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7417016 Composition for the removing of sidewall residues  
The present invention relates to a composition for the removal of so-called “sidewall residues” from metal surfaces, in particular from aluminium or aluminium-containing surfaces, in particular...
7416611 Process and apparatus for treating a workpiece with gases  
In a method and apparatus for cleaning or processing a workpiece, a process gas is brought into contact with the workpiece by diffusion through a heated liquid layer on the workpiece, and by bulk...
7413993 Process for removing a residue from a metal structure on a semiconductor substrate  
The invention is concerned with a process for removing residue comprising a polymeric resist and metal oxide from a metal structure on a semiconductor substrate, the process comprising the steps...
7410909 Method of removing ion implanted photoresist  
A method of removing an ion implanted photoresist comprises performing first cleaning a semiconductor substrate having the ion implanted photoresist using hot deionized water to which a megasonic...
7410814 Process and apparatus for cleaning silicon wafers  
An effective electropurge process and apparatus for wet processing of semiconductor wafers applies electrical charges to the wafer surface with an ample voltage sufficient to provide an effective...
7410611 In-line method and apparatus to prevent fouling of heat exchangers  
The present invention relates to a method and apparatus for the prevention of fouling of process streams by the application of electric charge on process components. The electric charge may be...
7402362 Method and system for reducing and monitoring precipitated defects on masking reticles  
A method and system is disclosed for reducing and monitoring precipitated defects on mask reticles. A predetermined gas is provided into an environment surrounding the reticle assembly for reducing...
7402258 Methods of removing metal contaminants from a component for a plasma processing apparatus  
Methods of removing metal contaminants from a component for a plasma processing apparatus are provided. The method includes cleaning a surface of the component with a cleaning liquid that includes...
7399713 Selective treatment of microelectric workpiece surfaces  
This invention provides a process for treating a workpiece having a front side, a back side, and an outer perimeter. In accordance with the process, a processing fluid is selectively applied or...
7396806 Semiconductor cleaner comprising a reducing agent, dispersant, and phosphonic acid-based chelant  
To provide a detergent composition which has little corrosion to a wiring material and is excellent in cleaning ability of a semiconductor substrate or semiconductor device on which the fine...
7396416 Substrate cleaning device  
A substrate cleaning device comprises a chamber for cleaning a substrate; a substrate support installed in the chamber providing a surface for supporting the substrate during cleaning thereof; at...
7395823 Method and apparatus for local fluorine and nitrogen trifluoride production  
The present invention relates to a process for production, shipment, and treatment of a NH 4 F(HF) x feedstock for local production of fluorine and NF 3 for semiconductor chamber cleaning without...
7390758 Method of manufacturing a semiconductor integrated circuit device with elimination of static charge  
A sealed type container accommodating a semiconductor substrate is positioned to a load port of a semiconductor manufacturing apparatus. The semiconductor substrate is taken out of the container....
7387989 AlxGayInl−x−yN substrate, cleaning method of AlxGayInl−x−yN substrate, AlN substrate, and cleaning method of AlN substrate  
An Al x Ga y In 1-x-y N substrate in which particles having a grain size of at least 0.2 μm on a surface of the Al x Ga y In 1-x-y N substrate are at most 20 in number when a diameter of the Al x...
7387988 Thinner composition and method of removing photoresist using the same  
A thinner composition includes propylene glycol ether acetate, methyl 2-hydroxy-2-methyl propionate, and an ester compound such as ethyl lactate, ethyl 3-ethoxy propionate or a mixture thereof.
7387968 Batch photoresist dry strip and ash system and process  
Photoresist stripping is provided that employs batch processing to maximize throughput and an upstream plasma activation source using vapor or gas processing to efficiently create reactive species...
7387964 Copper polishing cleaning solution  
A cleaning solution for removing copper complex residues from the surface of polishing pads and wafer substrates includes an amine pH-adjusting agent, which can be a unidentate or bidentate amine...
7387868 Treatment of a dielectric layer using supercritical CO2  
A method of passivating silicon-oxide based low-k materials using a supercritical carbon dioxide passivating solution comprising a silylating agent is disclosed. The silylating agent is preferably...
7387130 Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials  
A composition for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent,...
7384900 Composition and method for removing copper-compatible resist  
A composition for removing a copper-compatible resist includes about 10 to 30% by weight of an amine compound solvent, the amine compound solvent including an alkanol amine, about 10 to 80% by...
7384870 Method for manufacturing glass substrate  
A method for providing a high quality glass substrate that if free of residual polishing particles. The method includes polishing the surface of the glass plate with a polishing agent containing...
7384486 Chamber cleaning method  
A method for cleaning a process chamber in such a manner that chamber-cleaning chemicals or agents are incapable of remaining in the chamber after cleaning and chemically interfering with...
7381694 Composition and method for removing photoresist materials from electronic components  
Composition and method for removing photoresist materials from electronic components. The composition is a mixture of at least one dense phase fluid and at least one dense phase fluid modifier. The...
7381344 Method to reduce particle level for dry-etch  
The invention teaches a multi-step method for shutting down the dry-etch process. The ICP rf power is reduced between each of these consecutive power-down steps of the dry-etch process, the...
7381278 Using supercritical fluids to clean lenses and monitor defects  
Disclosed are immersion lithography methods involving irradiating a first photoresist through a lens and an immersion liquid, the immersion liquid contacting the lens and the first photoresist in a...
7375066 Semiconductor wafer cleaning agent and cleaning method  
A semiconductor surface cleaning agent containing a compound the molecule of which has a nitrogen atom having an unshared electron pair and used for cleaning the surface of a semiconductor on which...
7375037 Fabrication method for semiconductor integrated circuit device  
To improve the shape of a gate electrode having SiGe, after patterning a gate electrode 15 G having an SiGe layer 15 b by a dry etching process, a plasma processing (postprocessing) is carried...
7372058 Ex-situ removal of deposition on an optical element  
A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an...
7372049 Lithographic apparatus including a cleaning device and method for cleaning an optical element  
An EUV lithographic apparatus includes an EUV radiation source, an optical element and a cleaning device. The cleaning device includes a hydrogen radical source and a flow tube in communication...
7371263 Plasmaless dry contact cleaning method using interhalogen compounds  
A method of removing an oxide layer from an article. The article may be located in a reaction chamber into which an interhalogen compound reactive with the oxide layer is introduced. A temperature...
7368589 Purification of silicone containing compounds by supercritical fluid extraction  
The present invention relates to a process for the purification of silicone containing compounds via supercritical fluid extraction. Specifically, the present invention relates to a process...
7368416 Methods of removing metal-containing materials  
Various methods for selectively etching metal-containing materials (such as, for example, metal nitrides, which can include, for example, titanium nitride) relative to one or more of silicon,...
7368397 Method for monitoring edge bead removal process of copper metal interconnection  
Disclosed is a method for monitoring an edge bead removal process for a copper metal interconnection. The method includes the steps of (a) forming a copper metal layer on a semiconductor wafer, (b)...
7368020 Reduced particle contamination manufacturing and packaging for reticles  
A method of transporting a reticle is disclosed. The reticle is placed in a reticle carrier that has an ionizer. Moreover, the reticle may be attached with a pellicle. The pellicle consists of a...
7367344 Atmospheric pressure non-thermal plasma device to clean and sterilize the surfaces of probes, cannulas, pin tools, pipettes and spray heads  
The present invention relates to methods and apparatus for the use of atmospheric pressure non-thermal plasma to clean and sterilize the surfaces of liquid handling devices. In one embodiment, a...
7367343 Method of cleaning a surface of a cobalt-containing material, method of forming an opening to a cobalt-containing material, semiconductor processing method of forming an integrated circuit comprising a copper-containing conductive line, and a cobalt-containing film cleaning solution  
The invention includes methods of cleaning a surface of a cobalt-containing material, methods of forming an opening to a cobalt-containing material, semiconductor processing methods of forming an...
7365044 Chemical for data destruction  
A compound and method for rendering a hard disk drive forensically unrecoverable includes a solution comprising cerium ammonium nitrate, hydrochloric acid by mass, and water. When applied to the...
7365012 Etching method, a method of forming a trench isolation structure, a semiconductor substrate and a semiconductor apparatus  
An etching method of subjecting a base material to an etching process using an etching agent containing hydrogen fluoride and ozone is disclosed. The base material has a first region constituted...
7362412 Method and apparatus for cleaning a semiconductor substrate in an immersion lithography system  
A method and apparatus for reduction and prevention of residue formation and removal of residues formed in an immersion lithography tool. The apparatus including incorporation of a cleaning...
7361231 System and method for mid-pressure dense phase gas and ultrasonic cleaning  
Workpieces are loaded into a cleaning chamber. The cleaning chamber is pressurized with a first dense-phase cleaning fluid, the temperature and pressure of the first dense-phase fluid being...
7360546 Cleaning apparatus for semiconductor wafer  
A cleaning apparatus for a semiconductor wafer comprising: a double container including an inner container with an upper opening for accommodating a substrate to be cleaned and an outer container...
7358197 Method for avoiding polysilicon film over etch abnormal  
The method for avoiding polysilicon film over etch abnormal includes cleaning a semiconductor substrate. A dielectric layer is formed on the substrate. Subsequently, a first silicon source gas at a...
7357138 Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materials  
A process for the removal of a substance from a substrate for etching and/or cleaning applications is disclosed herein. In one embodiment, there is provided a process for removing a substance...
7354890 Cleaning composition and method  
Cleaning compositions composed of specific amounts of carbonic acid and/or carbonate, hydrogen peroxide, aluminum fluoride and water are highly effective for cleaning electronic devices of resist,...
7354865 Method for removal of pattern resist over patterned metal having an underlying spacer layer  
A method of removing the pattern resist that remains on a microchip wafer after etching a patterned layer that is supported by a spacer layer. After the etch, the wafer is cleaned with a develop...
7354525 Specimen surface processing apparatus and surface processing method  
For a surface processing apparatus using a plasma, a mixed gas of a fluorine-containing gas and an oxygen gas is used as an ashing gas. A mixed gas of an oxygen gas and a fluorine-containing gas is...
7351667 Etching solution for silicon oxide method of manufacturing a semiconductor device using the same  
An etching solution for silicon oxide may be used in a process for enlarging an opening formed through a silicon oxide layer. The etching solution includes about 0.2 to about 5.0 percent by weight...
7344602 Scale conditioning agents and treatment method  
An improved scale conditioning composition and method is disclosed that results in improved dissolution and disruption of tube scale, hardened sludge and other deposits composed primarily of highly...
7341065 Single wafer cleaning method to reduce particle defects on a wafer surface  
Methods of preventing air-liquid interfaces on the surface of a wafer in order to prevent the formation of particle defects on a wafer are presented. The air-liquid interfaces may be prevented by...
7338904 Method for manufacturing single-side mirror surface wafer  
A surface of a semiconductor wafer which has been lapped is ground. This removes a damage caused on the wafer surface during lapping, thereby increasing the flatness of the wafer surface. Next, the...
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