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7424893 |
Dishwasher
A dishwasher is disclosed, by which an installation height of a rack is adjusted inside a washing chamber and in which the installation height is automatically adjusted by a button. The dishwasher...
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7413628 |
Substrate treatment method and substrate treatment apparatus
A substrate treatment method for treating a substrate by supplying a treatment liquid to the substrate while rotating the substrate. The method comprises the steps of: performing a first substrate...
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7412982 |
Cleaning probe and megasonic cleaning apparatus having the same
A cleaning probe capable of providing uniform cleaning to an entire wafer while not damaging the edge portion of the wafer, and a megasonic cleaning apparatus having the cleaning probe are...
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7412980 |
Machine for cleaning glasses or similar articles
A washing machine for glass lenses ( 11 ) or other similar items of the type including a conveyor ( 1 ) has a bearing surface ( 10 ) for moving the lenses through a washing chamber ( 12 ) made of a...
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7409960 |
Cleaning fluid container
The invention aims at improving a cleaning fluid container ( 3 ) for a cleaning device (RV) for personal needs, in particular for cleaning a shaving head (SK) of a dry shaving apparatus (R), with a...
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7404410 |
Dish-washing machine with versatility of position
Described herein is a dish-washing machine, in which there is provided: at least one supporting structure; a washing station, defined by one or more washing arms; a rinsing station, defined by one...
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7383846 |
Dishwasher basket
A dishwasher rack basket assembly that includes a water impervious basket of open mesh construction, the basket is selectively positionable between a first size and a second size, the first size...
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7346956 |
Automatic cart wash apparatus
An automatic cart wash apparatus. The automatic cart wash apparatus provides improved cleaning of stock carts on a regular basis over manual cleaning by store employees. The automatic cart wash...
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7325557 |
Roller and paintbrush cleaning kit
A paint roller includes a spindle adapted to hold a rotatable cylindrical paint pad, and an arm connecting the spindle to a handle. A semi-cylindrical cover curves about the roller's spindle. A...
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7306002 |
System and method for wet cleaning a semiconductor wafer
A system and method for cleaning a substrate, such as a semiconductor wafer, utilizes a rotatable wafer supporting assembly with a cylindrical body to provide stability for the substrate being...
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7299810 |
Substrate treating apparatus with circulating and heating mechanism for removal liquid
A substrate treating apparatus includes a spin chuck for supporting a substrate to be rotatable in a plane including a principal surface of the substrate, a motor for rotating the spin chuck, a...
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7267132 |
Methods for removing silicon and silicon-nitride contamination layers from deposition tubes
Described are methods, systems, and chemistries for removing layers of stubborn silicon and silicon-nitride contamination layers from the inside surfaces of such articles as deposition tubes. In...
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7266196 |
Telephone mouthpiece and earpiece cover system
A telephone mouthpiece and earpiece cover system for helping protect a user from contact from germs on a telephone. The system includes an earpiece cover attachment and a mouthpiece cover...
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7264008 |
Apparatus for cleaning a wafer
An apparatus for cleaning a wafer includes a plurality of holders for contacting and securing peripheral portions of a wafer, and for rotating the wafer, a first plate disposed to face a first...
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7261110 |
Shaving apparatus cleaning device
A shaving apparatus cleaning device includes a reservoir for holding a supply of a cleaning fluid and a cleaning receptacle for receiving the shaving apparatus. The reservoir has a discharge...
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7258124 |
Apparatus and method for treating surfaces of semiconductor wafers using ozone
An apparatus and method for treating surfaces of semiconductor wafers with a reactive gas, such as ozone, utilizes streams of gaseous material ejected from a gas nozzle structure to create...
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7255114 |
Ion sampling system for wafer
An ion sampling method for wafer provides a wafer in a sampling chamber, wherein the wafer surface that is going to be sampled faces upward; spraying an extraction liquid continuously on the wafer...
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7243911 |
Substrate treating apparatus
A substrate treating apparatus for performing a predetermined treatment of substrates includes a treating tank for storing a treating solution, a holder for holding a plurality of substrates...
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7237564 |
Distribution of energy in a high frequency resonating wafer processing system
A transducer for use in an acoustic energy cleaner is provided. The transducer includes a resonator and a plurality of crystals bonded to a surface of the resonator. The plurality of crystals is...
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7225819 |
Apparatus process and method for mounting and treating a substrate
The present invention is a method, apparatus and process for an improved substrate mounting and processing technique for various substrate treatments comprising cleaning, dicing, sawing, polishing,...
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7201176 |
Wafer chucking apparatus for spin processor
A wafer chuck is configured to hold a wafer efficiently for spin process cleaning of wafer edges and back sides. A first group of retractable tips extend to hold the wafer during a first portion of...
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7153388 |
Chamber for high-pressure wafer processing and method for making the same
Broadly speaking, a wafer processing chamber for performing a high pressure wafer process is provided. More specifically, the wafer processing chamber incorporates a wafer processing volume and an...
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7140066 |
Apparatus and method for inspecting and cleaning semiconductor devices
A semiconductor device is inspected and cleaned by applying a vacuum to the area in which the semiconductor device is positioned. Micro-sized particulates that are brushed off the semiconductor...
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7056392 |
Wafer chucking apparatus and method for spin processor
A wafer chuck is configured to hold a wafer efficiently for spin process cleaning of wafer edges and back sides. A first group of retractable tips extend to hold the wafer during a first portion of...
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7051743 |
Apparatus and method for cleaning surfaces of semiconductor wafers using ozone
An apparatus and method for cleaning surfaces of semiconductor wafers utilizes streams of gaseous material ejected from a gas nozzle structure to create depressions on or holes through a boundary...
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7047984 |
Device and method for cleaning articles used in the production of semiconductor components
A cleaning device for use in the production of semiconductor components comprises two feed devices with which a fluid medium is guided across a respective surface of an object to be cleaned so that...
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7040330 |
Method and apparatus for megasonic cleaning of patterned substrates
A system for cleaning a semiconductor substrate is provided. The system includes transducers for generating acoustic energy oriented in a substantially perpendicular direction to a surface of a...
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7028698 |
Pressure processing apparatus with improved heating and closure system
Apparatus for pressure processing components is disclosed which includes an improved closure system that minimizes dust-generating parts and allows easy access to the chamber. Ports are provided...
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6983756 |
Substrate treatment process and apparatus
A substrate treatment apparatus comprises a treatment vessel, a substrate holder for rotating the substrate in a horizontal plane in the treatment vessel, a nozzle unit arranged in an upper part of...
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6964724 |
Etching and cleaning methods and etching and cleaning apparatuses used therefor
An etching/cleaning apparatus is provided, which makes it possible to effectively remove an unnecessary material or materials existing on a semiconductor wafer without damaging the device area with...
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6945259 |
Substrate cleaning method and substrate cleaning apparatus
A substrate cleaning apparatus is provided that includes a cleaning cup for receiving a to-be-cleaned substrate, a table in the cleaning cup, a first, second, and third nozzles, a pure water...
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6907890 |
Capillary drying of substrates
An apparatus and method for drying substrates. The inventive apparatus comprises: an object support member for supporting at least one substrate in a process tank having one or more support...
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6899111 |
Configurable single substrate wet-dry integrated cluster cleaner
The present invention provides a method and an apparatus for cleaning substrates. The cleaning chamber defines a processing cavity adapted to accommodate a substrate therein. In one embodiment, the...
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6892738 |
Apparatus and methods for reducing damage to substrates during megasonic cleaning processes
The present invention provides a megasonic cleaning apparatus configured to provide effective cleaning of a substrate without causing damage to the substrate. The apparatus includes a probe having...
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6880563 |
Apparatus and method of cleaning a substrate
A cleaning apparatus is provided with a processing bath to be filled with a cleaning chemical, an ultrasonic oscillator, and a retainer for holding a substrate to be immersed into a cleaning...
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6866051 |
Megasonic substrate processing module
A megasonic module for substrate processing is provided. Embodiments of the present invention include a tank configured to hold processing fluids in which the substrate is submerged, and a lid...
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6848455 |
Method and apparatus for removing photoresist and post-etch residue from semiconductor substrates by in-situ generation of oxidizing species
Contaminants are removed from a semiconductor wafer by the in-situ generation of oxidizing species. These active species are generated by the simultaneous application of ultra-violet radiation and...
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6843257 |
Wafer cleaning system
Embodiments of the invention include a megasonic energy cleaning apparatus that has the ability to rotate the wafer to be cleaned, as well as rotate the cleaning probe during the cleaning process....
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6832404 |
Cleaning machine for shirt collar
A collar cleaning system for dress shirts comprising a slide plate, a guiding plate, a pressured soap-water spraying subsystem and a rotating brush is presented. The shirt collar is loaded onto the...
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6817475 |
Multi-stage filter cleaning system with water recycling
A system for liquid cleaning a plurality of dirty open-ended cylindrical internal combustion engine paper air filters by subjecting each filter to a cleaning cycle including successive first,...
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6739347 |
System for spin-cleaning closed-end filter cartridges
The spindle assembly is self-centered on the end of the cylindrically shaped cartridge filter by a three-point grip on the perimeter. A similar spindle assembly is attached to the other end of the...
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6736906 |
Turbine part mount for supercritical fluid processor
A workpiece holder for processing a workpiece in a chamber of a liquified fluid. In one embodiment, the workpiece holder includes a cylindrically shaped rotator having an exterior wall and at least...
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6732750 |
Semiconductor wafer cleaning apparatus and method of using the same
A semiconductor wafer cleaning apparatus and method uses only one inner bath for chemical solution and de-ionized water cleaning, and includes a marangoni dryer for cleaning and drying...
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6729339 |
Method and apparatus for cooling a resonator of a megasonic transducer
A method for cleaning a semiconductor substrate is provided. The method initiates with introducing a liquid onto the top surface of the semiconductor substrate. Then, a bottom surface of a...
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6709581 |
Pool filter cleaner
A device for cleaning a swimming pool filter of the flexible tube type and wherein the pool may either be either of the standard backyard type or the larger commercial type pool. The flexible tubes...
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6679272 |
Megasonic probe energy attenuator
The present invention provides a megasonic cleaning apparatus configured to provide effective cleaning of a substrate without causing damage to the substrate. The apparatus includes a probe having...
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6676769 |
Apparatus and method for cleaning a furnace torch
An apparatus and a method for cleaning a torch for a vertical furnace used in semiconductor processing are disclosed. The apparatus is constructed by two main components of a basket-shaped fixture...
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6668844 |
Systems and methods for processing workpieces
Workpieces requiring low levels of contamination, such as semiconductor wafers, are loaded into a rotor within a process chamber. The process chamber has a horizontal drain opening in its...
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6666984 |
Chemical stripping apparatus and method
An apparatus for forming a loop in a filament comprising a first wall having a first guide slot formed therein and a second wall having a second guide slot formed therein coplanar and parallel to...
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6641547 |
Instruments for diagnosing and treating fibrotic soft tissues
Presented are novel instruments intended for use in the diagnosis and treatment of fibrotic soft tissue through soft tissue mobilization therapies performed on, particularly, a human patient. Three...
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