metal features, using water, ozone and a base such as ammonium hydroxide. Processing is performed at room temperature to...
7159598 Cleaning system and method of use  
A method, system and apparatus for cleaning a tank through the use of a pair of spray heads arranged in operable communication with a pump via a pair of hose lines. One of the spray heads is...
7138065 Method for removing at least one area of a layer of a component consisting of metal or a metal compound  
The invention relates to a method for removing an area of a layer of a component consisting of metal or a metal compound. According to prior art, corrosion products of a component are removed in a...
7125457 Method for removing oxide from cracks in turbine components  
A method for removing an oxide material from a crack in a substrate, the method includes: applying a slurry paste comprising a fluoride salt to the crack; heating the slurry paste and the crack to...
7097717 Method and device for collecting particulate contaminants during CO2 blasting decontamination  
Disclosed is a method and device for collecting particulate contaminants removed using a CO 2 decontamination medium from an early step of a decontamination process. The device removes particulate...
7097713 Method for removing a composite coating containing tantalum deposition and arc sprayed aluminum from ceramic substrates  
A method for removing a metallic layer from the surface of a ceramic substrate, the method including the steps of immersing the metallic coated ceramic substrate in a solution of up to 31%...
7045022 Removal of adherent molten metal from surfaces  
The present invention provides a method and process for removing adherent molten metal from a surface by applying a non-wetting agent for the metal to the surface or to the adherent molten metal....
7041177 High temperature rapid soil removal method  
A method of removing soil an article including the steps of immersing said article in an alkaline composition having a concentration of at least one source of alkalinity about 0.25% or higher,...
7040327 Die cleaning method  
There is disclosed a die cleaning method for removing a forming-material from a die used in forming the forming-material containing a binder, comprising the steps of: removing a part or all of the...
7037381 Method for removing ceramic coatings from component surfaces  
Method for stripping ceramic coatings from the surfaces of articles. The apparatus includes a dedicated pressure vessel, such as an autoclave, which is maintained at an elevated temperature....
7029537 Method of processing selected surfaces in a semiconductor process chamber based on a temperature differential between surfaces  
The present invention relates to a method of processing selected surfaces in a semiconductor process chamber by creating a temperature differential between the selected surfaces and contacting the...
7018483 Machine and method for thermal cleaning and separation of metal parts  
Thermal cleaning and separation of metal parts is performed by a stator from an electric motor. Windings embedded in an organic, insulating material are placed and heated to 250°–500° C. under...
7011713 Cascade extracting and solvent refreshing method for recycling jelly cables  
The method of continuously collecting jelly compounds from jelly filled cable is performed by recycling operation of a solvent by repeatedly heating, cleaning and condensing the recycling solvent...
6996479 Method and apparatus for measuring and controlling the water content of a water-containing liquid mixture  
An apparatus for measuring the water content of a water-containing liquid mixture contained in a tight chemistry tank includes a heating device for controlling the temperature of the liquid mixture...