Matches 1 - 50 out of 107 1 2 3 >
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7386944 Method and apparatus for drying a wafer, and an apparatus for cleaning and drying a wafer  
A method an apparatus for drying a wafer, and an apparatus for cleaning and drying a wafer are provided. In the apparatus for cleaning and drying a wafer, the wafer is dipped into a cleaning...
7383844 Meniscus, vacuum, IPA vapor, drying manifold  
A head is provided which includes a first surface of the head capable of being in close proximity to the wafer surface, and includes a first conduit region on the head where the first conduit...
7343922 Wafer drying apparatus  
A wafer drying method includes submerging a wafer in a cleaning solution in a dry chamber. An organic liquid vapor from an organic liquid is supplied into the dry chamber at a first volumetric...
7293571 Substrate proximity processing housing and insert for generating a fluid meniscus  
An apparatus for generating a fluid meniscus to be formed on a surface of a substrate is provided including a housing where the housing includes a housing surface to be placed proximate to a...
7107701 Substrate drying method and apparatus  
There are provided a substrate drying method and apparatus by which an attachment amount of particles to surfaces of substrates can be reduced when the substrates are exposed from pure water, and...
7103992 Industrial dishwasher  
An industrial dishwashing machine with at least one essentially closed water circuit in which washing water is circulated, and with at least one water inflow which makes rinsing water available...
7040328 Fluid/air burst washing system  
A combination fluid and air washing apparatus for washing a vehicle's viewing surface. The apparatus includes a housing, a nozzle assembly with at least one fluid nozzle and at least one air nozzle...
7021323 Dust-incompatible article transfer container cleaner  
To clean the inside and outside of a container capable of containing dust-free objects for carrying, a cleaning apparatus is used within a clean room or a housing in which the cleaning apparatus is...
6901938 Substrate cleaning apparatus  
The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a gas-liquid mixture by mixing a liquid and a pressurized gas, to discharge the gas-liquid mixture to a...
6895981 Cross flow processor  
A centrifugal processor includes an elongated inlet and outlet in fluid communication with a rotor housing having an eccentric bowl. A rotor having fan blades and adapted to hold flat media is...
6837252 Apparatus for treating a workpiece with steam and ozone  
In a method for processing a workpiece to remove material from a first surface of the workpiece, steam is introduced onto the first surface under conditions so that at least some of the steam...
6818178 Method for high vacuum sterilization of closures  
A heat sterilization process for small, washed, and bagged articles such as vial stoppers includes a conditioning or air removal phase prior to sterilization. During the air removal phase, a...
6817370 Method for processing the surface of a workpiece  
An apparatus for supplying a mixture of a treatment liquid and ozone for treatment of a surface of a workpiece, and a corresponding method are set forth. The preferred embodiment of the apparatus...
6792693 Wafer dryer system for PRS wet bench  
A wafer dryer system which is suitable for drying rinse water from substrates in the event of a system malfunction or failure during or after rinsing of the substrates. The wafer dryer system...
6790291 Method of and apparatus for processing substrate  
In a substrate processing apparatus for use in performing a reduced-pressure pull up drying method, a liquid drainage pipe ( 46 ) for draining a drainage liquid containing an organic solvent from a...
6746543 Apparatus for and method of cleaning objects to be processed  
A cleaning apparatus and a cleaning method for cleaning a object are provided. In the cleaning apparatus, a drying chamber 42 and a cleaning bath 41 are separated from each other up and down,...
6706243 Apparatus and method for cleaning particulate matter and chemical contaminants from a hand  
An apparatus has a hand-cleaning volume sized to receive a gloved or ungloved human hand. The apparatus includes a mechanical-cleaning device and a chemical-cleaning device, operated sequentially...
6601594 Apparatus and method for delivering a treatment liquid and ozone to treat the surface of a workpiece  
An apparatus for supplying a mixture of a treatment liquid and ozone for treatment of a surface of a workpiece, and a corresponding method are set forth. The preferred embodiment of the apparatus...
6591845 Apparatus and method for processing the surface of a workpiece with ozone  
An apparatus for supplying a mixture of a treatment liquid and ozone for treatment of a surface of a workpiece, and a corresponding method are set forth. The preferred embodiment of the apparatus...
6575178 Cleaning and drying method and apparatus  
An enclosure 23 A that defines a drying chamber 23 is configured of a pair of enclosing elements 23 c and 23 d and a base element 23 b. When wafers enter or leave the drying chamber 23, ...
6491045 Apparatus for and method of cleaning object to be processed  
A method for cleaning an object to be processed in which the atmosphere in a drying chamber is replaced by an inert gas prior to placing an object to be cleaned from an external environment into...
6484737 Process of and device for treating small parts with a liquid treatment medium  
A machine for carrying out a process of treating small parts with a liquid treatment medium, especially for coating the small parts or for chemically deburring the small parts, has a closable...
6368556 Apparatus for operational cleaning of dental handpieces  
An apparatus for operative cleaning and preparation of dental handpieces is made as an integrated unit having holding stubs ( 6 ) for receiving the handpieces inside a treating chamber ( 1, 30 ),...
6342104 Method of cleaning objects to be processed  
A cleaning apparatus and a cleaning method for cleaning an object are provided. In the cleaning apparatus, a drying chamber 42 and a cleaning bath 41 are separated from each other up and down,...
6338350 Portable eyeglass washing system  
The present invention 10 discloses a portable device for cleaning eyeglasses 16. A transparent enclosure 14 is provided having an upper chamber 18 for cleaning the eyeglasses, a lower left...
6336463 Cleaning/drying station and production line for semiconductor devices  
A production line includes a centralized cleaning/drying station for cleaning a wafer by using an HF cleaning solution or a non-HF cleaning solution and subsequently drying the wafer based on the...
6286524 Wafer drying apparatus and method with residual particle removability enhancement  
A wafer dry cleaning method and apparatus capable of eliminating or suppressing adhesion of dust and particles on dried wafer surfaces while minimizing generation of water marks thereon. To achive...
6283132 Anesthesia spirometer absorber circuit cleaner and method  
Disclosed for cleaning an anesthesia spirometry absorber circuit is a cleaning and drying apparatus which includes an adapter for introducing fluids into the exhalation valve after the exhalation...
6273109 Cleaning device for automobile bodies  
A cleaning device for automobile bodies has a cleaning chamber having a base structure and a roof structure. A transport device is provided on which vehicle bodies are transported in a transport...
6235122 Cleaning method and cleaning apparatus of silicon  
In a cleaning method and a cleaning apparatus of a silicon substrate, after wet cleaning or etching of the substrate having a silicon surface is carried out, and during or after a pure water rinse...
6213136 Robot end-effector cleaner and dryer  
In a spin dryer for semiconductor wafers, the wafer is held beneath a platen with its active side (i.e., the side containing the components or circuitry) facing upward. One or more nozzles spray...
6170495 Apparatus for treating substrates using the marangoni effect  
Apparatus for treating substrates, such as silicon wafers (1), wherein the substrates are immersed for some time in a bath (2) containing a liquid (3) and are taken therefrom so slowly that...
6131587 Hand washing and drying apparatus and system including waste disposal apparatus and method  
A disposal apparatus for use with a wash station and a towel dispenser includes a liquid source and a waste disposal unit arranged in fluid communication with the liquid source that (i) collects...
6125863 Offset rotor flat media processor  
A centrifugal processor for flat media, such as a silicon wafer, has a rotor eccentrically positioned within a cylindrical chamber or bowl. Drainage openings or slots are located near the bottom of...
6116254 Cleaning method and system of semiconductor substrate and production method of cleaning solution  
A cleaning method for a semiconductor substrate is provided. After pure water is supplied to a cleaning tank, a chlorine gas is supplied to the pure water to thereby generate chloride ions,...
6053185 Dishwasher having a drying mode with jet-air injection  
A dishwasher having a drying mode with jet-air injection comprising a washing chamber refined by a back wall, a top wall, a bottom floor, a first and second side walls and a dishwasher door; and, a...
6039057 Automated washing system and method  
A system and a method for washing objects, such as cassettes and carriers used to hold and transport silicon wafers during manufacture of semiconductor chips. The method employs the steps of...
6019117 Water line decontamination system  
A water line decontamination unit has inlets for connection to a supply of irrigant liquid, a supply of disinfectant, and a pressurized gas supply, and an outlet for connection to a water line...
6014817 Semiconductor wafer processing system  
A processor for processing integrated circuit wafers, semiconductor substrates, data disks and similar units requiring very low contamination levels. The processor has an interface section which...
5996241 Semiconductor wafer processing system with immersion module  
A processor for processing integrated circuit wafers, semiconductor substrates, data disks and similar units requiring very low contamination levels. The processor has an interface section which...
5992430 Automatic hand washing and drying apparatus including combined blow drying means, towel dispensing means and waste disposal means  
A hand washing and drying apparatus comprising a washing and drying chamber including at least one access port providing access for inserting at least one hand to be washed, a wash liquid dispenser...
5988189 Method and apparatus for cleaning wafers using multiple tanks  
A cleaning system (1, 5) having multiple cleaning chambers (200) is provided. Each cleaning chamber (200) includes an interior region sufficient for immersing a carrier (242), which has at least...
5979472 Toy washer and disinfector device  
A toy washing and disinfecting device for washing and disinfecting a variety of toys, particularly at locations such as doctors waiting rooms and child care facilities where large numbers of...
5945068 Ozone hand sterilizer  
An apparatus and method for sterilizing hands includes a sink containing ozonated water. Water is continually circulated through said sink past an ozone generator which continually injects ozone...
5896875 Equipment for cleaning, etching and drying semiconductor wafer and its using method  
An equipment for cleaning, etching and drying a semiconductor wafer is provided with a process chamber having a closed space of which temperature is capable of being heated and adjusted by a...
5890503 Self-contained fully automatic apparatus for cleaning eyeglasses  
A fully automatic eyeglass cleaning apparatus includes a vessel partially filled with a cleaning fluid, wherein a mechanism is included to accept and hold a pair of eyeglasses to be cleaned. The...
5875802 Washload drying arrangement of dishwashing machines  
Dishwashing machine including a washing tank (1) provided with an upper aperture (6) and a lower aperture (7) that are interconnected through a conduit (8) extending outside the tank. During...
5857474 Method of and apparatus for washing a substrate  
A substrate washing apparatus includes a cooling system for cooling a substrate to below zero, a wet gas supplying system for supplying a gas containing atomized water to the surface of the...
5845660 Substrate washing and drying apparatus, substrate washing method, and substrate washing apparatus  
A substrate washing and drying apparatus comprising a processing section for holding wafers, to which process solution to wash and vapor for drying the wafers are introduced, a supply/discharge...
5823210 Cleaning method and cleaning apparatus  
A part subjected to cleaning is cleaned or rinsed with a cleaning agent or rinsing agent having a nonaqueous type solvent or a hydrophilic solvent as a main component thereof. Then the cleaning...
Matches 1 - 50 out of 107 1 2 3 >