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8182609 |
Apparatus and method for direct surface cleaning
The present invention provides a method for cleaning a surface of a substrate that includes directing a laser towards at least one radiation-produced particle disposed on a substrate, generating a...
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8177993 |
Apparatus and methods for cleaning and drying of wafers
An first example method and apparatus for etching and cleaning a substrate comprises device with a first manifold and a second manifold. The first manifold has a plurality of nozzles for dispensing...
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8178482 |
Cleaning compositions for microelectronic substrates
A stripping and cleaning composition for cleaning microelectronics substrates, the composition comprising: at least one organic stripping solvent, at least one nucleophilic amine, at least one...
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8173584 |
Composition and method for treating semiconductor substrate surface
The present invention is directed to compositions and method of use for treating semiconductor substrate comprising a sulfonium compound and a nucleophilic amine in the fabrication of electronic...
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8173214 |
Substrate processing method
A substrate processing method for use in a substrate processing apparatus having a stocker therein which stores a multiplicity of dummy substrates; a reaction chamber for producing semiconductor...
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8173934 |
Dry cleaning apparatus and method
Disclosed is a dry cleaning apparatus and method for removing contaminants on a surface of a workpiece. The disclosed dry cleaning apparatus comprises a laser cleaning unit having a laser beam...
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8168577 |
Post plasma etch/ash residue and silicon-based anti-reflective coating remover compositions containing tetrafluoroborate ion
A microelectronic cleaning compositions of: a) from about 80% to about 99% by weight of the composition of at least one organic sulfone; b) from about 0.5% to about 19% by weight of the composition...
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8163093 |
Cleaning operations with dwell time
Methods of cleaning one or more workpieces are described. A method includes oscillating workpieces while performing a cleaning operation (e.g., sonication, rinse, etc.) and dwelling the workpieces...
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8163197 |
Azeotropic compositions comprising fluorinated olefins for cleaning applications
The present invention relates to azeotropic or azeotrope-like compositions comprising a fluorinated olefin having the formula E- or Z—C3F7CH═CHC3F7, and at least one alcohol, halocarbon, hyd...
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8163095 |
Composition for stripping and stripping method
The present invention provides a stripping composition and a stripping method capable of easily stripping a color resist or an organic insulating film formed on a substrate to reuse the substrate...
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8158568 |
Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith
It is disclosed a cleaning liquid used in a process for forming a dual damascene structure comprising steps of etching a low dielectric layer (low-k layer) accumulated on a substrate having thereon...
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8152928 |
Substrate cleaning method, substrate cleaning system and program storage medium
A substrate cleaning method can uniformly removing particles from substrates at a high removing efficiency. The substrate cleaning method includes the steps of immersing substrates W in a cleaning...
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8153019 |
Methods for substantially equalizing rates at which material is removed over an area of a structure or film that includes recesses or crevices
Methods for preventing isotropic removal of materials at corners formed by seams, keyholes, and other anomalies in films or other structures include use of etch blockers to cover or coat such...
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8148272 |
Application of millisecond heating source for surface treatment
A method for fabricating semiconductor devices, e.g., strained silicon MOS device, includes providing a semiconductor substrate (e.g., silicon wafer) having a surface region, which has one or more...
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8148311 |
Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acid
The compositions and methods for the removal of residues and contaminants from metal or dielectric surfaces comprises at least one alkyl diphosphonic acid, at least one second acidic substance at a...
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8148310 |
Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acid
The compositions and methods herein relate to the method for the removal of residues and contaminants from metal or dielectric surfaces. Particularly, a composition and method of cleaning residues...
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8147615 |
Method of fabricating semiconductor cleaners
A method of manufacturing cleaning solvents is provided. The method includes selecting a small plurality of test solvents from a large plurality of perspective solvents. The equilibrium composition...
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8143203 |
Method for washing device substrate
The present invention provides a washing method for a device substrate, capable of sufficiently removing a resist attached to a device substrate, particularly a resist attached to fine pore...
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8137472 |
Semiconductor process
A semiconductor process is provided. First, a metal layer, a dielectric layer and a patterned hard mask layer are sequentially formed on a substrate. Thereafter, a portion of the dielectric layer...
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8133324 |
Methods for removal of polymeric coating layers from coated substrates
The invention provides a method for the at least partial removal of one or more polymeric coating layers from a coated substrate having at least one coated surface. The method includes generating...
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8133325 |
Dry cleaning method for plasma processing apparatus
This dry cleaning method for a plasma processing apparatus is a dry cleaning method for a plasma processing apparatus that includes: a vacuum container provided with a dielectric member; a planar...
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8114825 |
Photoresist stripping solution
Disclosed is a photoresist stripping solution consisting essentially of (a) a quaternary ammonium hydroxide (e.g., tetramethylammonium hydroxide), (b) at least one water-soluble organic solvent...
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8114220 |
Formulations for cleaning ion-implanted photoresist layers from microelectronic devices
A method and composition for removing bulk and ion-implanted photoresist and/or post-etch residue material from densely patterned microelectronic devices is described. The composition includes a...
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8110534 |
Cleaning solution for substrate for semiconductor device and process for producing substrate for semiconductor device
To provide a cleaning solution for a substrate for a semiconductor device which is excellent in the ability to remove particles, organic contaminants, metal contaminants and composite contaminants...
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8105997 |
Composition and application of a two-phase contaminant removal medium
The embodiments provide substrate cleaning techniques to remove contaminants from the substrate surface to improve device yield. The substrate cleaning techniques utilize a cleaning material with...
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8105998 |
Liquid composition for removing photoresist residue and polymer residue
Provided is a liquid composition for, at a low temperature in a short time, removing a photoresist residue and a polymer residue generated in a semiconductor circuit element manufacturing process A...
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8101934 |
Methods and apparatus for detecting a substrate notch or flat
In a first aspect, a first apparatus is provided. The first apparatus includes a through-beam sensor coupled to a scrubber and adapted to detect a notch or flat of a substrate in the scrubber...
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8101561 |
Composition and method for treating semiconductor substrate surface
The present invention is directed to compositions and method of use for treating semiconductor substrate comprising a sulfonium compound and a nucleophilic amine in the fabrication of electronic...
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8097089 |
Methods for cleaning process kits and chambers, and for ruthenium recovery
A method is provided for recovering a metal from electronic device deposition equipment including: providing deposition equipment wherein the deposition equipment is at least partially coated with...
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8097087 |
Method of cleaning support plate
A method of cleaning a support plate according to which, while no waste solution is produced after cleaning the support plate, the support plate can be treated at low cost. The method of cleaning...
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8097088 |
Methods for processing substrates in a dual chamber processing system having shared resources
Methods for processing substrates in dual chamber processing systems comprising first and second process chambers that share resources may include performing a first internal chamber clean in each...
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8097091 |
Hot source cleaning system
There is an apparatus for cleaning a substrate (5) mounted on a moveable platen. In an example embodiment, the apparatus comprises a first chamber (20), the first chamber has solvent-dispensing...
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8093154 |
Etchant treatment processes for substrate surfaces and chamber surfaces
In one embodiment of the invention, a method for finishing or treating a silicon-containing surface is provided which includes removing contaminants and/or smoothing the surface contained on the...
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8092760 |
Scanning arm for semiconductor wafer pollutant measurement apparatus and scanning device using the same
Provided is a scanning arm which moves to collect pollutants on the surface of a semiconductor wafer, for use in a semiconductor wafer pollutant measurement apparatus, and a scanning device using...
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8088455 |
Laser treatment apparatus
A drain port and an exhaust port arranged at the bottom of a cup surrounding a substrate holding unit. A drainage tray is arranged below the cup so as to cover the moving area of the drain port...
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8088227 |
Method and apparatus for the treatment of objects, in particular for the cleaning of semiconductor elements
The invention relates to the continuous cleaning of objects, in particular of semiconductor elements, using ultrasound, wherein the objects to be cleaned are arranged within a liquid. Furthermore,...
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8084194 |
Substrate edge treatment for coater/developer
A method of substrate edge treatment includes forming a processing target film on a treatment target substrate, applying an energy line to a predetermined position on the processing target film to...
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8083857 |
Substrate cleaning method and substrate cleaning apparatus
The present invention provides a substrate cleaning method capable of reducing non-uniformity of a removal efficiency of particles between lots with a simple procedure. The substrate cleaning...
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8080477 |
Film formation apparatus and method for using same
A method for using a film formation apparatus for a semiconductor process to form a thin film on a target substrate inside a reaction chamber includes performing a cleaning process to remove a...
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8075703 |
Immersive oxidation and etching process for cleaning silicon electrodes
A process for cleaning a silicon electrode is provided where the silicon electrode is soaked in an agitated aqueous detergent solution and rinsed with water following removal from the aqueous...
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8075695 |
Apparatus, circuitry, signals, probes and methods for cleaning and/or processing with sound
The invention utilizes single and multiple frequency ultrasound generators driving single and multiple frequency resonant and harmonic transducer arrays at frequencies into the megasonic range....
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8070882 |
Method for the wet-chemical treatment of a semiconductor wafer
A method for the wet-chemical treatment of a semiconductor wafer involves: a) rotating a semiconductor wafer; b) applying a cleaning liquid comprising gas bubbles having a diameter of 100 μm or ...
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8071961 |
Charged particle beam apparatus
A sample measuring method and a charged particle beam apparatus are provided which remove contaminants, that have adhered to a sample in a sample chamber of an electron microscope, to eliminate...
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8066819 |
Method of removing organic materials from substrates
Water-free, gaseous sulfur trioxide is used as an agent to remove various organic coatings, films, layers and residues from the surface of a substrate when used in conjunction with certain other...
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8063007 |
Removing agent composition and removing/cleaning method using same
The present invention relates to a removal cleaning method for a semiconductor substrate or a semiconductor device with metal wirings by using a remover composition, wherein the remover composition...
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8062429 |
Methods of cleaning semiconductor devices at the back end of line using amidoxime compositions
The present invention relates to aqueous compositions comprising amidoxime compounds and methods for cleaning plasma etch residue from semiconductor substrates including such dilute aqueous...
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8058219 |
Metals compatible post-etch photoresist remover and/or sacrificial antireflective coating etchant
A liquid removal composition and process for removing photoresist and/or sacrificial anti-reflective coating (SARC) material from a microelectronic device having same thereon. The liquid removal...
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8058220 |
Cleaning liquid for lithography and a cleaning method using it for photoexposure devices
Problem: To provide a cleaning liquid for lithography and a cleaning method using it for photoexposure devices. In a process of liquid immersion lithography, the cleaning liquid may efficiently...
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8052797 |
Method for removing foreign matter from substrate surface
A method for removing inorganic foreign matters from the surface of a substrate made of silicon or glass or the surface of an inorganic coating formed on the surface of the substrate, which...
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8052798 |
Particle removal apparatus and method and plasma processing apparatus
A particle removal apparatus for removing particles from a chamber of a plasma processing apparatus, wherein the chamber is connected to a gas exhaust port and a plasma of a processing gas is...
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