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8182610 Cleaning equipment and cleaning method of deposition mask  
Equipment is realized which is capable of increasing the frequency of use of a deposition mask of an organic EL element and the recycle of an adhesive agent by efficiently cleaning the deposition...
8182609 Apparatus and method for direct surface cleaning  
The present invention provides a method for cleaning a surface of a substrate that includes directing a laser towards at least one radiation-produced particle disposed on a substrate, generating a...
8177993 Apparatus and methods for cleaning and drying of wafers  
An first example method and apparatus for etching and cleaning a substrate comprises device with a first manifold and a second manifold. The first manifold has a plurality of nozzles for dispensing...
8178482 Cleaning compositions for microelectronic substrates  
A stripping and cleaning composition for cleaning microelectronics substrates, the composition comprising: at least one organic stripping solvent, at least one nucleophilic amine, at least one...
8177913 Cleaning apparatus and method utilizing sublimation of nanofabricated particles  
A cleaning apparatus comprises a container configured to hold an article to be cleaned, a cleaning solvent dispenser configured to supply a cleaning solvent to the container, an energy generator...
8173584 Composition and method for treating semiconductor substrate surface  
The present invention is directed to compositions and method of use for treating semiconductor substrate comprising a sulfonium compound and a nucleophilic amine in the fabrication of electronic...
8173214 Substrate processing method  
A substrate processing method for use in a substrate processing apparatus having a stocker therein which stores a multiplicity of dummy substrates; a reaction chamber for producing semiconductor...
8173036 Plasma processing method and apparatus  
A plasma processing method includes the steps of etching the target object with a CF-based processing gas by using a patterned resist film as a mask, removing deposits accumulated inside a...
8173934 Dry cleaning apparatus and method  
Disclosed is a dry cleaning apparatus and method for removing contaminants on a surface of a workpiece. The disclosed dry cleaning apparatus comprises a laser cleaning unit having a laser beam...
8172951 Method of cleaning with an aqueous composition containing a semiconductor  
The use of an aqueous composition comprising a semiconductor as cleaning agent for surfaces in the outdoors field and indoors field is proposed.
8168577 Post plasma etch/ash residue and silicon-based anti-reflective coating remover compositions containing tetrafluoroborate ion  
A microelectronic cleaning compositions of: a) from about 80% to about 99% by weight of the composition of at least one organic sulfone; b) from about 0.5% to about 19% by weight of the composition...
8163099 Method and apparatus for reducing deposits in petroleum pipes  
Examples of methods and apparatus for reducing deposits from a petroleum flow line may include a pipe capable of being attached to a petroleum flow line. The pipe may have a pipe axis that defines...
8163093 Cleaning operations with dwell time  
Methods of cleaning one or more workpieces are described. A method includes oscillating workpieces while performing a cleaning operation (e.g., sonication, rinse, etc.) and dwelling the workpieces...
8163197 Azeotropic compositions comprising fluorinated olefins for cleaning applications  
The present invention relates to azeotropic or azeotrope-like compositions comprising a fluorinated olefin having the formula E- or Z—C3F7CH═CHC3F7, and at least one alcohol, halocarbon, hyd...
8163095 Composition for stripping and stripping method  
The present invention provides a stripping composition and a stripping method capable of easily stripping a color resist or an organic insulating film formed on a substrate to reuse the substrate...
8163094 Method to improve indium bump bonding via indium oxide removal using a multi-step plasma process  
A process for removing indium oxide from indium bumps in a flip-chip structure to reduce contact resistance, by a multi-step plasma treatment. A first plasma treatment of the indium bumps with an...
8158568 Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith  
It is disclosed a cleaning liquid used in a process for forming a dual damascene structure comprising steps of etching a low dielectric layer (low-k layer) accumulated on a substrate having thereon...
8152928 Substrate cleaning method, substrate cleaning system and program storage medium  
A substrate cleaning method can uniformly removing particles from substrates at a high removing efficiency. The substrate cleaning method includes the steps of immersing substrates W in a cleaning...
8153523 Method of etching a layer of a semiconductor device using an etchant layer  
A method of semiconductor fabrication including an etching process is provided. The method includes providing a substrate and forming a target layer on the substrate. An etchant layer is formed on...
8153019 Methods for substantially equalizing rates at which material is removed over an area of a structure or film that includes recesses or crevices  
Methods for preventing isotropic removal of materials at corners formed by seams, keyholes, and other anomalies in films or other structures include use of etch blockers to cover or coat such...
8148272 Application of millisecond heating source for surface treatment  
A method for fabricating semiconductor devices, e.g., strained silicon MOS device, includes providing a semiconductor substrate (e.g., silicon wafer) having a surface region, which has one or more...
8148311 Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acid  
The compositions and methods for the removal of residues and contaminants from metal or dielectric surfaces comprises at least one alkyl diphosphonic acid, at least one second acidic substance at a...
8147647 Method and arrangement for cleaning optical surfaces in plasma-based radiation sources  
The invention is directed to a method and an arrangement for cleaning optical surfaces of reflection optics which are arranged in a plasma-based radiation source or exposure device arranged...
8148310 Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acid  
The compositions and methods herein relate to the method for the removal of residues and contaminants from metal or dielectric surfaces. Particularly, a composition and method of cleaning residues...
8147615 Method of fabricating semiconductor cleaners  
A method of manufacturing cleaning solvents is provided. The method includes selecting a small plurality of test solvents from a large plurality of perspective solvents. The equilibrium composition...
8143203 Method for washing device substrate  
The present invention provides a washing method for a device substrate, capable of sufficiently removing a resist attached to a device substrate, particularly a resist attached to fine pore...
8137473 Method for cleaning elements in vacuum chamber and apparatus for processing substrates  
To clean an element in a vacuum chamber by causing particles sticking to the element to scatter, the present invention uses a means for applying a voltage to the element and causing the particles...
8137472 Semiconductor process  
A semiconductor process is provided. First, a metal layer, a dielectric layer and a patterned hard mask layer are sequentially formed on a substrate. Thereafter, a portion of the dielectric layer...
8133324 Methods for removal of polymeric coating layers from coated substrates  
The invention provides a method for the at least partial removal of one or more polymeric coating layers from a coated substrate having at least one coated surface. The method includes generating...
8133325 Dry cleaning method for plasma processing apparatus  
This dry cleaning method for a plasma processing apparatus is a dry cleaning method for a plasma processing apparatus that includes: a vacuum container provided with a dielectric member; a planar...
8129281 Plasma based photoresist removal system for cleaning post ash residue  
A method of cleaning a low dielectric constant film in a lithographic process includes providing a dielectric film having thereover a resist composition, the dielectric film having a dielectric...
8128755 Cleaning solvent and cleaning method for metallic compound  
Disclosed are cleaning solvents and cleaning methods for metallic compounds deposited on the equipment that supplies organometallic compounds to the manufacturing tool in the photovoltaic industry...
8128869 Air sanitization system with variable speed fan  
An air sanitization system including a reactive oxygen species generator, a variable speed fan, a pathogen sensor and a controller. The reactive oxygen species generator generates reactive oxygen...
8123870 Handheld sterilization device  
Embodiments of the disclosed technology comprise a handheld cleaning device that sanitizes an item to be cleaned by, in a single action, dispensing ozone and ultrasonic wave cavitations in an...
8123969 Process for removing high stressed film using LF or HF bias power and capacitively coupled VHF source power with enhanced residue capture  
A method of fabricating multilayer interconnect structures on a semiconductor wafer uses an interior surface of a metal lid that has been roughed to a surface roughness in excess of RA 2000 with a...
8118946 Cleaning process residues from substrate processing chamber components  
A component from a substrate processing chamber which has plasma process residues on both its internal and external surfaces, is removed from the processing chamber, and transferred to a cleaning...
8114825 Photoresist stripping solution  
Disclosed is a photoresist stripping solution consisting essentially of (a) a quaternary ammonium hydroxide (e.g., tetramethylammonium hydroxide), (b) at least one water-soluble organic solvent...
8114220 Formulations for cleaning ion-implanted photoresist layers from microelectronic devices  
A method and composition for removing bulk and ion-implanted photoresist and/or post-etch residue material from densely patterned microelectronic devices is described. The composition includes a...
8114244 Method for etching a sample  
The invention provides a method for performing mass production processing of etching a sample capable of maintaining a stable processing profile. The method for performing mass production...
8110534 Cleaning solution for substrate for semiconductor device and process for producing substrate for semiconductor device  
To provide a cleaning solution for a substrate for a semiconductor device which is excellent in the ability to remove particles, organic contaminants, metal contaminants and composite contaminants...
8105997 Composition and application of a two-phase contaminant removal medium  
The embodiments provide substrate cleaning techniques to remove contaminants from the substrate surface to improve device yield. The substrate cleaning techniques utilize a cleaning material with...
8105998 Liquid composition for removing photoresist residue and polymer residue  
Provided is a liquid composition for, at a low temperature in a short time, removing a photoresist residue and a polymer residue generated in a semiconductor circuit element manufacturing process A...
8101934 Methods and apparatus for detecting a substrate notch or flat  
In a first aspect, a first apparatus is provided. The first apparatus includes a through-beam sensor coupled to a scrubber and adapted to detect a notch or flat of a substrate in the scrubber...
8101561 Composition and method for treating semiconductor substrate surface  
The present invention is directed to compositions and method of use for treating semiconductor substrate comprising a sulfonium compound and a nucleophilic amine in the fabrication of electronic...
8101025 Method for controlling corrosion of a substrate  
A method for controlling corrosion of a substrate is provided herein. In one embodiment, a method for controlling corrosion of a substrate includes the steps of providing a substrate having a...
8097089 Methods for cleaning process kits and chambers, and for ruthenium recovery  
A method is provided for recovering a metal from electronic device deposition equipment including: providing deposition equipment wherein the deposition equipment is at least partially coated with...
8097087 Method of cleaning support plate  
A method of cleaning a support plate according to which, while no waste solution is produced after cleaning the support plate, the support plate can be treated at low cost. The method of cleaning...
8097088 Methods for processing substrates in a dual chamber processing system having shared resources  
Methods for processing substrates in dual chamber processing systems comprising first and second process chambers that share resources may include performing a first internal chamber clean in each...
8097091 Hot source cleaning system  
There is an apparatus for cleaning a substrate (5) mounted on a moveable platen. In an example embodiment, the apparatus comprises a first chamber (20), the first chamber has solvent-dispensing...
8093154 Etchant treatment processes for substrate surfaces and chamber surfaces  
In one embodiment of the invention, a method for finishing or treating a silicon-containing surface is provided which includes removing contaminants and/or smoothing the surface contained on the...