Matches 1 - 50 out of 212 1 2 3 4 5 >
Match Document Document Title
7604013 Substrate cleaning method and developing apparatus  
A cleaning method highly effectively cleans a surface of a semiconductor wafer by removing a dissolution product, produced when a surface of a semiconductor wafer is processed by a developing...
7596886 Method and system to separate and recycle divergent chemistries  
In one embodiment of the invention, an apparatus for collecting fluid within a wafer cleaning chamber is provided. The apparatus includes a rotatable annular manifold configured to support a wafer...
7527698 Method and apparatus for removing a liquid from a surface of a substrate  
A method and apparatus for removing a first liquid from a surface of a substrate is provided. A second liquid is supplied to at least part of a surface of a substrate having a rotary movement. The...
7513263 Substrate holding device and substrate processing apparatus  
A substrate holding device according to the present invention comprises: a motor; a rotating shaft rotated by the driving force of the motor; a spin base coupled to the rotating shaft and rotated...
7467635 Apparatus and method for substrate processing  
A substrate processing apparatus 10 includes a holding table 20 for rotatably holding a wafer W, a nozzle 40 for supplying chemical solutions L 1 and L 2 to the wafer W, at least one light...
7461664 Roller cover end plug  
The plug is proposed for insertion into a hollow core of a roller cover to keep water from traveling through the hollow core, the plug comprising a body sized and configured to be received in the...
7412980 Machine for cleaning glasses or similar articles  
A washing machine for glass lenses ( 11 ) or other similar items of the type including a conveyor ( 1 ) has a bearing surface ( 10 ) for moving the lenses through a washing chamber ( 12 ) made of a...
7396416 Substrate cleaning device  
A substrate cleaning device comprises a chamber for cleaning a substrate; a substrate support installed in the chamber providing a surface for supporting the substrate during cleaning thereof; at...
7389783 Proximity meniscus manifold  
An apparatus for processing a substrate is provided which includes a first manifold module to generate a fluid meniscus on a substrate surface. The apparatus also includes a second manifold module...
7383847 Paint implements cleaning system  
A paint implement cleaning system consists of a basic container having at least three water pressure nozzles located therein. There is at least one at the bottom of the container and others are...
7368016 Substrate processing unit and substrate processing apparatus  
A substrate processing unit includes: a vertically-movable substrate holder for holding a substrate; a pan surrounding a periphery of the substrate holder; a cell, located below the substrate...
7347214 Rotary shaft sealing mechanism and liquid processing apparatus  
The present invention provides a rotary shaft sealing mechanism having the seal between the rotary shaft and the seal ring improved, and a liquid processing apparatus including the rotary shaft...
7337792 Liquid processing apparatus and liquid processing method  
A cleaning apparatus 1 includes a foup loading/unloading part 2 for mounting foups F each accommodating a plurality of wafers W at intervals of a constant pitch (normal pitch), a rotor 34 ...
7328713 Nozzle apparatus for stripping edge bead of wafer  
There is provided a nozzle apparatus for stripping an edge bead from a wafer, which includes a rotatable support arm, and a side rinse nozzle coupled to a leading end of the support arm to remove...
7323066 Paint accessory cleaning device and method  
A device and method for cleaning paint accessories and particularly roller covers and/or other paint accessories simultaneously or individually. A spray head has a fluid inlet engageable to a...
7306002 System and method for wet cleaning a semiconductor wafer  
A system and method for cleaning a substrate, such as a semiconductor wafer, utilizes a rotatable wafer supporting assembly with a cylindrical body to provide stability for the substrate being...
7303633 Apparatus for producing optical information recording medium  
A method for producing an optical information recording medium includes the steps of: coating a solution for forming a dye recording layer onto a surface of a rotating disc-shaped resin substrate;...
7275551 Device for cleaning food with ozone water, and method of cleaning food using cleaning device  
A food washing apparatus of the invention includes an ozonized water generator ( 10 ), a cylindrical washing tank ( 1 ) in which the food materials are put and which can rotate to wash the food...
7270136 Apparatus for cleaning the edges of wafers  
The invention concerns an apparatus for cleaning the edge of a wafer that may be relatively simply constructed with low cost, and prevent the wafer from being re-contaminated by the edge cleaning,...
7252102 Ultrasonic slat washer  
An ultrasonic cleaner apparatus is disclosed which includes a support housing, a tub supported by the housing and an ultrasound and sensor transducer contacting the bottom of the cleaning tank. A...
7252099 Wafer cleaning apparatus with multiple wash-heads  
A wafer cleaning apparatus with multiple wash-heads is applied in chemical and mechanical polishing process after wafer cleaning. The wafer cleaning apparatus device includes a supporting base,...
7237561 Apparatus for cleaning semiconductor wafer including heating using a light source and method for cleaning wafer using the same  
An apparatus for cleaning a semiconductor wafer and method for cleaning a wafer using the same wherein, the apparatus includes a chamber on which a wafer is mounted, a revolving chuck mounted in...
7223323 Multi-chemistry plating system  
Embodiments of the invention generally provide an electrochemical plating system. The plating system includes a substrate loading station positioned in communication with a mainframe processing...
7169664 Method of reducing wafer contamination by removing under-metal layers at the wafer edge  
According to the present invention, a metal and a barrier material, such as copper and a tantalum-based barrier material, are effectively removed from the wafer edge and especially from the bevel...
7165564 Device for cleaning installations and related methods  
A device having at least one cleaning unit for cleaning installations, especially for the production and/or processing of food stuffs or pharmaceuticals is provided. The device may include a...
7122084 Device for liquid treatment of disk-shaped objects  
A device is suggested which includes a carrier ( 1 ) for receiving the disk-shaped object ( 10 ), a liquid supply device ( 17 ) for applying liquid onto a disk-shaped object ( 10 ) located on the...
7047989 Sonic-energy cleaner system with gasified fluid  
In accordance with one embodiment there is provided a method of improving the performance of a substrate cleaner of the type having a megasonic probe with a probe shaft extending generally parallel...
7000621 Methods and apparatuses for drying wafer  
Apparatuses and methods of processing a substrate. The apparatus includes a wet-cleaning chamber, a drying chamber, and a substrate transferring chamber which transfers a substrate to and from the...
6983755 Cleaning method and cleaning apparatus for performing the same  
A cleaning apparatus includes upper and lower nozzle assemblies supplying a cleaning liquid to edge and bottom sections of a semiconductor substrate. The upper nozzle assembly has a first nozzle...
6983756 Substrate treatment process and apparatus  
A substrate treatment apparatus comprises a treatment vessel, a substrate holder for rotating the substrate in a horizontal plane in the treatment vessel, a nozzle unit arranged in an upper part of...
6960265 Apparatus and method for collecting metallic impurity on a semiconductor wafer  
An apparatus and method for automatically collecting metallic impurities of a semiconductor wafer. In one aspect, an apparatus includes an air tight process chamber including a loading unit for...
6941957 Method and apparatus for pretreating a substrate prior to electroplating  
A method including the step of providing a substrate having a contact pad, and an under bump metallurgy overlying the contact pad, and a photoresist layer overlying the under bump metallurgy, and...
6939410 Apparatus and method for collecting impurities on a semiconductor wafer  
An apparatus for collecting impurities on a semiconductor wafer includes an airtight process chamber, a rotary chuck disposed in the process chamber for rotating and horizontally supporting the...
6913028 Flexible container for liquid transport, liquid transport method using the container, liquid transport apparatus using the container, method for washing the container, and washing equipment  
A flexible container for liquid transport made of a flexible material includes a top face portion, a bottom face portion, and a peripheral face portion connecting the top face portion and the...
6907893 Appliance for treating articles, particularly nursing bottles and accessories  
Appliance ( 100 ) having a housing ( 101 ) of compact dimensions wherein articles, particularly nursing bottles ( 123, 179 ) and accessories ( 119 ), are treated inside a chamber ( 1 ). Treatment...
6904920 Method and apparatus for cleaning containers  
A machine for cleaning containers such as flat media carriers has inside and outside arrays of nozzles arranged to spray a cleaning solution onto containers supported on a spinning rotor in a...
6899110 Cleaning method and apparatus  
The present invention can remove particles such as dust by flowing solvent gas such as CO 2 through a line filter and eject it from a nozzle so as to be converted to solid particles or liquid...
6895979 Processing apparatus and processing method  
A processing apparatus essentially includes a rotatable rotor 21 for carrying semiconductor wafers W, a motor 22 for driving to rotate the rotor 21, a plurality of processing chambers for...
6895981 Cross flow processor  
A centrifugal processor includes an elongated inlet and outlet in fluid communication with a rotor housing having an eccentric bowl. A rotor having fan blades and adapted to hold flat media is...
6892738 Apparatus and methods for reducing damage to substrates during megasonic cleaning processes  
The present invention provides a megasonic cleaning apparatus configured to provide effective cleaning of a substrate without causing damage to the substrate. The apparatus includes a probe having...
6883528 Apparatus for cleaning eggs by conveying thereof upon multiple conveyors through washers which are vertically tiered  
Apparatus for washing eggs including a housing with a first feed conveyor for receiving them through the housing inlet for conveying same to a second conveyor which transports them through an...
6880563 Apparatus and method of cleaning a substrate  
A cleaning apparatus is provided with a processing bath to be filled with a cleaning chemical, an ultrasonic oscillator, and a retainer for holding a substrate to be immersed into a cleaning...
6874516 Substrate cleaning apparatus  
A substrate cleaning apparatus comprises an outer shell constructed such that the outer shell is selectively openable or hermetically closable to form a sealed space, an inner shell enclosed within...
6874515 Substrate dual-side processing apparatus  
A substrate dual-side processing apparatus has a processor to apply a specific process to a front surface and a rear surface of a substrate, a reversing unit to reverse the substrate and a...
6860277 Single type of semiconductor wafer cleaning device  
A semiconductor wafer cleaning apparatus includes a gas spraying unit, having a gas injection tube and a gas guard extending therearound, for spraying cleaning gas into a water layer formed on a...
6843855 Methods for drying wafer  
Apparatuses and methods of processing a substrate. The apparatus includes a wet-cleaning chamber, a drying chamber, and a substrate transferring chamber which transfers a substrate to and from the...
6837252 Apparatus for treating a workpiece with steam and ozone  
In a method for processing a workpiece to remove material from a first surface of the workpiece, steam is introduced onto the first surface under conditions so that at least some of the steam...
6832616 Substrate treating apparatus  
The present invention is directed to a substrate treating apparatus of a multi-nozzle type comprising an outer tube nozzle through which a chemical fluid, a combination of a chemical fluid and a...
6830057 Wafer container cleaning system  
A system and method for cleaning boxes used for handling flat media includes a rotor rotatably mounted within an enclosure, with spray nozzles in the enclosure for spraying fluid toward the rotor....
6821349 Method and apparatus for removing a liquid from a surface  
A method and an apparatus for removing a liquid, i.e. a wet processing liquid, from at least one surface of at least one substrate is disclosed. A liquid is supplied on a surface of substrate....
Matches 1 - 50 out of 212 1 2 3 4 5 >