Matches 151 - 200 out of 502 < 1 2 3 4 5 6 7 8 9 10 11 >
Match Document Document Title
6251195 Method for transferring a microelectronic device to and from a processing chamber  
An apparatus having a processing chamber for processing a semiconductor wafer under evacuated conditions that is capable of transfer of the wafer from the processing chamber under conditions that...
6247479 Washing/drying process apparatus and washing/drying process method  
A washing/drying process apparatus comprises a spin chuck for holding a substrate such that a surface thereof to be processed faces upward and for rotating the substrate, a process fluid supply...
6196240 Equipment for conveyance and treatment of garbage in high building  
An equipment for conveyance and treatment of garbage in a high building comprises a conveyer, a guide track, gathering barrels, and a cleaning mechanism. The conveyer further comprises a driving...
6197150 Apparatus for wafer treatment for the manufacture of semiconductor devices  
An apparatus is provided for wafer treatment during the manufacture of semiconductor devices. The apparatus for wafer treatment includes a shaft, a chuck supported by the shaft for holding a wafer...
6192903 Spin-processing apparatus and spin-processing method  
The present invention provides a spin-processing apparatus less likely to produce a mist when an object to be processed is rotated. The apparatus is characterized in that it comprises a cup body...
6168660 Spin coating bowl  
Apparatuses are disclosed for use in dispensing a process liquid onto a surface of a wafer. The apparatus may include a bowl having a bottom and a side defining an interior region. An air ring is...
6167893 Dynamic chuck for semiconductor wafer or other substrate  
A dynamic chuck for holding a semiconductor wafer or other substrate includes a plurality of clamping arms mounted radially about a central axis of rotation of the wafer or other substrate. Each of...
6165267 Spin coating apparatus  
A spin coating apparatus requires less cleanroom air flow than prior spin coating apparatus to minimize cleanroom contamination. A shaped exhaust duct from the spin coater maintains process quality...
6156213 Embedded spin-clean cartridge-type water filters  
A water filter includes a cartridge filter element mounted on a coaxial bearing so it can be spun. During normal operation, a pressure tank enclosure allows the outside of the cartridge filter...
6152155 Filter cleaning device  
A filter cleaning device having a base with a central aperture. A threaded male and female vertical post is coupled together as a single combination post and is mechanically fastened to the base...
6149727 Substrate processing apparatus  
A spin holder has a disk-like supporting portion, and a circular wall portion for supporting the back side of a substrate is formed inside the periphery of the top surface of the disk-like...
6138695 Substrate processing apparatus  
6115867 Apparatus for cleaning both sides of substrate  
An apparatus for cleaning both sides of a substrate, incorporating a spin chuck for holding a substrate such that contact with at least a central portion of the substrate is prevented, a motor...
6070601 Jet-cleaning device for developing station  
A jet-cleaning device for a developing station, especially suitable for installing on a wafer back cleaning ring of a CLEAN TRACK MK-V developing station. The jet-cleaning device is used for...
6062240 Treatment device  
A treatment device comprising a holding method for holding a substrate such as an LCD substrate; and a treatment solution supply method for supplying a treatment solution on a surface of the...
6026830 Post-CMP cleaner apparatus and method  
An improved and new apparatus and method for post chemical-mechanical planarization (CMP) cleaning has been developed. Use of a QDR (Quick Dump Rinse) DI water bath for receiving a cassette of...
6021785 Procedure and device for cleaning disk-shaped objects in particular wafers by sonification with water as rinsing medium  
Procedure and device for cleaning disk-shaped objects, in particular wafers, with sonification and water as rinsing medium and coupling liquid between the ultrasonic transmitter and the surface...
6019843 Apparatus for coating a semiconductor wafer with a photoresist  
An apparatus coats a semiconductor wafer with photoresist that is to be etched in the manufacture of the semiconductor. The apparatus includes a body having an open top, a spin chuck for revolving...
6012470 Method of drying a wafer  
In a spin dryer for semiconductor wafers, the wafer is held beneath a platen with its active side (i.e., the side containing the components or circuitry) facing upward. One or more nozzles spray...
6012192 Substrate processing apparatus  
A substrate processing apparatus which includes a substrate retention mechanism having retention rollers, including a plurality of driving rollers, for holding a substrate by abutting the retention...
5997653 Method for washing and drying substrates  
A method for washing and drying a substrate includes the steps of (a) disposing a substrate on a spin chuck such that a surface to be treated faces upward, (b) applying a washing solution from a...
5993547 Edge rinse mechanism for removing a peripheral portion of a resist film formed on a wafer  
In a resist deposition machine, an edge rinse mechanism comprising a cover covering and surrounding an exfoliating-agent discharging nozzle and having an opening formed at a position in the...
5988191 Holder for ophthalmic lenses and lens blocks  
A holder for suspending ophthalmic lenses and lens blocks of various diameters from a rod in a lens and block cleaning machine has a frame with a horizontal base member and a pair of upright...
5979475 Specimen holding method and fluid treatment method of specimen surface and systems therefor  
A highly clean fluid treatment system having a small system volume is provided by using a Bernoulli holder to accomplish stable holding of a specimen in a simple configuration. A holder having a...
5980647 Metal removal cleaning process and apparatus  
A megasonic liquid stream semiconductor wafer cleaning apparatus and method uniformly removes debris from all points on the surface of a semiconductor wafer. The wafer is rotated about a proscribed...
5979472 Toy washer and disinfector device  
A toy washing and disinfecting device for washing and disinfecting a variety of toys, particularly at locations such as doctors waiting rooms and child care facilities where large numbers of...
5979473 Method and apparatus for washing fruit  
An improved apparatus for washing fruit that includes supporting rollers, a nozzle for directing a spray of water at 100 psi at the surface of the whole fruit; and clean-out bars that reduce the...
5975097 Processing apparatus for target processing substrate  
A processing apparatus of this invention has an openable window portion for transferring a target processing substrate, and an inlet port for introducing the outer atmosphere. Further, the...
5975098 Apparatus for and method of cleaning substrate  
A substrate rinsing apparatus of a non-contact type having a high rinsing ability. An ultrasonic rinsing nozzle and a high-pressure rinsing nozzle are both disposed within the same rinsing...
5972127 Methods for centrifugally cleaning wafer carriers  
A process for cleaning carriers used to hold semiconductor articles includes loading a carrier on a rotor within a processing chamber. The rotor is rotated while spraying cleaning liquid onto the...
5964952 Method of cleaning surfaces with water and steam  
A method and device for cleaning contaminated surfaces with both water and steam. A water film is applied to the contaminated surface and steam sprayed into the water film while water is continued...
5964959 Shoe cleaning device  
A shoe cleaning device using liquid sprays and including a housing with a base portion and two side portions. The side portions are spaced from each other and extend upwardly from the base portion...
5966635 Method for reducing particles on a substrate using chuck cleaning  
Particles counts and concentrations are reduced from the backside of a substrate, such as a semiconductor wafer or flat panel display with the invention, to improve precision and uniformity in...
5964229 Device for or in garbage trucks  
A device for or in a garbage truck, particularly a vehicle for receiving and transporting so-called biological or organic garbage, includes tilting arrangements at the end of the vehicle for...
5954068 Device and method for treating substrates in a fluid container  
A device for treatment of substrates in a fluid container includes a container containing a treatment fluid and a substrate transport device moveable into a position above the container. The...
5954072 Rotary processing apparatus  
A rotary processing apparatus comprises a rotary table on which a substrate to be processed is placed, a rotary drive means for rotating the rotary table, a plurality of holding members each...
5947134 Scrubbing equipment for a semiconductor device using laser distance sensor to automatically adjust brush height above the wafer  
Scrubbing equipment for semiconductor devices includes an automatic brush-height adjustment device for automatically adjusting the height of a brush over a wafer surface so that eddy currents are...
5941290 Cleaning system for industrial uses  
An apparatus and a system for cleaning or sanitizing industrial filling equipment is described. The apparatus is a movable arm spray manifold which is used to position a spray manifold below a...
5927303 Substrate processing apparatus  
In a substrate processing apparatus wherein a substrate is held horizontally and rotated about a center axis which extends in a vertical direction to thereby supply processing liquid to the...
5927304 Food article washer  
A food article washer includes a container for containing food articles and a cleaning liquid used for cleaning the food articles. A basket is provided within the container for holding the food...
5927305 Cleaning apparatus  
A cleaning apparatus is disclosed which is capable of simultaneously and precisely cleaning two sides of a substrate required to be cleaned, such as a silicon wafer. The cleaning apparatus has a...
5915452 Apparatus for removing cores from castings  
Apparatus for removing a ceramic core from a casting in a relatively rapid manner wherein the casting and a fluid spray nozzle are disposed in a manner to expose a region of the core to a core...
5916366 Substrate spin treating apparatus  
A substrate treating apparatus for performing a predetermined treatment of a substrate in a spin, has a spin motor including a rotor having a hollow opening centrally thereof, and a stator disposed...
5904163 Dishwasher for washing dishes by rotating a dish washing basket and dish washing basket therefor  
A dishwasher includes a cabinet having an opening, a door provided to open/close the cabinet opening, a washing chamber member provided in the cabinet and forming a washing chamber facing the...
5904164 Arrangement for treatment of wafer-shaped articles, particularly silicon wafers  
In order to remove, after treatment of wafer-shaped articles (2), prefera a silicon wafer, with a treatment medium, preferably with an etching fluid, on the bottom of wafer-shaped article (2), i.e....
5896877 Support for wafer-like objects  
In the case of a support 1 for wafer-like object 2, which in its surface ing toward wafer-like object 2 has a ring-shaped die 8 for the discharge of compressed gas, there is a circular step 10 that...
5887605 Apparatus for cleaning semiconductor wafers  
A semiconductor wafer cleaning apparatus is disclosed including a cleaning solution supply line for supplying a cleaning solution to a surface of a wafer, one end of which is connected to a...
5875800 Device for cleaning utensils and removable chamber into which the utensils are disposed  
A cleaning device for cutlery, includes a cleaning chamber with a spraying device acting in the cleaning chamber, the cleaning chamber being disposed so that it can be removed from the cleaning...
5873380 Wafer cleaning apparatus  
A cleaning apparatus is provided which removes contaminants sticking onto a wafer without damaging a device. The cleaning apparatus includes liquid supply means 23 for supplying a liquid not...
5868866 Method of and apparatus for cleaning workpiece  
A method of and an apparatus for cleaning a thin disk-shaped workpiece that is required to have a high degree of cleanliness, e.g., a semiconductor wafer, a glass substrate, a liquid crystal...
Matches 151 - 200 out of 502 < 1 2 3 4 5 6 7 8 9 10 11 >