Matches 101 - 150 out of 502 < 1 2 3 4 5 6 7 8 9 10 11 >
Match Document Document Title
6604535 Substrate cleaning apparatus and method  
A substrate cleaning apparatus includes a chamber having a substrate support capable of supporting and rotating a substrate in the chamber. A cleaning solution injector is provided to inject a...
6601594 Apparatus and method for delivering a treatment liquid and ozone to treat the surface of a workpiece  
An apparatus for supplying a mixture of a treatment liquid and ozone for treatment of a surface of a workpiece, and a corresponding method are set forth. The preferred embodiment of the apparatus...
6601596 Apparatus for cleaning a wafer with shearing stress from slab with curved portion  
An apparatus for cleaning a semiconductor wafer is disclosed to substantially improve the efficiency of the cleaning process, and reduce the quantity of cleaning solvent used. The apparatus...
6589359 Cleaning method and cleaning apparatus for substrate  
A cleaning method is provided for cleaning a semiconductor wafer. In this method, after removing adhering substances from the wafer by using a chemical liquid of organic amine type, there is...
6578586 Single chamber dishwashing machine  
An improved dishwashing machine is proposed which has a dish-cleaning compartment, a dish-rack rotating mechanism, a re-circulating fluid spraying system, a non re-circulating fluid spraying...
6578853 Chuck assembly for use in a spin, rinse, and dry module and methods for making and implementing the same  
A chuck assembly for use in a substrate spin, rinse, and dry (SRD) module is provided. The chuck assembly includes a wedge, a chuck body, and a plurality of grippers. The wedge has a sidewall and...
6561204 Apparatus and method for cleaning wafers with contact holes or via holes  
An apparatus and a method for cleaning wafers with contact holes or via holes are provided. The apparatus for cleaning wafers comprises a first arm, a second arm, a fixing device, a rotating device...
6557564 Method and apparatus for cleaning a thin disk  
A megasonic tank system is provided that employs a monitoring system adapted to monitor power signals reflected from a transducer and to determine cleaning information based on the reflected power...
6554010 Substrate cleaning tool, having permeable cleaning head  
In a cleaning apparatus for substrates, such as semiconductor wafers, a permeable core member 68 made of a synthetic resin is supplied with distilled water from a distilled water supply path 60 ...
6554003 Method and apparatus for cleaning a thin disc  
Methods and apparatus are provided for cleaning a thin disc. In accordance with a first aspect, an apparatus is provided that includes a tank adapted to contain a fluid, and at least one support...
6550489 Recirculating, low pressure hot water parts washing apparatus  
A low pressure hot water parts washing apparatus recirculating a heated water/detergent solution and spraying same from a perforated manifold onto oily and dirt-laden parts carried by a rotary...
6539959 Cleaning apparatus for plate-like part and method thereof  
At a time of cleaning a plate-like part such as a wafer or the like while rotating, for the purpose of reducing a contamination, a damage and an unevenness of process of the plate-like part which...
6539960 Cleaning system for cleaning ink in a semiconductor wafer  
The present invention provides a cleaning system for removing ink from the surface of a semiconductor wafer. The cleaning system comprises a first cleaning station, a second cleaning station and a...
6536454 Device for treating a disc-shaped object  
The invention relates to a device for treating at least one bottom of a disc-shaped object.
6526999 Random high pressure water jetting nozzle for cleaning castings  
An apparatus for cleaning castings includes a cleaning cabinet having a rotary clamping device which clamps a casting to be cleaned upon a freely rotatable plate in the cabinet. An elongate lance...
6516815 Edge bead removal/spin rinse dry (EBR/SRD) module  
The present invention provides an apparatus for etching a substrate, comprising: a container; a substrate support disposed in the container; a rotation actuator attached to the substrate support;...
6511914 Reactor for processing a workpiece using sonic energy  
A system for processing a workpiece includes a base having a bowl or recess for holding a liquid. A sonic energy source, such as a megasonic transducer, provides sonic energy into a liquid in the...
6508258 Method and apparatus for cleaning flat workpieces within a semiconductor manufacturing system  
A semiconductor deposition system in accordance with the present invention includes a CMP apparatus operative to planarize an active surface of a semiconductor wafer, and a wafer cleaner for...
6505635 Lifting and rinsing a wafer  
A nozzle that extends telescopically upward is used to elevate a wafer without contacting the wafer. The nozzle includes a stationary hollow cylinder, closed at its lower end and open at its upper...
6497241 Hollow core spindle and spin, rinse, and dry module including the same  
A spindle includes a hollow central shaft having an upper end and a lower end. The hollow central shaft defines a channel for transmitting fluid through the spindle. A wafer backing plate is...
6494221 Device for wet etching an edge of a semiconductor disk  
The invention concerns a device for wet etching an edge of a semiconductor disk.
6494219 Apparatus with etchant mixing assembly for removal of unwanted electroplating deposits  
Embodiments of the invention generally provide an etchant mixing assembly for a semiconductor processing system. The etchant mixing assembly includes at least one acid source, at least one oxidizer...
6494220 Apparatus for cleaning a substrate such as a semiconductor wafer  
A cleaning apparatus comprises a holder for holding a substrate such as a semiconductor wafer horizontally and rotating the substrate about its central axis, while conducting a cleaning operation...
6491046 Vertical batch type wafer cleaning apparatus  
The present invention provides a vertical batch type wafer cleaning apparatus comprising a wafer bearing apparatus in a cleaning tank. The wafer bearing apparatus comprises three parallel...
6488779 Method and apparatus for cleaning substrates  
A method of cleaning substrates is provided. Prior to, during or prior to and during a cleaning process, fluid is applied to a substrate surface to form a fluid film thereon. Ice crystals are...
6453918 Safety and environmental workbench  
A workbench including provisions for cleaning of an object. The workbench includes an enclosure and a shelf that is slidable into and out of the enclosure. The shelf can support an object within...
6453916 Low angle solvent dispense nozzle design for front-side edge bead removal in photolithography resist process  
An edge bead removal system and method is provided that employs a nozzle for applying edge bead removal solvent to an edge bead of a photoresist material layer disposed on a wafer. The nozzle...
6443168 Plate-like specimen fluid-treating apparatus and plate-like specimen fluid-treating method  
The fluid treatment apparatus, as disclosed, comprises upper and lower Bernoulli-plates 12 and 14, each of which includes a metal plate 25 provided on overall outer surface thereof. On each...
6444047 Method of cleaning a semiconductor substrate  
A method of cleaning a semiconductor substrate is disclosed. The method comprises setting a substrate to-be-treated substantially in parallel to ends of multi-nozzles including an inner tube nozzle...
6431190 Fluid processing apparatus  
To carry out very clean and low-cost fluid processing on both the front and rear surfaces of an object to be processed without generating rubbing particles and without leakage of fluid. A retention...
6432214 Cleaning apparatus  
A machine for cleaning containers has inside and outside arrays of nozzles arranged to spray a cleaning solution onto containers supported on a spinning rotor. Used cleaning solution is diverted to...
6428588 Filter cleaning apparatus  
The present invention is concerned with the cleaning of fouled air filters to alleviate the problems caused by disposal of such filters as waste and to reduce the cost of maintenance of the many...
6405740 Accurate positioning of a wafer  
A load station is used in a planarizing machine to perform several useful functions related to handling of a wafer. By centering the wafer with respect to a spindle carrier the load station...
6405739 Spin chuck capable of providing simultaneous dual-sided processing  
A spin chuck using at least three clamping rollers for clamping a substrate during the rotation of the substrate. The clamping rollers are driven by a planetary gear transmission mechanism that is...
6401734 Substrate treating apparatus  
A substrate treating apparatus and method can recover a substrate treating liquid such as a cleaning liquid in an efficient manner and positively avoid occurrences of treatment defects such as...
6374836 Apparatus for treating plate type part with fluid  
The apparatus has chuck pins 201 for chucking the wafer 1 and a cylindrical inner wheel 204 and a cylindrical outer wheel 203 to prevent the wafer from tilting or moving when fluid-treating...
6357457 Substrate cleaning apparatus and method  
An apparatus for cleaning a substrate comprises a spin chuck for holding a substrate substantially horizontally a rotation driving mechanism for rotating the spin chuck, a lower nozzle having a...
6350319 Micro-environment reactor for processing a workpiece  
An apparatus for processing a workpiece in a micro-environment is set forth. The apparatus includes a rotor motor and a workpiece housing. The workpiece housing is connected to be rotated by the...
6325982 Method and apparatus for the deacidification of library materials  
A method and apparatus are provided for deacidifying cellulose based materials, especially books, magazines, and other bound or folded cellulose materials having a spine. The method includes...
6315836 Clean, recirculating processing method which prevents surface contamination of an object  
A clean, recirculating and processing method which prevents surface contamination of an object, such as a semiconductor, semi-conductor wafer, glass for LCD or magnetic disk is provided which...
6302960 Photoresist coater  
A photoresist coater has a rotatable chuck to support a substrate, a source of photoresist, a pivotable dispensing arm extendable over the chuck, and a nozzle at the end of the dispensing arm. The...
6299697 Method and apparatus for processing substrate  
A substrate is processed with a first process solution prepared by mixing sulfuric acid with a hydrogen peroxide solution, followed by processing the substrate with a second process solution. After...
6289907 Device and method for cleaning contact lenses  
A device for cleaning soft contact lenses includes a cage having two cavities to loosely receive soft contact lenses therein. The cavities are defined by spaced ribs and provide surfaces...
6286523 Parts transport mechanism for a rotary style parts treating machine  
Drive mechanism suitable for a parts treating machine comprises a housing defining a chamber containing a rotatable carriage wheel with a fixture journalled for rotation thereon. A carriage wheel...
6286525 Substrate cleaning apparatus and method  
A plurality of cleaning devices of the same type are attached to one support arm. The cleaning devices are simultaneously moved over a surface to be cleaned of a substrate supported and spun by a...
6276370 Sonic cleaning with an interference signal  
An array of ultrasonic or megasonic transducers is used to clean a substrate. An interference signal that is the superposition of the signals from each transducer enhances the cleaning. The system...
6276374 Rotary style parts cleaning machine with a pocketed wheel  
A parts cleaning machine comprises a housing having a wheel with a fixture journalled for rotation thereon. The wheel comprises one or more pockets within which the fixtures may rotate. Drive...
6276378 Apparatus for cleaning both sides of substrate  
An apparatus for cleaning both sides of a substrate, incorporating a spin chuck for holding a substrate such that contact with at least a central portion of the substrate is prevented, a motor...
6254690 Semiconductor wafer cleaning method using a semiconductor wafer cleaning device that supports a lower surface of the wafer  
Disclosed herein is a semiconductor wafer cleaning method using a semiconductor wafer cleaning device. The method includes providing a semiconductor wafer cleaning device with a back brush,...
6250902 Embossing roll cleaning apparatus  
An embossing roll cleaning apparatus is provided. The cleaning apparatus includes a nozzle having an air inlet and an elongated narrow outlet that extends an embossing width of the embossing roll....
Matches 101 - 150 out of 502 < 1 2 3 4 5 6 7 8 9 10 11 >