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7607442 |
Wash chamber for automated appendage-washing apparatus
A wash cylinder or chamber for an automated cleaning station to clean an object or a person's body part includes nozzles on the interior of the cylinder, the nozzles of one embodiment comprising an...
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7604013 |
Substrate cleaning method and developing apparatus
A cleaning method highly effectively cleans a surface of a semiconductor wafer by removing a dissolution product, produced when a surface of a semiconductor wafer is processed by a developing...
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7596886 |
Method and system to separate and recycle divergent chemistries
In one embodiment of the invention, an apparatus for collecting fluid within a wafer cleaning chamber is provided. The apparatus includes a rotatable annular manifold configured to support a wafer...
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7582163 |
Apparatus for processing surface of substrate
A substrate surface processing apparatus is provided. In the substrate surface processing apparatus, a spin chuck holds a substrate thereon by suction, spins the substrate, and moves up and down...
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7568489 |
Method of and apparatus for eluting impurities
Impurities can be eluted simultaneously from a plurality of local areas of a surface layer of a semiconductor substrate. A supporting unit supports the substrate, and a sample plate is disposed on...
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7527698 |
Method and apparatus for removing a liquid from a surface of a substrate
A method and apparatus for removing a first liquid from a surface of a substrate is provided. A second liquid is supplied to at least part of a surface of a substrate having a rotary movement. The...
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7520286 |
Apparatus and method for cleaning and drying a container for semiconductor workpieces
The invention provides an apparatus for cleaning and drying a container for semiconductor workpieces. The apparatus comprises a load port with a fixture that receives a dirty container and delivers...
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7517431 |
Spinning apparatus
In an embodiment, a spinning apparatus includes a spin table on which an object to be etched is placed, a rotation unit rotating the spin table, and a nozzle unit including a center nozzle,...
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7510611 |
Coating film forming method and apparatus
A coating solution is sprayed on a rotating wafer held horizontally from a nozzle provided above the wafer while the nozzle is travelling over the wafer from a wafer center to a wafer outer area,...
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7488400 |
Apparatus for etching wafer by single-wafer process
An apparatus for etching a wafer by a single-wafer process comprises a fluid supplying device which feeds an etching fluid on a wafer, and a wafer-chuck for horizontally holding the wafer. The...
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7422024 |
Ultrasonic shower cleaning apparatus of double-side cleaning type
An ultrasonic shower cleaning apparatus is disclosed which is capable of efficiently cleaning both surfaces of an article and configured to have a reduced size enabling an installation space...
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7412981 |
Liquid processing apparatus and method
A liquid processing apparatus includes containers 26, 27, 26 a , 26 b surrounding processing chambers 51, 52 for accommodating a plurality of wafers W and nozzles 54, 56 for supplying a...
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7393387 |
Particle filter cleaning apparatus
The invention is an apparatus for cleaning one or more cylindrical filters. An enclosure contains the entire apparatus in which each filter is supported on its own pair of rotating horizontal...
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7389783 |
Proximity meniscus manifold
An apparatus for processing a substrate is provided which includes a first manifold module to generate a fluid meniscus on a substrate surface. The apparatus also includes a second manifold module...
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7387132 |
Apparatus for treating wafer
An apparatus for treating a wafer preferably includes a rotating chuck for rotating the wafer and a treating fluid supplying part for supplying the wafer with one or more treating fluids. The...
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7387131 |
Processing apparatus and substrate processing method
A substrate processing apparatus for processing a substrate With a processing fluid is provided. The apparatus includes holding members 60 for holding the substrate W, a chuck member 61 for...
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7364626 |
Substrate processing apparatus and substrate processing method
Substrate cleaning apparatus and method capable of preventing adhesion of particles to a substrate irrespective of being hydrophilic or hydrophobic are provided. Although a cleaning liquid ejected...
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7353832 |
Housingless washer
An industrial parts washer includes a stand adapted to support a part, a chamber selectively movable from a first position clear of the part to a second position engaging the stand where the...
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7347214 |
Rotary shaft sealing mechanism and liquid processing apparatus
The present invention provides a rotary shaft sealing mechanism having the seal between the rotary shaft and the seal ring improved, and a liquid processing apparatus including the rotary shaft...
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7337792 |
Liquid processing apparatus and liquid processing method
A cleaning apparatus 1 includes a foup loading/unloading part 2 for mounting foups F each accommodating a plurality of wafers W at intervals of a constant pitch (normal pitch), a rotor 34 ...
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7328713 |
Nozzle apparatus for stripping edge bead of wafer
There is provided a nozzle apparatus for stripping an edge bead from a wafer, which includes a rotatable support arm, and a side rinse nozzle coupled to a leading end of the support arm to remove...
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7314054 |
Liquid processing apparatus with nozzle having planar ejecting orifices
A liquid processing apparatus includes containers 26, 27, 26 a, 26 b surrounding processing chambers 51, 52 for accommodating a plurality of wafers W and nozzles 54, 56 for supplying a...
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7311781 |
Substrate rotation type treatment apparatus
An apparatus causes a substrate to rotate and supplies a treatment liquid to a substrate surface to make a treatment, without concern that a mixed substance is eluted from a cup in the use for a...
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7305999 |
Centrifugal spray processor and retrofit kit
A centrifugal spray processor for processing semiconductor wafers uses larger numbers of spray nozzles. Each spray nozzle delivers a reduced volume of liquid, to reduce consumption of liquid...
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7303633 |
Apparatus for producing optical information recording medium
A method for producing an optical information recording medium includes the steps of: coating a solution for forming a dye recording layer onto a surface of a rotating disc-shaped resin substrate;...
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7284560 |
Liquid processing apparatus
A liquid processing apparatus has a substrate rotating device including a holder for holding a substrate and a motor, a chamber for applying the liquid processing to the substrate, a posture...
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7282086 |
Fluid filter cleaning apparatus
A filter cleaning apparatus for cleaning a filter using cleaning fluid comprises a housing, a filter holder for holding the filter, wherein the filter holder is mountable in the housing, a rotating...
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7275551 |
Device for cleaning food with ozone water, and method of cleaning food using cleaning device
A food washing apparatus of the invention includes an ozonized water generator ( 10 ), a cylindrical washing tank ( 1 ) in which the food materials are put and which can rotate to wash the food...
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7267129 |
Device and process for liquid treatment of wafer-shaped articles
A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, near the edge, in which the liquid is applied to a first surface, flows essentially radially to the...
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7252099 |
Wafer cleaning apparatus with multiple wash-heads
A wafer cleaning apparatus with multiple wash-heads is applied in chemical and mechanical polishing process after wafer cleaning. The wafer cleaning apparatus device includes a supporting base,...
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7237561 |
Apparatus for cleaning semiconductor wafer including heating using a light source and method for cleaning wafer using the same
An apparatus for cleaning a semiconductor wafer and method for cleaning a wafer using the same wherein, the apparatus includes a chamber on which a wafer is mounted, a revolving chuck mounted in...
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7226055 |
Substrate holding and spinning assembly and methods for making the same
A substrate holding apparatus is provided. The substrate holding apparatus includes a chuck yoke, a plurality of arm assemblies, and a plurality of gripper assemblies. A first end of each of the...
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7223323 |
Multi-chemistry plating system
Embodiments of the invention generally provide an electrochemical plating system. The plating system includes a substrate loading station positioned in communication with a mainframe processing...
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7217325 |
System for processing a workpiece
A system for processing a workpiece includes a process head assembly and a base assembly. The process head assembly has a process head and an upper rotor. The base assembly has a base and a lower...
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7201808 |
Method and apparatus for rotating a semiconductor substrate
An apparatus that includes a rotatable single wafer holding bracket with one or more wafer supports disposed on the single wafer holding bracket, wherein the one or more wafer supports position a...
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7195679 |
Versatile system for wafer edge remediation
The present invention provides a system ( 200, 300 ) for remediating aberrations along the perimeter of a semiconductor wafer ( 202 ). The system includes a cleaning apparatus ( 204 ) within which...
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7172674 |
Device for liquid treatment of wafer-shaped articles
A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, in which a mask is kept at a defined short distance to the wafer-shaped article such that liquid...
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7169664 |
Method of reducing wafer contamination by removing under-metal layers at the wafer edge
According to the present invention, a metal and a barrier material, such as copper and a tantalum-based barrier material, are effectively removed from the wafer edge and especially from the bevel...
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7143793 |
Cleaning system for a filling machine
An automatic cleaning apparatus and/or method for periodically cleaning a filling machine during a filling cycle without the need for human interaction to initiate the cleaning process. In some...
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7124466 |
Particle capture system
A particle capture system includes a container sized to receive a structural disc drive component. A fixture is able to maintain the disc drive component within a spray zone in the container, and a...
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7107999 |
Substrate processing apparatus for removing organic matter by removal liquid
An indexer part, removal processing part, interface, and dry processing part are disposed adjacent to each other in a row. That is, the removal processing part that performs removal processing of...
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7017281 |
Substrate processing apparatus and substrate processing method drying substrate by spraying gas
A first gas nozzle and a second gas nozzle are fixedly provided in the vicinity of the forward end of a nozzle arm. The nozzle arm is rotated along a locus R while a substrate rinsed with deionized...
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7000653 |
High pressure processing apparatus and high pressure processing method
A high-pressure processing apparatus includes a processing vessel including a processing chamber formed therein to perform a certain process onto an object in the processing chamber; fluid feeding...
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7000623 |
Apparatus and method for substrate preparation implementing a surface tension reducing process
Methods and systems for preparing a substrate implementing a surface tension reducing process are provided. In one example, a substrate preparation system includes a chuck which fingers for edge...
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7000621 |
Methods and apparatuses for drying wafer
Apparatuses and methods of processing a substrate. The apparatus includes a wet-cleaning chamber, a drying chamber, and a substrate transferring chamber which transfers a substrate to and from the...
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6983755 |
Cleaning method and cleaning apparatus for performing the same
A cleaning apparatus includes upper and lower nozzle assemblies supplying a cleaning liquid to edge and bottom sections of a semiconductor substrate. The upper nozzle assembly has a first nozzle...
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6969682 |
Single workpiece processing system
A system for processing wafers includes a robot moveable within an enclosure to load and unload workpieces into and out of workpiece processors. A processor includes an upper rotor having alignment...
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6960265 |
Apparatus and method for collecting metallic impurity on a semiconductor wafer
An apparatus and method for automatically collecting metallic impurities of a semiconductor wafer. In one aspect, an apparatus includes an air tight process chamber including a loading unit for...
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6941957 |
Method and apparatus for pretreating a substrate prior to electroplating
A method including the step of providing a substrate having a contact pad, and an under bump metallurgy overlying the contact pad, and a photoresist layer overlying the under bump metallurgy, and...
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6939410 |
Apparatus and method for collecting impurities on a semiconductor wafer
An apparatus for collecting impurities on a semiconductor wafer includes an airtight process chamber, a rotary chuck disposed in the process chamber for rotating and horizontally supporting the...
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