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8166985 |
Substrate cleaning and processing apparatus with magnetically controlled spin chuck holding pins
When a substrate is subjected to bevel cleaning processing, a first magnet plate is arranged at a lower position, and a second magnet plate is arranged at an upper position. In this case, each of...
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8136540 |
Cleaning system having heated cleaning enclosure for cleaning heat exchanger tube bundles
An improved portable cleaning system for use in cleaning heat exchanger tube bundles, fin-fans, towers and other elongated components. The cleaning system comprises a cleaning unit having a...
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8113221 |
Substrate cleaning method, substrate cleaning apparatus and computer readable recording medium
After a rinse process on a wafer W is performed by feeding pure water to the surface of the wafer W at a predetermined flow rate while rotating the wafer W in an approximately horizontal state, a...
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8020570 |
Substrate processing apparatus and substrate processing method
A part of the opening of the nozzle insertion hole located in the liquid discharging direction relative to the nozzle inserted in the nozzle insertion hole is enlarged in the liquid discharging...
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8007634 |
Wafer spin chuck and an etcher using the same
A wafer spin chuck and an etcher using the same are provided. According to an aspect of the present invention, there is provide a wafer spin chuck device comprising: a spin body which spins a...
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7799141 |
Method and system for using a two-phases substrate cleaning compound
Cleaning compounds, apparatus, and methods to remove contaminants from a substrate surface are provided. An exemplary cleaning compound to remove particulate contaminants from a semiconductor...
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7726323 |
Device and process for liquid treatment of wafer-shaped articles
A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, near the edge, in which the liquid is applied to a first surface, flows essentially radially to the...
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7624744 |
Paint roller tool
An apparatus for covering and cleaning a cylindrical paint roller pad includes a painting shield having a semi-cylindrical side wall; mounting means for rotatably mounting the pad so that the...
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7412982 |
Cleaning probe and megasonic cleaning apparatus having the same
A cleaning probe capable of providing uniform cleaning to an entire wafer while not damaging the edge portion of the wafer, and a megasonic cleaning apparatus having the cleaning probe are...
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7387131 |
Processing apparatus and substrate processing method
A substrate processing apparatus for processing a substrate With a processing fluid is provided. The apparatus includes holding members 60 for holding the substrate W, a chuck member 61 for...
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7323066 |
Paint accessory cleaning device and method
A device and method for cleaning paint accessories and particularly roller covers and/or other paint accessories simultaneously or individually. A spray head has a fluid inlet engageable to a...
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7267129 |
Device and process for liquid treatment of wafer-shaped articles
A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, near the edge, in which the liquid is applied to a first surface, flows essentially radially to the...
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7267132 |
Methods for removing silicon and silicon-nitride contamination layers from deposition tubes
Described are methods, systems, and chemistries for removing layers of stubborn silicon and silicon-nitride contamination layers from the inside surfaces of such articles as deposition tubes. In...
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7258124 |
Apparatus and method for treating surfaces of semiconductor wafers using ozone
An apparatus and method for treating surfaces of semiconductor wafers with a reactive gas, such as ozone, utilizes streams of gaseous material ejected from a gas nozzle structure to create...
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7240680 |
Substrate processing apparatus
A substrate processing apparatus includes a rotor 45 for rotating a plurality of wafers W paralleled each other at appropriate intervals. While rotating the wafers W by the rotor 45, a chemical...
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7229206 |
Geometric and perforated paint mixer and paint roller cleaner
The present invention sets forth an implement which enables the user to mix paint, clean the can and can lip, and to clean conventional paint rollers utilizing a hand drill. The implement is...
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7226055 |
Substrate holding and spinning assembly and methods for making the same
A substrate holding apparatus is provided. The substrate holding apparatus includes a chuck yoke, a plurality of arm assemblies, and a plurality of gripper assemblies. A first end of each of the...
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7172674 |
Device for liquid treatment of wafer-shaped articles
A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, in which a mask is kept at a defined short distance to the wafer-shaped article such that liquid...
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7140066 |
Apparatus and method for inspecting and cleaning semiconductor devices
A semiconductor device is inspected and cleaned by applying a vacuum to the area in which the semiconductor device is positioned. Micro-sized particulates that are brushed off the semiconductor...
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7108001 |
Method and apparatus for rotation of a workpiece in supercritical fluid solutions for removing photo resist, residues and particles therefrom
A supercritical fluid cleaning system uses process fluid for operating rotary motors in the chamber with fluid bearings and fluid load levitation for rotating workpieces and impellers. Rotating...
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7040330 |
Method and apparatus for megasonic cleaning of patterned substrates
A system for cleaning a semiconductor substrate is provided. The system includes transducers for generating acoustic energy oriented in a substantially perpendicular direction to a surface of a...
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6983755 |
Cleaning method and cleaning apparatus for performing the same
A cleaning apparatus includes upper and lower nozzle assemblies supplying a cleaning liquid to edge and bottom sections of a semiconductor substrate. The upper nozzle assembly has a first nozzle...
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6880563 |
Apparatus and method of cleaning a substrate
A cleaning apparatus is provided with a processing bath to be filled with a cleaning chemical, an ultrasonic oscillator, and a retainer for holding a substrate to be immersed into a cleaning...
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6877518 |
Chemical solution treatment apparatus for semiconductor substrate
A chemical solution treatment apparatus for dissolving and removing ruthenium-based metal adhering to a substrate by a chemical solution, includes: a chemical solution treatment unit; a reservoir...
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6848455 |
Method and apparatus for removing photoresist and post-etch residue from semiconductor substrates by in-situ generation of oxidizing species
Contaminants are removed from a semiconductor wafer by the in-situ generation of oxidizing species. These active species are generated by the simultaneous application of ultra-violet radiation and...
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6823876 |
Methodology of rotational etching tool maintenance
A method of cleaning and maintenance used for a rotational etching tool, combining the physical characteristics of water (splashed off after striking the surface of a spinning wafer) and a PM...
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6821488 |
Sample holding chuck for use in reactor and reactor using same
A chuck assembly for holding a sample includes a shaft; a generally circular chuck member, the shaft extending from a first surface of the chuck member; and a sample holder associated with a second...
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6818071 |
Method and apparatus for cleaning a roller cover
An apparatus and method for cleaning a roller cover of the type used to apply a coating material is disclosed. In one embodiment the apparatus includes a body, at least one roller cover engaging...
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6810888 |
Wafer rotary holding apparatus and wafer surface treatment apparatus with waste liquid recovery mechanism
Provided is a wafer rotary holding apparatus by which a reduced pressure is created on an upper surface of a rotary disk by a simple and easy-to-make mechanism with no need of any of a vacuum...
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6789554 |
Removing toner from printed material
Toner xerographically adhered to a material, such as a sheet of paper, may be removed using a solvent-based or solventless approach. The application of ultrasonic tamping, scraping and brushing may...
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6761362 |
Wafer holding device
A wafer holding device, comprising a rotating baseplate, a wafer seat which is provided on the rotating baseplate coaxially with the rotating baseplate and which receives a peripheral edge of a...
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6742279 |
Apparatus and method for rinsing substrates
Embodiments of the invention provide a spin rinse dry (SRD) chamber for a semiconductor processing system. The SRD chamber includes a selectively rotatable substrate support member having an upper...
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6739347 |
System for spin-cleaning closed-end filter cartridges
The spindle assembly is self-centered on the end of the cylindrically shaped cartridge filter by a three-point grip on the perimeter. A similar spindle assembly is attached to the other end of the...
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6666928 |
Methods and apparatus for holding a substrate in a pressure chamber
A process chamber assembly for use with a substrate includes a vessel and a substrate holder. The vessel defines a chamber. The substrate holder has a rotational axis and includes front and rear...
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6609529 |
Method and apparatus for cleaning disc drive components
An apparatus adapted to clean an exposed surface of a microstructure device such as a disc or head for a disc drive. The apparatus includes a fixture with a mounting surface adapted to receive the...
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6607606 |
Self-cleaning lens shield
The present invention is a method and apparatus for shielding the lens and the field of view of an optical device, such as a camera or an image projector, from obstruction by unwanted contaminants...
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6539952 |
Megasonic treatment apparatus
The invention provides an apparatus and method for cleaning or etching wafers. The invention further provides a megasonic transducer designed to apply mechanical vibrations to a layer of fluid in...
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6520672 |
Paint cleanup kit
A kit of painting accessories enabling a user to clean paint rollers and brushes by spinning them with a hand drill, and to mix paint utilizing a hand drill. The kit includes an element for...
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6494220 |
Apparatus for cleaning a substrate such as a semiconductor wafer
A cleaning apparatus comprises a holder for holding a substrate such as a semiconductor wafer horizontally and rotating the substrate about its central axis, while conducting a cleaning operation...
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6491046 |
Vertical batch type wafer cleaning apparatus
The present invention provides a vertical batch type wafer cleaning apparatus comprising a wafer bearing apparatus in a cleaning tank. The wafer bearing apparatus comprises three parallel...
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6438781 |
Washer for cleaning substrates
A washer includes driving and scrubbing rollers that press against the opposing surfaces of a substrate, which may be, e.g., a small form factor disk. The driving rollers and scrubbing rollers are...
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6405739 |
Spin chuck capable of providing simultaneous dual-sided processing
A spin chuck using at least three clamping rollers for clamping a substrate during the rotation of the substrate. The clamping rollers are driven by a planetary gear transmission mechanism that is...
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6374836 |
Apparatus for treating plate type part with fluid
The apparatus has chuck pins 201 for chucking the wafer 1 and a cylindrical inner wheel 204 and a cylindrical outer wheel 203 to prevent the wafer from tilting or moving when fluid-treating the...
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6363954 |
Paint roller cleaning device
A cleaning device for cleaning a paint roller cover with a cleaning liquid emanating from a liquid pressure supply line. The cleaning device includes a generally elongated casing for receiving the...
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6363623 |
Apparatus and method for spinning a work piece
Apparatus for spinning a work piece such as a semiconductor wafer includes a work piece platform that is configured to be rotated about a central axis. Arrayed about the periphery of the platform...
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6345636 |
Roller cover washer
A roller cover washer for removing paint from a paint roller cover. The roller cover washer includes a roller housing having a front portion and a rear portion. The front portion has a front wall,...
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6289907 |
Device and method for cleaning contact lenses
A device for cleaning soft contact lenses includes a cage having two cavities to loosely receive soft contact lenses therein. The cavities are defined by spaced ribs and provide surfaces...
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6267126 |
Apparatus for rinsing
A synthetic sponge having a high density is rinsed while changing the hydrostatic pressure of rinsing solution in pore spaces of the sponge to remove chemical residue and particulate matter more...
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6192903 |
Spin-processing apparatus and spin-processing method
The present invention provides a spin-processing apparatus less likely to produce a mist when an object to be processed is rotated. The apparatus is characterized in that it comprises a cup body...
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6038787 |
Paint brush and roller cleaning adapter
The disclosed invention is an improved means of cleaning paint brushes and paint rollers. The device consists of a base with at least two pliable longitudinal extensions which are held together by...
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