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7615163 |
Film formation apparatus and method of using the same
A method of using a film formation apparatus for a semiconductor process includes processing by a cleaning gas a by-product film deposited on an inner surface of a reaction chamber of the film...
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7614407 |
Prime coat, indicia and clear coat removal process for a golf ball
A process for removing the coating layers from finished golf balls is disclosed herein. The process involves soaking the golf balls in a removal solution and then subjecting the golf balls to...
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7614406 |
Method of cleaning substrates utilizing megasonic energy
A method of cleaning a substrate without causing damage to the substrate is provided. The method comprises the steps of providing a transmitter made of a material that is a good conductor of...
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7608548 |
Method for cleaning a multilayer substrate and method for bonding substrates and method for producing a bonded wafer
Disclosed is a method for cleaning a multilayer substrate at least having a silicon single crystal wafer with a SiGe layer epitaxially grown on a surface of the silicon single crystal wafer, where...
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7605113 |
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
A semiconductor wafer cleaning formulation, including 1-35% wt. fluoride source, 20-60% wt. organic amine(s), 0.1-40% wt. nitrogenous component, e.g., a nitrogen-containing carboxylic acid or an...
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7604841 |
Method for extending time between chamber cleaning processes
A method for extending time between chamber cleaning processes in a process chamber of a processing system. A particle-reducing film is formed on a chamber component in the process chamber to...
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7604702 |
Method, apparatus, and system for bi-solvent based cleaning of precision components
A bi-solvent cleaning system for cleaning precision components without the use of VOC solvents. The bi-solvent cleaning system provides for is a two mode operation for cleaning and rinsing...
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7604011 |
Method and apparatus for semiconductor wafer cleaning using high-frequency acoustic energy with supercritical fluid
An apparatus and a method is provided for using high-frequency acoustic energy with a supercritical fluid to perform a semiconductor wafer (“wafer”) cleaning process. High-frequency acoustic...
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7604010 |
Film formation apparatus and method of using the same
A film formation apparatus for a semiconductor process includes a cleaning gas supply circuit, a concentration measuring section, and an information processor. The cleaning gas supply circuit is...
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7601112 |
Dense fluid cleaning centrifugal phase shifting separation process and apparatus
The present invention is an apparatus and process for cleaning substrates using fluids, including dense fluids. A perforated centrifuge drum operates within a pressure vessel. A dense fluid...
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7598654 |
Megasonic processing apparatus with frequency sweeping of thickness mode transducers
A megasonic processing apparatus and method has one or more piezoelectric transducers operating in thickness mode at fundamental resonant frequencies of at least 300 KHz. A generator powers the...
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7598503 |
Lithographic apparatus and cleaning method therefor
A lithographic apparatus is disclosed. The apparatus includes a source for supplying hydrogen radicals, a guide for use in conjunction with the source, for directing hydrogen radicals to an...
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7598181 |
Process for enhancing solubility and reaction rates in supercritical fluids
Processes for enhancing solubility and the reaction rates in supercritical fluids are provided. In preferred embodiments, such processes provide for the uniform and precise deposition of...
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7597816 |
Wafer bevel polymer removal
A method of forming a semiconductor device is provided. A wafer with a dielectric layer disposed under a photoresist mask is placed in an etch chamber. The dielectric layer is etched. The wafer is...
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7595096 |
Method of manufacturing vacuum plasma treated workpieces
A method of manufacturing vacuum plasma treated workpieces includes the steps of introducing at least one workpiece to be treated into a vacuum chamber; treating the workpiece in the vacuum...
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7591270 |
Process solutions containing surfactants
Process solutions comprising one or more surfactants are used to reduce the number of pattern collapse defects on a plurality of photoresist coated substrates during the manufacture of...
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7588036 |
Chamber clean method using remote and in situ plasma cleaning systems
A process for removing unwanted deposition build-up from one or more interior surfaces of a substrate processing chamber. According to one embodiment the process comprises performing a substrate...
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7585372 |
Method and apparatus for generating gas pulses
Method and apparatus of producing gas pressure pulses in a dust-deposit cleaning apparatus. The apparatus comprises a combustion chamber and an amplifying horn. According to the method a...
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7583196 |
Method and system for detecting a body in a zone located proximate an interface
The invention concerns a method and a system for detecting a body ( 801 ) in a zone ( 802 ) located proximate an interface ( 803 ). The body is illuminated by an electromagnetic radiation ( 804 )...
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7582570 |
Compositions for removal of processing byproducts and method for using same
A composition and methods for using the composition in removing processing byproducts is provided. The composition can be non-aqueous or semi-aqueous. The non-aqueous composition includes a...
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7582181 |
Method and system for controlling a velocity field of a supercritical fluid in a processing system
A method and system for controlling a velocity field in a processing system is described. In an exemplary embodiment described, the system includes a multi-outlet exhaust manifold having three or...
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7582168 |
Method and apparatus for cleaning semiconductor wafer
A wafer is placed on a rotatable stage to clean an upper surface of the wafer with a cleaning liquid while the stage and wafer are rotating. A cup-shaped cover is provided over the upper surface of...
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7581550 |
Method of cleaning reaction chamber using substrate having catalyst layer thereon
A method of cleaning a reaction chamber using a substrate having a metal catalyst thereon is disclosed. The method includes preparing a substrate having a catalyst layer to activate a cleaning gas....
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7581549 |
Method for removing carbon-containing residues from a substrate
A process for removing carbon-containing residues from a substrate is described herein. In one aspect, there is provided a process for removing carbon-containing residue from at least a portion of...
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7579309 |
Methods for characterizing defects on silicon surfaces and etching composition and treatment process therefor
The present invention relates to a method for characterizing defects on silicon surfaces, such as silicon wafers, a method for treating silicon surfaces with an etching solution, and an etching...
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7579307 |
Cleaner for semiconductor devices
The invention has for its object the provision of a cleaner capable of removing particles and metal impurities present on the surface of a wafer without corrosion of wirings, gates or the like yet...
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7579253 |
Method for cleaning a semiconductor wafer
Bottom electrodes of stacked capacitor DRAM cells are formed by depositing a metal layer on the side walls of trenches within a hard mask layer, which serves as a mold for the bottom electrode...
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7578890 |
Method for removing contaminants from silicon wafer surface
Taught is a method of removal surface contaminants, including organic contaminants, metal ions and solid particles, from silicon wafer surface comprising the following steps: (a) submerging the...
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7578889 |
Methodology for cleaning of surface metal contamination from electrode assemblies
Systematic and effective methodology to clean capacitively coupled plasma reactor electrodes and reduce surface roughness so that the cleaned electrodes meet surface contamination specifications...
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7578886 |
Substrate processing apparatus, substrate processing method, and substrate holding apparatus
A substrate processing apparatus and a substrate processing method is provided for performing a chemical liquid process, a cleaning process, a drying process, or the like while rotating a substrate...
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7578302 |
Megasonic cleaning using supersaturated solution
A method and system for the megasonic cleaning of one or more substrates that reduces damage to the substrate(s) resulting from the megasonic energy. The substrates are supported in a process...
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7578301 |
Methods and apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing system
A method of determining an endpoint of a process by measuring a thickness of a layer, the layer being deposited on the surface by a prior process is disclosed. The method includes providing a...
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7576046 |
Cleaning liquid for lithography and method of cleaning therewith
A cleaning liquid for lithography that exhibits equally excellent cleaning performance for resists of a wide variety of compositions, such as various resists for i-line, KrF and ArF, silicic resist...
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7575007 |
Chamber recovery after opening barrier over copper
A chamber dry cleaning process particularly useful after a dielectric plasma etch process which exposes an underlying copper metallization. After the dielectric etch process, the production wafer...
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7572736 |
Method of dry-etching semiconductor devices
A system, method and product of dry-etching a semiconductor device are disclosed, the system having a material supply for forming a material layer on the semiconductor substrate, a pattern for...
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7571732 |
Ignition control of remote plasma unit
A method of maintaining a remote plasma unit for cleaning a semiconductor-processing apparatus includes: (i) detecting if the semiconductor-processing apparatus is in an idle state; (ii) if the...
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7569112 |
Scanning probe apparatus with in-situ measurement probe tip cleaning capability
A scanning probe apparatus includes a measurement probe tip and an auxiliary probe tip that is movably positionable with respect to the measurement probe tip. The measurement probe tip and the...
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7569111 |
Method of cleaning deposition chamber
A process for cleaning a deposition chamber. The process includes feeding a fluorine-containing gas into the deposition chamber; maintaining the fluorine-containing gas in the deposition chamber at...
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7568489 |
Method of and apparatus for eluting impurities
Impurities can be eluted simultaneously from a plurality of local areas of a surface layer of a semiconductor substrate. A supporting unit supports the substrate, and a sample plate is disposed on...
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7566872 |
Scanning electron microscope
A scanning electron microscope is disclosed. The primary electron beam is radiated on a reticle (specimen), and an observation image of the reticle is obtained using the electrons secondarily...
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7566662 |
Method of dry cleaning silicon surface prior to forming self-aligned nickel silicide layer
Provided is a method of manufacturing a semiconductor device. After a semiconductor wafer is placed over a wafer stage with which a dry cleaning chamber of a film forming apparatus is equipped, dry...
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7566370 |
Wafer clamping apparatus and method for operating the same
A wafer clamping apparatus is provided to secure a wafer within a chamber during wafer processing. The wafer clamping apparatus creates a pressure differential between a top surface and a bottom...
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7563754 |
Composition for removing photoresist residue and polymer residue
A composition for removing a photoresist residue and a polymer residue remaining on a semiconductor substrate after dry etching and after ashing is provided, the composition containing at least one...
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7563753 |
Cleaning solution for removing photoresist
Cleaning solutions for removing photoresist resins and a method of forming patterns using the same are disclosed. The cleaning solution includes water (H 2 O) as main component, one or more...
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7562662 |
Cleaning solution and cleaning method of a semiconductor device
A cleaning method for removing foreign bodies during the fabrication of semiconductor devices including treating a substrate with a cleaning solution including an oxidizer to form a chemical oxide...
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7559993 |
Process for decoating a washcoat catalyst substrate
The invention relates to a process for decoating a used washcoat carrier substrate to produce a clean, inert carrier or substrate. In a preferred embodiment, a process according to the invention...
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7559992 |
Semiconductor processing apparatus and method
A semiconductor processing apparatus includes a process chamber to accommodate a target substrate, a gas supply system to supply a process gas into the process chamber, an exhaust unit to exhaust...
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7556697 |
System and method for carrying out liquid and subsequent drying treatments on one or more wafers
Systems for processing microelectronic substrates in a process chamber that incorporate improved technology for transitioning from a wet process to a dry process (especially transitioning from...
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7556048 |
In-situ removal of surface impurities prior to arsenic-doped polysilicon deposition in the fabrication of a heterojunction bipolar transistor
A process for cleaning the silicon surface of a semiconductor device material layer. The surface undergoes a pre-clean process followed by exposure to a nitrogen-containing gas. A polysilicon layer...
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7553378 |
Substrate cleaning apparatus and method
A substrate cleaning apparatus includes a chamber for accommodating a substrate; a mounting table, disposed in the chamber, for mounting thereon the substrate; an electrode disposed in the mounting...
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