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7617830 |
Wash chamber for automated appendage-washing apparatus
A wash cylinder or chamber for an automated cleaning station to clean an object or a person's body part includes nozzles on the interior of the cylinder, the nozzles of one embodiment comprising an...
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7607442 |
Wash chamber for automated appendage-washing apparatus
A wash cylinder or chamber for an automated cleaning station to clean an object or a person's body part includes nozzles on the interior of the cylinder, the nozzles of one embodiment comprising an...
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7607443 |
Wash chamber for automated appendage-washing apparatus
A wash cylinder or chamber for an automated cleaning station to clean an object or a person's body part includes nozzles on the interior of the cylinder, the nozzles of one embodiment comprising an...
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7568490 |
Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids
An apparatus and method are disclosed in which a semiconductor substrate having a surface containing contaminants is cleaned or otherwise subjected to chemical treatment using a foam. The...
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7517431 |
Spinning apparatus
In an embodiment, a spinning apparatus includes a spin table on which an object to be etched is placed, a rotation unit rotating the spin table, and a nozzle unit including a center nozzle,...
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7451774 |
Method and apparatus for wafer cleaning
An apparatus for wet processing individual wafers comprising; a means for holding the wafer; a means for providing acoustic energy to a non-device side of the wafer; and a means for flowing a fluid...
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7422023 |
Tissue valve cleansing apparatus
The apparatus includes a housing having a centrally disposed longitudinal axis situated along a horizontal plane during operating conditions. The housing further has a monolithically formed flange...
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7422024 |
Ultrasonic shower cleaning apparatus of double-side cleaning type
An ultrasonic shower cleaning apparatus is disclosed which is capable of efficiently cleaning both surfaces of an article and configured to have a reduced size enabling an installation space...
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7387132 |
Apparatus for treating wafer
An apparatus for treating a wafer preferably includes a rotating chuck for rotating the wafer and a treating fluid supplying part for supplying the wafer with one or more treating fluids. The...
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7306002 |
System and method for wet cleaning a semiconductor wafer
A system and method for cleaning a substrate, such as a semiconductor wafer, utilizes a rotatable wafer supporting assembly with a cylindrical body to provide stability for the substrate being...
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7270136 |
Apparatus for cleaning the edges of wafers
The invention concerns an apparatus for cleaning the edge of a wafer that may be relatively simply constructed with low cost, and prevent the wafer from being re-contaminated by the edge cleaning,...
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7267129 |
Device and process for liquid treatment of wafer-shaped articles
A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, near the edge, in which the liquid is applied to a first surface, flows essentially radially to the...
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7267132 |
Methods for removing silicon and silicon-nitride contamination layers from deposition tubes
Described are methods, systems, and chemistries for removing layers of stubborn silicon and silicon-nitride contamination layers from the inside surfaces of such articles as deposition tubes. In...
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7258124 |
Apparatus and method for treating surfaces of semiconductor wafers using ozone
An apparatus and method for treating surfaces of semiconductor wafers with a reactive gas, such as ozone, utilizes streams of gaseous material ejected from a gas nozzle structure to create...
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7252102 |
Ultrasonic slat washer
An ultrasonic cleaner apparatus is disclosed which includes a support housing, a tub supported by the housing and an ultrasound and sensor transducer contacting the bottom of the cleaning tank. A...
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7201176 |
Wafer chucking apparatus for spin processor
A wafer chuck is configured to hold a wafer efficiently for spin process cleaning of wafer edges and back sides. A first group of retractable tips extend to hold the wafer during a first portion of...
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7172674 |
Device for liquid treatment of wafer-shaped articles
A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, in which a mask is kept at a defined short distance to the wafer-shaped article such that liquid...
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7140066 |
Apparatus and method for inspecting and cleaning semiconductor devices
A semiconductor device is inspected and cleaned by applying a vacuum to the area in which the semiconductor device is positioned. Micro-sized particulates that are brushed off the semiconductor...
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7108001 |
Method and apparatus for rotation of a workpiece in supercritical fluid solutions for removing photo resist, residues and particles therefrom
A supercritical fluid cleaning system uses process fluid for operating rotary motors in the chamber with fluid bearings and fluid load levitation for rotating workpieces and impellers. Rotating...
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7073521 |
Substrate processing apparatus comprising ring-shaped motor
In a substrate processing apparatus for performing a substrate processing with a substrate being rotated, a ring-shaped motor is provided and a water pipe, a drainpipe and gas supply pipes are...
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7055535 |
Holding unit, processing apparatus and holding method of substrates
A holding unit holds a substrate to enable a surface of the substrate to be processed. The unit has a vacuum suction member that comes into contact with a peripheral portion of the surface of the...
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7056392 |
Wafer chucking apparatus and method for spin processor
A wafer chuck is configured to hold a wafer efficiently for spin process cleaning of wafer edges and back sides. A first group of retractable tips extend to hold the wafer during a first portion of...
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7051743 |
Apparatus and method for cleaning surfaces of semiconductor wafers using ozone
An apparatus and method for cleaning surfaces of semiconductor wafers utilizes streams of gaseous material ejected from a gas nozzle structure to create depressions on or holes through a boundary...
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7040330 |
Method and apparatus for megasonic cleaning of patterned substrates
A system for cleaning a semiconductor substrate is provided. The system includes transducers for generating acoustic energy oriented in a substantially perpendicular direction to a surface of a...
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6983755 |
Cleaning method and cleaning apparatus for performing the same
A cleaning apparatus includes upper and lower nozzle assemblies supplying a cleaning liquid to edge and bottom sections of a semiconductor substrate. The upper nozzle assembly has a first nozzle...
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6969682 |
Single workpiece processing system
A system for processing wafers includes a robot moveable within an enclosure to load and unload workpieces into and out of workpiece processors. A processor includes an upper rotor having alignment...
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6964724 |
Etching and cleaning methods and etching and cleaning apparatuses used therefor
An etching/cleaning apparatus is provided, which makes it possible to effectively remove an unnecessary material or materials existing on a semiconductor wafer without damaging the device area with...
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6960265 |
Apparatus and method for collecting metallic impurity on a semiconductor wafer
An apparatus and method for automatically collecting metallic impurities of a semiconductor wafer. In one aspect, an apparatus includes an air tight process chamber including a loading unit for...
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6949172 |
Arrangement enabling a liquid to flow evenly around a surface of a sample and use of said arrangement
The invention relates to an arrangement enabling a liquid ( 2 ) to flow evenly around a surface of a sample ( 3 ); said arrangement has a flow chamber ( 1 ) through which a liquid ( 2 ) flows via...
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6916126 |
Developing method for semiconductor substrate
Embodiments of the present invention provide a developing method, which can efficiently prevent the developing solution from remaining on the backside surface of the wafer, so as to avoid the...
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6900132 |
Single workpiece processing system
A system for processing semiconductor wafers has process units on a deck of a frame. The process units and the deck have precision locating features, such as tapered pins, for precisely positioning...
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6895979 |
Processing apparatus and processing method
A processing apparatus essentially includes a rotatable rotor 21 for carrying semiconductor wafers W, a motor 22 for driving to rotate the rotor 21, a plurality of processing chambers for...
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6895981 |
Cross flow processor
A centrifugal processor includes an elongated inlet and outlet in fluid communication with a rotor housing having an eccentric bowl. A rotor having fan blades and adapted to hold flat media is...
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6880563 |
Apparatus and method of cleaning a substrate
A cleaning apparatus is provided with a processing bath to be filled with a cleaning chemical, an ultrasonic oscillator, and a retainer for holding a substrate to be immersed into a cleaning...
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6874516 |
Substrate cleaning apparatus
A substrate cleaning apparatus comprises an outer shell constructed such that the outer shell is selectively openable or hermetically closable to form a sealed space, an inner shell enclosed within...
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6845778 |
In-situ local heating using megasonic transducer resonator
An apparatus for cleaning a semiconductor substrate is provided. In embodiment of the present invention, a megasonic cleaner capable of providing localized heating is provided. The megasonic...
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6827093 |
Optical lens steam cleaning apparatus and method of using the same
A cleaning apparatus for a lens defining opposed top and bottom surfaces and a peripheral edge. The cleaning apparatus comprises a rotatable base having a plurality of arms pivotally connected...
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6821488 |
Sample holding chuck for use in reactor and reactor using same
A chuck assembly for holding a sample includes a shaft; a generally circular chuck member, the shaft extending from a first surface of the chuck member; and a sample holder associated with a second...
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6821356 |
Cleaning device and method for cleaning, using liquid and/or supercritical gases
A cleaning apparatus includes (1) a pressure tank with at least one cleaning tank arranged therein; (2) means for supplying the cleaning apparatus with a cleaning fluid; and (3) means inside the...
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6818071 |
Method and apparatus for cleaning a roller cover
An apparatus and method for cleaning a roller cover of the type used to apply a coating material is disclosed. In one embodiment the apparatus includes a body, at least one roller cover engaging...
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6810888 |
Wafer rotary holding apparatus and wafer surface treatment apparatus with waste liquid recovery mechanism
Provided is a wafer rotary holding apparatus by which a reduced pressure is created on an upper surface of a rotary disk by a simple and easy-to-make mechanism with no need of any of a vacuum...
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6806194 |
Apparatus and methods for processing a workpiece
A system for processing a workpiece includes a head attached to a head lifter. A workpiece is supported in the head between an upper rotor and a lower rotor. A base has a bowl for containing a...
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6797075 |
Ferris wheel-like stripping or cleaning mechanism for semiconductor fabrication
A Ferris wheel-like stripping or cleaning mechanism that can be used in semiconductor fabrication, such as in photoresist or other stripping, or wafer or other cleaning, is disclosed. A stripping...
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6794291 |
Reactor for processing a semiconductor wafer
An apparatus for processing a semiconductor wafer or similar article includes a reactor having a processing chamber formed by upper and lower rotors. The wafer is supported between the rotors. The...
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6786224 |
Spin, rinse, and dry station with adjustable nozzle assembly for semiconductor wafer backside rinsing
A nozzle assembly includes a connector tube having a first end and a second end. An outer surface of the connector tube is threaded. A first cap having an opening therethrough is threaded onto the...
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6776175 |
Liquid waste disposal and canister flushing system
A liquid waste disposal and canister flushing system for a medical canister including a press-fit canister lid, features a cabinet with an opening and a sink with a drain positioned therein. A...
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6766813 |
Apparatus and method for cleaning a wafer
The present invention provides a method of cleaning a wafer. The method comprises suspending the wafer beneath a vacuum chuck. The vacuum chuck contains an acoustic wave emitter. The acoustic wave...
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6752162 |
Edge roller assembly, method for contacting an edge of a substrate, and transport system for transporting semiconductor wafers to a wafer processing station
An edge roller assembly includes first and second grip rings. The grip rings are held together in an opposing relationship such that outer surfaces thereof define a groove for receiving an edge of...
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6745784 |
Method of and apparatus for cleaning substrate
An apparatus continuously supplies an acid solution to a central portion of a surface of a substrate while the substrate is rotating, and also supplies an oxidizing agent solution continuously or...
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6739347 |
System for spin-cleaning closed-end filter cartridges
The spindle assembly is self-centered on the end of the cylindrically shaped cartridge filter by a three-point grip on the perimeter. A similar spindle assembly is attached to the other end of the...
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